Contact Alignment Recipes - Revision history

Biljana: /* SU-8 Recipes */ Update for SU8-2015 recipe

2025-05-19T21:10:52Z

SU-8 Recipes: Update for SU8-2015 recipe

← Older revision		Revision as of 21:10, 19 May 2025
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	*[//wiki.nanotech.ucsb.edu/w/images/b/bb/48-Photolithography_of_SU8-2010.pdf SU-8-2010 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/b/bb/48-Photolithography_of_SU8-2010.pdf SU-8-2010 Recipe]

			*[https://wiki.nanofab.ucsb.edu/w/images/b/b3/SU8-2015_for_WIKi_page.pdf SU8-2015 Biljana's Updated recipe]

	*[Biljana's Updated recipe]
	*[//wiki.nanotech.ucsb.edu/w/images/0/0c/49-Photolithography_of_SU8-2015-a.pdf SU-8-2015 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/0/0c/49-Photolithography_of_SU8-2015-a.pdf SU-8-2015 Recipe]

Biljana: /* SU-8 Recipes */

2025-05-19T21:08:47Z

SU-8 Recipes

← Older revision		Revision as of 21:08, 19 May 2025
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	*[//wiki.nanotech.ucsb.edu/w/images/b/bb/48-Photolithography_of_SU8-2010.pdf SU-8-2010 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/b/bb/48-Photolithography_of_SU8-2010.pdf SU-8-2010 Recipe]


	*[https://drive.google.com/drive/folders/1N0p4damL2cOR5JrH7skOnD0KS2w7_dPe SU8-2015 Recipe Update]
	*[Biljana's Updated recipe]		*[Biljana's Updated recipe]
	*[//wiki.nanotech.ucsb.edu/w/images/0/0c/49-Photolithography_of_SU8-2015-a.pdf SU-8-2015 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/0/0c/49-Photolithography_of_SU8-2015-a.pdf SU-8-2015 Recipe]

Biljana: /* SU-8 Recipes */

2025-05-19T21:08:31Z

SU-8 Recipes

← Older revision		Revision as of 21:08, 19 May 2025
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	*[//wiki.nanotech.ucsb.edu/w/images/1/1e/47-Photolithography_of_SU8-2005.pdf SU-8-2005 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/1/1e/47-Photolithography_of_SU8-2005.pdf SU-8-2005 Recipe]
	*[//wiki.nanotech.ucsb.edu/w/images/b/bb/48-Photolithography_of_SU8-2010.pdf SU-8-2010 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/b/bb/48-Photolithography_of_SU8-2010.pdf SU-8-2010 Recipe]

			*[https://drive.google.com/drive/folders/1N0p4damL2cOR5JrH7skOnD0KS2w7_dPe SU8-2015 Recipe Update]
	*[Biljana's Updated recipe]		*[Biljana's Updated recipe]
	*[//wiki.nanotech.ucsb.edu/w/images/0/0c/49-Photolithography_of_SU8-2015-a.pdf SU-8-2015 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/0/0c/49-Photolithography_of_SU8-2015-a.pdf SU-8-2015 Recipe]

Biljana: /* SU-8 Recipes */

2025-05-19T19:12:08Z

SU-8 Recipes

← Older revision		Revision as of 19:12, 19 May 2025
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	*[//wiki.nanotech.ucsb.edu/w/images/1/1e/47-Photolithography_of_SU8-2005.pdf SU-8-2005 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/1/1e/47-Photolithography_of_SU8-2005.pdf SU-8-2005 Recipe]
	*[//wiki.nanotech.ucsb.edu/w/images/b/bb/48-Photolithography_of_SU8-2010.pdf SU-8-2010 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/b/bb/48-Photolithography_of_SU8-2010.pdf SU-8-2010 Recipe]
	*[Biljana's Updated recipe}		*[Biljana's Updated recipe]
	*[//wiki.nanotech.ucsb.edu/w/images/0/0c/49-Photolithography_of_SU8-2015-a.pdf SU-8-2015 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/0/0c/49-Photolithography_of_SU8-2015-a.pdf SU-8-2015 Recipe]

Biljana: /* SU-8 Recipes */

2025-05-19T19:11:58Z

SU-8 Recipes

← Older revision		Revision as of 19:11, 19 May 2025
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	*[//wiki.nanotech.ucsb.edu/w/images/1/1e/47-Photolithography_of_SU8-2005.pdf SU-8-2005 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/1/1e/47-Photolithography_of_SU8-2005.pdf SU-8-2005 Recipe]
	*[//wiki.nanotech.ucsb.edu/w/images/b/bb/48-Photolithography_of_SU8-2010.pdf SU-8-2010 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/b/bb/48-Photolithography_of_SU8-2010.pdf SU-8-2010 Recipe]
			*[Biljana's Updated recipe}
	*[//wiki.nanotech.ucsb.edu/w/images/0/0c/49-Photolithography_of_SU8-2015-a.pdf SU-8-2015 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/0/0c/49-Photolithography_of_SU8-2015-a.pdf SU-8-2015 Recipe]

