<?xml version="1.0"?>
<feed xmlns="http://www.w3.org/2005/Atom" xml:lang="en">
	<id>https://wiki.nanofab.ucsb.edu/w/index.php?action=history&amp;feed=atom&amp;title=ASML_5500%3A_Choose_Marks_for_Prealignment</id>
	<title>ASML 5500: Choose Marks for Prealignment - Revision history</title>
	<link rel="self" type="application/atom+xml" href="https://wiki.nanofab.ucsb.edu/w/index.php?action=history&amp;feed=atom&amp;title=ASML_5500%3A_Choose_Marks_for_Prealignment"/>
	<link rel="alternate" type="text/html" href="https://wiki.nanofab.ucsb.edu/w/index.php?title=ASML_5500:_Choose_Marks_for_Prealignment&amp;action=history"/>
	<updated>2026-04-08T22:13:03Z</updated>
	<subtitle>Revision history for this page on the wiki</subtitle>
	<generator>MediaWiki 1.43.6</generator>
	<entry>
		<id>https://wiki.nanofab.ucsb.edu/w/index.php?title=ASML_5500:_Choose_Marks_for_Prealignment&amp;diff=155285&amp;oldid=prev</id>
		<title>John d: added global mark updating</title>
		<link rel="alternate" type="text/html" href="https://wiki.nanofab.ucsb.edu/w/index.php?title=ASML_5500:_Choose_Marks_for_Prealignment&amp;diff=155285&amp;oldid=prev"/>
		<updated>2018-07-17T21:17:56Z</updated>

		<summary type="html">&lt;p&gt;added global mark updating&lt;/p&gt;
&lt;table style=&quot;background-color: #fff; color: #202122;&quot; data-mw=&quot;interface&quot;&gt;
				&lt;col class=&quot;diff-marker&quot; /&gt;
				&lt;col class=&quot;diff-content&quot; /&gt;
				&lt;col class=&quot;diff-marker&quot; /&gt;
				&lt;col class=&quot;diff-content&quot; /&gt;
				&lt;tr class=&quot;diff-title&quot; lang=&quot;en&quot;&gt;
				&lt;td colspan=&quot;2&quot; style=&quot;background-color: #fff; color: #202122; text-align: center;&quot;&gt;← Older revision&lt;/td&gt;
				&lt;td colspan=&quot;2&quot; style=&quot;background-color: #fff; color: #202122; text-align: center;&quot;&gt;Revision as of 21:17, 17 July 2018&lt;/td&gt;
				&lt;/tr&gt;&lt;tr&gt;
  &lt;td colspan=&quot;2&quot; class=&quot;diff-lineno&quot;&gt;Line 7:&lt;/td&gt;
  &lt;td colspan=&quot;2&quot; class=&quot;diff-lineno&quot;&gt;Line 7:&lt;/td&gt;
&lt;/tr&gt;
&lt;tr&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;## The wafer schematic shows which alignment marks you are choosing.&lt;/div&gt;&lt;/td&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;## The wafer schematic shows which alignment marks you are choosing.&lt;/div&gt;&lt;/td&gt;
&lt;/tr&gt;
&lt;tr&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;## The alignment marks, defined on a previous layer (usually combined with the first litho), are programmed/named in: &#039;&#039;&amp;lt;to be added: where in the program the AlMks are defined&amp;gt;&#039;&#039;&lt;/div&gt;&lt;/td&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;## The alignment marks, defined on a previous layer (usually combined with the first litho), are programmed/named in: &#039;&#039;&amp;lt;to be added: where in the program the AlMks are defined&amp;gt;&#039;&#039;&lt;/div&gt;&lt;/td&gt;
&lt;/tr&gt;
&lt;tr&gt;
  &lt;td colspan=&quot;2&quot; class=&quot;diff-empty diff-side-deleted&quot;&gt;&lt;/td&gt;
  &lt;td class=&quot;diff-marker&quot; data-marker=&quot;+&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;# Your &quot;Fine&quot; alignment marks will probably also fail if they&#039;re set to use the same marks!  Fix this by editing your &#039;&#039;&#039;Wafer Layout &amp;gt; Alignment Strategy&#039;&#039;&#039;, and select different alignment marks or set some &quot;backup&quot; marks. Make sure your &#039;&#039;&#039;Layer Layout &amp;gt; Strategy Selection&#039;&#039;&#039; is using this new/updated strategy.&lt;/div&gt;&lt;/td&gt;
&lt;/tr&gt;
&lt;/table&gt;</summary>
		<author><name>John d</name></author>
	</entry>
	<entry>
		<id>https://wiki.nanofab.ucsb.edu/w/index.php?title=ASML_5500:_Choose_Marks_for_Prealignment&amp;diff=154941&amp;oldid=prev</id>
		<title>John d: initial, instructions on how to edit Optical Prealignment alignment choice</title>
		<link rel="alternate" type="text/html" href="https://wiki.nanofab.ucsb.edu/w/index.php?title=ASML_5500:_Choose_Marks_for_Prealignment&amp;diff=154941&amp;oldid=prev"/>
		<updated>2018-03-28T16:47:30Z</updated>

		<summary type="html">&lt;p&gt;initial, instructions on how to edit Optical Prealignment alignment choice&lt;/p&gt;
&lt;p&gt;&lt;b&gt;New page&lt;/b&gt;&lt;/p&gt;&lt;div&gt;How to edit your job and choose which alignment marks the system will use for optical prealignment, performed on the P-Chuck (before wafer is moved to the exposure E-Chuck).&lt;br /&gt;
&lt;br /&gt;
# Edit your job with Modify Job&lt;br /&gt;
# Go to &amp;#039;&amp;#039;&amp;#039;&amp;#039;&amp;#039;Layer Layout &amp;gt; Process Data&amp;#039;&amp;#039;&amp;#039;&amp;#039;&amp;#039;&lt;br /&gt;
# Use Layer: &amp;#039;&amp;#039;&amp;#039;&amp;#039;&amp;#039;(Prev)&amp;#039;&amp;#039;&amp;#039;&amp;#039;&amp;#039; / &amp;#039;&amp;#039;&amp;#039;&amp;#039;&amp;#039;(Next)&amp;#039;&amp;#039;&amp;#039;&amp;#039;&amp;#039; to select the layer you need to change alignment marks for&lt;br /&gt;
# Under  &amp;#039;&amp;#039;&amp;#039;&amp;#039;&amp;#039;Prealignment Mode&amp;#039;&amp;#039;&amp;#039;&amp;#039;&amp;#039;: &amp;#039;&amp;#039;&amp;#039;&amp;#039;&amp;#039;Selection: Mark 1___ &amp;amp; Mark 2___&amp;#039;&amp;#039;&amp;#039;&amp;#039;&amp;#039; choose the alignment marks to align to, and use a microscope to make sure these alignment marks are (a) present on your wafer and (b) look ok with no defects.&lt;br /&gt;
## The wafer schematic shows which alignment marks you are choosing.&lt;br /&gt;
## The alignment marks, defined on a previous layer (usually combined with the first litho), are programmed/named in: &amp;#039;&amp;#039;&amp;lt;to be added: where in the program the AlMks are defined&amp;gt;&amp;#039;&amp;#039;&lt;/div&gt;</summary>
		<author><name>John d</name></author>
	</entry>
</feed>