UCSB Nanofab Wiki - Recent changes [en]

Lab Rules

John d — Thu, 04 Jun 2026 22:27:54 GMT

Procedure for the Use and Handling of Precious Metals

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	#All precious metals (as well as other materials paid for by the Nanofab) are the property of the Nanofab. They are not to be used for any other purpose than for use within Nanofab systems. The materials must remain in the Nanofab at all times.		#All precious metals (as well as other materials paid for by the Nanofab) are the property of the Nanofab. They are not to be used for any other purpose than for use within Nanofab systems. The materials must remain in the Nanofab at all times.
	#Gold, platinum, palladium, and various alloys of these metals are stocked by the UCSB Nanofab and are provided for in the hourly recharge fee. Each research group can be issued a precious metal supply. You should check with your group first before contacting the Nanofab. Please contact the Nanofab Director for precious metals, thibeault@ece.ucsb.edu.[[File:Lab Rules - 1.15.2 metals lock box.png\|thumb\|121x121px]]		#Gold, platinum, palladium, and various alloys of these metals are stocked by the UCSB Nanofab and are provided for in the hourly recharge fee. Each research group can be issued a precious metal supply. You should check with your group first before contacting the Nanofab. Please contact the Nanofab Director for precious metals, thibeault@ece.ucsb.edu.[[File:Lab Rules - 1.15.2 metals lock box.png\|thumb\|121x121px]]
	#This supply must be stored in a small lockable container, along with a log sheet for recording the use of these metals. Precious metals, the lockable security container, and log sheets will be issued by the Nanofab manager. All use of precious metals must be accurately recorded on the log sheet, and include user name, date, metal type, metal weight before use, and metal weight after use. '''Any discrepancies, such as over use or loss of the precious metals will be invoiced to the responsible group/company. Loss of a precious metal lock box will be reported to the local UCSB police and will elevate the issue as this is may constitute theft.''' Please make sure you are careful with your metal supply as you would be with your own money.		#This supply must be stored in a small lockable container, along with a log sheet for recording the use of these metals. Precious metals, the lockable security container, and log sheets will be issued by the Nanofab manager. All use of precious metals must be accurately recorded on the log sheet, and include user name, date, metal type, metal weight before use, and metal weight after use. '''Any discrepancies, such as over use or loss of the precious metals will be invoiced to the responsible group/company. Loss of a precious metal lock box will be reported to the local UCSB police and will elevate the issue as this is may constitute theft.''' Please make sure you are careful with your metal supply as you would be with your own money. [[File:Lab Rules - 1.15.4 metals weighing scale.png\|thumb\|151x151px]]
	#Every group is responsible for keeping their supply of precious metals up to date and full. But since all users are sharing the same lab supply of provided metals it is fine to share metals between groups if there are extenuating circumstances that prevented a group from having sufficient precious metal supply. It must be correctly noted in the other group’s log sheets that metal was used.		#Every group is responsible for keeping their supply of precious metals up to date and full. But since all users are sharing the same lab supply of provided metals it is fine to share metals between groups if there are extenuating circumstances that prevented a group from having sufficient precious metal supply. It must be correctly noted in the other group’s log sheets that metal was used.
	#To request more metals, email the operational director your request and leave the lockbox in the labeled blue bin located on the wire rack in the gowning room entryway. You will be notified by email when the metal has been replenished and your box has been returned to the blue bin.[[File:Lab Rules - 1.15.4 metals weighing scale.png\|thumb\|151x151px]]
	#Multiple digital scales have been acquired and placed throughout the Nanofab to facilitate weighing of these metals. When requesting additional precious metals, the completed log sheet must be presented to the Nanofab manager. Any discrepancies or loss in recorded precious metal use will result in charges to the principle investigator/company corresponding to the value of the precious metal missing.		#Multiple digital scales have been acquired and placed throughout the Nanofab to facilitate weighing of these metals. When requesting additional precious metals, the completed log sheet must be presented to the Nanofab manager. Any discrepancies or loss in recorded precious metal use will result in charges to the principle investigator/company corresponding to the value of the precious metal missing.
	#Any loose precious metal lock boxes left out or any loose unmarked precious metals found in the lab either in a plastic bags, tins or individually laying on the floor should be returned to the lab manager for reclaim.		#Any loose precious metal lock boxes left out or any loose unmarked precious metals found in the lab either in a plastic bags, tins or individually laying on the floor should be returned to the lab manager for reclaim.

			==== Procedure to request more metals ====
			# email [mailto:nanofab-metal-refill@ece.ucsb.edu nanofab-metal-refill@ece.ucsb.edu], with the following info:
			# Your group name (labelled on your lockbox)
			# What metals you need refilled
			# The code to your lockbox
			# And leave the lockbox in the labeled blue bin located on the wire rack in the gowning room entryway.
			# You will be notified by email when the metal has been replenished and your box has been returned to the blue bin.

