UCSB Nanofab Wiki - User contributions [en]

File:RB IK P3 T2 60 800 018.jpg

2024-11-20T00:01:35Z

Dread:

in situ tgate

File:Exsitu TGate.jpg

2024-11-19T23:50:48Z

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t gate

File:Ex situ porous GaN.png

2024-11-19T23:42:26Z

Dread:

ex situ JEOL SEM

File:In situ porous GaN.jpg

2024-11-19T23:33:57Z

Dread:

Porous GaN with in situ Velion SEM

Focused Ion-Beam Lithography (Raith Velion)

2024-11-19T01:57:59Z

Dread:

{{tool|{{PAGENAME}}
|picture=RaithVelion.jpg
|type = Lithography
|super= Dan Read
|location=Bay 1
|description = Focused Ion Beam Lithography
|manufacturer = Raith GmbH
|model = Velion
|materials =
|toolid=69
}}
= About =

VELION is a novel FIB-SEM instrument dedicated to advanced nanofabrication, in which FIB is the true priority technique. An evolution of Raith’s ionLINE, the ion column at the vertical position features a unique design to meet the most demanding nanofabrication requirements. It is supported by a field emission SEM solution as well as a highest-precision laser interferometer-controlled sample stage.

With its FIB-prioritized nanofabrication setup, including SEM and a high-accuracy stage, VELION allows for versatile use in four different operation modes that offer

• direct and versatile FIB patterning for simplified, flexible, 3D, and automated processing

• highest-precision nanofabrication over extended areas and periods of time with both FIB and SEM

• SEM imaging for in-situ process control, inspection and sample preparation.

The Raith Velion ion beam tool was installed at UCSB in 2020 and signed off and avaiable for. use in early 2021.

=Detailed Specifications=

nanoFIB column:
* Liquid Metal Alloy Ion Sources (LMAIS) providing ions for Gallium-free patterning (Au, Si)
* High resolution patterning capabilities (minimum feature size < 15nm)
* Fully corrected write fields (distortion, stigmation)
* Long term current stability (days)
Laser Interferometer stage:
* Mechanical movement at 1nm precision
* Continuous stage modes for stitch free FIB patterning on full 4”wafer scale
* Stitching and overlay accuracy: < 50 nm ( mean+3 sigma)
FE SEM
* Process control for rapid prototyping
Additional Capabilities:
* Automated height sensing to detect sample surface height variation for automated correction
* Pt Gas Injection System (GIS) localized deposition/writing
*
* Raith Nanosuite software including CAD (GDSII) navigation & patterning
== Recipes ==
* Recipes > Lithography > '''[[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29|FIB Lithography]]'''
** ''Contains starting recipes etc.''

== Examples of FIB-SEM cross sections ==

=== T-gates ===
{| class="wikitable"
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!''in situ'' SEM
!''ex situ'' SEM
|-
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|}

=== Porous layers ===
{| class="wikitable"
|+
!''in situ'' SEM
!''ex situ'' SEM
|-
|
|
|}

== Example Images CHESSY ==
{| class="wikitable"
|+
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!
|-
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Template:Tool

2021-03-18T21:03:42Z

Dread:

{| border="0" cellpadding="20" align="right" style="float: right;"
|-
|
{| border="0" cellpadding="2" cellspacing="0" style="background: whitesmoke; border: 1px solid #aaaaaa" align="center"
|-
! style="background:skyblue;" |{{{name|<includeonly>{{PAGENAME}}</includeonly>}}}
|-
|

{| border="0" cellpadding="2" cellspacing="0" style="background: black; border: 1px solid #aaaaaa" align="center"
|-
![[image:{{{picture|none.jpg}}}|300x350px|center|]]
|-
|}

