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	<id>https://wiki.nanofab.ucsb.edu/w/index.php?action=history&amp;feed=atom&amp;title=GCA_6300_training_manual_-old_instructions</id>
	<title>GCA 6300 training manual -old instructions - Revision history</title>
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	<updated>2026-07-29T10:07:45Z</updated>
	<subtitle>Revision history for this page on the wiki</subtitle>
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	<entry>
		<id>https://wiki.nanofab.ucsb.edu/w/index.php?title=GCA_6300_training_manual_-old_instructions&amp;diff=157272&amp;oldid=prev</id>
		<title>Biljana at 15:49, 23 March 2020</title>
		<link rel="alternate" type="text/html" href="https://wiki.nanofab.ucsb.edu/w/index.php?title=GCA_6300_training_manual_-old_instructions&amp;diff=157272&amp;oldid=prev"/>
		<updated>2020-03-23T15:49:34Z</updated>

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				&lt;td colspan=&quot;2&quot; style=&quot;background-color: #fff; color: #202122; text-align: center;&quot;&gt;← Older revision&lt;/td&gt;
				&lt;td colspan=&quot;2&quot; style=&quot;background-color: #fff; color: #202122; text-align: center;&quot;&gt;Revision as of 15:49, 23 March 2020&lt;/td&gt;
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  &lt;td colspan=&quot;2&quot; class=&quot;diff-lineno&quot;&gt;Line 1:&lt;/td&gt;
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  &lt;td style=&quot;color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;Updated  &lt;del style=&quot;font-weight: bold; text-decoration: none;&quot;&gt;4-24-2019&lt;/del&gt;&lt;/div&gt;&lt;/td&gt;
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  &lt;td colspan=&quot;2&quot; class=&quot;diff-empty diff-side-deleted&quot;&gt;&lt;/td&gt;
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  &lt;td style=&quot;color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;br /&gt;&lt;/td&gt;
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&lt;tr&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;GCA Stepper Training Guide &amp;amp; References&lt;/div&gt;&lt;/td&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;GCA Stepper Training Guide &amp;amp; References&lt;/div&gt;&lt;/td&gt;
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  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;br /&gt;&lt;/td&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;br /&gt;&lt;/td&gt;
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  &lt;td colspan=&quot;2&quot; class=&quot;diff-lineno&quot;&gt;Line 108:&lt;/td&gt;
  &lt;td colspan=&quot;2&quot; class=&quot;diff-lineno&quot;&gt;Line 109:&lt;/td&gt;
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&lt;tr&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;29)	For Die Alignment Offset, the offset of the DFAS center to the die center at the wafer plane is entered for X and Y.  You should run a test sample to determine how well the DFAS system is performing for your mask set and process.  You may need a small offset in X or Y to compensate.  &lt;/div&gt;&lt;/td&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;29)	For Die Alignment Offset, the offset of the DFAS center to the die center at the wafer plane is entered for X and Y.  You should run a test sample to determine how well the DFAS system is performing for your mask set and process.  You may need a small offset in X or Y to compensate.  &lt;/div&gt;&lt;/td&gt;
&lt;/tr&gt;
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  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;30)	Use pass shift to shift all exposures in this pass by a set amount.  Usually this option is passed over, but may be used if you have multiple levels on a single mask and are aperturing all layers but the one of interest and this pattern is off-center.  You would enter the correct offset to ensure pattern alignment. See picture below for sign convention for X and Y for pass shifts to place pattern into center of wafer.&lt;/div&gt;&lt;/td&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;30)	Use pass shift to shift all exposures in this pass by a set amount.  Usually this option is passed over, but may be used if you have multiple levels on a single mask and are aperturing all layers but the one of interest and this pattern is off-center.  You would enter the correct offset to ensure pattern alignment. See picture below for sign convention for X and Y for pass shifts to place pattern into center of wafer.&lt;/div&gt;&lt;/td&gt;
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		<author><name>Biljana</name></author>
	</entry>
	<entry>
		<id>https://wiki.nanofab.ucsb.edu/w/index.php?title=GCA_6300_training_manual_-old_instructions&amp;diff=157271&amp;oldid=prev</id>
		<title>Biljana: Created page with &quot;Updated  4-24-2019 GCA Stepper Training Guide &amp; References  General Information about system	1 Aligning reticle (mask) to system	2 Logging into computer/checking the system	3...&quot;</title>
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		<updated>2020-03-23T15:48:39Z</updated>

		<summary type="html">&lt;p&gt;Created page with &amp;quot;Updated  4-24-2019 GCA Stepper Training Guide &amp;amp; References  General Information about system	1 Aligning reticle (mask) to system	2 Logging into computer/checking the system	3...&amp;quot;&lt;/p&gt;
&lt;a href=&quot;https://wiki.nanofab.ucsb.edu/w/index.php?title=GCA_6300_training_manual_-old_instructions&amp;amp;diff=157271&quot;&gt;Show changes&lt;/a&gt;</summary>
		<author><name>Biljana</name></author>
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