Focused Ion-Beam Lithography (Raith Velion) - Revision history

John d: added ToolActions widget

2025-12-06T09:10:32Z

added ToolActions widget

← Older revision		Revision as of 09:10, 6 December 2025
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	\|toolid=69		\|toolid=69
	}}		}}
			{{ToolActions\|
			\|toolid = 69
			\|InstructionsURL =
			\|ProcessControlURL =
			\|TrainingURL =
			}}
	= About =		= About =

Dread at 01:57, 19 November 2024

2024-11-19T01:57:59Z

← Older revision		Revision as of 01:57, 19 November 2024
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	* Recipes > Lithography > '''[[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29\|<u>FIB Lithography</u>]]'''		* Recipes > Lithography > '''[[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29\|<u>FIB Lithography</u>]]'''
	** ''Contains starting recipes etc.''		** ''Contains starting recipes etc.''

			== Examples of FIB-SEM cross sections ==

			=== T-gates ===
			{\| class="wikitable"
			\|+
			!''in situ'' SEM
			!''ex situ'' SEM
			\|-
			\|
			\|
			\|}

			=== Porous layers ===
			{\| class="wikitable"
			\|+
			!''in situ'' SEM
			!''ex situ'' SEM
			\|-
			\|
			\|
			\|}

			== Example Images CHESSY ==
			{\| class="wikitable"
			\|+
			!
			!
			!
			!
			\|-
			\|
			\|
			\|
			\|
			\|-
			\|
			\|
			\|
			\|
			\|-
			\|
			\|
			\|
			\|
			\|}

John d: added toolid, removed WIP, Pt dep/writing

2021-03-15T16:56:42Z

added toolid, removed WIP, Pt dep/writing

← Older revision		Revision as of 16:56, 15 March 2021
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	{{WIP}}
	{{tool\|{{PAGENAME}}		{{tool\|{{PAGENAME}}
	\|picture=RaithVelion.jpg		\|picture=RaithVelion.jpg
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	\|model = Velion		\|model = Velion
	\|materials =		\|materials =
	\|toolid=		\|toolid=69
	}}		}}
	= About =		= About =
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	Additional Capabilities:		Additional Capabilities:
	* Automated height sensing to detect sample surface height variation for automated correction		* Automated height sensing to detect sample surface height variation for automated correction
	* Pt Gas ~~Iinjection~~ System (GIS) deposition		* Pt Gas Injection System (GIS) localized deposition/writing
	*		*
	* Raith Nanosuite software including CAD (GDSII) navigation & patterning		* Raith Nanosuite software including CAD (GDSII) navigation & patterning

Dread: /* Detailed Specifications */

2021-03-12T14:58:13Z

Detailed Specifications

← Older revision		Revision as of 14:58, 12 March 2021
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	* Pt Gas Iinjection System (GIS) deposition		* Pt Gas Iinjection System (GIS) deposition
	*		*
	* Raith Nanosuite software ~~incl.~~ CAD (GDSII) navigation & patterning		* Raith Nanosuite software including CAD (GDSII) navigation & patterning
	== Recipes ==		== Recipes ==
	* Recipes > Lithography > '''[[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29\|<u>FIB Lithography</u>]]'''		* Recipes > Lithography > '''[[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29\|<u>FIB Lithography</u>]]'''

Dread at 14:54, 12 March 2021

2021-03-12T14:54:48Z

← Older revision		Revision as of 14:54, 12 March 2021
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	\|location=Bay 1		\|location=Bay 1
	\|description = Focused Ion Beam Lithography		\|description = Focused Ion Beam Lithography
	\|manufacturer = Raith ~~Gmbh~~		\|manufacturer = Raith GmbH
	\|model = Velion		\|model = Velion
	\|materials =		\|materials =
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	}}		}}
	= About =		= About =

			VELION is a novel FIB-SEM instrument dedicated to advanced nanofabrication, in which FIB is the true priority technique. An evolution of Raith’s ionLINE, the ion column at the vertical position features a unique design to meet the most demanding nanofabrication requirements. It is supported by a field emission SEM solution as well as a highest-precision laser interferometer-controlled sample stage.

			With its FIB-prioritized nanofabrication setup, including SEM and a high-accuracy stage, VELION allows for versatile use in four different operation modes that offer

			• direct and versatile FIB patterning for simplified, flexible, 3D, and automated processing

			• highest-precision nanofabrication over extended areas and periods of time with both FIB and SEM

			• SEM imaging for in-situ process control, inspection and sample preparation.