|-
|
{| border="0" cellpadding="2" cellspacing="1" style="background: none; border-top:1px solid #aaaaaa"
|-valign="top"
!width=150|Tool Type
!width=200|[[:Category:{{{type|NONE}}}|{{{type|NONE}}}]]
|-valign="top"
!width=150|Location
!width=200|{{{location|}}}
|-valign="top"
{{#ifeq: {{{super}}}|Tony Bosch|{{StaffInfo|Tony Bosch|(805) 893-3486||bosch@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Ning Cao|{{StaffInfo|Ning Cao|(805) 893-4689| |ningcao@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Mike Day|{{StaffInfo|Mike Day|(805) 893-3101||day@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Don Freeborn|{{StaffInfo|Don Freeborn|(805) 893-7975| |dfreeborn@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Aidan Hopkins|{{StaffInfo|Aidan Hopkins|(805) 893-2343||hopkins@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Demis D. John|{{StaffInfo|Demis D. John|(805) 893-5934||demis@ucsb.edu}} }}{{#ifeq: {{{super}}}|Brian Lingg|{{StaffInfo|Brian Lingg|(805) 893-8145||lingg_b@ucsb.edu}} }}{{#ifeq: {{{super}}}|Bill Mitchell|{{StaffInfo|Bill Mitchell|(805) 893-4974| |mitchell@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Dan Read|{{StaffInfo|Dan Read|(805) 893-3138||dread@ucsb.edu}} }}{{#ifeq: {{{super}}}|Tom Reynolds|{{StaffInfo|Tom Reynolds|(805) 893-8158||reynolds@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Lee Sawyer|{{StaffInfo|Lee Sawyer|(805) 893-2123||lee_sawyer@ucsb.edu}} }}{{#ifeq: {{{super}}}|Mike Silva|{{StaffInfo|Mike Silva|(805) 893-3096||silva@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Biljana Stamenic|{{StaffInfo|Biljana Stamenic|(805) 893-4002 | |biljana@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Tino Sy|{{StaffInfo|Tino Sy|(805) 893-4796||sy@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Brian Thibeault|{{StaffInfo|Brian Thibeault|(805) 893-2268||thibeault@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Zack Warburg|{{StaffInfo|Zack Warburg|(805) 893-3918x200| |zwarburg@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Jack Whaley|{{StaffInfo|Jack Whaley|(805) 893-8174||whaley@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Luis Zuzunaga|{{StaffInfo|Luis Zuzunaga|(805) 893-8258||luis@ece.ucsb.edu}} }}
|-
|}
{| border="0" cellpadding="2" cellspacing="1" style="background: none; border-top:1px solid #aaaaaa"
|-valign="top"
!width=150|Description
!width=200|{{{description|NONE}}}
|-valign="top"
!width=150|Manufacturer
!width=200|{{{manufacturer|NONE}}}
|-valign="top"
{{#if:{{{model|}}} |
!width=150{{!}}Model
!width=200{{!}}{{{model|}}}
}}
|-valign="top"
{{#if:{{{materials|}}} |
!width=150{{!}}Materials
!width=200{{!}}{{{materials|}}}
}}
|-align="center"
{{#ifeq: {{{type}}}|Vacuum Deposition|{{!}}colspan="2"{{!}}'''[[Vacuum Deposition Recipes{{!}}{{{type}}} Recipes]]'''}}{{#ifeq: {{{type}}}|Dry Etch|{{!}}colspan="2"{{!}}'''[[Dry Etching Recipes{{!}}{{{type}}} Recipes]]'''}}{{#if:{{{recipe|}}}|{{!}}colspan="2"{{!}}'''[[{{{recipe}}} Recipes{{!}}{{{type}}} Recipes]]'''}}
|-
|}
{{#if:{{{toolid|}}}|
{{{!}} border="0" cellpadding="2" cellspacing="1" style="background: none; border-top:1px solid #aaaaaa"
{{!}}-valign="top"
{{!}}width=350 align=center{{!}}[http://signupmonkey.ece.ucsb.edu/cgi-bin/users/{{#ifeq:{{{toolid|}}}|999|tools.cgi|browse.cgi?tool_ID={{{toolid|}}}}} Sign up for this tool]
{{!}}-
{{!}}}|[[category:NOID]]
}}
|}
|}
<includeonly>[[category:Tools]][[Category:{{{type|NONE}}}]]</includeonly>
<noinclude>
[[category:Templates]]
This template inserts a "Tool Info" panel into a page, including a tool photo, supervisor contact info and other relevant links.

Copy/paste the following code to include this template in a page. Preferably inserted at the top of the page.