	===Surveillance Cameras===		===Surveillance Cameras===

Tool List

John d — Mon, 01 Jun 2026 18:22:43 GMT

Lithography: deleted Stepper 1

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	=====Steppers (Optical Exposure)=====		=====Steppers (Optical Exposure)=====

	*[[Stepper 1 (GCA 6300)\|Stepper 1 (GCA 6300, i-line)]]
	*[[Stepper 2 (AutoStep 200)\|Stepper 2 (AutoStep 200, i-line)]]		*[[Stepper 2 (AutoStep 200)\|Stepper 2 (AutoStep 200, i-line)]]
	*[[Stepper 3 (ASML DUV)\|Stepper 3 (ASML DUV, Deep-UV)]]		*[[Stepper 3 (ASML DUV)\|Stepper 3 (ASML DUV, Deep-UV)]]

Decomissioned Tools

John d — Mon, 01 Jun 2026 18:22:23 GMT

added Stepepr 1

← Older revision		Revision as of 18:22, 1 June 2026
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	*[[E-Beam Lithography System (JEOL JBX-6300FS)]]		*[[E-Beam Lithography System (JEOL JBX-6300FS)]]
	*[[Nano-Imprint (Nanonex NX2000)]]		*[[Nano-Imprint (Nanonex NX2000)]]
			*[[Stepper 1 (GCA 6300)]]

	==Vacuum Deposition==		==Vacuum Deposition==

Stepper 1 (GCA 6300)

John d — Mon, 01 Jun 2026 18:21:35 GMT

tool removed notice

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 == About ==
 Our GCA wafer stepper is an i-line (365 nm) step and repeat exposure tool for doing lithography that requires high resolution and/or critical alignment. The system has been modified to accept piece parts (down to ~15 mm x 15 mm) up to 6” diameter wafers using manual wafer loading. The maximum square die size is 14.8mm x 14.8mm. The system has an Olympus 2142 (N.A. = 0.42) lens that reduces the mask image by 5 x and gives an ultimate resolution of ~ 0.5 um in the center of the lens field. The system can easily produce 0.7 um isolated lines across the entire field. Autofocus is used to determine the sample surface relative to the lens, making the focus stable and repeatable for different thickness of wafer. The stages are controlled by stepper motors and laser interferometers. Using the global, manual alignment, better than 0.25 um alignment error is achievable. Using the DFAS local alignment system, alignment error better than 0.15 um is achieved. With the 350 W Hg arc lamp, we get approximately 180 mW/cm² of i-line intensity at the wafer.

Nanofab Job Postings

Noahdutra — Mon, 01 Jun 2026 17:02:57 GMT

Closed internship page and edited some details

Template:News

John d — Wed, 27 May 2026 19:53:35 GMT

Prototyping Lab Opening Soon: added arin's email

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	<!---------------------------------------------->		<!---------------------------------------------->
	<!-------- NEWS ITEMS: newest on top -------->		<!-------- NEWS ITEMS: newest on top -------->
			===Prototyping Lab Opening Soon===
			The Nanofab is launching a [https://protofab.oasis.ucsb.edu/ Prototyping Facility called the "Protofab"], which is located at [https://oasis.ucsb.edu/ UCSB's new OASIS building].

			The new lab will enable taking your diced chips from the Nanofab, to the Protofab where you can wirebond, attach to PCB's/carriers, align+attach optical fibers etc., to make a real "prototype". The lab is expected to open in Summer 2026, with equipment currently being installed.

			Access will be similar to the Nanofab - anyone can pay an hourly fee to go into the Protofab, using key fobs for access. (OASIS "Membership" is ''not required'' to use the Protofab, unless you also want your own desk + private lab space at OASIS.)

			Contact the Protofab lab manager [mailto:arin_abed@ucsb.edu Arin Abed] for more information.
			// [[User:John_d\|Demis D. John]] 19:51, 27 May 2026 (UTC)

	===DREAMS Hub awarded 2 projects in GaN and 5G/6G technologies===		===DREAMS Hub awarded 2 projects in GaN and 5G/6G technologies===
	[https://viterbischool.usc.edu/news/2024/09/usc-viterbi-led-ca-dreams-hub-is-awarded-31-9-million-in-funding-under-the-microelectronics-commons/ CA DREAMS Hub is awarded $31.9 million in funding under the Microelectronics Commons] -		[https://viterbischool.usc.edu/news/2024/09/usc-viterbi-led-ca-dreams-hub-is-awarded-31-9-million-in-funding-under-the-microelectronics-commons/ CA DREAMS Hub is awarded $31.9 million in funding under the Microelectronics Commons] -

Atomic Layer Deposition Recipes

Biljana — Thu, 21 May 2026 22:43:01 GMT

Al2O3 deposition (ALD CHAMBER 1)

