Automated Coat/Develop System (S-Cubed Flexi) - Revision history

John d: add ToolActions

2025-12-06T02:47:49Z

add ToolActions

← Older revision		Revision as of 02:47, 6 December 2025
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	\|toolid=67		\|toolid=67
	}}		}}
			{{ToolActions
	''This Tool is now available for training - please contact the [[Tony Bosch\|supervisor]]. 2022-11-01''
			\|toolid = 67

			\|ProcessControlURL =
			\|InstructionsURL = https://wiki.nanofab.ucsb.edu/wiki/Automated_Coat/Develop_System_(S-Cubed_Flexi)#Operating_Procedures
			\|TrainingURL =
			}}
	==About==		==About==

John d: /* Detailed Specifications */ linked to PR's,

2024-09-03T18:03:19Z

Detailed Specifications: linked to PR's,

← Older revision		Revision as of 18:03, 3 September 2024
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	\|toolid=67		\|toolid=67
	}}		}}
	''This Tool is now available for training - please contact the supervisor. 2022-11-01''		''This Tool is now available for training - please contact the [[Tony Bosch\|supervisor]]. 2022-11-01''

	==About==		==About==
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	The S3-Coater is a Coater/Developer system that has one photoresist spinner, one developer spinner and 4 hotplates each with independent temperature control and a chill plate. A central robot picks your wafer/s from one of 2 cassettes, processes them and returns them to the cassette. The system is recipe driven with a high degree of process control and minimal backside contamination, and coats photoresists with low particle counts/streaks and high uniformity.		The S3-Coater is a Coater/Developer system that has one photoresist spinner, one developer spinner and 4 hotplates each with independent temperature control and a chill plate. A central robot picks your wafer/s from one of 2 cassettes, processes them and returns them to the cassette. The system is recipe driven with a high degree of process control and minimal backside contamination, and coats photoresists with low particle counts/streaks and high uniformity.

	At ~~this~~ ~~time~~ ~~only~~ ~~full size~~ substrates are allowed on this system. ~~The S3 Coater is still in process development and not open for general use.~~		Only full size 4-inch (100mm) substrates are allowed on this system.

	==Detailed Specifications==		==Detailed Specifications==

	*Wafer Size: 100mm ~~(150mm possible but not set up)~~		*Wafer Size: 100mm
	*PR Coating Properties:		*PR Coating Properties:
	**Uniformity < 1.0%		**Uniformity < 1.0%
	**< 100 particles on 100mm wafer		**< 100 particles on 100mm wafer
	*Photoresists/Underlayers Available:		*Photoresists/Underlayers Available:
			**[https://wiki.nanofab.ucsb.edu/w/images/3/38/UV6-Positive-Resist-Datasheet.pdf UV6-0.8] - DUV Positive imaging resist
	**UV6-0.8
			**[[Stepper Recipes#DS-K101-304\|DS-K101-304]] - DUV bottom anti-reflection layer (BARC).
	**DS-K101-304
	**PMMA - '''<u>NOT FOR PUBLIC USE AT THIS TIME</u>'''		**PMMA - '''<u>NOT FOR PUBLIC USE AT THIS TIME</u>'''
	**PMGI SF11 - '''<u>NOT FOR ~~GENERAL~~ USE AT THIS TIME</u>'''		**PMGI SF11 - '''<u>NOT FOR PUBLIC USE AT THIS TIME</u>'''
	**PMGI SF5 - '''<u>NOT FOR ~~GENERAL~~ USE AT THIS TIME</u>'''		**PMGI SF5 - '''<u>NOT FOR PUBLIC USE AT THIS TIME</u>'''
	*Solvents Available:		*Solvents Available:
	**EBR100 (wafer backside cleaning)		**EBR100 (wafer backside cleaning)
	*Developers Available:		*Developers Available:
			**[https://wiki.nanofab.ucsb.edu/w/images/f/f0/AZ300MIF-Developer-Datasheet.pdf AZ 300 MiF] - ''now available to use! (2024-07)''
	**AZ 300 MiF - '''<u>NOT FOR GENERAL USE AT THIS TIME</u>'''
			*Hotplates Available:
			**135°C - for UV6 soft-bake and Post-Exposure Bake
			**220°C - for DSK101 BARC soft-bake - dry etchable
			*185C - for DSK101 BARC soft-bake - developable for undercut

