Lab Rules - Revision history

John d: /* Acid/Base and HF/TMAH/Bromine Processing */ minor wording on HF TRIonic glove description to match shelf labeling

2024-07-11T20:35:43Z

Acid/Base and HF/TMAH/Bromine Processing: minor wording on HF TRIonic glove description to match shelf labeling

← Older revision		Revision as of 20:35, 11 July 2024
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	The Iris Camera and Card Access System provides security to the Nanofab, and allows tracking of the time each user spends in the Nanofab. '''Always scan in when entering the lab and scan out when exiting the lab, even when attending training sessions or performing beneficial work.''' The only exception to this rule is entering as a visitor as defined in the visitor policy below. '''Willful Violation this policy will result in suspension.''' This policy is both for safety (knowing who is in the lab in case of emergencies) and for fair, accurate billing of facility resources.		The Iris Camera and Card Access System provides security to the Nanofab, and allows tracking of the time each user spends in the Nanofab. '''Always scan in when entering the lab and scan out when exiting the lab, even when attending training sessions or performing beneficial work.''' The only exception to this rule is entering as a visitor as defined in the visitor policy below. '''Willful Violation this policy will result in suspension.''' This policy is both for safety (knowing who is in the lab in case of emergencies) and for fair, accurate billing of facility resources.

	==== After Hours Access ====		====After Hours Access====
	The building is open from 7am to 6pm M-F, excluding holidays. During all other hours, the building is electronically locked. After hour access can be gained by using the iris reader or WHITE card reader on the south entrance (mountains are north, not the main entrance)		The building is open from 7am to 6pm M-F, excluding holidays. During all other hours, the building is electronically locked. After hour access can be gained by using the iris reader or WHITE card reader on the south entrance (mountains are north, not the main entrance)

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	==='''For emergencies after hours'''===		==='''For emergencies after hours'''===
	[[File:Lab Rules - 4.6 after hours contact sign.png\|thumb]]		[[File:Lab Rules - 4.6 after hours contact sign.png\|thumb]]
	Contact the Nanofab cell phone ('''805-451-0509''') for non-injury producing events, but not for simple equipment failures or issues. The cell phone number is also posted under the clocks at the end of each Bay. You can dial 911 from you cell phone or dial 9-911 from all Nanofab phones for life threatening emergencies. The campus phone will connect you directly to UCSB Police Dispatch. Remember, dialing 911 on your personal cell phone connects you to a county dispatch and not a campus dispatch so you will need to give them location information. The campus dispatch will know by the campus phone number where you are located on campus.		Contact the Nanofab cell phone ('''[[Tel:805-451-0509\|805-451-0509]]''') for non-injury producing events, but not for simple equipment failures or issues. The cell phone number is also posted under the clocks at the end of each Bay. You can dial 911 from you cell phone or dial 9-911 from all Nanofab phones for life threatening emergencies. The campus phone will connect you directly to UCSB Police Dispatch. Remember, dialing 911 on your personal cell phone connects you to a county dispatch and not a campus dispatch so you will need to give them location information. The campus dispatch will know by the campus phone number where you are located on campus.

