Ion Beam Deposition (Veeco NEXUS) - Revision history

John d: /* Documentation */ moved DBR calibration into "documentation" section

2025-05-08T22:16:11Z

Documentation: moved DBR calibration into "documentation" section

← Older revision		Revision as of 22:16, 8 May 2025
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	*Wide-band Anti-Reflection coatings demonstrated in near-IR (~1550nm)		*Wide-band Anti-Reflection coatings demonstrated in near-IR (~1550nm)

			=Procedures=
	=Documentation=

	*{{file\|IBDoperationguide1.pdf\|Operating Instructions Part 1}}		*{{file\|IBDoperationguide1.pdf\|Operating Instructions Part 1}}
	*{{file\|IBDoperationguide2.pdf\|Operating Instructions Part 2}}		*{{file\|IBDoperationguide2.pdf\|Operating Instructions Part 2}}
		⚫	[https://wiki.nanofab.ucsb.edu/w/images/1/18/IBD_Troubleshooting_Guide.pdf Troubleshooting Guide]
		⚫	*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating multi-layer optical films]]
			**For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.
			**Uses Fabry-Perot depositions to calibration "optical thickness" directly, similar to VCSEL growth calibrations.
		⚫	[https://wiki.nanofab.ucsb.edu/w/images/1/1c/IBD_SOP.pdf IBD Standard Operating procedure]

	==Recipes==		==Recipes==

	*[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29\|Sputtering Recipes: Ion Beam Deposition (Veeco NEXUS)]]		*[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29\|Sputtering Recipes: Ion Beam Deposition (Veeco NEXUS)]]
	**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''		**''Dep Rates, Refractive Indices, Stress etc. for various available dielectric coatings''
⚫	*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating multi-layer optical films]]~~: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.~~
⚫	[https://wiki.nanofab.ucsb.edu/w/images/1/1c/IBD_SOP.pdf IBD Standard Operating procedure]

	==Other documents==

⚫	[https://wiki.nanofab.ucsb.edu/w/images/1/18/IBD_Troubleshooting_Guide.pdf ~~Troubleshootung~~ Guide]

	==Schematics/Examples==		==Schematics/Examples==

John d: /* Schematics/Examples */ added example DBR spectrum

2024-10-23T18:22:07Z

Schematics/Examples: added example DBR spectrum

← Older revision		Revision as of 18:22, 23 October 2024
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	[[File:IBD Schematic.jpg\|alt=Illustration showing wafer, assist beam and sputter/depo beam\|none\|thumb\|Top-Down Schematic of the Ion Beam Deposition system, where (1) is the substrate/wafer, (2) is the Depo/Sputter ion beam, (3) is the variable sputter target (either Si, Ta, Al, or Ti), and (4) is the Assist Ion Beam (Ar, O<sub>2</sub>, or N<sub>2</sub> beam). ''Image'' ''Author: [[Demis D. John]], 2010'']]		[[File:IBD Schematic.jpg\|alt=Illustration showing wafer, assist beam and sputter/depo beam\|none\|thumb\|Top-Down Schematic of the Ion Beam Deposition system, where (1) is the substrate/wafer, (2) is the Depo/Sputter ion beam, (3) is the variable sputter target (either Si, Ta, Al, or Ti), and (4) is the Assist Ion Beam (Ar, O<sub>2</sub>, or N<sub>2</sub> beam). ''Image'' ''Author: [[Demis D. John]], 2010'']]
	<br />		<br />
			[[File:IBD 9-period DBR - Reflectivity Spectrum (EMpy).png\|alt=Screenshot of optical reflection spectrum\|none\|thumb\|Example reflectivity of a 9-period SiO2/Ta2O5 DBR, with high reflectivity at ~1050nm, measured with the Filmetrics F10-RT]]