Biljana at 18:50, 19 May 2025

2025-05-19T18:50:47Z

@@ Line 288: / Line 288: @@
 | align="left" |
 *For Undercut
 |-
 |[[Media:NR9-6000PY-revA.pdf|NR9-6000PY]]

John d: /* Negative Resist (MA-6) */ subheading for SU8

2024-08-22T23:41:52Z

Negative Resist (MA-6): subheading for SU8

← Older revision		Revision as of 23:41, 22 August 2024
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	<nowiki>**</nowiki> To use AZ5214 as a negative PR requires Flood Exposure with the [[Contact Aligner (SUSS MA-6)\|MA6]] or [[Suss Aligners (SUSS MJB-3)\|MJB]] aligner '''''after PEB''''', before developing. See here for a [[AZ5214 - Basic Process\|basic AZ5214 process]], it is different than typical negative resists.		<nowiki>**</nowiki> To use AZ5214 as a negative PR requires Flood Exposure with the [[Contact Aligner (SUSS MA-6)\|MA6]] or [[Suss Aligners (SUSS MJB-3)\|MJB]] aligner '''''after PEB''''', before developing. See here for a [[AZ5214 - Basic Process\|basic AZ5214 process]], it is different than typical negative resists.
	\|}		\|}

			=== SU-8 Recipes ===
			Staff-developed recipes for SU-8:

	*[//wiki.nanotech.ucsb.edu/w/images/1/1e/47-Photolithography_of_SU8-2005.pdf SU-8-2005 Recipe]		*[//wiki.nanotech.ucsb.edu/w/images/1/1e/47-Photolithography_of_SU8-2005.pdf SU-8-2005 Recipe]

John d: /* Negative Resist (MJB-3) */ added PEB and 5214 info

2024-08-21T17:16:52Z

Negative Resist (MJB-3): added PEB and 5214 info

← Older revision		Revision as of 17:16, 21 August 2024
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	! width="100" \|Thickness		! width="100" \|Thickness
	! width="125" \|Exposure Time		! width="125" \|Exposure Time
	! width="100" \|PEB		! width="100" \|PEB*
	! width="100" \|Flood		! width="100" \|Flood**
	! width="125" \|Developer		! width="125" \|Developer
	! width="125" \|Developer Time		! width="125" \|Developer Time
	! width="350" \|Comments		! width="350" \|Comments
	\|-		\|-
	\|[[Media:AZ5214-Negative-Resist-Datasheet.pdf\|AZ5214]]		\|[[Media:AZ5214-Negative-Resist-Datasheet.pdf\|AZ5214]]**
	\|6 krpm/30”		\|6 krpm/30”
	\|95°C/60”		\|95°C/60”
Line 111:		Line 111:

	\|-		\|-
	\|[[Media:AZ5214-Negative-Resist-Datasheet.pdf\|AZ5214]]		\|[[Media:AZ5214-Negative-Resist-Datasheet.pdf\|AZ5214]]**
	\|6 krpm/30”		\|6 krpm/30”
	\|95°C/60”		\|95°C/60”
Line 151:		Line 151:
	*Before litho, do Gasonics #3, 120"; Bake at 140 C, 5'		*Before litho, do Gasonics #3, 120"; Bake at 140 C, 5'
	*Spin-on HMDS 3krpm 30", prior to NR9-6000PY		*Spin-on HMDS 3krpm 30", prior to NR9-6000PY
			\|-

			\| colspan="10" \|*PEB: post-exposure bake. For AZ 5214-IR, this performs Image Reversal
			<nowiki>**</nowiki> To use AZ5214 as a negative PR requires Flood Exposure with the [[Contact Aligner (SUSS MA-6)\|MA6]] or [[Suss Aligners (SUSS MJB-3)\|MJB]] aligner '''''after PEB''''', before developing. See here for a [[AZ5214 - Basic Process\|basic AZ5214 process]], it is different than typical negative resists.
	\|}		\|}