	==='''UCSB NanoFab Exit Map'''===		==='''UCSB NanoFab Exit Map'''===
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	#All wet processing involving acids and bases ('''except HF or any mixture including HF, Bromine, TMAH >5%, and developers''') is limited to the acid/base benches. Do not bring acids/bases to the solvent stainless-steel benches.		#All wet processing involving acids and bases ('''except HF or any mixture including HF, Bromine, TMAH >5%, and developers''') is limited to the acid/base benches. Do not bring acids/bases to the solvent stainless-steel benches.
	#All HF, TMAH >5%, and Bromine-based processing is limited to the two HF/TMAH wet benches in bay 5 and wet bench in bay 4 - NO EXCEPTIONS. Store all HF, TMAH >5%, and bromine in labeled containers in the HF acid/bromine storage cabinet. Please keep open containers of these toxic chemicals away from the edge of the bench. Waste solutions containing HF and TMAH are poured down the drain, and treated in the Nanofab acid treatment system. Empty HF and concentrated TMAH bottles should be returned to the HF acid storage cabinet.[[File:Lab Rules - 7.5.3 acid benches PPE.png\|thumb\|194x194px]]		#All HF, TMAH >5%, and Bromine-based processing is limited to the two HF/TMAH wet benches in bay 5 and wet bench in bay 4 - NO EXCEPTIONS. Store all HF, TMAH >5%, and bromine in labeled containers in the HF acid/bromine storage cabinet. Please keep open containers of these toxic chemicals away from the edge of the bench. Waste solutions containing HF and TMAH are poured down the drain, and treated in the Nanofab acid treatment system. Empty HF and concentrated TMAH bottles should be returned to the HF acid storage cabinet.[[File:Lab Rules - 7.5.3 acid benches PPE.png\|thumb\|194x194px]]
	#Personal Protective Equipment: When working at any HF/TMAH bench (bay 4 and bay 5) always wear ~~a fully-sleeved chemical apron, face shield, and “Trionic” gloves.~~		#Personal Protective Equipment: When working at any HF/TMAH bench (bay 4 and bay 5) always wear:
			##'''fully-sleeved chemical apron,'''
			##'''face shield, and'''
			##'''“TRIonic E-194” (Nitrile/Neoprene/Latex Blend) thicker gloves.'''
	#When working with other acids/bases at the benches, use appropriate PPE based on the materials being used by you or others at the bench. Full gowning and face-shields are recommended for heated or high concentration acid processing, especially piranha.		#When working with other acids/bases at the benches, use appropriate PPE based on the materials being used by you or others at the bench. Full gowning and face-shields are recommended for heated or high concentration acid processing, especially piranha.
	#Always keep your face above the sash as much as possible to minimize exposure to the head in case of an accident. '''Do not cover the holes on the fronts of the benches''' with wipes as this will disrupt the exhaust resulting in fumes escaping the bench.		#Always keep your face above the sash as much as possible to minimize exposure to the head in case of an accident. '''Do not cover the holes on the fronts of the benches''' with wipes as this will disrupt the exhaust resulting in fumes escaping the bench.

Silva: /* Containers and Labeling */

2023-04-12T17:16:10Z

Containers and Labeling

← Older revision		Revision as of 17:16, 12 April 2023
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	##A beaker in use on a solvent bench can contain acetone, propanol, or methanol if the beaker is labeled with the text: “acetone/propanol/methanol”. The generic label “solvent” is insufficient. Beakers containing solvents other that acetone, propanol, or methanol must be labeled with the specific solvent.		##A beaker in use on a solvent bench can contain acetone, propanol, or methanol if the beaker is labeled with the text: “acetone/propanol/methanol”. The generic label “solvent” is insufficient. Beakers containing solvents other that acetone, propanol, or methanol must be labeled with the specific solvent.
	##Beakers in use at lithography developer benches must be labeled with exact contents and ownership (individual or group name). The generic label “developer” is insufficient.		##Beakers in use at lithography developer benches must be labeled with exact contents and ownership (individual or group name). The generic label “developer” is insufficient.
	##“Acid” or “Base” is insufficient as a label. You must have the chemical name. Common names of user-mixed chemical mixtures such as “Aqua-Regia”, “RCA-2”, “Piranha” are also insufficient. Mixtures must be properly labeled such as ~~“H<sub>2</sub>SO<sub>4</sub>~~:~~H<sub>2</sub>O<sub>2</sub>”~~ or ~~“HCl~~: ~~HNO<sub>3</sub>”~~ when mixed by users. Premixed chemicals poured from manufacturer bottles may be labeled as on the bottle. “Gold-Etchant – Type TFA” or “Al-Etchant Type D”, or “Nanostrip” etc. are acceptable for chemical designation.		##“Acid” or “Base” is insufficient as a label. You must have the chemical name. Common names of user-mixed chemical mixtures such as “Aqua-Regia”, “RCA-2”, “Piranha” are also insufficient. Mixtures must be properly labeled such as “Sulfuric Acid: Hydrogen Peroxide” or “Hydrochloric Acid: Nitric Acid” when mixed by users. Premixed chemicals poured from manufacturer bottles may be labeled as on the bottle. “Gold-Etchant – Type TFA” or “Al-Etchant Type D”, or “Nanostrip” etc. are acceptable for chemical designation.

