DUV Flood Expose - Revision history

John d: linked to uses of DUV flood expose

2025-12-06T04:24:38Z

linked to uses of DUV flood expose

← Older revision		Revision as of 04:24, 6 December 2025
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	Materials that are exposed are primarily spun-on thin films such as PMMA, PMGI, etc.		Materials that are exposed are primarily spun-on thin films such as PMMA, PMGI, etc.

			DUV exposure can be used to:

			# Expose PMGI underlayers - see the [[Lithography Recipes#Lift-Off Recipes\|liftoff recipes]] for recipes.
			# Harden the top of resists before develop, creating "lip" for better liftoff. [https://wiki.nanofab.ucsb.edu/w/images/b/bc/Liftoff-Techniques.pdf See the Liftoff Tutorial for an example].
			# Expose DUV resists for edge-bead removal: [[Photolithography - Manual Edge-Bead Removal Techniques#DUV Photo-EBR Process\|see the EBR page for recipes]].

	==Detailed Specifications==		==Detailed Specifications==

John d: documentation --> operating procedures

2025-12-06T04:21:22Z

documentation --> operating procedures

← Older revision		Revision as of 04:21, 6 December 2025
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	===DUV Exposure System Spectra===		===DUV Exposure System Spectra===
	[[image:DUV-System-Spectra.png\|thumb\|none\|~~600px~~\|DUV Exposure System Spectra]]		[[image:DUV-System-Spectra.png\|thumb\|none\|482x482px\|DUV Exposure System Spectra]]

			==Operating Procedures==
	==Documentation==

	*[https://wiki.nanofab.ucsb.edu/w/images/8/89/DUV_Flood_Expose_SOP_Rev_C.pdf DUV Flood Expose Standard Operating Procedure]		*[https://wiki.nanofab.ucsb.edu/w/images/8/89/DUV_Flood_Expose_SOP_Rev_C.pdf DUV Flood Expose Standard Operating Procedure]

Jcrode at 01:55, 13 May 2025

2025-05-13T01:55:19Z

← Older revision		Revision as of 01:55, 13 May 2025
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	==Detailed Specifications==		==Detailed Specifications==

	*DUV wavelengths are 200-260 nm; the lamp power is limited to 1000 ~~watts~~ and can operate in either constant intensity or constant power mode		*DUV wavelengths are 200-260 nm; the lamp power is limited to 1000 Watts and can operate in either constant intensity or constant power mode
	*The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample		*The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample
	*Exposure can be performed on a 4" wafer		*Exposure can be performed on a 4" wafer

Sawyer l: SOP Rev

2024-01-04T22:40:07Z

SOP Rev

← Older revision		Revision as of 22:40, 4 January 2024
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	==Documentation==		==Documentation==

	*[https://~~signupmonkey~~.~~ece~~.ucsb.edu/~~wiki~~/images/2/27/~~DUV_Flood_Expose_SOP~~.pdf DUV Flood Expose Standard Operating Procedure]		*[https://wiki.nanofab.ucsb.edu/w/images/8/89/DUV_Flood_Expose_SOP_Rev_C.pdf DUV Flood Expose Standard Operating Procedure]

Silva at 17:12, 30 August 2022

2022-08-30T17:12:45Z

← Older revision		Revision as of 17:12, 30 August 2022
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	<br />{{~~tool~~\|{{PAGENAME}}		<br />{{tool2\|{{PAGENAME}}
	\|picture=DUV.jpg		\|picture=DUV.jpg
	\|type = Lithography		\|type = Lithography
	\|super= Lee Sawyer		\|super= Lee Sawyer
			\|super2= Bill Millerski
	\|phone=(805)893-2123		\|phone=(805)893-2123
	\|location=Bay 6		\|location=Bay 6

Sawyer l: cosmetic

2019-09-11T22:27:07Z

cosmetic

← Older revision		Revision as of 22:27, 11 September 2019
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			<br />{{tool\|{{PAGENAME}}
	<nowiki><nowiki>Insert non-formatted text here</nowiki><nowiki><nowiki>Insert non-formatted text here</nowiki></nowiki></nowiki>{{tool\|{{PAGENAME}}
	\|picture=DUV.jpg		\|picture=DUV.jpg
	\|type = Lithography		\|type = Lithography
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	[[image:DUV-System-Spectra.png\|thumb\|none\|600px\|DUV Exposure System Spectra]]		[[image:DUV-System-Spectra.png\|thumb\|none\|600px\|DUV Exposure System Spectra]]

	== Documentation ==		==Documentation==

	* [https://signupmonkey.ece.ucsb.edu/wiki/images/2/27/DUV_Flood_Expose_SOP.pdf DUV Flood Expose Standard Operating Procedure]		*[https://signupmonkey.ece.ucsb.edu/wiki/images/2/27/DUV_Flood_Expose_SOP.pdf DUV Flood Expose Standard Operating Procedure]

Sawyer l: added SOP link

2019-09-11T22:26:37Z

added SOP link

← Older revision		Revision as of 22:26, 11 September 2019
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	}}		}}

	= About =		==About==
	This unit consists of a collimated deep ultraviolet (DUV) light source (mercury gas discharge short arc lamp) and power supply. The substrate is placed on a rotating chuck (not presently working) and is exposed by opening a timer-controlled shutter.		This unit consists of a collimated deep ultraviolet (DUV) light source (mercury gas discharge short arc lamp) and power supply. The substrate is placed on a rotating chuck (not presently working) and is exposed by opening a timer-controlled shutter.