<div style="width: 70%;"><pre>
{{tool
|super = Tool Supervisor name from the list below
|picture=Photo_of_the_tool_01.jpg
|type = One of the tool types from the list below
|recipe = One of the process types, from the list below
|toolid = ### the Tool ID number from SignupMonkey
|location = Bay #
|description = This is a machine
|manufacturer = MfgCorp.
|model = (if applicable)
|materials = (If applicable)
}}
</pre></div>
</noinclude>

<noinclude>
=== Options ===
You can add the following "arguments" in the template.
* '''Supervisor''': The '''<tt style="blue">|super = </tt>''' argument must match one of the names listed below, and email/phone will be filled in automatically. See the section below for available options/how to edit info.
* '''picture''': A photograph of the tool. You must Upload the image file first (see [[Special:Upload|Upload File]] on the left sidebar), then Copy the resulting filename and Paste it into this argument. No Spaces Allowed in the filename!
* '''Type of Tool''': The '''<tt>|type = </tt>''' argument must match one of the defined values below. This will will automatically link to the correct ''Tool Listing'' wiki page (eg. Dry Etching vs. Deposition etc.)
* '''Recipe Link''': The '''<tt>|recipes = </tt>''' argument must match one of the defined values below. This will will automatically link to the correct ''Recipes'' wiki page (eg. Dry Etching vs. Deposition etc.)
* '''Tool ID on SignupMonkey''': The '''<tt>|toolid = </tt>''' argument will create a link to the Signup Monkey page for this tool. This is the number at the end of the url for a tool on SignupMonkey. Using 999 will link to the Main tool list on SignupMonkey.
* '''location, description, manufacturer, model, materials''' : You can type anything you want for these, or leave them out entirely to omit that section.
* '''Name''': By default, this argument is not included, and the title of the page will be used (which should be the name of the tool). If you want to change the name printed, add a line like:
*:<pre>|name = Optional Tool Name</pre>

=== Supervisor Information ===
The Supervisor information (email, phone) is inserted automatically by the template. Their info is coded in the template, hence there is no "email" or "phone" argument in the above example. This allows you to change their contact info in this template only, and the change will show up on all of their tool pages automatically.

To edit the Supervisor info listed, you must edit this template in <tt>Edit Source</tt> mode.

Then find the line that shows the list of '''<tt>if equals</tt>''' for each supervisor, which looks like this:
<nowiki>{{#ifeq: {{{super}}}|Tony Bosch|{{StaffInfo|Tony Bosch|(805) 893-3486||bosch@ece.ucsb.edu}} }}{{#ifeq: {{{super}}}|Ning Cao|{{StaffInfo|Ning Cao|(805) 893-4689| |ningcao@ece.ucsb.edu}} }} ....</nowiki>

It is a bit of an eyesore because no newlines or spaces can be inserted between each supervisor's options.

You can see the First option ''Tony Bosch'' here is the name you type into the Tool Template's '''<tt>|super=</tt>''' argument. Then the '''<tt><nowiki>{{StaffInfo|</nowiki></tt>''' section lists the Supervisor's information that will be inserted.

To make a new supervisor option, copy one of the sections from the first pair of curly brackets '''<tt><nowiki>{{</nowiki></tt>''' to the ending 4 brackets '''<tt><nowiki>}} }}</nowiki></tt>''', add it to the end of the list and edit the info as needed.

=== Arguments with Specific Values ===
The following arguments have specific options, only enter one of these values:
* '''super''':
*: Tony Bosch
*: Ning Cao
*: Mike Day
*: Don Freeborn
*: Aidan Hopkins
*: Demis D. John
*: Brian Lingg
*: Bill Mitchell
*: Dan Read
*: Tom Reynolds
*: Lee Sawyer
*: Mike Silva
*: Biljana Stamenic
*: Tino Sy
*: Brian Thibeault
*: Zack Warburg
*: Jack Whaley
*: Luis Zuzunaga
* '''type''':
*: Vacuum Deposition
*: Dry Etch
*: Wet Processing
*: Thermal Processing
*: Packaging
*: Inspection, Test and Characterization
*:: (spaces are ok)
* '''recipe''':
*: Lithography
*: Vacuum Deposition (auto if `type` is set to this)
*: Dry Etching (auto if `type` is set to this)
*: Wet Etching
*: Thermal Processing
*: Packaging

</noinclude>

Dan Read

2021-03-18T20:48:43Z

Dread:

{{staff|{{PAGENAME}}
|position =
|room = 1109D
|phone = (805) 893-3138
|cell =
|email = dread@ucsb.edu
}}
=About=
.