	====Chemical compatibility with containers====		====Chemical compatibility with containers====

Thibeault: Added after hours access directions and changed wireless access section

2022-11-14T20:03:33Z

Added after hours access directions and changed wireless access section

← Older revision		Revision as of 20:03, 14 November 2022
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	Since there are multiple users of the facility, with their own unique projects, the management of the facility cannot be responsible for overseeing all aspects of their work. Therefore, the supervisors of individuals using the facility, e.g., UCSB '''Principal Investigators (PIs) and external user PIs or managers are ultimately responsible for ensuring that their supervisees have the appropriate knowledge and training to work safely in the facility.''' They are also responsible for ensuring that all applicable regulatory requirements are met. This includes having a compliant "'''Chemical Hygiene Plan" per OSHA regulations'''. The information in this document and on the [https://www.nanotech.ucsb.edu/wiki UCSB Nanofab wiki site], https://www.nanotech.ucsb.edu/wiki, should be considered as providing "general supporting information" to the Chemical Hygiene Plan of a particular supervisor. Supervisors can reference all or some of this information within their Plans, but this document does not constitute a complete plan. UCSB EH&S can provide assistance to supervisors in preparing their Plans.		Since there are multiple users of the facility, with their own unique projects, the management of the facility cannot be responsible for overseeing all aspects of their work. Therefore, the supervisors of individuals using the facility, e.g., UCSB '''Principal Investigators (PIs) and external user PIs or managers are ultimately responsible for ensuring that their supervisees have the appropriate knowledge and training to work safely in the facility.''' They are also responsible for ensuring that all applicable regulatory requirements are met. This includes having a compliant "'''Chemical Hygiene Plan" per OSHA regulations'''. The information in this document and on the [https://www.nanotech.ucsb.edu/wiki UCSB Nanofab wiki site], https://www.nanotech.ucsb.edu/wiki, should be considered as providing "general supporting information" to the Chemical Hygiene Plan of a particular supervisor. Supervisors can reference all or some of this information within their Plans, but this document does not constitute a complete plan. UCSB EH&S can provide assistance to supervisors in preparing their Plans.

	=== Laboratory Orientation and Initial Training ===		===Laboratory Orientation and Initial Training===
	All new users must take the initial fundamentals of laboratory safety course offered through the UC learning center. Additionally, there is a mandatory general orientation and in-lab wet bench training that is required. Contact the facility operational director to request access.		All new users must take the initial fundamentals of laboratory safety course offered through the UC learning center. Additionally, there is a mandatory general orientation and in-lab wet bench training that is required. Contact the facility operational director to request access.

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	[[File:Lab Rules - 1.6 iris scanner.png\|thumb\|97x97px]]		[[File:Lab Rules - 1.6 iris scanner.png\|thumb\|97x97px]]
	The Iris Camera and Card Access System provides security to the Nanofab, and allows tracking of the time each user spends in the Nanofab. '''Always scan in when entering the lab and scan out when exiting the lab, even when attending training sessions or performing beneficial work.''' The only exception to this rule is entering as a visitor as defined in the visitor policy below. '''Willful Violation this policy will result in suspension.''' This policy is both for safety (knowing who is in the lab in case of emergencies) and for fair, accurate billing of facility resources.		The Iris Camera and Card Access System provides security to the Nanofab, and allows tracking of the time each user spends in the Nanofab. '''Always scan in when entering the lab and scan out when exiting the lab, even when attending training sessions or performing beneficial work.''' The only exception to this rule is entering as a visitor as defined in the visitor policy below. '''Willful Violation this policy will result in suspension.''' This policy is both for safety (knowing who is in the lab in case of emergencies) and for fair, accurate billing of facility resources.

			==== After Hours Access ====
			The building is open from 7am to 6pm M-F, excluding holidays. During all other hours, the building is electronically locked. After hour access can be gained by using the iris reader or WHITE card reader on the south entrance (mountains are north, not the main entrance)

	===Visitor Policy ===		===Visitor Policy ===
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	===Wireless Access in the Nanofab and on campus===		===Wireless Access in the Nanofab and on campus===
			All registered users should have a UCSBNetID to access the network. Repeaters are used within the facility to boost the signals.
	Currently there are three wireless networks available to Nanofab users:

	====UCSB Secure ~~(recommended)~~====		====UCSB Secure====

	#~~Local~~ ~~academic~~ ~~users~~ can access ~~the UCSB Secure wireless~~ network ~~by using their UCSBnetID and password~~.		#Everyone with a UCSBNetID can access this network.
	#Access accounts for external Nanofab user (other university or industrial users) are provided on email request by the Nanofab manager. Please contact the Nanofab manager if you would like an account, thibeault@ece.ucsb.edu.