John d: /* Detailed Specifications */ "available" sputter targets

2024-08-21T19:13:29Z

Detailed Specifications: "available" sputter targets

← Older revision		Revision as of 19:13, 21 August 2024
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	*Xenon sputter-target bombardment		*Xenon sputter-target bombardment
	*Nitrogen and/or Oxygen deposition assist source for metal oxides/nitrides		*Nitrogen and/or Oxygen deposition assist source for metal oxides/nitrides
	*~~Available~~ Sputter Targets: Ta, Si, Al, Ti (ITO target on-hand but not installed)		*Currently installed Sputter Targets: '''Ta, Si, Al, Ti''' (ITO target on-hand but not installed)
	*Standard Recipes: Ta<sub>2</sub>O<sub>5</sub>, SiO<sub>2</sub>, Si<sub>3</sub>N<sub>4</sub>, TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>.		*Standard Recipes: Ta<sub>2</sub>O<sub>5</sub>, SiO<sub>2</sub>, Si<sub>3</sub>N<sub>4</sub>, SiO<sub>x</sub>N<sub>y</sub>, TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>.
	**Custom recipes: ~~SiO<sub>x</sub>N<sub>y</sub>,~~ AlN, TaN, TiN		**Custom recipes: AlN, TaN, TiN
	*Argon sample cleaning/pre-sputtering with low energy/etch rate		*Argon sample cleaning/pre-sputtering with low energy/etch rate
	*Base Pressure ≤ 3e-8 Torr		*Base Pressure ≤ 3e-8 Torr
	*Accepts small pieces, up to 6” wafers accepted		*Accepts small pieces, up to 6” wafers accepted
	**Holders available for etched/cleaved facet coating		**Holders available for etched/cleaved facet coating
			*High uniformity over 6-inch area, high density films, low hydrogen content. Higher particle count.
	*High quality, High Reflectivity DBR (>99.5%) mirrors demonstrated at UV-Vis & near-IR wavelengths		*High quality, High Reflectivity DBR (>99.5%) mirrors demonstrated at UV-Vis & near-IR wavelengths
	*Wide-band Anti-Reflection coatings demonstrated in near-IR (~1550nm)		*Wide-band Anti-Reflection coatings demonstrated in near-IR (~1550nm)
Line 47:		Line 48:
	**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''		**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''
	*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating multi-layer optical films]]: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.		*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating multi-layer optical films]]: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.
	* [https://wiki.nanofab.ucsb.edu/w/images/1/1c/IBD_SOP.pdf IBD Standard Operating procedure] *		[https://wiki.nanofab.ucsb.edu/w/images/1/1c/IBD_SOP.pdf IBD Standard Operating procedure]

	==Other documents==		==Other documents==

	* [https://wiki.nanofab.ucsb.edu/w/images/1/18/IBD_Troubleshooting_Guide.pdf Troubleshootung Guide] *		[https://wiki.nanofab.ucsb.edu/w/images/1/18/IBD_Troubleshooting_Guide.pdf Troubleshootung Guide]

	==Schematics/Examples==		==Schematics/Examples==
	[[File:IBD Schematic.jpg\|alt=Illustration showing wafer, assist beam and sputter/depo beam\|none\|thumb\|Top-Down Schematic of the Ion Beam Deposition system, where (1) is the substrate/wafer, (2) is the Depo/Sputter ion beam, (3) is the variable sputter target (either Si, Ta, Al, or Ti), and (4) is the Assist Ion Beam.]]		[[File:IBD Schematic.jpg\|alt=Illustration showing wafer, assist beam and sputter/depo beam\|none\|thumb\|Top-Down Schematic of the Ion Beam Deposition system, where (1) is the substrate/wafer, (2) is the Depo/Sputter ion beam, (3) is the variable sputter target (either Si, Ta, Al, or Ti), and (4) is the Assist Ion Beam (Ar, O<sub>2</sub>, or N<sub>2</sub> beam). ''Image'' ''Author: [[Demis D. John]], 2010'']]
	<br />		<br />

Biljana: /* Documentation */

2024-01-11T18:04:59Z

Documentation

← Older revision		Revision as of 18:04, 11 January 2024
Line 47:		Line 47:
	**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''		**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''
	*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating multi-layer optical films]]: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.		*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating multi-layer optical films]]: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.
			* [https://wiki.nanofab.ucsb.edu/w/images/1/1c/IBD_SOP.pdf IBD Standard Operating procedure] *

			==Other documents==

	* [https://wiki.nanofab.ucsb.edu/w/images/1/18/IBD_Troubleshooting_Guide.pdf Troubleshootung Guide] *		* [https://wiki.nanofab.ucsb.edu/w/images/1/18/IBD_Troubleshooting_Guide.pdf Troubleshootung Guide] *

Biljana: /* Documentation */

2024-01-11T18:03:19Z

Documentation

← Older revision		Revision as of 18:03, 11 January 2024
Line 47:		Line 47:
	**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''		**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''
	*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating multi-layer optical films]]: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.		*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating multi-layer optical films]]: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.

			* [https://wiki.nanofab.ucsb.edu/w/images/1/18/IBD_Troubleshooting_Guide.pdf Troubleshootung Guide] *

	==Schematics/Examples==		==Schematics/Examples==

John d: /* Recipes */

2023-09-22T04:33:50Z

Recipes

← Older revision		Revision as of 04:33, 22 September 2023
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	*[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29\|Sputtering Recipes: Ion Beam Deposition (Veeco NEXUS)]]		*[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29\|Sputtering Recipes: Ion Beam Deposition (Veeco NEXUS)]]
	**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''		**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''
	*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating optical films]]: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.		*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating multi-layer optical films]]: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.

	== Schematics/Examples ==		==Schematics/Examples==
	[[File:IBD Schematic.jpg\|alt=Illustration showing wafer, assist beam and sputter/depo beam\|none\|thumb\|Top-Down Schematic of the Ion Beam Deposition system, where (1) is the substrate/wafer, (2) is the Depo/Sputter ion beam, (3) is the variable sputter target (either Si, Ta, Al, or Ti), and (4) is the Assist Ion Beam.]]		[[File:IBD Schematic.jpg\|alt=Illustration showing wafer, assist beam and sputter/depo beam\|none\|thumb\|Top-Down Schematic of the Ion Beam Deposition system, where (1) is the substrate/wafer, (2) is the Depo/Sputter ion beam, (3) is the variable sputter target (either Si, Ta, Al, or Ti), and (4) is the Assist Ion Beam.]]
	<br />		<br />

John d: added schematic of ion beam

2023-04-26T06:28:09Z

added schematic of ion beam

← Older revision		Revision as of 06:28, 26 April 2023
Line 47:		Line 47:
	**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''		**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''
	*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating optical films]]: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.		*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating optical films]]: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.