	Materials that are exposed are primarily spun-on thin films such as PMMA, PMGI, etc.		Materials that are exposed are primarily spun-on thin films such as PMMA, PMGI, etc.

	=Detailed Specifications=		==Detailed Specifications==

	*DUV wavelengths are 200-260 nm; the lamp power is limited to 1000 watts and can operate in either constant intensity or constant power mode		*DUV wavelengths are 200-260 nm; the lamp power is limited to 1000 watts and can operate in either constant intensity or constant power mode
	*The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample		*The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample
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	*Lamps are nominally rated for 400 hours		*Lamps are nominally rated for 400 hours
	*A reset timer was added in Feb. 1995 to limit "on" time (ie. provide for auto shut-off) for bulb life conservation		*A reset timer was added in Feb. 1995 to limit "on" time (ie. provide for auto shut-off) for bulb life conservation
⚫	=Spectra Images=

		⚫	==Spectra Images==
⚫	==DUV Exposure System Spectra==

		⚫	===DUV Exposure System Spectra===
	[[image:DUV-System-Spectra.png\|thumb\|none\|600px\|DUV Exposure System Spectra]]		[[image:DUV-System-Spectra.png\|thumb\|none\|600px\|DUV Exposure System Spectra]]

			== Documentation ==

			* [https://signupmonkey.ece.ucsb.edu/wiki/images/2/27/DUV_Flood_Expose_SOP.pdf DUV Flood Expose Standard Operating Procedure]

Sawyer l: System model and manufacturer info

2019-04-02T23:35:36Z

System model and manufacturer info

← Older revision		Revision as of 23:35, 2 April 2019
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	<nowiki><nowiki>Insert non-formatted text here</nowiki><nowiki><nowiki>Insert non-formatted text here</nowiki></nowiki></nowiki>{{tool\|{{PAGENAME}}		<nowiki><nowiki>Insert non-formatted text here</nowiki><nowiki><nowiki>Insert non-formatted text here</nowiki></nowiki></nowiki>{{tool\|{{PAGENAME}}
	\|picture=DUV.jpg		\|picture=DUV.jpg
	\|type = Lithography		\|type = Lithography
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	\|location=Bay 6		\|location=Bay 6
	\|email=lee_sawyer@ucsb.edu		\|email=lee_sawyer@ucsb.edu
	\|description = Deep UV Flood ~~Exposer~~ / ~~Light source~~ and ~~HA-1KC2~~ ~~power~~ ~~supply~~		\|description = 1000W Deep UV Flood Exposure System (LS-150X-10C2) and Illumination Controller (2130-C2)
	\|manufacturer = AB Manufacturing		\|manufacturer = Bachur & Associates/AB Manufacturing
	\|materials =		\|materials =
	}}		}}

Silva at 21:59, 1 April 2019

2019-04-01T21:59:03Z

← Older revision		Revision as of 21:59, 1 April 2019
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	\|picture=DUV.jpg		\|picture=DUV.jpg
	\|type = Lithography		\|type = Lithography
	\|super= ~~Mike~~ ~~Silva~~		\|super= Lee Sawyer
	\|phone=(805)~~839\|cell=(805)245~~-~~9356~~		\|phone=(805)893-2123
	\|location=Bay 6		\|location=Bay 6
	\|email=~~silva~~@~~ece.~~ucsb.edu		\|email=lee_sawyer@ucsb.edu
	\|description = Deep UV Flood Exposer / Light source and HA-1KC2 power supply		\|description = Deep UV Flood Exposer / Light source and HA-1KC2 power supply
	\|manufacturer = AB Manufacturing		\|manufacturer = AB Manufacturing

Silva m at 18:03, 15 June 2015

2015-06-15T18:03:17Z

← Older revision		Revision as of 18:03, 15 June 2015
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	=Detailed Specifications=		=Detailed Specifications=
	*DUV wavelengths are 200-260 nm; the lamp power is limited to ~~either~~ 1000 watts and can operate in either constant intensity or constant power mode		*DUV wavelengths are 200-260 nm; the lamp power is limited to 1000 watts and can operate in either constant intensity or constant power mode
	*The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample		*The full spectrum of Hg emission wavelengths from 200-450 nm is present on the sample
	*Exposure can be performed on a 4" wafer		*Exposure can be performed on a 4" wafer