	==Process Information==		==Process Information==
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	==Recipes==		==Recipes==

	* '''Recipes > Lithography >''' [[Lithography Recipes#Automated Coat.2FDevelop System Recipes .28S-Cubed Flexi.29\|'''<u>Automated Coater Recipes</u>''']] - See all available spin-coat recipes for this machine. Only Staff may edit/create recipes.		*'''Recipes > Lithography >''' [[Lithography Recipes#Automated Coat.2FDevelop System Recipes .28S-Cubed Flexi.29\|'''<u>Automated Coater Recipes</u>''']] - See all available spin-coat recipes for this machine. Only Staff may edit/create recipes.

John d: /* Recipes */

2022-11-08T21:41:36Z

Recipes

← Older revision		Revision as of 21:41, 8 November 2022
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	*[[S-Cubed Flexi - Operating Procedure\|Standard Operating Procedure]] - For running pre-written recipes only.		*[[S-Cubed Flexi - Operating Procedure\|Standard Operating Procedure]] - For running pre-written recipes only.

	== Recipes ==		==Recipes==

	'''Recipes > Lithography >''' [[Lithography Recipes#Automated Coat.2FDevelop System Recipes .28S-Cubed Flexi.29\|'''<u>Automated Coater Recipes</u>''']] - See all available spin-coat recipes for this machine. Only Staff may edit/create recipes.		* '''Recipes > Lithography >''' [[Lithography Recipes#Automated Coat.2FDevelop System Recipes .28S-Cubed Flexi.29\|'''<u>Automated Coater Recipes</u>''']] - See all available spin-coat recipes for this machine. Only Staff may edit/create recipes.

John d at 21:41, 8 November 2022

2022-11-08T21:41:24Z

← Older revision		Revision as of 21:41, 8 November 2022
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	==Operating Procedures==		==Operating Procedures==

	**[[S-Cubed Flexi - Operating Procedure\|Standard Operating Procedure]] - For running pre-written recipes only.		*[[S-Cubed Flexi - Operating Procedure\|Standard Operating Procedure]] - For running pre-written recipes only.

	== Recipes ==		== Recipes ==

John d: link to recipes table

2022-11-08T21:41:04Z

link to recipes table

← Older revision		Revision as of 21:41, 8 November 2022
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	''This Tool is now available for training - please contact the supervisor. 2022-11-01''		''This Tool is now available for training - please contact the supervisor. 2022-11-01''

	=About=		==About==

	The S3-Coater is a Coater/Developer system that has one photoresist spinner, one developer spinner and 4 hotplates each with independent temperature control and a chill plate. A central robot picks your wafer/s from one of 2 cassettes, processes them and returns them to the cassette. The system is recipe driven with a high degree of process control and minimal backside contamination, and coats photoresists with low particle counts/streaks and high uniformity.		The S3-Coater is a Coater/Developer system that has one photoresist spinner, one developer spinner and 4 hotplates each with independent temperature control and a chill plate. A central robot picks your wafer/s from one of 2 cassettes, processes them and returns them to the cassette. The system is recipe driven with a high degree of process control and minimal backside contamination, and coats photoresists with low particle counts/streaks and high uniformity.
Line 20:		Line 20:
	At this time only full size substrates are allowed on this system. The S3 Coater is still in process development and not open for general use.		At this time only full size substrates are allowed on this system. The S3 Coater is still in process development and not open for general use.