			== Schematics/Examples ==
			[[File:IBD Schematic.jpg\|alt=Illustration showing wafer, assist beam and sputter/depo beam\|none\|thumb\|Top-Down Schematic of the Ion Beam Deposition system, where (1) is the substrate/wafer, (2) is the Depo/Sputter ion beam, (3) is the variable sputter target (either Si, Ta, Al, or Ti), and (4) is the Assist Ion Beam.]]
			<br />

Silva at 17:38, 30 August 2022

2022-08-30T17:38:39Z

← Older revision		Revision as of 17:38, 30 August 2022
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	{{~~tool~~\|{{PAGENAME}}		{{tool2\|{{PAGENAME}}
	\|picture=IBD.jpg		\|picture=IBD.jpg
	\|type = Vacuum Deposition		\|type = Vacuum Deposition
	\|super= ~~Bill~~ ~~Millerski~~		\|super= Michael Barreraz
			\|super2= Bill Millerski
	\|location=Bay 4		\|location=Bay 4
	\|description = Ion Beam Deposition Tool		\|description = Ion Beam Deposition Tool

John d: /* Detailed Specifications */ mentioned ITO not installed, minor formatting

2022-05-11T00:15:17Z

Detailed Specifications: mentioned ITO not installed, minor formatting

← Older revision		Revision as of 00:15, 11 May 2022
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	*Full programmable control through GUI, designed for multi-layer optical coatings		*Full programmable control through GUI, designed for multi-layer optical coatings
	*Xenon target bombardment		*Xenon sputter-target bombardment
	*Nitrogen and/or Oxygen deposition assist source for metal oxides/nitrides		*Nitrogen and/or Oxygen deposition assist source for metal oxides/nitrides
		⚫	*Available Sputter Targets: Ta, Si, Al, Ti (ITO target on-hand but not installed)
⚫	*Argon sample cleaning/pre-sputtering with low energy/etch rate
		⚫	*Standard Recipes: Ta<sub>2</sub>O<sub>5</sub>, SiO<sub>2</sub>, Si<sub>3</sub>N<sub>4</sub>, TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>.
⚫	*Available Sputter Targets: Ta, Si, Al, Ti, ITO ~~(up~~ to 4 installed ~~at a time~~)
⚫	*Standard Recipes: Ta<sub>2</sub>O<sub>5</sub> ~~(1.33 A/s rate)~~, SiO<sub>2</sub> ~~(0.85A/s)~~, Si<sub>3</sub>N<sub>4</sub>, TiO<sub>2</sub>, Al<sub>2</sub>O<sub>3</sub>.
	**Custom recipes: SiO<sub>x</sub>N<sub>y</sub>, AlN, TaN, TiN		**Custom recipes: SiO<sub>x</sub>N<sub>y</sub>, AlN, TaN, TiN
		⚫	*Argon sample cleaning/pre-sputtering with low energy/etch rate
	*Base Pressure ≤ 3e-8 Torr		*Base Pressure ≤ 3e-8 Torr
	*Accepts small pieces, up to 6” wafers accepted~~, or etched/cleaved facet coating~~		*Accepts small pieces, up to 6” wafers accepted
			**Holders available for etched/cleaved facet coating
	*High quality, High Reflectivity DBR (>99.5%) mirrors demonstrated at ~~blue~~ & ~~nIR~~ wavelengths		*High quality, High Reflectivity DBR (>99.5%) mirrors demonstrated at UV-Vis & near-IR wavelengths
	*Wide-band Anti-Reflection coatings demonstrated in near-IR (~1550nm)		*Wide-band Anti-Reflection coatings demonstrated in near-IR (~1550nm)

John d: /* Recipes */ DBR Calibration-Method page created, removed the "avaialbel from process group" text

2022-03-31T19:50:38Z

Recipes: DBR Calibration-Method page created, removed the "avaialbel from process group" text

← Older revision		Revision as of 19:50, 31 March 2022
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	*[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29\|Sputtering Recipes: Ion Beam Deposition (Veeco NEXUS)]]		*[[Sputtering_Recipes#Ion_Beam_Deposition_.28Veeco_NEXUS.29\|Sputtering Recipes: Ion Beam Deposition (Veeco NEXUS)]]
	**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''		**''Dep Rates, Refractive Indices etc. for various available dielectric coatings''
	*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating optical films]]: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc. ~~''Available from NanoFab Process Group''~~		*[[IBD: Calibrating Optical Thickness\|Method for accurately calibrating optical films]]: For example, for calibrating and depositing Multi-layer DBR gratings, Anti-Reflection coatings etc.