John d: /* Negative Resist (MA-6) */ addeed 5214 info

2024-08-21T17:16:17Z

Negative Resist (MA-6): addeed 5214 info

← Older revision		Revision as of 17:16, 21 August 2024
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	! width="100" \|Thickness		! width="100" \|Thickness
	! width="125" \|Exposure Time		! width="125" \|Exposure Time
	! width="100" \|PEB		! width="100" \|PEB*
	! width="100" \|Flood Exposure		! width="100" \|Flood Exposure**
	! width="125" \|Developer		! width="125" \|Developer
	! width="125" \|Developer Time		! width="125" \|Developer Time
	! width="350" \|Comments		! width="350" \|Comments
	\|-		\|-
	\|[[Media:AZ5214-Negative-Resist-Datasheet.pdf\|AZ5214]]		\|[[Media:AZ5214-Negative-Resist-Datasheet.pdf\|AZ5214]]**
	\|6 krpm/30”		\|6 krpm/30”
	\|95°C/60”		\|95°C/60”
Line 300:		Line 300:
	*Before litho, do Gasonics #3, 120"; Bake at 140 C, 5'		*Before litho, do Gasonics #3, 120"; Bake at 140 C, 5'
	*Spin-on HMDS 3krpm 30", prior to NR9-6000PY		*Spin-on HMDS 3krpm 30", prior to NR9-6000PY
			\|-

			\| colspan="10" \|*PEB: post-exposure bake. For AZ 5214-IR, this performs Image Reversal
			<nowiki>**</nowiki> To use AZ5214 as a negative PR requires Flood Exposure with the [[Contact Aligner (SUSS MA-6)\|MA6]] or [[Suss Aligners (SUSS MJB-3)\|MJB]] aligner '''''after PEB''''', before developing. See here for a [[AZ5214 - Basic Process\|basic AZ5214 process]], it is different than typical negative resists.
	\|}		\|}

John d: links to all PR datasheets

2022-12-01T19:20:07Z

links to all PR datasheets

← Older revision		Revision as of 19:20, 1 December 2022
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	! width="300" \|Comments		! width="300" \|Comments
	\|-		\|-
			\|[[Media:AXP4000pb-Datasheet.pdf\|AZ4110]]
	\|AZ4110
	\|4 krpm/30”		\|4 krpm/30”
	\|95°C/60”		\|95°C/60”
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	\| align="left" \|		\| align="left" \|
	\|-		\|-
			\|[[Media:AXP4000pb-Datasheet.pdf\|AZ4210]]
	\|AZ4210
	\|4 krpm/30”		\|4 krpm/30”
	\|95°C/60”		\|95°C/60”
Line 70:		Line 70:

	\|-		\|-
			\|[[Media:SPR220-Positive-Resist-Datasheet.pdf\|SPR220-7.0]]
	\|SPR220-7.0
	\|3.5 krpm/45”		\|3.5 krpm/45”
	\|115°C/120”		\|115°C/120”
Line 124:		Line 124:

	\|-		\|-
			\|[[Media:AZnLOF2020-Negative-Resist-Datasheet.pdf\|AZnLOF2020]]
	\|AZnLOF2020
	\|3 krpm/30”		\|3 krpm/30”
	\|110°C/90”		\|110°C/90”
Line 139:		Line 139:

	\|-		\|-
	\|NR9-6000PY		\|[[Media:NR9-6000PY-revA.pdf\|NR9-6000PY]]
	\|3 krpm/30”		\|3 krpm/30”
	\|140°C/180”		\|140°C/180”
Line 172:		Line 172:
	! width="300" \|Comments		! width="300" \|Comments
	\|-		\|-
			\|[[Media:AXP4000pb-Datasheet.pdf\|AZ4110]]
	\|AZ4110
	\|4 krpm/30”		\|4 krpm/30”
	\|95°C/60”		\|95°C/60”
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	\| align="left" \|		\| align="left" \|
	\|-		\|-
			\|[[Media:AXP4000pb-Datasheet.pdf\|AZ4210]]
	\|AZ4210
	\|4 krpm/30”		\|4 krpm/30”
	\|95°C/60”		\|95°C/60”
Line 221:		Line 221:

	\|-		\|-
			\|[[Media:SPR220-Positive-Resist-Datasheet.pdf\|SPR220-7.0]]
	\|SPR220-7.0
	\|3.5 krpm/45”		\|3.5 krpm/45”
	\|115°C/120”		\|115°C/120”
Line 262:		Line 262:

	\|-		\|-
			\|[[Media:AZnLOF2020-Negative-Resist-Datasheet.pdf\|AZnLOF2020]]
	\|AZnLOF2020
	\|3 krpm/30”		\|3 krpm/30”
	\|110°C/90”		\|110°C/90”
Line 275:		Line 275:

	\|-		\|-
			\|[[Media:AZnLOF2020-Negative-Resist-Datasheet.pdf\|AZnLOF2035]]
	\|AZnLOF2035
	\|2.5 krpm/30”		\|2.5 krpm/30”
	\|110°C/60”		\|110°C/60”
Line 288:		Line 288:

	\|-		\|-
	\|NR9-6000PY		\|[[Media:NR9-6000PY-revA.pdf\|NR9-6000PY]]
	\|3 krpm/30”		\|3 krpm/30”
	\|140°C/180”		\|140°C/180”