	=Detailed Specifications=		==Detailed Specifications==

	*Wafer Size: 100mm (150mm possible but not set up)		*Wafer Size: 100mm (150mm possible but not set up)
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	**< 100 particles on 100mm wafer		**< 100 particles on 100mm wafer
	*Photoresists/Underlayers Available:		*Photoresists/Underlayers Available:
	**UV6-0.8		**UV6-0.8
	**DS-K101-304		**DS-K101-304
	**PMMA - '''<u>NOT FOR PUBLIC USE AT THIS TIME</u>'''		**PMMA - '''<u>NOT FOR PUBLIC USE AT THIS TIME</u>'''
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	**AZ 300 MiF - '''<u>NOT FOR GENERAL USE AT THIS TIME</u>'''		**AZ 300 MiF - '''<u>NOT FOR GENERAL USE AT THIS TIME</u>'''

	=Process Information=		==Process Information==

	*Recipe Page for S-Cubed Coater: [[Lithography Recipes#Automated%20Coat.2FDevelop%20System%20Recipes%20.28S-Cubed%20Flexi.29\|Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi]])		*Recipe Page for S-Cubed Coater: [[Lithography Recipes#Automated%20Coat.2FDevelop%20System%20Recipes%20.28S-Cubed%20Flexi.29\|Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi]])
	*See the [https://wiki.nanotech.ucsb.edu/w/index.php?title=Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Photolith. Chemicals page] for info on the installed resists.		*See the [https://wiki.nanotech.ucsb.edu/w/index.php?title=Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Photolith. Chemicals page] for info on the installed resists.

	=Operating Procedures=		==Operating Procedures==

	**[[S-Cubed Flexi - Operating Procedure\|Standard Operating Procedure]] - For running pre-written recipes only.		**[[S-Cubed Flexi - Operating Procedure\|Standard Operating Procedure]] - For running pre-written recipes only.

			== Recipes ==
			'''Recipes > Lithography >''' [[Lithography Recipes#Automated Coat.2FDevelop System Recipes .28S-Cubed Flexi.29\|'''<u>Automated Coater Recipes</u>''']] - See all available spin-coat recipes for this machine. Only Staff may edit/create recipes.

John d: indicated which PR's/chems are availabelf for general use

2022-11-08T21:19:36Z

indicated which PR's/chems are availabelf for general use

← Older revision		Revision as of 21:19, 8 November 2022
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	\|toolid=67		\|toolid=67
	}}		}}
			''This Tool is now available for training - please contact the supervisor. 2022-11-01''
⚫	'''~~THIS TOOL IS ONLY~~ FOR ~~STAFF~~ USE AT THIS TIME.'''

	=About=		=About=
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	**< 100 particles on 100mm wafer		**< 100 particles on 100mm wafer
	*Photoresists/Underlayers Available:		*Photoresists/Underlayers Available:
	**UV6-0.8		**UV6-0.8
	**DS-K101-304		**DS-K101-304
		⚫	**PMMA - '''<u>NOT FOR PUBLIC USE AT THIS TIME</u>'''
	**PMMA
			**PMGI SF11 - '''<u>NOT FOR GENERAL USE AT THIS TIME</u>'''
	**PMGI SF11
			**PMGI SF5 - '''<u>NOT FOR GENERAL USE AT THIS TIME</u>'''
	**PMGI SF5
	*Solvents Available:		*Solvents Available:
	**EBR100		**EBR100 (wafer backside cleaning)
	*Developers Available:		*Developers Available:
			**AZ 300 MiF - '''<u>NOT FOR GENERAL USE AT THIS TIME</u>'''
	**AZ 300 MiF

	=Process Information=		=Process Information=
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	=Operating Procedures=		=Operating Procedures=

	*[[S-Cubed Flexi - Operating Procedure\|Standard Operating Procedure]] - For running pre-written recipes only.		**[[S-Cubed Flexi - Operating Procedure\|Standard Operating Procedure]] - For running pre-written recipes only.