.

=Current Work=
.

.

=Tools=
{{PAGENAME}} is in charge of the following tools:
* [[Focused Ion-Beam Lithography (Raith Velion)]]

Dan Read

2021-03-18T20:48:27Z

Dread:

{{staff|{{PAGENAME}}
|position =
|room = 1109D
|phone =
|cell = (805) 893-3138
|email = dread@ucsb.edu
}}
=About=
.

.

=Current Work=
.

.

=Tools=
{{PAGENAME}} is in charge of the following tools:
* [[Focused Ion-Beam Lithography (Raith Velion)]]

Staff List

2021-03-18T20:46:17Z

Dread:

See the [https://www.nanotech.ucsb.edu/staff Contact Page] for who to contact for different requests.

==Financial & Administrative==
For questions regarding lab access or capabilities, please contact the Lab Director.
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:left; font-size: 95%" border="1"
|- bgcolor="#D0E7FF"
! width="150" bgcolor="#D0E7FF" align="center" |'''Name'''
! width="250" bgcolor="#D0E7FF" align="center" |'''Title'''
! width="150" bgcolor="#D0E7FF" align="center" |'''Phone'''
! width="100" bgcolor="#D0E7FF" align="center" |'''E-mail'''
|-
|-
|[[Brian Thibeault]]
|Technical/Operational '''Director'''
|(805) 893-2268
|thibeault@ece.ucsb.edu
|-
|[[Claudia Gutierrez]]||Financial Analyst||(805) 893-7989||claudia@ece.ucsb.edu
|}

== Facilities Group ==
General Nanofab facility management, operations, supplies inventory/stocking, plumbing, wet benches, house water/gas/waste collection etc., are handled by the Facilities Group. Facilities and supplies-related requests and requests should be directed to the appropriate person on the list, or to the group's Manager. See the [https://www.nanotech.ucsb.edu/staff Contact Page] for info on who should be contacted for different requests.
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:left; font-size: 95%" border="1"
|- bgcolor="#D0E7FF"
! width="150" bgcolor="#D0E7FF" align="center" |'''Name'''
! width="250" bgcolor="#D0E7FF" align="center" |'''Title'''
! width="150" bgcolor="#D0E7FF" align="center" |'''Phone'''
! width="100" bgcolor="#D0E7FF" align="center" |'''E-mail'''
|-
|-
|[[Mike Day]]||Facility Engineer||(805) 893-3101||day@ece.ucsb.edu
|-
|[[Aidan Hopkins]]||Facility Staff '''Manager'''||(805) 893-2343||hopkins@ece.ucsb.edu
|-
|[[Tom Reynolds]]||Engineering Expert||(805) 893-8158||reynolds@ece.ucsb.edu
|-
|[[Tino Sy]]||Facility Staff||(805) 893-4796||sy@ece.ucsb.edu
|-
|[[Luis Zuzunaga]]||Facility Staff||(805) 893-8258||luis@ece.ucsb.edu
|}

==Equipment Group==
The equpiment group manages, maintains and upgrades all fabrication tools and equipment, such as vaccuum deposition, etchers, thermal processing etc.

For issues on a particular piece of equipment, please consult the [[Frequently Asked Questions#Specific Equipment Problem|FAQ]] for who to contact and how.

See the [https://www.nanotech.ucsb.edu/staff Contact Page] for info on who should be contacted for different requests.
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:left; font-size: 95%" border="1"
|- bgcolor="#D0E7FF"
! width="150" bgcolor="#D0E7FF" align="center" |'''Name'''
! width="250" bgcolor="#D0E7FF" align="center" |'''Title'''
! width="150" bgcolor="#D0E7FF" align="center" |'''Phone'''
! width="100" bgcolor="#D0E7FF" align="center" |'''E-mail'''
|-
|-
|[[Tony Bosch]]||Equipment Engineer||(805) 893-3486||tbosch@ucsb.edu
|-
|[[Don Freeborn]]||Equipment Engineer
|(805) 893-4171||dfreeborn@ece.ucsb.edu
|-
|[[Brian Lingg]]||Equipment Engineer
|(805) 893-8145||lingg@ece.ucsb.edu
|-
|[[Lee Sawyer]]
|Equipment Engineer
|(805) 893-2123
|lee_sawyer@ucsb.edu
|-
|[[Mike Silva]]||Equipment Engineer '''Manager'''||(805) 893-3096||silva@ece.ucsb.edu
|}

