ASML Stepper 3 Standard Operating Procedure - Revision history

John d: /* Tips for FEM analysis */ link top FEM tutorial

2025-11-05T17:04:56Z

Tips for FEM analysis: link top FEM tutorial

← Older revision		Revision as of 17:04, 5 November 2025
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	\|}		\|}
	====Tips for FEM analysis====		====Tips for FEM analysis====

			* [[Lithography Calibration - Analyzing a Focus-Exposure Matrix\|'''Tutorial: Analyzing a Focus-Exposure Matrix (FEM)''']] - New detailed tutorial on how to optimize your litho, the brief summary is below:

	You need to find the '''center of the ''Viable Process Window''''' - meaning you need to see the BAD dose (too high + too low) and BAD focus (too high + too low) then choose a Dose+Focus in the ''middle'' of this range. This allows your process to work even if the focus or some other process varies.		You need to find the '''center of the ''Viable Process Window''''' - meaning you need to see the BAD dose (too high + too low) and BAD focus (too high + too low) then choose a Dose+Focus in the ''middle'' of this range. This allows your process to work even if the focus or some other process varies.

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	##On the ASML, you can now keep the Focus constant according to the central Focus value from your Coarse FEM, and do only an Energy serpentine.		##On the ASML, you can now keep the Focus constant according to the central Focus value from your Coarse FEM, and do only an Energy serpentine.
	#Analyze to measure actual feature size, according to your process tolerance.		#Analyze to measure actual feature size, according to your process tolerance.
			Written by: [[Demis D. John]], original operating procedure written by [[Brian Thibeault]] & Adam Abrahamson.

John d: /* General process: */ ASML: keep focus constant for Fine FEM

2024-10-23T03:37:48Z

General process:: ASML: keep focus constant for Fine FEM

← Older revision		Revision as of 03:37, 23 October 2024
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	#Run a "Coarse" (wide-range) Focus-Exposure Matrix using the "starting params" from the wiki for your PR/tool.		#Run a "Coarse" (wide-range) Focus-Exposure Matrix using the "starting params" from the wiki for your PR/tool.
	#Analyze (microscope or SEM) to find the edges of the process window in both Focus & Dose. Often this can be done somewhat ~~faster~~, without detailed measurements, allowing you to locate the center of the process window based on the obviously "Bad" rows/cols.		#Analyze (microscope or SEM) to find the edges of the process window in both Focus & Dose. Often this can be done somewhat fast by eye and optical microscope, without detailed measurements, allowing you to locate the center of the process window based on the obviously "Bad" rows/cols.
	##Tip: If possible, mark up your wafer with sharpie, scribes or other to make the grid easier to analyze, especially to avoid getting "lost" on the SEM.		##Tip: If possible, mark up your wafer with sharpie, scribes or other to make the grid easier to analyze, especially to avoid getting "lost" on the SEM.
	#Run a "Fine" FEM with finer step size.		#Run a "Fine" FEM with finer step size.
			##On the ASML, you can now keep the Focus constant according to the central Focus value from your Coarse FEM, and do only an Energy serpentine.
	#Analyze to measure actual feature size, according to your tolerance.		#Analyze to measure actual feature size, according to your process tolerance.

John d: /* Running a focus and/or exposure matrix */ new heading for schematics

2023-04-23T20:59:46Z

Running a focus and/or exposure matrix: new heading for schematics

← Older revision		Revision as of 20:59, 23 April 2023
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	#When the batch is complete, select the batch in the Task ist, and click '''Batch:''' '''(Report)'''. The '''"Test Exposure Data"''' section of the report shows the exposure params for each die location. This is very useful during your inspection, and it is recommended that you bring a photograph or copy of this exposure matrix table with you when inspecting on the microscope/SEM.		#When the batch is complete, select the batch in the Task ist, and click '''Batch:''' '''(Report)'''. The '''"Test Exposure Data"''' section of the report shows the exposure params for each die location. This is very useful during your inspection, and it is recommended that you bring a photograph or copy of this exposure matrix table with you when inspecting on the microscope/SEM.