	====Eduroam (~~Internal or External academics,~~ recommended)====		====Eduroam (recommended)====

	#~~This is available to any academic user that has an Eduroam account only.~~ Everyone with a ~~valid~~ UCSBNetID ~~should have~~ access to this ~~wireless~~ network.		#Everyone with a UCSBNetID can access this network.

	====UCSB Wireless Web (not recommended)====		====UCSB Wireless Web (not recommended)====

Thibeault: /* Chemical Bench Use */

2022-10-05T23:31:40Z

Chemical Bench Use

Show changes

John d: /* Wet Benches */ Added heading for "Glassware Confiscation Policy" (2.9.2.1)

2022-05-26T18:57:09Z

Wet Benches: Added heading for "Glassware Confiscation Policy" (2.9.2.1)

← Older revision		Revision as of 18:57, 26 May 2022
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	When you are training a group member or any other user, the correct way to enter the Nanofab is to log in and then take the user in as a visitor with a Visitor Badge. We assume that you are training while you are performing your own work and the other user is <u>only observing</u>. Only one user can be using the equipment and that user should be charged for their use.		When you are training a group member or any other user, the correct way to enter the Nanofab is to log in and then take the user in as a visitor with a Visitor Badge. We assume that you are training while you are performing your own work and the other user is <u>only observing</u>. Only one user can be using the equipment and that user should be charged for their use.

	*'''This should not be logged as beneficial time as the visitor is not charged.'''		*'''This should not be logged as beneficial time as the visitor is not charged.'''

	The other method would be for the new user that is being trained to log in and you will go in as the visitor. This will allow the new user to handle and operate systems while you observe his use as the visitor and give verbal guidance.		The other method would be for the new user that is being trained to log in and you will go in as the visitor. This will allow the new user to handle and operate systems while you observe his use as the visitor and give verbal guidance.
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	====Wet Benches====		====Wet Benches====
	For wet benches in particular: Do not cover the exhaust holes on the bench tops with wipes or foil, as this will impede the laminar flow of air through the bench and possibly expose you or other Nanofab users to toxic fumes. Glassware may be left to dry on the racks or, for large containers, at the back of the bench only while you are working in the lab. When you leave the lab, you are responsible for drying and putting away all of your glassware. A user’s job in the facility is not complete until all user-specific materials have been cleaned up and put away. Glassware left out to dry after you leave the lab for the day may be confiscated and put into a secure location for a time, before being disposed of. The group/user name will be placed on a list in the facility that users can check to determine if their materials have been taken by staff. The current location for this list is on the cabinet in service chase 4. Make sure your glassware/wafer holders have a group name written on them. Items with no user or group name are subject to disposal. If you ask staff to retrieve your glassware and it is found, your PI/advisor/supervisor will be charged a fee of 30 minutes of staff time and this will be noted on the invoice. For continued violations there will be an escalation of consequences:		For wet benches in particular: Do not cover the exhaust holes on the bench tops with wipes or foil, as this will impede the laminar flow of air through the bench and possibly expose you or other Nanofab users to toxic fumes. Glassware may be left to dry on the racks or, for large containers, at the back of the bench only while you are working in the lab. When you leave the lab, you are responsible for drying and putting away all of your glassware. A user’s job in the facility is not complete until all user-specific materials have been cleaned up and put away.

			===== Glassware Confiscation Policy =====
			Glassware left out to dry after you leave the lab for the day may be confiscated and put into a secure location for a time, before being disposed of. The group/user name will be placed on a list in the facility that users can check to determine if their materials have been taken by staff. The current location for this list is on the cabinet in service chase 4, and all Staff have key-access to this cabinet.

			Make sure your glassware/wafer holders have a group name written on them. Items with no user or group name are subject to disposal. If you ask staff to retrieve your glassware and it is found, your PI/advisor/supervisor will be charged a fee of 30 minutes of staff time and this will be noted on the invoice. For continued violations there will be an escalation of consequences:

	1<sup>st</sup> offense: fee		1<sup>st</sup> offense: fee
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	#Use wipes sparingly. They should not be treated like paper towels. Take the few extra moments to '''only grab the number you really need'''. This reduces a lot of unnecessary waste & cost.		#Use wipes sparingly. They should not be treated like paper towels. Take the few extra moments to '''only grab the number you really need'''. This reduces a lot of unnecessary waste & cost.
	#Do not place wipes on the sink trays or sink bottoms.		#Do not place wipes on the sink trays or sink bottoms.
	#Dispose of used wipes in the proper manner. Wipes that have Photoresist or solvents on them should never be thrown in the trash, but should be placed in the proper waste bins located in the backs of the exhausted benches.		#Dispose of used wipes in the proper manner. Wipes that have Photoresist or solvents on them should never be thrown in the trash, but should be placed in the proper waste bins located in the backs of the exhausted benches.

