InP Etch Rate and Selectivity (InP/SiO2) - Revision history

Ningcao: add a SEM

2021-11-09T01:00:35Z

add a SEM

← Older revision		Revision as of 01:00, 9 November 2021
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	\|1.24		\|1.24
	\|13.8		\|13.8
	\|[https://wiki.nanotech.ucsb.edu/w/images/4/45/IP210201.pdf]		\|[https://wiki.nanotech.ucsb.edu/w/images/4/45/IP210201.pdf][https://wiki.nanotech.ucsb.edu/w/images/4/49/IP210212.pdf]
	\|}		\|}

2021-11-09T00:58:50Z

add a SEM

← Older revision		Revision as of 00:58, 9 November 2021
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	{\| class="wikitable"		{\| class="wikitable"
	\| colspan="4" \|1.4 mT, 125/800W, Cl2/H2/Ar flow-rate=6.3/12.7/2 sccm, chuck temperature=200 C, and etch time=90s (Prior to the etch, do O2 plasma chamber clean for 15 minutes, then, chamber coating with the same recipe and a quarter dummy InP on carrier for 15 minutes.		\| colspan="4" \|[https://wiki.nanotech.ucsb.edu/w/images/4/45/IP210201.pdf 1.4] mT, 125/800W, Cl2/H2/Ar flow-rate=6.3/12.7/2 sccm, chuck temperature=200 C, and etch time=90s (Prior to the etch, do O2 plasma chamber clean for 15 minutes, then, chamber coating with the same recipe and a quarter dummy InP on carrier for 15 minutes.
	\|		\|
	\|-		\|-
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	\|1.24		\|1.24
	\|13.8		\|13.8
			\|[https://wiki.nanotech.ucsb.edu/w/images/4/45/IP210201.pdf]
	\|
	\|}		\|}

2021-11-09T00:48:38Z

enter a data point

← Older revision		Revision as of 00:48, 9 November 2021
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	\|16		\|16
	\|[https://wiki.nanotech.ucsb.edu/w/images/4/47/IP210117.pdf][https://wiki.nanotech.ucsb.edu/w/images/d/d4/IP210119.pdf]		\|[https://wiki.nanotech.ucsb.edu/w/images/4/47/IP210117.pdf][https://wiki.nanotech.ucsb.edu/w/images/d/d4/IP210119.pdf]
			\|-
			\|11/8/2021
			\|InP#2102
			\|1.24
			\|13.8
			\|
	\|}		\|}

2021-02-04T01:33:39Z

add another pic

← Older revision		Revision as of 01:33, 4 February 2021
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	\|1.30		\|1.30
	\|16		\|16
	\|[https://wiki.nanotech.ucsb.edu/w/images/4/47/IP210117.pdf]		\|[https://wiki.nanotech.ucsb.edu/w/images/4/47/IP210117.pdf][https://wiki.nanotech.ucsb.edu/w/images/d/d4/IP210119.pdf]
	\|}		\|}

2021-02-04T01:32:29Z

add a pic

← Older revision		Revision as of 01:32, 4 February 2021
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	\|1.30		\|1.30
	\|16		\|16
			\|[https://wiki.nanotech.ucsb.edu/w/images/4/47/IP210117.pdf]
	\|
	\|}		\|}

2021-02-04T01:28:34Z

add a data point

← Older revision		Revision as of 01:28, 4 February 2021
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	\|10.4		\|10.4
	\|[https://wiki.nanotech.ucsb.edu/w/images/8/8d/IP020104.pdf]		\|[https://wiki.nanotech.ucsb.edu/w/images/8/8d/IP020104.pdf]
			\|-
			\|2/3/2021
			\|InP#2101
			\|1.30
			\|16
			\|
	\|}		\|}

2020-08-31T01:55:35Z

add a Sem PIC

← Older revision		Revision as of 01:55, 31 August 2020
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	\|1.11		\|1.11
	\|10.4		\|10.4
			\|[https://wiki.nanotech.ucsb.edu/w/images/8/8d/IP020104.pdf]
	\|
	\|}		\|}

2020-08-31T01:50:29Z

add a data point

← Older revision		Revision as of 01:50, 31 August 2020
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	\|9.7		\|9.7
	\|[https://wiki.nanotech.ucsb.edu/wiki/images/b/b7/IP190101.pdf][https://wiki.nanotech.ucsb.edu/wiki/images/0/06/IP190103.pdf]		\|[https://wiki.nanotech.ucsb.edu/wiki/images/b/b7/IP190101.pdf][https://wiki.nanotech.ucsb.edu/wiki/images/0/06/IP190103.pdf]
			\|-
			\|8/30/2020
			\|InP#2001
			\|1.11
			\|10.4
			\|
	\|}		\|}

2020-04-07T01:35:08Z

Text replacement - "www.nanotech.ucsb.edu/wiki/" to "wiki.nanotech.ucsb.edu/wiki/"

2019-02-01T23:36:53Z

add SEM

← Older revision		Revision as of 23:36, 1 February 2019
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	\|0.91		\|0.91
	\|9.3		\|9.3
			\|[https://www.nanotech.ucsb.edu/wiki/images/6/64/IP161510.pdf]
	\|
	\|-		\|-
	\|1/23/2017		\|1/23/2017