			==== FEM Array/Matrix Layout ====
			''The below schematics show how the ASML PAS software arranges the varying Dose/Focus on a wafer. The layout is always calculated with respect to with the Cell at Column/Row = (0,0) in your program's Cell Layout.''
	{\|		{\|
	![[File:Stepper 3 - FEM Energy Meander Schematic.png\|alt=Stepper 3 - FEM Energy Meander Schematic\|none\|thumb\|335x335px\|Ordering of Energy/Focus for "Meander" mode.]]		![[File:Stepper 3 - FEM Energy Meander Schematic.png\|alt=Stepper 3 - FEM Energy Meander Schematic\|none\|thumb\|335x335px\|Ordering of Energy/Focus for "Meander" mode.]]
	![[File:Stepper 3 - FEM Matrix Schematic.png\|alt=Stepper 3 - FEM Matrix Schematic\|none\|thumb\|375x375px\|Ordering of Exposure Energy/Focus for "Matrix" mode.]]		![[File:Stepper 3 - FEM Matrix Schematic.png\|alt=Stepper 3 - FEM Matrix Schematic\|none\|thumb\|375x375px\|Ordering of Exposure Energy/Focus for "Matrix" mode.]]
	!		!


	\|}		\|}
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	A '''common mistake is to look for "''the best die''"''' - but this one good die could be (and often is) at the edge of the working process window, so a small process variation (wafer thickness, hotplate temperature) will put your process outside the process window - you'll have chosen a very tight process that easily goes out of spec with random fluctuation in the process.		A '''common mistake is to look for "''the best die''"''' - but this one good die could be (and often is) at the edge of the working process window, so a small process variation (wafer thickness, hotplate temperature) will put your process outside the process window - you'll have chosen a very tight process that easily goes out of spec with random fluctuation in the process.

	===== General process: =====		=====General process:=====

	# Run a "Coarse" (wide-range) Focus-Exposure Matrix using the "starting params" from the wiki for your PR/tool.		#Run a "Coarse" (wide-range) Focus-Exposure Matrix using the "starting params" from the wiki for your PR/tool.
	# Analyze (microscope or SEM) to find the edges of the process window in both Focus & Dose. Often this can be done somewhat faster, without detailed measurements, allowing you to locate the center of the process window based on the obviously "Bad" rows/cols.		#Analyze (microscope or SEM) to find the edges of the process window in both Focus & Dose. Often this can be done somewhat faster, without detailed measurements, allowing you to locate the center of the process window based on the obviously "Bad" rows/cols.
	## Tip: If possible, mark up your wafer with sharpie, scribes or other to make the grid easier to analyze, especially to avoid getting "lost" on the SEM.		##Tip: If possible, mark up your wafer with sharpie, scribes or other to make the grid easier to analyze, especially to avoid getting "lost" on the SEM.
	# Run a "Fine" FEM with finer step size.		#Run a "Fine" FEM with finer step size.
	# Analyze to measure actual feature size, according to your tolerance.		#Analyze to measure actual feature size, according to your tolerance.

John d: /* Running a focus and/or exposure matrix */ added "general process" for FEMs

2023-02-07T23:28:24Z

Running a focus and/or exposure matrix: added "general process" for FEMs

@@ Line 82: / Line 82: @@
 #When the batch is complete, select the batch in the Task ist, and click '''Batch:''' '''(Report)'''.  The '''"Test Exposure Data"''' section of the report shows the exposure params for each die location.  This is very useful during your inspection, and it is recommended that you bring a photograph or copy of this exposure matrix table with you when inspecting on the microscope/SEM.
 {|
 ![[File:Stepper 3 - FEM Energy Meander Schematic.png|alt=Stepper 3 - FEM Energy Meander Schematic|none|thumb|335x335px|Ordering of Energy/Focus for "Meander" mode.]]
 ![[File:Stepper 3 - FEM Matrix Schematic.png|alt=Stepper 3 - FEM Matrix Schematic|none|thumb|375x375px|Ordering of Exposure Energy/Focus for "Matrix" mode.]]
+!
 |}

John d: /* Running a focus and/or exposure matrix */ added how to view/modufy exposure before exposing

2022-11-22T16:28:52Z

Running a focus and/or exposure matrix: added how to view/modufy exposure before exposing

← Older revision		Revision as of 16:28, 22 November 2022
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	==Normal User Procedures==		==Normal User Procedures==

	** ''BEFORE starting your job'', check the '''Warnings''' window for any errors, and deal with them first.		**''BEFORE starting your job'', check the '''Warnings''' window for any errors, and deal with them first.
	*** You may need to press the ''[F4] Front'' keyboard key to bring the window forward.		***You may need to press the ''[F4] Front'' keyboard key to bring the window forward.
	*** See the "[[ASML Stepper 3 Error Recovery, Troubleshooting and Calibration#Important Warnings\|Errors: Warnings]]" section for how to deal with these.		***See the "[[ASML Stepper 3 Error Recovery, Troubleshooting and Calibration#Important Warnings\|Errors: Warnings]]" section for how to deal with these.

