Filmetrics F40-UV Microscope-Mounted - Revision history

John d: /* Good Curve-Fitting */ explained reasonable vs. perfect curve fit

2022-09-29T21:28:18Z

Good Curve-Fitting: explained reasonable vs. perfect curve fit

← Older revision		Revision as of 21:28, 29 September 2022
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	===Good Curve-Fitting===		===Good Curve-Fitting===
	Do not believe your thickness measurements unless the red/blue curves show a reasonably good match![[File:Filmetrics_F40-UV_-_Measurement_screenshot_on_metal_pad_01.PNG\|alt=example spectrum curve fit\|none\|thumb\|500x500px\|Screenshot showing 10x microscope view and optical spectrum/curve fitting of the SiO2 film thickness on top of Platinum contact metal.]]		Do not believe your thickness measurements unless the red/blue curves show a reasonably good match![[File:Filmetrics_F40-UV_-_Measurement_screenshot_on_metal_pad_01.PNG\|alt=example spectrum curve fit\|none\|thumb\|500x500px\|Screenshot showing 10x microscope view and optical spectrum/curve fitting of the SiO2 film thickness on top of Platinum contact metal. This is considered a "reasonable" fit because the curves are very similar, but don't overlay perfectly, giving only reasonable confidence in the reported numbers.]]

	[[File:Filmetrics F40-UV - spectrum curve fit 07.jpg\|alt=example spectrum curve fit\|none\|thumb\|300x300px\|A good fit should show the Calculated (red) curve overlay on top of the ~~Measureed~~ (blue) curve.]]		[[File:Filmetrics F40-UV - spectrum curve fit 07.jpg\|alt=example spectrum curve fit\|none\|thumb\|300x300px\|A good fit should show the Calculated (red) curve overlay on top of the Measured (blue) curve. This is a very good curve-fit and the reported thickness/index should be accurate.]]

	===Checking whether a dry etch is complete===		===Checking whether a dry etch is complete===

John d: /* Capabilities */ added spot size and film thickness limits

2022-09-13T17:02:14Z

Capabilities: added spot size and film thickness limits

← Older revision		Revision as of 17:02, 13 September 2022
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	*Measure optically transparent thin-films down to ~30nm thickness.		*Measure optically transparent thin-films down to ~30nm thickness.
	*Microscope Objectives: 10x, 20x, 50x, 100x, 150x		*Microscope Objectives: 10x, 20x, 50x, 100x, 150x
			**Can measure thin-films in few-micron spot.
	*Acquire Optical Reflection Spectra from 400-900nm		*Acquire Optical Reflection Spectra from 400-900nm
	*Spectrometer/Detector is capable of detecting down to UV ~190nm, but light source does not support this wavelength.		*Spectrometer/Detector is capable of detecting down to UV ~190nm, but light source does not support this wavelength.
	*Reflectivity curve-fitting for thin-film thickness analysis, supporting many common materials (Si<sub>3</sub>N<sub>4</sub>, SiO<sub>2</sub> dielectrics, Si, GaAs, InP semiconductors, metals, photoresists etc.)		*Reflectivity curve-fitting for thin-film thickness analysis, supporting many common materials (Si<sub>3</sub>N<sub>4</sub>, SiO<sub>2</sub> dielectrics, Si, GaAs, InP semiconductors, metals, photoresists etc.)
			*Approx ≥20nm film transparent measurement up to tens of microns.