	==='''Preparing Equipment for Entry into the Nanofab'''===		==='''Preparing Equipment for Entry into the Nanofab'''===
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	Most systems require web-based sign-up. (<nowiki>http://signupmonkey.ece.ucsb.edu,see</nowiki> below) for reservations.		Most systems require web-based sign-up. (<nowiki>http://signupmonkey.ece.ucsb.edu,see</nowiki> below) for reservations.

	#There is a 15 minute grace period for you to use your time slot or someone else is allowed to use the system. If you don’t show for your time slot then any user can take all of your consecutive time slots not just that specific slot. It is the registered user's responsibility to make sure there is a note at the tool if they will show up later than 15 minutes before the beginning of their time slot in order to prevent another user from taking the reservation times for themselves on the system.		#There is a 15 minute grace period for you to use your time slot or someone else is allowed to use the system. If you don’t show for your time slot then any user can take all of your consecutive time slots not just that specific slot. It is the registered user's responsibility to make sure there is a note at the tool if they will show up later than 15 minutes before the beginning of their time slot in order to prevent another user from taking the reservation times for themselves on the system.
	#If you show up to a system and the scheduled user is not there, but you want to use the system, you need to first attempt to contact the user. Phone numbers and emails are accessible on signupmonkey. You should also look around the lab to see if the person is present as they may be doing something like etch/characterization cycles that require them to step away from the system for short times. Only after making reasonable effort to contact the user may you take the slots at the 15-minute mark after the start of the reservation.		#If you show up to a system and the scheduled user is not there, but you want to use the system, you need to first attempt to contact the user. Phone numbers and emails are accessible on signupmonkey. You should also look around the lab to see if the person is present as they may be doing something like etch/characterization cycles that require them to step away from the system for short times. Only after making reasonable effort to contact the user may you take the slots at the 15-minute mark after the start of the reservation.
	#Schedule enough time for all procedures you need to perform so that you will not encroach on the next user’s time slot. This includes all pre-and post-cleaning of the tools, where applicable. '''This is every user’s responsibility and will result in suspensions if you abuse the system.''' The next user is not responsible for your scheduling issues. Do not take “extra” slots to buffer around your schedule, instead give yourself adequate time between process steps to accommodate difficulties. The Nanofab staff tracks and resolves non-shows and users that abuse the system.		#Schedule enough time for all procedures you need to perform so that you will not encroach on the next user’s time slot. This includes all pre-and post-cleaning of the tools, where applicable. '''This is every user’s responsibility and will result in suspensions if you abuse the system.''' The next user is not responsible for your scheduling issues. Do not take “extra” slots to buffer around your schedule, instead give yourself adequate time between process steps to accommodate difficulties. The Nanofab staff tracks and resolves non-shows and users that abuse the system.
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	#Standard solvent-based photoresist spinning should be performed at the PR spinner benches. Some lithography chemicals utilize non-standard chemicals in place of solvents, which may require spinning at a different bench. If using non-standard lithography chemicals, please provide the (M)SDS and process instructions to the Nanofab manager for direction in this matter. Spin-coaters have standard recipes 2-9 programmed into all units. '''Do not change these recipes'''. Recipes 0 and 1 can be changed at will for user-defined spincoat processes. A variety of spin-coating chucks are provided by the facility. Use a chuck appropriate for the sample size you are using. Make sure chuck surfaces are clean when done. Do not remove the O-ring from the chuck. If you need a specialized chuck, please discuss with the Nanofab staff. Unless you purchased the chuck separately for your research group, '''all chucks are the property of the Nanofab and may not be taken and placed in your box for your own personal use. Non-compliance of this policy can result in lab suspension.'''[[File:Lab Rules - 7.6.2 spin bowl liners on racks.png\|thumb]]		#Standard solvent-based photoresist spinning should be performed at the PR spinner benches. Some lithography chemicals utilize non-standard chemicals in place of solvents, which may require spinning at a different bench. If using non-standard lithography chemicals, please provide the (M)SDS and process instructions to the Nanofab manager for direction in this matter. Spin-coaters have standard recipes 2-9 programmed into all units. '''Do not change these recipes'''. Recipes 0 and 1 can be changed at will for user-defined spincoat processes. A variety of spin-coating chucks are provided by the facility. Use a chuck appropriate for the sample size you are using. Make sure chuck surfaces are clean when done. Do not remove the O-ring from the chuck. If you need a specialized chuck, please discuss with the Nanofab staff. Unless you purchased the chuck separately for your research group, '''all chucks are the property of the Nanofab and may not be taken and placed in your box for your own personal use. Non-compliance of this policy can result in lab suspension.'''[[File:Lab Rules - 7.6.2 spin bowl liners on racks.png\|thumb]]
	#Spin Bowl Liners: Use two large orange backed wipes to line the bowl before spinning resist. Place them at 45 degrees relative to each other so that wipes cover the maximum amount of bowl area. If the wipe is saturated with resist, remove the top wipe and place in the beaker at the back of the bench after you are done with your coating process. NEVER place/dispose of the spin bowl liners or any other resist coated material into the regular trash or other non-exhausted area.		#Spin Bowl Liners: Use two large orange backed wipes to line the bowl before spinning resist. Place them at 45 degrees relative to each other so that wipes cover the maximum amount of bowl area. If the wipe is saturated with resist, remove the top wipe and place in the beaker at the back of the bench after you are done with your coating process. NEVER place/dispose of the spin bowl liners or any other resist coated material into the regular trash or other non-exhausted area.
	#Adhesion Promoters: HMDS is commonly used as an adhesion promoter. Samples can be soaked in HMDS on the spinner chuck and then spun dry. Residual HMDS vapor can interact with resist and inhibit development, so it is recommended to either replace the wipe in the bowl after HMDS or to use the nitrogen gun to dry residuals from the liner wipes before spin coating the resist.		#Adhesion Promoters: HMDS is commonly used as an adhesion promoter. Samples can be soaked in HMDS on the spinner chuck and then spun dry. Residual HMDS vapor can interact with resist and inhibit development, so it is recommended to either replace the wipe in the bowl after HMDS or to use the nitrogen gun to dry residuals from the liner wipes before spin coating the resist.

