CAIBE (Oxford Ion Mill) - Revision history

Millerski w: Added Ion Mill SOP

2023-12-21T16:47:58Z

Added Ion Mill SOP

← Older revision		Revision as of 16:47, 21 December 2023
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	**''Make sure to securely attach your samples to the platens with clips, since the holder will be angled and rotated!'' ''6-inch wafers can be loaded as-is.''		**''Make sure to securely attach your samples to the platens with clips, since the holder will be angled and rotated!'' ''6-inch wafers can be loaded as-is.''

			*[https://wiki.nanofab.ucsb.edu/w/images/4/4d/Oxford_Ion_Mill_SOP.pdf Ion Mill SOP]
	*[//wiki.nanotech.ucsb.edu/wiki/images/7/75/Ion_Beam_Etch_Overview_rev1.pdf Additional Documentation]		*[//wiki.nanotech.ucsb.edu/wiki/images/7/75/Ion_Beam_Etch_Overview_rev1.pdf Additional Documentation]

2023-03-08T21:57:33Z

Update SOP rev

← Older revision		Revision as of 21:57, 8 March 2023
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	==Procedures & Documentation==		==Procedures & Documentation==

	* [//wiki.nanotech.ucsb.edu/~~wiki~~/images/5/52/~~Cluster_operating_instructions~~.pdf Cluster Operating Instructions] - same instructions as ALD, except for the '''following difference''':		*[https://wiki.nanotech.ucsb.edu/w/images/4/40/Oxford_Cluster_Tool_Operating_Instructions_Rev_B.pdf Cluster Operating Instructions] - same instructions as ALD, except for the '''following difference''':
	** ''Make sure to securely attach your samples to the platens with clips, since the holder will be angled and rotated!'' ''6-inch wafers can be loaded as-is.''		**''Make sure to securely attach your samples to the platens with clips, since the holder will be angled and rotated!'' ''6-inch wafers can be loaded as-is.''

	*[//wiki.nanotech.ucsb.edu/wiki/images/7/75/Ion_Beam_Etch_Overview_rev1.pdf Additional Documentation]		*[//wiki.nanotech.ucsb.edu/wiki/images/7/75/Ion_Beam_Etch_Overview_rev1.pdf Additional Documentation]

2022-08-30T17:51:42Z

← Older revision		Revision as of 17:51, 30 August 2022
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	{{~~tool~~\|{{PAGENAME}}		{{tool2\|{{PAGENAME}}
	\|picture=CAIBE.jpg		\|picture=CAIBE.jpg
	\|type = Dry Etch		\|type = Dry Etch
	\|super= Bill Millerski		\|super= Bill Millerski
			\|super2= Lee Sawyer
	\|location=Bay 2		\|location=Bay 2
	\|description = CAIBE (Chemically Assisted Ion Beam Etcher)		\|description = CAIBE (Chemically Assisted Ion Beam Etcher)

2021-10-28T17:11:32Z

← Older revision		Revision as of 17:11, 28 October 2021
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	\|picture=CAIBE.jpg		\|picture=CAIBE.jpg
	\|type = Dry Etch		\|type = Dry Etch
	\|super= ~~Brian~~ ~~Lingg~~		\|super= Bill Millerski
	\|location=Bay 2		\|location=Bay 2
	\|description = CAIBE (Chemically Assisted Ion Beam Etcher)		\|description = CAIBE (Chemically Assisted Ion Beam Etcher)

2021-09-04T19:50:49Z

Text replacement - "/wiki/index.php" to "/w/index.php"

← Older revision		Revision as of 19:50, 4 September 2021
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	==Recipes==		==Recipes==
	Recipes can be found on the [https://wiki.nanotech.ucsb.edu/~~wiki~~/index.php?title=Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29 '''CAIBE Recipes Page'''].		Recipes can be found on the [https://wiki.nanotech.ucsb.edu/w/index.php?title=Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29 '''CAIBE Recipes Page'''].