	#Cleaning the back-sides of wafers: '''<u>Very important</u>'''		#Cleaning the back-sides of wafers: '''<u>Very important</u>'''
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	##Check ALL the Images in the job! Use the '''(Preset)''' button to apply to all Images in the job.		##Check ALL the Images in the job! Use the '''(Preset)''' button to apply to all Images in the job.
	#Press '''Accept''' Button at Top		#Press '''Accept''' Button at Top
			#(optional) ''Before'' running the exposure, click '''Batch: (Report)''' to view the exposure (dose/focus) distribution.
			##If you need to alter the FEM, close the report and choose '''Batch: (Modify)''' and "'''Overwrite report'''" when prompted.
	#Press '''Continue''' Button to execute batch.		#Press '''Continue''' Button to execute batch.
	#When the batch is complete, select the batch in the Task ist, and click '''Batch:''' '''(Report)'''. The '''"Test Exposure Data"''' section of the report shows the exposure params for each die location. This is very useful during your inspection, and it is recommended that you bring a photograph or copy of this exposure matrix table with you when inspecting on the microscope/SEM.		#When the batch is complete, select the batch in the Task ist, and click '''Batch:''' '''(Report)'''. The '''"Test Exposure Data"''' section of the report shows the exposure params for each die location. This is very useful during your inspection, and it is recommended that you bring a photograph or copy of this exposure matrix table with you when inspecting on the microscope/SEM.

John d: added to check Warnings window before starting

2022-08-24T23:26:38Z

added to check Warnings window before starting

@@ Line 3: / Line 3: @@
 ==Normal User Procedures==
-### Spin wafer, wait until at top speed.
+###Remove wafer and do bake as normal.
-## Place Pod lid back on
+##Remove Pod Lid
 ===Running a focus and/or exposure matrix===

John d: pasted from Word Doc rev. 2022-08-23 DJ

2022-08-24T23:13:19Z

pasted from Word Doc rev. 2022-08-23 DJ

Show changes

John d: /* Running a focus and/or exposure matrix */ discussion of "process window" and "tolerance"

2021-11-11T19:23:43Z

Running a focus and/or exposure matrix: discussion of "process window" and "tolerance"

Show changes

John d: /* Reticle Unloading and Loading */

2020-07-26T03:55:18Z

Reticle Unloading and Loading

← Older revision		Revision as of 03:55, 26 July 2020
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	# Place Pod back in stepper		# Place Pod back in stepper
	# '''(Read)''' Box #3 - takes a few minutes		# '''(Read)''' Box #3 - takes a few minutes
			# Exit the Material Handler. The Material Handler can be run in parallel with other operations.
	# Go back to '''Main Menu''' once mask barcodes are all showing on screen

	=== Wafer Load ===		=== Wafer Load ===

John d: /* Running a Job – Normal operation */ added unload reticle

2020-07-26T03:52:58Z

Running a Job – Normal operation: added unload reticle

← Older revision		Revision as of 03:52, 26 July 2020
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	*### Press '''Accept''' Button at Top		*### Press '''Accept''' Button at Top
	*### Press '''Continue''' Button to execute batch. (May be a short delay before this becomes active.)		*### Press '''Continue''' Button to execute batch. (May be a short delay before this becomes active.)
	*### If batch has general failure: ~~Choose the ('''clear litho cluster''') option.~~		*### If batch has general failure:
			*### On the “Abort Batch” error window: click (HELP) button to see the cause of error - photograph this screen. Then Choose the ('''clear litho cluster''') option
			*### unload your Reticle when done, follow procedure above.

	=== Running a focus and/or exposure matrix ===		=== Running a focus and/or exposure matrix ===