Jcrode: Text replacement - "/wiki/index.php" to "/w/index.php"

2021-09-04T19:50:36Z

Text replacement - "/wiki/index.php" to "/w/index.php"

← Older revision		Revision as of 19:50, 4 September 2021
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	http://signupmonkey.ece.ucsb.edu. Once you have been trained by the specific staff engineer in charge of a system then you will be able to reserve time on the tool through signupmonkey.		http://signupmonkey.ece.ucsb.edu. Once you have been trained by the specific staff engineer in charge of a system then you will be able to reserve time on the tool through signupmonkey.

	There is more information about the system on our wiki page: [[Main Page\|https://wiki.nanotech.ucsb.edu/~~wiki~~/index.php?title=Main_Page.]]		There is more information about the system on our wiki page: [[Main Page\|https://wiki.nanotech.ucsb.edu/w/index.php?title=Main_Page.]]

	#'''Script writing for tool sign-up is forbidden'''. '''Users caught trying to run scripts will be suspended from the cleanroom without exception.'''		#'''Script writing for tool sign-up is forbidden'''. '''Users caught trying to run scripts will be suspended from the cleanroom without exception.'''

Jcrode: Text replacement - "/wiki/index.php/" to "/wiki/index.php?title="

2021-09-04T19:47:22Z

Text replacement - "/wiki/index.php/" to "/wiki/index.php?title="

← Older revision		Revision as of 19:47, 4 September 2021
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	http://signupmonkey.ece.ucsb.edu. Once you have been trained by the specific staff engineer in charge of a system then you will be able to reserve time on the tool through signupmonkey.		http://signupmonkey.ece.ucsb.edu. Once you have been trained by the specific staff engineer in charge of a system then you will be able to reserve time on the tool through signupmonkey.