	==Operating Procedures==		==Operating Procedures==
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	\|}		\|}

	== Other Info ==		==Other Info==
	'''''Equip > Characterization > <u>[[Microscopes]]</u>''''' - ''see a list of all our microscopes''		'''''Equip > Characterization > <u>[[Microscopes]]</u>''''' - ''see a list of all our microscopes''

Silva at 18:49, 30 August 2022

2022-08-30T18:49:01Z

← Older revision		Revision as of 18:49, 30 August 2022
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	{{tool2		{{tool2
	\|super = Aidan Hopkins		\|super = Aidan Hopkins
	\|super2= Demis John		\|super2= Demis D. John
	\|picture=Filmetrics F40-UV - system pic 01.jpg		\|picture=Filmetrics F40-UV - system pic 01.jpg
	\|type = Inspection, Test and Characterization		\|type = Inspection, Test and Characterization

Silva at 18:48, 30 August 2022

2022-08-30T18:48:23Z

← Older revision		Revision as of 18:48, 30 August 2022
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	{{~~tool~~		{{tool2
	\|super = ~~Ning~~ ~~Cao~~		\|super = Aidan Hopkins
			\|super2= Demis John
	\|picture=Filmetrics F40-UV - system pic 01.jpg		\|picture=Filmetrics F40-UV - system pic 01.jpg
	\|type = Inspection, Test and Characterization		\|type = Inspection, Test and Characterization

John d: link to all scopes

2022-06-06T17:28:28Z

link to all scopes

← Older revision		Revision as of 17:28, 6 June 2022
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	]]		]]
	\|}		\|}

			== Other Info ==
			'''''Equip > Characterization > <u>[[Microscopes]]</u>''''' - ''see a list of all our microscopes''

John d: /* About */ add BHJML model

2020-01-22T17:48:59Z

About: add BHJML model

← Older revision		Revision as of 17:48, 22 January 2020
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	}}		}}

	== About ==		==About==
	The Filmetrics F40-UV is a microscope-mounted thin-film measurement system, allowing you to non-destructively measure thin-film thicknesses in small (patterned) areas on your sample. It is an optical reflectometer, acquiring reflection spectra between 400-900nm optical wavelengths (Vis to Near-IR) with a regular halogen microscope light source. The Filmetrics software then performs curve-fitting to determine the thickness and/or refractive index of the measured films.		The Filmetrics F40-UV is a microscope-mounted thin-film measurement system, allowing you to non-destructively measure thin-film thicknesses in small (patterned) areas on your sample. The microscope is a standard Olympus BHJML metallurgical trinocular microscope. It is an optical reflectometer, acquiring reflection spectra between 400-900nm optical wavelengths (Vis to Near-IR) with a regular halogen microscope light source. The Filmetrics software then performs curve-fitting to determine the thickness and/or refractive index of the measured films.

	== Capabilities ==		==Capabilities==
⚫	* Measure optically transparent thin-films down to ~30nm thickness.
⚫	* Microscope Objectives: 10x, 20x, 50x, 100x, 150x
⚫	* Acquire Optical Reflection Spectra from 400-900nm
⚫	* Spectrometer/Detector is capable of detecting down to UV ~190nm, but light source does not support this wavelength.
⚫	* Reflectivity curve-fitting for thin-film thickness analysis, supporting many common materials (Si<sub>3</sub>N<sub>4</sub>, SiO<sub>2</sub> dielectrics, Si, GaAs, InP semiconductors, metals, photoresists etc.)

		⚫	*Measure optically transparent thin-films down to ~30nm thickness.
	== Operating Procedures ==
		⚫	*Microscope Objectives: 10x, 20x, 50x, 100x, 150x
⚫	* [[Filmetrics F40-UV Quick Start\|Quick Start Procedure]]
		⚫	*Acquire Optical Reflection Spectra from 400-900nm
		⚫	*Spectrometer/Detector is capable of detecting down to UV ~190nm, but light source does not support this wavelength.
		⚫	*Reflectivity curve-fitting for thin-film thickness analysis, supporting many common materials (Si<sub>3</sub>N<sub>4</sub>, SiO<sub>2</sub> dielectrics, Si, GaAs, InP semiconductors, metals, photoresists etc.)