==Process Group==
The process group provides expertise on process development, fabrication techniques, recipe development, and some direct tool training and maintenance. The Process Group helps to ensure that equipment is providing the expected processing capabilities.

In addition, the group performs fabrication jobs for companies, universities and research groups, for on- and off-campus groups. [https://www.nanotech.ucsb.edu/services#comp-k3t1h1jc Submit a job request here], or contact the group's Manager.
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:left; font-size: 95%" border="1"
|- bgcolor="#D0E7FF"
! width="150" bgcolor="#D0E7FF" align="center" |'''Name'''
! width="250" bgcolor="#D0E7FF" align="center" |'''Title'''
! width="150" bgcolor="#D0E7FF" align="center" |'''Phone'''
! width="100" bgcolor="#D0E7FF" align="center" |'''E-mail'''
|-
|-
|[[Ning Cao]]||Sr. Process Scientist||(805) 893-4689||ningcao@ece.ucsb.edu
|-
|[[Demis D. John]]||Process Scientist '''Manager'''||(805) 893-5934||demis@ucsb.edu
|-
|[[Bill Mitchell]]||Process Expert||(805) 893-4974||mitchell@ece.ucsb.edu
|-
|[[Dan Read]]||TBA||(805) 893-3138||dread@ucsb.edu
|-
|[[Biljana Stamenic]]||Process Scientist||(805) 893-4002||biljana@ece.ucsb.edu
|}

Staff List

2021-03-18T20:44:00Z

Dread:

See the [https://www.nanotech.ucsb.edu/staff Contact Page] for who to contact for different requests.

==Financial & Administrative==
For questions regarding lab access or capabilities, please contact the Lab Director.
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:left; font-size: 95%" border="1"
|- bgcolor="#D0E7FF"
! width="150" bgcolor="#D0E7FF" align="center" |'''Name'''
! width="250" bgcolor="#D0E7FF" align="center" |'''Title'''
! width="150" bgcolor="#D0E7FF" align="center" |'''Phone'''
! width="100" bgcolor="#D0E7FF" align="center" |'''E-mail'''
|-
|-
|[[Brian Thibeault]]
|Technical/Operational '''Director'''
|(805) 893-2268
|thibeault@ece.ucsb.edu
|-
|[[Claudia Gutierrez]]||Financial Analyst||(805) 893-7989||claudia@ece.ucsb.edu
|}

== Facilities Group ==
General Nanofab facility management, operations, supplies inventory/stocking, plumbing, wet benches, house water/gas/waste collection etc., are handled by the Facilities Group. Facilities and supplies-related requests and requests should be directed to the appropriate person on the list, or to the group's Manager. See the [https://www.nanotech.ucsb.edu/staff Contact Page] for info on who should be contacted for different requests.
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:left; font-size: 95%" border="1"
|- bgcolor="#D0E7FF"
! width="150" bgcolor="#D0E7FF" align="center" |'''Name'''
! width="250" bgcolor="#D0E7FF" align="center" |'''Title'''
! width="150" bgcolor="#D0E7FF" align="center" |'''Phone'''
! width="100" bgcolor="#D0E7FF" align="center" |'''E-mail'''
|-
|-
|[[Mike Day]]||Facility Engineer||(805) 893-3101||day@ece.ucsb.edu
|-
|[[Aidan Hopkins]]||Facility Staff '''Manager'''||(805) 893-2343||hopkins@ece.ucsb.edu
|-
|[[Tom Reynolds]]||Engineering Expert||(805) 893-8158||reynolds@ece.ucsb.edu
|-
|[[Tino Sy]]||Facility Staff||(805) 893-4796||sy@ece.ucsb.edu
|-
|[[Luis Zuzunaga]]||Facility Staff||(805) 893-8258||luis@ece.ucsb.edu
|}

==Equipment Group==
The equpiment group manages, maintains and upgrades all fabrication tools and equipment, such as vaccuum deposition, etchers, thermal processing etc.