	==Procedures & Documentation==		==Procedures & Documentation==

2021-09-04T19:49:16Z

Text replacement - "/wiki/index.php/" to "/wiki/index.php?title="

← Older revision		Revision as of 19:49, 4 September 2021
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	==Recipes==		==Recipes==
	Recipes can be found on the [https://wiki.nanotech.ucsb.edu/wiki/index.php/Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29 '''CAIBE Recipes Page'''].		Recipes can be found on the [https://wiki.nanotech.ucsb.edu/wiki/index.php?title=Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29 '''CAIBE Recipes Page'''].

	==Procedures & Documentation==		==Procedures & Documentation==

2020-11-19T17:13:28Z

Detailed Specifications: added sample sizes/holders

← Older revision		Revision as of 17:13, 19 November 2020
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	*He-backside cooling		*He-backside cooling
	*Substrate temperature 5C to 300C		*Substrate temperature 5C to 300C
			*Sample sizes:
	*Sample size from 6" wafer to pieces (using holders)
			**6" wafer (no carrier needed)
			**4" wafer mount with backside Helium cooling ports
			**2" wafer mount with backside Helium cooling ports
			**35mm square pieces or smaller, mount with backside Helium cooling ports
	*Clustered through vacuum chambers with ALD systems.		*Clustered through vacuum chambers with ALD systems.
	*Masking material depends on material being etched and etch gas used		*Masking material depends on material being etched and etch gas used

2020-08-18T22:06:08Z

Recipes: bolded recipe page li nk

← Older revision		Revision as of 22:06, 18 August 2020
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	==Recipes==		==Recipes==
	Recipes can be found on the [https://wiki.nanotech.ucsb.edu/wiki/index.php/Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29 CAIBE Recipes Page].		Recipes can be found on the [https://wiki.nanotech.ucsb.edu/wiki/index.php/Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29 '''CAIBE Recipes Page'''].

	==Procedures & Documentation==		==Procedures & Documentation==

2020-07-01T14:58:37Z

corrected cluster chamber--> metal/dielectric designation

← Older revision		Revision as of 14:58, 1 July 2020
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	The Ion Mill system is clustered with 2 Oxford ALD systems, allowing the process flexibility of etching followed by ALD passivation or metalization without breaking vacuum.		The Ion Mill system is clustered with 2 Oxford ALD systems, allowing the process flexibility of etching followed by ALD passivation or metalization without breaking vacuum.

	*Chamber #1: [[Atomic Layer Deposition (Oxford FlexAL)\|ALD ~~Dielectrics~~ Films only]]		*Chamber #1: [[Atomic Layer Deposition (Oxford FlexAL)\|ALD Metal Films only]]
	*Chamber #2: [[CAIBE (Oxford Ion Mill)\|CAIBE Oxford Ion Mill]] (this page)		*Chamber #2: [[CAIBE (Oxford Ion Mill)\|CAIBE Oxford Ion Mill]] (this page)
	*Chamber #3: [[Atomic Layer Deposition (Oxford FlexAL)\|ALD ~~Metal~~ Films only]]		*Chamber #3: [[Atomic Layer Deposition (Oxford FlexAL)\|ALD Dielectrics Films only]]

	==Detailed Specifications==		==Detailed Specifications==

2020-05-22T17:52:56Z

linked to Cluster operating instructions

← Older revision		Revision as of 17:52, 22 May 2020
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	Recipes can be found on the [https://wiki.nanotech.ucsb.edu/wiki/index.php/Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29 CAIBE Recipes Page].		Recipes can be found on the [https://wiki.nanotech.ucsb.edu/wiki/index.php/Other_Dry_Etching_Recipes#CAIBE_.28Oxford_Ion_Mill.29 CAIBE Recipes Page].

	==Documentation==		==Procedures & Documentation==
			* [//wiki.nanotech.ucsb.edu/wiki/images/5/52/Cluster_operating_instructions.pdf Cluster Operating Instructions] - same instructions as ALD, except for the '''following difference''':
			** ''Make sure to securely attach your samples to the platens with clips, since the holder will be angled and rotated!'' ''6-inch wafers can be loaded as-is.''

	*[//wiki.nanotech.ucsb.edu/wiki/images/7/75/Ion_Beam_Etch_Overview_rev1.pdf Additional Documentation]		*[//wiki.nanotech.ucsb.edu/wiki/images/7/75/Ion_Beam_Etch_Overview_rev1.pdf Additional Documentation]