	== ~~Examples~~ ==		==Operating Procedures==

		⚫	*[[Filmetrics F40-UV Quick Start\|Quick Start Procedure]]
⚫	=== Good Curve-Fitting ===

			==Examples==

		⚫	===Good Curve-Fitting===
	Do not believe your thickness measurements unless the red/blue curves show a reasonably good match![[File:Filmetrics_F40-UV_-_Measurement_screenshot_on_metal_pad_01.PNG\|alt=example spectrum curve fit\|none\|thumb\|500x500px\|Screenshot showing 10x microscope view and optical spectrum/curve fitting of the SiO2 film thickness on top of Platinum contact metal.]]		Do not believe your thickness measurements unless the red/blue curves show a reasonably good match![[File:Filmetrics_F40-UV_-_Measurement_screenshot_on_metal_pad_01.PNG\|alt=example spectrum curve fit\|none\|thumb\|500x500px\|Screenshot showing 10x microscope view and optical spectrum/curve fitting of the SiO2 film thickness on top of Platinum contact metal.]]

	[[File:Filmetrics F40-UV - spectrum curve fit 07.jpg\|alt=example spectrum curve fit\|none\|thumb\|300x300px\|A good fit should show the Calculated (red) curve overlay on top of the Measureed (blue) curve.]]		[[File:Filmetrics F40-UV - spectrum curve fit 07.jpg\|alt=example spectrum curve fit\|none\|thumb\|300x300px\|A good fit should show the Calculated (red) curve overlay on top of the Measureed (blue) curve.]]

	=== Checking whether a dry etch is complete ===		===Checking whether a dry etch is complete===
	The F40-UV is very useful for measuring whether a thin-film has been completely removed during a dry etch. This is similar to using [[Laser Etch Monitoring\|laser monitoring]] during the etch, except that the microscope enables you to measure inside small patterned areas that a laser monitor spot may not fit inside.		The F40-UV is very useful for measuring whether a thin-film has been completely removed during a dry etch. This is similar to using [[Laser Etch Monitoring\|laser monitoring]] during the etch, except that the microscope enables you to measure inside small patterned areas that a laser monitor spot may not fit inside.

John d: removed "screenshots" section --> "Examples"

2019-05-31T18:23:51Z

removed "screenshots" section --> "Examples"

← Older revision		Revision as of 18:23, 31 May 2019
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	* [[Filmetrics F40-UV Quick Start\|Quick Start Procedure]]		* [[Filmetrics F40-UV Quick Start\|Quick Start Procedure]]

	== ~~Screenshots +~~ Examples ==		== Examples ==

	=== Good Curve-Fitting ===		=== Good Curve-Fitting ===

John d: /* Screenshots + Examples */ updated examples & confirming removal of SiO2 on Pt

2019-05-31T18:23:15Z

Screenshots + Examples: updated examples & confirming removal of SiO2 on Pt

← Older revision		Revision as of 18:23, 31 May 2019
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	== Screenshots + Examples ==		== Screenshots + Examples ==

⚫	[[File:Filmetrics_F40-UV_-_Measurement_screenshot_on_metal_pad_01.PNG\|alt=example spectrum curve fit\|none\|thumb\|500x500px\|Screenshot showing 10x microscope view and optical spectrum/curve fitting of the SiO2 film thickness on top of Platinum contact metal.]]
			=== Good Curve-Fitting ===
		⚫	Do not believe your thickness measurements unless the red/blue curves show a reasonably good match![[File:Filmetrics_F40-UV_-_Measurement_screenshot_on_metal_pad_01.PNG\|alt=example spectrum curve fit\|none\|thumb\|500x500px\|Screenshot showing 10x microscope view and optical spectrum/curve fitting of the SiO2 film thickness on top of Platinum contact metal.]]

	[[File:Filmetrics F40-UV - spectrum curve fit 07.jpg\|alt=example spectrum curve fit\|none\|thumb\|300x300px\|A good fit should show the Calculated (red) curve overlay on top of the Measureed (blue) curve.]]		[[File:Filmetrics F40-UV - spectrum curve fit 07.jpg\|alt=example spectrum curve fit\|none\|thumb\|300x300px\|A good fit should show the Calculated (red) curve overlay on top of the Measureed (blue) curve.]]