For issues on a particular piece of equipment, please consult the [[Frequently Asked Questions#Specific Equipment Problem|FAQ]] for who to contact and how.

See the [https://www.nanotech.ucsb.edu/staff Contact Page] for info on who should be contacted for different requests.
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:left; font-size: 95%" border="1"
|- bgcolor="#D0E7FF"
! width="150" bgcolor="#D0E7FF" align="center" |'''Name'''
! width="250" bgcolor="#D0E7FF" align="center" |'''Title'''
! width="150" bgcolor="#D0E7FF" align="center" |'''Phone'''
! width="100" bgcolor="#D0E7FF" align="center" |'''E-mail'''
|-
|-
|[[Tony Bosch]]||Equipment Engineer||(805) 893-3486||tbosch@ucsb.edu
|-
|[[Don Freeborn]]||Equipment Engineer
|(805) 893-4171||dfreeborn@ece.ucsb.edu
|-
|[[Brian Lingg]]||Equipment Engineer
|(805) 893-8145||lingg@ece.ucsb.edu
|-
|[[Lee Sawyer]]
|Equipment Engineer
|(805) 893-2123
|lee_sawyer@ucsb.edu
|-
|[[Mike Silva]]||Equipment Engineer '''Manager'''||(805) 893-3096||silva@ece.ucsb.edu
|}

==Process Group==
The process group provides expertise on process development, fabrication techniques, recipe development, and some direct tool training and maintenance. The Process Group helps to ensure that equipment is providing the expected processing capabilities.

In addition, the group performs fabrication jobs for companies, universities and research groups, for on- and off-campus groups. [https://www.nanotech.ucsb.edu/services#comp-k3t1h1jc Submit a job request here], or contact the group's Manager.
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:left; font-size: 95%" border="1"
|- bgcolor="#D0E7FF"
! width="150" bgcolor="#D0E7FF" align="center" |'''Name'''
! width="250" bgcolor="#D0E7FF" align="center" |'''Title'''
! width="150" bgcolor="#D0E7FF" align="center" |'''Phone'''
! width="100" bgcolor="#D0E7FF" align="center" |'''E-mail'''
|-
|-
|[[Ning Cao]]||Sr. Process Scientist||(805) 893-4689||ningcao@ece.ucsb.edu
|-
|[[Demis D. John]]||Process Scientist '''Manager'''||(805) 893-5934||demis@ucsb.edu
|-
|[[Bill Mitchell]]||Process Expert||(805) 893-4974||mitchell@ece.ucsb.edu
|-
|[[Dan Read]]
|TBA
|(805) 893-3138|dread@ucsb.edu
|-
|[[Biljana Stamenic]]||Process Scientist||(805) 893-4002||biljana@ece.ucsb.edu
|}

Focused Ion-Beam Lithography (Raith Velion)

2021-03-12T14:58:13Z

Dread: /* Detailed Specifications */

{{WIP}}
{{tool|{{PAGENAME}}
|picture=RaithVelion.jpg
|type = Lithography
|super= Dan Read
|location=Bay 1
|description = Focused Ion Beam Lithography
|manufacturer = Raith GmbH
|model = Velion
|materials =
|toolid=
}}
= About =

VELION is a novel FIB-SEM instrument dedicated to advanced nanofabrication, in which FIB is the true priority technique. An evolution of Raith’s ionLINE, the ion column at the vertical position features a unique design to meet the most demanding nanofabrication requirements. It is supported by a field emission SEM solution as well as a highest-precision laser interferometer-controlled sample stage.

With its FIB-prioritized nanofabrication setup, including SEM and a high-accuracy stage, VELION allows for versatile use in four different operation modes that offer

• direct and versatile FIB patterning for simplified, flexible, 3D, and automated processing

• highest-precision nanofabrication over extended areas and periods of time with both FIB and SEM

• SEM imaging for in-situ process control, inspection and sample preparation.

The Raith Velion ion beam tool was installed at UCSB in 2020 and signed off and avaiable for. use in early 2021.