	There is more information about the system on our wiki page: [[Main Page\|https://wiki.nanotech.ucsb.edu/wiki/index.php/Main_Page.]]		There is more information about the system on our wiki page: [[Main Page\|https://wiki.nanotech.ucsb.edu/wiki/index.php?title=Main_Page.]]

	#'''Script writing for tool sign-up is forbidden'''. '''Users caught trying to run scripts will be suspended from the cleanroom without exception.'''		#'''Script writing for tool sign-up is forbidden'''. '''Users caught trying to run scripts will be suspended from the cleanroom without exception.'''

Thibeault: /* Hotplate use */

2021-06-29T16:35:06Z

Hotplate use

← Older revision		Revision as of 16:35, 29 June 2021
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	#[[File:Lab Rules - 2.6.1 spinner bench hotplates.png\|thumb\|195x195px]]Hot plates used for heating chemicals must be attended. This means you must be in the Nanofab and monitoring the hot plate whenever it is in use. This does not apply to PR baking hotplates that are built in to the PR spinner benches or to hotplates in the solvent benches used for heating photoresist strippers.		#[[File:Lab Rules - 2.6.1 spinner bench hotplates.png\|thumb\|195x195px]]Hot plates used for heating chemicals must be attended. This means you must be in the Nanofab and monitoring the hot plate whenever it is in use. This does not apply to PR baking hotplates that are built in to the PR spinner benches or to hotplates in the solvent benches used for heating photoresist strippers.
	#The nine built-in PR baking hotplates are preset at certain temperatures. They should not be changed unless you are directed by Nanofab staff. There are other freestanding hotplates to be used for custom temperatures. Please contact staff if you have any questions.		#The nine built-in PR baking hotplates are preset at certain temperatures. They should not be changed unless you are directed by Nanofab staff. There are other freestanding hotplates to be used for custom temperatures. Please contact staff if you have any questions.
	#Every group/company should have a temperature measuring device (thermometer, thermocouple or bi-metal sensor) to check hotplate temperatures. We calibrate ~~hotplates~~ ~~once~~ a ~~month~~. But hotplates can fail or users may wrongly change standard temperatures so every user is accountable for verifying hotplate temperature before use. Please contact staff, hopkins@ece.ucsb.eduor day@ece.ucsb.eduwhen hotplates have failed or are out of specifications.		#Every group/company should have a temperature measuring device (thermometer, thermocouple or bi-metal sensor) to check hotplate temperatures. We check and calibrate the built-in, lift-pin, and the large wafer round hotplates weekly. But hotplates can fail or users may wrongly change standard temperatures so every user is accountable for verifying hotplate temperature before use. Please contact staff, hopkins@ece.ucsb.eduor day@ece.ucsb.eduwhen hotplates have failed or are out of specifications.
	#The hotplates cannot be reserved. Please be conscientious about your hotplate use. Everyone needs to use them often so if you have a unique process that requires long baking or heating, contact Nanofab staff for a long term solution.		#The hotplates cannot be reserved. Please be conscientious about your hotplate use. Everyone needs to use them often so if you have a unique process that requires long baking or heating, contact Nanofab staff for a long term solution.
	#All heated beaker chemistry must be covered by a watch glass or some type of cover (foil or custom cover). You can cut handles of wafer/piece carriers to be below the beaker cover or notch them to have a handle protrude thru the cover. '''There are no exceptions to this rule.'''		#All heated beaker chemistry must be covered by a watch glass or some type of cover (foil or custom cover). You can cut handles of wafer/piece carriers to be below the beaker cover or notch them to have a handle protrude thru the cover. '''There are no exceptions to this rule.'''

