E-Beam 1 (Sharon) - Revision history

John d: /* Detailed Specifications */ added film limit

2026-04-22T19:36:20Z

Detailed Specifications: added film limit

← Older revision		Revision as of 19:36, 22 April 2026
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	*Pieces up to Four - 4" wafers in one run.		*Pieces up to Four - 4" wafers in one run.
	*For single wafers: tilt with motorized rotation and sample lowering for higher effective rates, sidewall coverage, angled evaporation.		*For single wafers: tilt with motorized rotation and sample lowering for higher effective rates, sidewall coverage, angled evaporation.
			*Maximum allowed film thickness: 1µm
			**Please ask supervisor if you need to go thicker
			**Please provide justification for your needs (eg. Not “2 µm is a nice round number”)

	=Documentation=		=Documentation=

John d: /* Recipes */ link to process control data

2025-05-21T18:35:39Z

Recipes: link to process control data

← Older revision		Revision as of 18:35, 21 May 2025
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	*See the [[E-Beam_Evaporation_Recipes#Materials_Table_(E-Beam #1)\|'''<u>E-Beam Recipe Page</u>''']], for the materials tables and deposition parameters for various materials.		*See the [[E-Beam_Evaporation_Recipes#Materials_Table_(E-Beam #1)\|'''<u>E-Beam Recipe Page</u>''']], for the materials tables and deposition parameters for various materials.
			*[[Process Group - Process Control Data#E-Beam 1 (Sharon) - Process Control\|'''Process Control Data''']] - Calibration data for the most utilized metals on this sytem.

Barreraz: /* Documentation */

2025-05-16T18:18:36Z

Documentation

← Older revision		Revision as of 18:18, 16 May 2025
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	*[https://wiki.nanofab.ucsb.edu/w/images/f/f0/EB-1_operation_instructions_6-6-24.pdf EBeam 1 Operating Procedure]		*[https://wiki.nanofab.ucsb.edu/w/images/f/f0/EB-1_operation_instructions_6-6-24.pdf EBeam 1 Operating Procedure]
	**Operating Instructions		**Operating Instructions
	**[https://wiki.nanofab.ucsb.edu/w/images/e/e3/~~EB1_Rotation_Fixture_SOP_6~~-4-24.pdf Rotation Fixture SOP]		**[https://wiki.nanofab.ucsb.edu/w/images/a/a1/EB1_Rotation_Fixture_SOP_5-16-25.pdf Rotation Fixture SOP]
	**[[E-Beam 1 - 4-inch, 4-wafer Fixture SOP\|4-inch, 4-wafer Fixture SOP]]		**[[E-Beam 1 - 4-inch, 4-wafer Fixture SOP\|4-inch, 4-wafer Fixture SOP]]

John d: fixed link

2024-12-18T23:07:45Z

fixed link

← Older revision		Revision as of 23:07, 18 December 2024
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	**Operating Instructions		**Operating Instructions
	**[https://wiki.nanofab.ucsb.edu/w/images/e/e3/EB1_Rotation_Fixture_SOP_6-4-24.pdf Rotation Fixture SOP]		**[https://wiki.nanofab.ucsb.edu/w/images/e/e3/EB1_Rotation_Fixture_SOP_6-4-24.pdf Rotation Fixture SOP]
	**[[EB-1 - 4-inch, 4-wafer Fixture SOP\|4-inch, 4-wafer Fixture SOP]]		**[[E-Beam 1 - 4-inch, 4-wafer Fixture SOP\|4-inch, 4-wafer Fixture SOP]]

	=Recipes=		=Recipes=

John d: link to 4-inch, 4-wafer Fixture SOP

2024-12-18T22:31:26Z

link to 4-inch, 4-wafer Fixture SOP

← Older revision		Revision as of 22:31, 18 December 2024
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	\|toolid=7		\|toolid=7
	}}		}}
	[[File:EBEAM1 Controls Sept2022.jpeg\|thumb\|EBeam#1]]		[[File:EBEAM1 Controls Sept2022.jpeg\|thumb\|EBeam#1 Deposition + Beam Controllers]]

	=About=		=About=
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	**Operating Instructions		**Operating Instructions
	**[https://wiki.nanofab.ucsb.edu/w/images/e/e3/EB1_Rotation_Fixture_SOP_6-4-24.pdf Rotation Fixture SOP]		**[https://wiki.nanofab.ucsb.edu/w/images/e/e3/EB1_Rotation_Fixture_SOP_6-4-24.pdf Rotation Fixture SOP]
			**[[EB-1 - 4-inch, 4-wafer Fixture SOP\|4-inch, 4-wafer Fixture SOP]]

	=Recipes=		=Recipes=

Barreraz: /* Documentation */

2024-06-06T22:08:12Z

Documentation

← Older revision		Revision as of 22:08, 6 June 2024
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	=Documentation=		=Documentation=

	*[https://wiki.nanofab.ucsb.edu/w/images/5/58/EB-1_operation_instructions_6-3-24.pdf EBeam 1 Operating Procedure]		*[https://wiki.nanofab.ucsb.edu/w/images/f/f0/EB-1_operation_instructions_6-6-24.pdf EBeam 1 Operating Procedure]
	**Operating Instructions		**Operating Instructions
	**[https://wiki.nanofab.ucsb.edu/w/images/e/e3/EB1_Rotation_Fixture_SOP_6-4-24.pdf Rotation Fixture SOP]		**[https://wiki.nanofab.ucsb.edu/w/images/e/e3/EB1_Rotation_Fixture_SOP_6-4-24.pdf Rotation Fixture SOP]