=Detailed Specifications=

nanoFIB column:
* Liquid Metal Alloy Ion Sources (LMAIS) providing ions for Gallium-free patterning (Au, Si)
* High resolution patterning capabilities (minimum feature size < 15nm)
* Fully corrected write fields (distortion, stigmation)
* Long term current stability (days)
Laser Interferometer stage:
* Mechanical movement at 1nm precision
* Continuous stage modes for stitch free FIB patterning on full 4”wafer scale
* Stitching and overlay accuracy: < 50 nm ( mean+3 sigma)
FE SEM
* Process control for rapid prototyping
Additional Capabilities:
* Automated height sensing to detect sample surface height variation for automated correction
* Pt Gas Iinjection System (GIS) deposition
*
* Raith Nanosuite software including CAD (GDSII) navigation & patterning
== Recipes ==
* Recipes > Lithography > '''[[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29|FIB Lithography]]'''
** ''Contains starting recipes etc.''

File:RaithVelion.jpg

2021-03-12T14:56:41Z

Dread:

Focused Ion-Beam Lithography (Raith Velion)

2021-03-12T14:54:48Z

Dread:

{{WIP}}
{{tool|{{PAGENAME}}
|picture=RaithVelion.jpg
|type = Lithography
|super= Dan Read
|location=Bay 1
|description = Focused Ion Beam Lithography
|manufacturer = Raith GmbH
|model = Velion
|materials =
|toolid=
}}
= About =

VELION is a novel FIB-SEM instrument dedicated to advanced nanofabrication, in which FIB is the true priority technique. An evolution of Raith’s ionLINE, the ion column at the vertical position features a unique design to meet the most demanding nanofabrication requirements. It is supported by a field emission SEM solution as well as a highest-precision laser interferometer-controlled sample stage.

With its FIB-prioritized nanofabrication setup, including SEM and a high-accuracy stage, VELION allows for versatile use in four different operation modes that offer

• direct and versatile FIB patterning for simplified, flexible, 3D, and automated processing

• highest-precision nanofabrication over extended areas and periods of time with both FIB and SEM

• SEM imaging for in-situ process control, inspection and sample preparation.

The Raith Velion ion beam tool was installed at UCSB in 2020 and signed off and avaiable for. use in early 2021.

=Detailed Specifications=

nanoFIB column:
* Liquid Metal Alloy Ion Sources (LMAIS) providing ions for Gallium-free patterning (Au, Si)
* High resolution patterning capabilities (minimum feature size < 15nm)
* Fully corrected write fields (distortion, stigmation)
* Long term current stability (days)
Laser Interferometer stage:
* Mechanical movement at 1nm precision
* Continuous stage modes for stitch free FIB patterning on full 4”wafer scale
* Stitching and overlay accuracy: < 50 nm ( mean+3 sigma)
FE SEM
* Process control for rapid prototyping
Additional Capabilities:
* Automated height sensing to detect sample surface height variation for automated correction
* Pt Gas Iinjection System (GIS) deposition
*
* Raith Nanosuite software incl. CAD (GDSII) navigation & patterning
== Recipes ==
* Recipes > Lithography > '''[[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29|FIB Lithography]]'''
** ''Contains starting recipes etc.''

Focused Ion-Beam Lithography (Raith Velion)

2021-03-12T14:49:17Z

Dread:

{{WIP}}
{{tool|{{PAGENAME}}
|picture=RaithVelion.jpg
|type = Lithography
|super= Dan Read
|location=Bay 1
|description = Focused Ion Beam Lithography
|manufacturer = Raith Gmbh
|model = Velion
|materials =
|toolid=
}}
= About =
The Raith Velion ion beam tool was installed at UCSB in 2020 and signed off and avaiable for. use in early 2021.