Thibeault: /* Rules and allocation */

2021-06-29T16:33:37Z

Rules and allocation

← Older revision		Revision as of 16:33, 29 June 2021
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	All Nanofab storage shelf space and the blue containers are controlled by the Nanofab. It is not open use. Please contact Tony Bosch (bosch@ece.ucsb.edu) for new or additional shelf space. It is assigned by group or company. There is a finite shelf space so please first check within your own group to make sure shelf space is optimized and old users’ boxes have been removed or re-assigned before contacting Tony. Extra blue bins, lids and dividers are stored in the gowning room for use. '''Please do not use any other boxes on the shelves except for the blue bins provided by the Nanofab. If boxes are left out or stored on the wrong shelves they will be removed from the lab. Additionally, the Nanofab is not a long term storage facility and users should regularly review what they and their groups are storing in the lab so that items no longer needed can be removed to make room for others that may need the space.'''		All Nanofab storage shelf space and the blue containers are controlled by the Nanofab. It is not open use. Please contact Tony Bosch (bosch@ece.ucsb.edu) for new or additional shelf space. It is assigned by group or company. There is a finite shelf space so please first check within your own group to make sure shelf space is optimized and old users’ boxes have been removed or re-assigned before contacting Tony. Extra blue bins, lids and dividers are stored in the gowning room for use. '''Please do not use any other boxes on the shelves except for the blue bins provided by the Nanofab. If boxes are left out or stored on the wrong shelves they will be removed from the lab. Additionally, the Nanofab is not a long term storage facility and users should regularly review what they and their groups are storing in the lab so that items no longer needed can be removed to make room for others that may need the space.'''

	A user’s job in the facility is not complete until all user-specific materials have been cleaned up and put away. All users are given space to store user-specific materials within the facility in a neat, organized fashion. In order to have space for everyone to work, all users must clean up their personal items and store them before leaving the lab for any time longer than a 30-minute break. Storage boxes found without the user being in the lab will be removed from the lab and stored in a secure location. The group/user name will be placed on a list in the facility that users can check to determine if their box has been taken by staff. Users will need to contact a staff member to retrieve boxes. There will be a charged fee of 30 minutes of staff time for each incident and this will be noted on the invoice. For continued violations there will be an escalation of consequences:		A user’s job in the facility is not complete until all user-specific materials have been cleaned up and put away. All users are given space to store user-specific materials within the facility in a neat, organized fashion. In order to have space for everyone to work, all users must clean up their personal items and store them before leaving the lab for any time longer than a 30-minute break. Storage boxes found without the user being in the lab will be removed from the lab and stored in a secure location. The group/user name will be placed on a list in the facility that users can check to determine if their box has been taken by staff. The current location for this list is on the cabinet in service chase 4. Users will need to contact a staff member to retrieve boxes. There will be a charged fee of 30 minutes of staff time for each incident and this will be noted on the invoice. For continued violations there will be an escalation of consequences:

	1<sup>st</sup> offense: fee		1<sup>st</sup> offense: fee

Thibeault: /* Wet Benches */ policy changes on glassware collection

2021-06-29T16:33:12Z

Wet Benches: policy changes on glassware collection

← Older revision		Revision as of 16:33, 29 June 2021
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	====Wet Benches====		====Wet Benches====
	For wet benches in particular: Do not cover the exhaust holes on the bench tops with wipes or foil, as this will impede the laminar flow of air through the bench and possibly expose you or other Nanofab users to toxic fumes. Glassware may be left to dry on the racks or, for large containers, at the back of the bench only while you are working in the lab. When you leave the lab, you are responsible for drying and putting away all of your glassware. Glassware left out to dry ~~while~~ you ~~are~~ ~~out~~ of the ~~lab~~ will be ~~permanently~~ ~~confiscated~~.		For wet benches in particular: Do not cover the exhaust holes on the bench tops with wipes or foil, as this will impede the laminar flow of air through the bench and possibly expose you or other Nanofab users to toxic fumes. Glassware may be left to dry on the racks or, for large containers, at the back of the bench only while you are working in the lab. When you leave the lab, you are responsible for drying and putting away all of your glassware. A user’s job in the facility is not complete until all user-specific materials have been cleaned up and put away. Glassware left out to dry after you leave the lab for the day may be confiscated and put into a secure location for a time, before being disposed of. The group/user name will be placed on a list in the facility that users can check to determine if their materials have been taken by staff. The current location for this list is on the cabinet in service chase 4. Make sure your glassware/wafer holders have a group name written on them. Items with no user or group name are subject to disposal. If you ask staff to retrieve your glassware and it is found, your PI/advisor/supervisor will be charged a fee of 30 minutes of staff time and this will be noted on the invoice. For continued violations there will be an escalation of consequences:

			1<sup>st</sup> offense: fee

			2<sup>nd</sup> offense within 12 months: fee

			3<sup>rd</sup> time offense within 12 months: fee and warning of impending suspension

			4<sup>th</sup> time offense within 12 months: fee, 2 day suspension, and supervisor notification

			5<sup>th</sup> time offense within 12 months: fee, minimum 3 days suspension, and personal discussion with user and supervisor.

	====Sharps Disposal====		====Sharps Disposal====