Silva at 17:00, 30 August 2022

2022-08-30T17:00:04Z

← Older revision		Revision as of 17:00, 30 August 2022
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	{{~~tool~~\|{{PAGENAME}}		{{tool2\|{{PAGENAME}}
	\|picture=TBD.jpg		\|picture=TBD.jpg
	\|super= Tony Bosch		\|super= Tony Bosch
			\|super2= Lee Sawyer
	\|location=Bay 7		\|location=Bay 7
	\|description = Automatic Coat/Bake/Develop		\|description = Automatic Coat/Bake/Develop

Jcrode: Text replacement - "/wiki/index.php" to "/w/index.php"

2021-09-04T19:50:10Z

Text replacement - "/wiki/index.php" to "/w/index.php"

← Older revision		Revision as of 19:50, 4 September 2021
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	*Recipe Page for S-Cubed Coater: [[Lithography Recipes#Automated%20Coat.2FDevelop%20System%20Recipes%20.28S-Cubed%20Flexi.29\|Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi]])		*Recipe Page for S-Cubed Coater: [[Lithography Recipes#Automated%20Coat.2FDevelop%20System%20Recipes%20.28S-Cubed%20Flexi.29\|Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi]])
	*See the [https://wiki.nanotech.ucsb.edu/~~wiki~~/index.php?title=Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Photolith. Chemicals page] for info on the installed resists.		*See the [https://wiki.nanotech.ucsb.edu/w/index.php?title=Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Photolith. Chemicals page] for info on the installed resists.

	=Operating Procedures=		=Operating Procedures=

Jcrode: Text replacement - "/wiki/index.php/" to "/wiki/index.php?title="

2021-09-04T19:46:44Z

Text replacement - "/wiki/index.php/" to "/wiki/index.php?title="

← Older revision		Revision as of 19:46, 4 September 2021
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	*Recipe Page for S-Cubed Coater: [[Lithography Recipes#Automated%20Coat.2FDevelop%20System%20Recipes%20.28S-Cubed%20Flexi.29\|Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi]])		*Recipe Page for S-Cubed Coater: [[Lithography Recipes#Automated%20Coat.2FDevelop%20System%20Recipes%20.28S-Cubed%20Flexi.29\|Lithography Recipes > Automated Coat/Develop System Recipes (S-Cubed Flexi]])
	*See the [https://wiki.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Photolith. Chemicals page] for info on the installed resists.		*See the [https://wiki.nanotech.ucsb.edu/wiki/index.php?title=Lithography_Recipes#Chemicals_Stocked_.2B_Datasheets Photolith. Chemicals page] for info on the installed resists.

	=Operating Procedures=		=Operating Procedures=

John d: added link to SOP

2020-08-26T18:42:59Z

added link to SOP

← Older revision		Revision as of 18:42, 26 August 2020
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	=About=		=About=

	The S3 is a Coater/Developer system that has 4 hotplates each with independent temperature control and a chill plate. A central robot picks your wafer/s from a ~~cassette~~, processes them and returns them to the cassette. The system is recipe driven with a high degree of process control and minimal backside contamination. At ~~this~~ ~~time~~ ~~only~~ ~~full~~ ~~size~~ ~~substrates~~ ~~are~~ ~~allowed~~ ~~on this system~~. ~~The S3 Coater is still in process development and not open for general use.~~		The S3-Coater is a Coater/Developer system that has one photoresist spinner, one developer spinner and 4 hotplates each with independent temperature control and a chill plate. A central robot picks your wafer/s from one of 2 cassettes, processes them and returns them to the cassette. The system is recipe driven with a high degree of process control and minimal backside contamination, and coats photoresists with low particle counts/streaks and high uniformity.

			At this time only full size substrates are allowed on this system. The S3 Coater is still in process development and not open for general use.

	=Detailed Specifications=		=Detailed Specifications=
Line 41:		Line 43:
	=Operating Procedures=		=Operating Procedures=

			*[[S-Cubed Flexi - Operating Procedure\|Standard Operating Procedure]] - For running pre-written recipes only.
	*''To Be Added''