		⚫	=== Checking whether a dry etch is complete ===
			The F40-UV is very useful for measuring whether a thin-film has been completely removed during a dry etch. This is similar to using [[Laser Etch Monitoring\|laser monitoring]] during the etch, except that the microscope enables you to measure inside small patterned areas that a laser monitor spot may not fit inside.

			In the following example, we are trying to etch away the SiO<sub>2</sub> from on top of a Platinum contact metal. The 20x objective allows us to measure the SiO2 thickness on top of the Platinum as we continue to etch in 1 minute increments, measuring in between etches.

			Finally, when the SiO2 has been fully removed, we see that we can't get a good fit between the measured (blue) and simulated (red) data.

			Since the Platinum layer is thick enough to be opaque to visible light (>50nm), we just modelled this as SiO2 on top of Platinum, ignoring any other materials below the platinum.
	{\| class="wikitable"		{\| class="wikitable"
			\|+
⚫	~~\|+Using~~ ~~the F40-UV to check~~ whether a dry etch is complete.
	![[File:Filmetrics F40-UV - SiO Etch 4m+4m - Incomplete Etch.png\|alt=Example Screenshot of incomplete SiO2 etch\|none\|thumb\|400x400px\|Incomplete Dry-Etch, showing some residual SiO2 left.]]		![[File:Filmetrics F40-UV - SiO Etch 4m+4m - Incomplete Etch.png\|alt=Example Screenshot of incomplete SiO2 etch\|none\|thumb\|400x400px\|Incomplete Dry-Etch, showing some residual SiO2 left. "Goodness of Fit" is close to 1.0 in the results pane, and the red+blue curves match closely so we believe the measurement.]]
	![[File:Filmetrics F40-UV - 2018-11-08 - SiO Etch 4m+4m+1m - Fully Removed.png\|alt=Example screenshot of fully removed SiO2 etch\|none\|thumb\|400x400px\|After re-etching, measurement shows bad fit (red and blue curves), ~~indicating~~ ~~the~~ ~~SiO2~~ ~~film~~ ~~has~~ ~~been~~ ~~fully~~ ~~removed~~.]]		![[File:Filmetrics F40-UV - 2018-11-08 - SiO Etch 4m+4m+1m - Fully Removed.png\|alt=Example screenshot of fully removed SiO2 etch\|none\|thumb\|400x400px\|After re-etching, measurement shows bad fit (red and blue curves), and "Goodness of Fit" = 0 in the results pane.
			The thickness value shown is not real, and this indicates that the SiO2 film has been fully removed since no parameter can give a good fit.
			]]
	\|}		\|}

John d: punctiation of tool type

2019-05-24T07:03:25Z

punctiation of tool type

← Older revision		Revision as of 07:03, 24 May 2019
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	\|super = Ning Cao		\|super = Ning Cao
	\|picture=Filmetrics F40-UV - system pic 01.jpg		\|picture=Filmetrics F40-UV - system pic 01.jpg
	\|type = Inspection,~~_Test_and_Characterization~~		\|type = Inspection, Test and Characterization
	\|location = Bay #4		\|location = Bay #4
	\|description = Microscope-mounted optical reflectometry		\|description = Microscope-mounted optical reflectometry

John d: tool descr. update

2019-05-24T04:47:28Z

tool descr. update

← Older revision		Revision as of 04:47, 24 May 2019
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	\|type = Inspection,_Test_and_Characterization		\|type = Inspection,_Test_and_Characterization
	\|location = Bay #4		\|location = Bay #4
	\|description = ~~Measures thin~~-~~film thickness/index in small regions via~~ optical reflectometry ~~through a microscope.~~		\|description = Microscope-mounted optical reflectometry
	\|manufacturer = Filmetrics Inc.		\|manufacturer = Filmetrics Inc.
	\|model = F40-UV		\|model = F40-UV