← Older revision		Revision as of 22:43, 21 May 2026
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	**300°C Dep., Thermal Water reaction		**300°C Dep., Thermal Water reaction
	**This is considered the standard recipe for ALD		**This is considered the standard recipe for ALD
			**TEMP = 300C, Al<sub>2</sub>O<sub>3</sub> deposition rate=1.3376 A/cyc
	**Al<sub>2</sub>O<sub>3</sub> deposition rate ~ 1 A/cyc		**Al<sub>2</sub>O<sub>3</sub> deposition rate ~ 1 A/cyc
	**Recipe variations: ''TBD''		**Recipe variations: ''TBD''
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	**TEMP = 300C (std), 250C, 230C, 200C, 150C, 120C		**TEMP = 300C (std), 250C, 230C, 200C, 150C, 120C
	**Etch rate (BHF:DI=1:100)~7.46nm/min		**Etch rate (BHF:DI=1:100)~7.46nm/min
	**
	Recipe name: '''''CH1-BDEAS-O/300W[LoP]-TEMP'''''		Recipe name: '''''CH1-BDEAS-O/300W[LoP]-TEMP'''''
	**replicates the (lower pressure) deposition conditions in ch3 for those that need it		**replicates the (lower pressure) deposition conditions in ch3 for those that need it
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	**Al<sub>2</sub>O<sub>3</sub> deposition rate ~ 1.1-1.2 A/cyc		**Al<sub>2</sub>O<sub>3</sub> deposition rate ~ 1.1-1.2 A/cyc
	**TEMP = 300C (std), 250C, 200C, 150C, 120C		**TEMP = 300C (std), 250C, 200C, 150C, 120C
	**TEMP= ~~200C~~, Al<sub>2</sub>O<sub>3</sub> deposition rate=1.~~1631~~ A/cyc		**TEMP = 300C, Al<sub>2</sub>O<sub>3</sub> deposition rate=1.1973 A/cyc
			**TEMP = 200C, Al<sub>2</sub>O<sub>3</sub> deposition rate=1.1631 A/cyc
			**TEMP = 150C, Al<sub>2</sub>O<sub>3</sub> deposition rate=1.0852 A/cyc
	Recipe Name: '''''CH3-TMA+250W/O-TEMP''''' ("Plasma")		Recipe Name: '''''CH3-TMA+250W/O-TEMP''''' ("Plasma")
	*Activated O Plasma reaction instead of H2O => non-thermal		*Activated O Plasma reaction instead of H2O => non-thermal
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	*Recipe utilizes an O plasma @ 40sccm O2, 300W ICP, 10mTorr pressure,		*Recipe utilizes an O plasma @ 40sccm O2, 300W ICP, 10mTorr pressure,
	**TEMP = <u>300°C</u> (std.), 250°C, 230°C, 220°C, 200°C, 150°C, 120°C		**TEMP = <u>300°C</u> (std.), 250°C, 230°C, 220°C, 200°C, 150°C, 120°C
			**TEMP = <u>300°C,</u> dep. rate=1.2333 A/cyc
	*Recipe name: '''''CH3-BDEAS+O3-300C''''' ("Ozone")		*Recipe name: '''''CH3-BDEAS+O3-300C''''' ("Ozone")
	*Uses Ozone (O<sub>3</sub>) for reactant instead of O plasma - still under development!		*Uses Ozone (O<sub>3</sub>) for reactant instead of O plasma - still under development!

Noah Dutra

Noahdutra — Thu, 21 May 2026 03:37:38 GMT

← Older revision		Revision as of 03:37, 21 May 2026
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	}}		}}
	==About==		==About==
	Noah is a Process Engineer at the UCSB NanoFab. He earned his degree in Chemical Engineering from UCSB in 2023, where he distinguished himself with the top capstone design project of his cohort. During his undergraduate studies in 2022, Noah was among the first interns at the UCSB NanoFab, marking his initial exposure to semiconductor engineering. This experience inspired him to accept a position as a Semiconductor Process Engineer at Lockheed Martin/Santa Barbara Focalplane in Goleta, where he contributed to the production of infrared focal plane arrays for military and space applications. Driven by the dynamic environment and opportunities at the UCSB NanoFab, Noah rejoined the facility in 2024.		Noah is a Process Engineer at the UCSB NanoFab. He earned his degree in Chemical Engineering from UCSB in 2023, where he distinguished himself with the top capstone design project of his cohort. During his undergraduate studies in 2022, Noah was among the first interns at the UCSB NanoFab, marking his initial exposure to semiconductor engineering. This experience inspired him to accept a position as a Semiconductor Process Engineer at Lockheed Martin/Santa Barbara Focalplane in Goleta, where he contributed to the production of infrared focal plane arrays for military and space applications. Driven by the dynamic environment and opportunities at the UCSB NanoFab, Noah rejoined the facility in 2024. In 2026, Noah will pursue a Masters of Science degree in Electronics and Photonics at UCSB.

	==Current Work==		==Current Work==

Direct-Write I-Line Recipes

Biljana — Wed, 20 May 2026 22:24:57 GMT

Positive Resist (MLA150): THMR exposre and focus for big feature size, dense

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 low dose for clear-field, high does for dark-field
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Research

John d — Tue, 19 May 2026 17:02:51 GMT

fixed duplicate lab names

Show changes

File:2026-04-24 research Mazin MKID 10K Array Zoom.png

Maintenance script — Tue, 19 May 2026 17:00:02 GMT

Maintenance script uploaded File:2026-04-24 research Mazin MKID 10K Array Zoom.png == Summary == Research images 2nd try 2026-04-24

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