	The Raith Velion ion beam tool was installed at UCSB in 2020 and signed off and avaiable for. use in early 2021.		The Raith Velion ion beam tool was installed at UCSB in 2020 and signed off and avaiable for. use in early 2021.

Dread at 14:49, 12 March 2021

2021-03-12T14:49:17Z

← Older revision		Revision as of 14:49, 12 March 2021
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	= About =		= About =
	The Raith Velion ion beam tool was installed at UCSB in 2020 and signed off and avaiable for. use in early 2021.		The Raith Velion ion beam tool was installed at UCSB in 2020 and signed off and avaiable for. use in early 2021.

	This system uses the vector scan approach for electron beam deflection within a field, step and repeat for stage movement between fields, the combination of which allows the entire area of the sample to be exposed to the electron beam.

	The machine can be run at 25, 50 and 100 kV. Note however that only the 100kV mode is used at UCSB.

	=Detailed Specifications=		=Detailed Specifications=

Dread: /* About */

2021-03-12T14:48:33Z

About

@@ Line 12: / Line 12: @@
 }}
 = About  =
-The 6300FS machine was installed at UCSB in May 2007.
+The Raith Velion ion beam tool was installed at UCSB in 2020 and signed off and avaiable for. use in early 2021.
 This system uses the vector scan approach for electron beam deflection within a field, step and repeat for stage movement between fields, the combination of which allows the entire area of the sample to be exposed to the electron beam.
@@ Line 19: / Line 19: @@
 =Detailed Specifications=
 == Recipes ==
 * Recipes > Lithography > '''[[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29|<u>FIB Lithography</u>]]'''

John d: /* Recipes */ formatting

2020-09-14T05:10:24Z

Recipes: formatting

← Older revision		Revision as of 05:10, 14 September 2020
Line 38:		Line 38:

	== Recipes ==		== Recipes ==
	* ~~'''~~Recipes > Lithography > [[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29\|FIB Lithography]]'''		* Recipes > Lithography > '''[[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29\|<u>FIB Lithography</u>]]'''
	** Contains starting recipes etc.		** ''Contains starting recipes etc.''

John d: linked to Recipes page

2020-09-14T04:15:43Z

linked to Recipes page

← Older revision		Revision as of 04:15, 14 September 2020
Line 38:		Line 38:

	== Recipes ==		== Recipes ==
			* '''Recipes > Lithography > [[Lithography Recipes#FIB Lithography Recipes .28Raith Velion.29\|FIB Lithography]]'''
	To be added
			** Contains starting recipes etc.

John d: initial page, copy/pasted the JEOL EBL page

2020-09-14T04:12:10Z

initial page, copy/pasted the JEOL EBL page

New page

{{WIP}}
{{tool|{{PAGENAME}}
|picture=RaithVelion.jpg
|type = Lithography
|super= Dan Read
|location=Bay 1
|description = Focused Ion Beam Lithography
|manufacturer = Raith Gmbh
|model = Velion
|materials =
|toolid=
}}
= About =
The 6300FS machine was installed at UCSB in May 2007.

This system uses the vector scan approach for electron beam deflection within a field, step and repeat for stage movement between fields, the combination of which allows the entire area of the sample to be exposed to the electron beam.

The machine can be run at 25, 50 and 100 kV. Note however that only the 100kV mode is used at UCSB.

=Detailed Specifications=
*Utilizes a “Hi-brightness” thermal field emission electron source (ZnO/W) with a minimum spot-size at the substrate of 2nm; operates at 100kV only
*Unique two lens/deflector scanning system:
**<u>4th lens</u> => 20-25nm minimum line-width, 1.000nm scan step resolution, 500 x 500um scan field
**<u>5th lens</u> => 7-8 nm minimum line-width, 0.125nm scan step resolution, 62.5x62.5um scan field

*Maximum deflector scan speed = 25MHz (=> 40ns/pixel minimum dwell time)
*150x150 mm writable area; stage position control to 0.6nm accuracy (λ/1024); 10mm/s maximum stage speed

*Dynamic Focus and Stigmation Control for improved writing performance across the entire scan field.
*UNIX computer controlled

*Advanced Fracturing software available (Layout BEAMER from GeniSys, Inc)
** automated proximity correction of patterns possible
** ability to manually position write fields within a pattern for optimum inter-field writing performance
** ability to adjust beam scanning strategy within a write field for optimum intra-field writing performance
** fine tuning of line-edge roughness by shot pitch correction

== Recipes ==
To be added