=Detailed Specifications=

nanoFIB column:
* Liquid Metal Alloy Ion Sources (LMAIS) providing ions for Gallium-free patterning (Au, Si)
* High resolution patterning capabilities (minimum feature size < 15nm)
* Fully corrected write fields (distortion, stigmation)
* Long term current stability (days)
Laser Interferometer stage:
* Mechanical movement at 1nm precision
* Continuous stage modes for stitch free FIB patterning on full 4”wafer scale
* Stitching and overlay accuracy: < 50 nm ( mean+3 sigma)
FE SEM
* Process control for rapid prototyping
Additional Capabilities:
* Automated height sensing to detect sample surface height variation for automated correction
* Pt Gas Iinjection System (GIS) deposition
*
* Raith Nanosuite software incl. CAD (GDSII) navigation & patterning
== Recipes ==
* Recipes > Lithography > '''[[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29|FIB Lithography]]'''
** ''Contains starting recipes etc.''

Focused Ion-Beam Lithography (Raith Velion)

2021-03-12T14:48:33Z

Dread: /* About */

{{WIP}}
{{tool|{{PAGENAME}}
|picture=RaithVelion.jpg
|type = Lithography
|super= Dan Read
|location=Bay 1
|description = Focused Ion Beam Lithography
|manufacturer = Raith Gmbh
|model = Velion
|materials =
|toolid=
}}
= About =
The Raith Velion ion beam tool was installed at UCSB in 2020 and signed off and avaiable for. use in early 2021.

This system uses the vector scan approach for electron beam deflection within a field, step and repeat for stage movement between fields, the combination of which allows the entire area of the sample to be exposed to the electron beam.

The machine can be run at 25, 50 and 100 kV. Note however that only the 100kV mode is used at UCSB.

=Detailed Specifications=

nanoFIB column:
* Liquid Metal Alloy Ion Sources (LMAIS) providing ions for Gallium-free patterning (Au, Si)
* High resolution patterning capabilities (minimum feature size < 15nm)
* Fully corrected write fields (distortion, stigmation)
* Long term current stability (days)
Laser Interferometer stage:
* Mechanical movement at 1nm precision
* Continuous stage modes for stitch free FIB patterning on full 4”wafer scale
* Stitching and overlay accuracy: < 50 nm ( mean+3 sigma)
FE SEM
* Process control for rapid prototyping
Additional Capabilities:
* Automated height sensing to detect sample surface height variation for automated correction
* Pt Gas Iinjection System (GIS) deposition
*
* Raith Nanosuite software incl. CAD (GDSII) navigation & patterning
== Recipes ==
* Recipes > Lithography > '''[[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29|FIB Lithography]]'''
** ''Contains starting recipes etc.''

Tech Talks Seminar Series

2021-03-12T14:30:15Z

Dread: /* Presented Slides */

__TOC__ 

==Thursday, Dec. 5, 12pm, ESB1001, Light Lunch Provided==
[[File:TechTalk20191205.jpg]]

===Presented Slides===

*{{File|2000 pixel mkids.pdf|The fabrication of 20,000 pixel kinetic inductance detector arrays for near-IR to visible astronomy - Grégoire Coiffard}}

==Thursday, Oct. 10, 12pm, ESB1001, Light Lunch Provided==
[[File:TechTalk20191010.jpg]]

===Presented Slides===

*{{File|N-Polar HEMTs mm-Wave.pdf|N-Polar GaN Deep Recess HEMTs for mm-wave Power Amplification - Brian Romanczyk}}

==Thursday, Sept. 26, 12pm, ESB1001, Light Lunch Provided==
[[File:TechTalk20190926.jpg]]

===Presented Slides===

*{{file|IR Imaging and Laser Sensing.pdf|Infrared Imaging and Laser Sensing - Michael MacDougal}}
*{{File|High Power PICs for Free Space.pdf|High Power Photonic Integrated Circuits for Free Space Communications - Hongwei Zhao}}

==Thursday, Sept. 12, 12pm, ESB1001, Light Lunch Provided==
[[File:TechTalk20190912.jpg]]

===Presented Slides===

*{{File|THz Transistors and Template Assisted Selective Epitaxy.pdf|THz Transistors and Template Assisted Selective Epitaxy - Brian Markman}}

==Thursday, Sept. 5, 12pm, ESB1001, Light Lunch Provided==
[[File:TechTalk20190905.jpg]]

===Presented Slides===

*{{file|High Performance Lasers on Silicon Slides.pdf|High Performance Lasers on Silicon - Songtao Liu}}
*{{File|Semiconductor Supermirrors.pdf|Semiconductor Supermirrors - Garrett Cole}}