Barreraz: /* Documentation */

2024-06-04T19:32:10Z

Documentation

← Older revision		Revision as of 19:32, 4 June 2024
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	*[https://wiki.nanofab.ucsb.edu/w/images/5/58/EB-1_operation_instructions_6-3-24.pdf EBeam 1 Operating Procedure]		*[https://wiki.nanofab.ucsb.edu/w/images/5/58/EB-1_operation_instructions_6-3-24.pdf EBeam 1 Operating Procedure]
	**Operating Instructions		**Operating Instructions
	**[https://wiki.nanofab.ucsb.edu/w/images/f/fd/~~Rotation_Fixture_SOP_5~~-7-24.pdf Rotation Fixture SOP]		**[https://wiki.nanofab.ucsb.edu/w/images/e/e3/EB1_Rotation_Fixture_SOP_6-4-24.pdf Rotation Fixture SOP]

	=Recipes=		=Recipes=

Barreraz: /* About */

2024-06-04T17:19:02Z

About

← Older revision		Revision as of 17:19, 4 June 2024
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	=About=		=About=

	The Sharon is a cryo-pumped thin film evaporator with a ~~Temescal~~ ~~four~~ ~~hearth 270° bent~~ electron beam evaporation source~~. The system incorporates a Commonwealth Scientific Corp. ion source for in-situ sample cleaning~~. Fixturing in ~~the Sharon~~ will accept any size sample up to ~~3.5~~-inch diameter. In addition, a rotation fixture is easily installed which permits adjustable angle, 360° ~~variable speed~~ rotation of any size sample, up to ~~1.5~~-inch diameter. This feature is particularly useful for promoting step coverage of irregular surfaces.		The Sharon is a cryo-pumped thin film evaporator with a Telemark 8 pocket electron beam evaporation source. Fixturing in EBeam1 will accept any size sample up to 4-inch diameter. In addition, a rotation fixture is easily installed which permits adjustable angle, 360° rotation of any size sample, up to 4-inch diameter. This feature is particularly useful for promoting step coverage of irregular surfaces.

		⚫	EBeam1 is used for the evaporation of high purity metals, e.a. Al, Au, Ni, Ge, AuGe, Ti, Pt etc., for interconnect and ohmic contact metallization for fabrication of III-V compound semiconductor and silicon device fabrication.
	A new fixture allowing up to four - 4" diameter wafers is now installed.

⚫	~~The Sharon~~ is used for the evaporation of high purity metals, e.a. Al, Au, Ni, Ge, AuGe, Ti, Pt etc., for interconnect and ohmic contact ~~metalization~~ for fabrication of III-V compound semiconductor and silicon device fabrication.

	=Detailed Specifications=		=Detailed Specifications=
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	*Electron Beam Power Supply: Temescal, Model CV-6SLX, 0 - 10 kV dc, 0–600 mA dc beam current; TemEBeam Sweep Control		*Electron Beam Power Supply: Temescal, Model CV-6SLX, 0 - 10 kV dc, 0–600 mA dc beam current; TemEBeam Sweep Control
	*Deposition Control: : Inficon IC/5, 6 film programs; 37 parameters for automatic or manual deposition control based on a resonating quartz crystal sensor		*Deposition Control: : Inficon IC/5, 6 film programs; 37 parameters for automatic or manual deposition control based on a resonating quartz crystal sensor
	*Ion Source: Commonwealth Scientific Corp., MOD. 2. Kaufman-type, 3cm ion source; beam currents to 100mA at 1000eV
	*Pieces up to Four - 4" wafers in one run.		*Pieces up to Four - 4" wafers in one run.
	*For single wafers: tilt with motorized rotation and sample lowering for higher effective rates, sidewall coverage, angled evaporation.		*For single wafers: tilt with motorized rotation and sample lowering for higher effective rates, sidewall coverage, angled evaporation.

Barreraz: /* Documentation */

2024-06-03T21:44:23Z

Documentation

← Older revision		Revision as of 21:44, 3 June 2024
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	=Documentation=		=Documentation=

	*[https://wiki.nanofab.ucsb.edu/w/images/0/0d/EB-~~1_operation_instructions_2~~-13-24.pdf EBeam 1 Operating Procedure]		*[https://wiki.nanofab.ucsb.edu/w/images/5/58/EB-1_operation_instructions_6-3-24.pdf EBeam 1 Operating Procedure]
	**Operating Instructions		**Operating Instructions
	**[https://wiki.nanofab.ucsb.edu/w/images/f/fd/Rotation_Fixture_SOP_5-7-24.pdf Rotation Fixture SOP]		**[https://wiki.nanofab.ucsb.edu/w/images/f/fd/Rotation_Fixture_SOP_5-7-24.pdf Rotation Fixture SOP]

Barreraz: /* Documentation */

2024-05-22T23:25:43Z

Documentation

← Older revision		Revision as of 23:25, 22 May 2024
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	=Documentation=		=Documentation=

	*[https://wiki.nanofab.ucsb.edu/w/images/2/2d/EB-~~1_operation_instructions_2_13_24~~.pdf EBeam 1 Operating Procedure]		*[https://wiki.nanofab.ucsb.edu/w/images/0/0d/EB-1_operation_instructions_2-13-24.pdf EBeam 1 Operating Procedure]
	**Operating Instructions		**Operating Instructions
	**[https://wiki.nanofab.ucsb.edu/w/images/f/fd/Rotation_Fixture_SOP_5-7-24.pdf Rotation Fixture SOP]		**[https://wiki.nanofab.ucsb.edu/w/images/f/fd/Rotation_Fixture_SOP_5-7-24.pdf Rotation Fixture SOP]