MLA150 - CAD Files and Templates - Revision history

John d: /* Alignment Marks */

2024-04-05T04:25:25Z

Alignment Marks

← Older revision		Revision as of 04:25, 5 April 2024
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	==Alignment Marks==		==Alignment Marks==
		⚫	Alignment Crosses can be exposed by the MLA150 itself (good for full wafers with open areas on the edges) using the ''Expose Bitmaps'' field in the Job Setup, or can be included in your CAD file (good for smaller pieces without much unused edge area).

	Any cross shape with a 10-50µm wide line will work for automatic alignment. By default, system expects this cross shape to cover/extend beyond the entire field of view of the chosen microscope, which are the following sizes:		Any cross shape with a 10-50µm wide line will work for automatic alignment. By default, system expects this cross shape to cover/extend beyond the entire field of view of the chosen microscope, which are the following sizes:
	{\| class="wikitable"		{\| class="wikitable"
Line 15:		Line 17:

	The coordinates to the center of each mark should be known, with respect to the origin (0,0) of the CAD file to be exposed.		The coordinates to the center of each mark should be known, with respect to the origin (0,0) of the CAD file to be exposed.

⚫	Crosses can be exposed by the MLA150 itself (good for full wafers with open areas on the edges), or can be included in your CAD file (good for ~~cleaved~~ pieces without much unused edge area).

	==Resolution and Calibration Patterns==		==Resolution and Calibration Patterns==
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	*''UCSB_MLA150_Calibration_pattern_v5_AcrossWafer.gds'' - covers a 100mm wafer, used for alignment vernier testing.		*''UCSB_MLA150_Calibration_pattern_v5_AcrossWafer.gds'' - covers a 100mm wafer, used for alignment vernier testing.

	== Other CAD File Templates ==		==Other CAD File Templates==
	See the [[Calculators + Utilities#CAD%20Files%20.26%20Templates\|Calculators + Utilities > CAD Files & Templates]] page for other useful CAD files, such as overlay verniers, vented fonts etc.		See the [[Calculators + Utilities#CAD%20Files%20.26%20Templates\|Calculators + Utilities > CAD Files & Templates]] page for other useful CAD files, such as overlay verniers, vented fonts etc.

John d: link to general CAD file templates

2023-04-27T21:46:01Z

link to general CAD file templates

← Older revision		Revision as of 21:46, 27 April 2023
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	**Image Size for the Unit-Cell: 500 x 650µm for stitching the alignment crosses of adjacent die.		**Image Size for the Unit-Cell: 500 x 650µm for stitching the alignment crosses of adjacent die.
	*''UCSB_MLA150_Calibration_pattern_v5_AcrossWafer.gds'' - covers a 100mm wafer, used for alignment vernier testing.		*''UCSB_MLA150_Calibration_pattern_v5_AcrossWafer.gds'' - covers a 100mm wafer, used for alignment vernier testing.

			== Other CAD File Templates ==
			See the [[Calculators + Utilities#CAD%20Files%20.26%20Templates\|Calculators + Utilities > CAD Files & Templates]] page for other useful CAD files, such as overlay verniers, vented fonts etc.

John d: /* Resolution and Calibration Patterns */ details on CAD files available on MLA150 computer

2023-04-03T07:52:23Z

Resolution and Calibration Patterns: details on CAD files available on MLA150 computer

← Older revision		Revision as of 07:52, 3 April 2023
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	Crosses can be exposed by the MLA150 itself (good for full wafers with open areas on the edges), or can be included in your CAD file (good for cleaved pieces without much unused edge area).		Crosses can be exposed by the MLA150 itself (good for full wafers with open areas on the edges), or can be included in your CAD file (good for cleaved pieces without much unused edge area).

	== Resolution and Calibration Patterns ==		==Resolution and Calibration Patterns==
			Resolution test patterns and Alignment Verniers can be found on the local MLA150 computer in the <code>.../Users-Nanofiles/a-Public Templates</code> folder.
	this section is in progress
⚫	Has line-space ~~periodicity~~ from ~~XYZ~~ to ~~XYZ nm~~. Isolated versus dense is shown via ~~certain~~ lines protruding further beyond the dense patterns. The text indicates the "period" - twice the line/space width.

		⚫	Has line-space resolutions from 65nm → 1.0µm. Isolated versus dense lines are shown via lines protruding further beyond the dense patterns. The text indicates the "period" - twice the line/space width.
⚫	*~~Single-Die~~ - a single unit cell of the pattern, used for focus-exposure matrix (series)

	**Image Size for the Unit-Cell
			You will find two such files on the tool:
⚫	*~~Full Wafer~~ - covers a 100mm wafer, used for alignment vernier testing.

		⚫	*''UCSB_MLA150_Calibration_pattern_v5_UnitCell.gds'' - a single unit cell of the pattern, used for focus-exposure matrix (series)
			**Image Size for the Unit-Cell: 500 x 650µm for stitching the alignment crosses of adjacent die.
		⚫	*''UCSB_MLA150_Calibration_pattern_v5_AcrossWafer.gds'' - covers a 100mm wafer, used for alignment vernier testing.

John d at 04:39, 28 September 2021

2021-09-28T04:39:46Z

@@ Line 1: / Line 1: @@
 ==Alignment Marks==
 Any cross shape with a 10-50µm wide line will work for automatic alignment. By default, system expects this cross shape to cover/extend beyond the entire field of view of the chosen microscope, which are the following sizes:
@@ Line 25: / Line 17: @@
 Crosses can be exposed by the MLA150 itself (good for full wafers with open areas on the edges), or can be included in your CAD file (good for cleaved pieces without much unused edge area).

John d: /* Resolution and Calibration Patterns */

2021-09-28T04:39:15Z

Resolution and Calibration Patterns

← Older revision		Revision as of 04:39, 28 September 2021
Line 1:		Line 1:
	== Resolution and Calibration Patterns ==		==Resolution and Calibration Patterns==
			this section is in progress
	Has line-space periodicity from XYZ to XYZ nm. Isolated versus dense is shown via certain lines protruding further beyond the dense patterns. The text indicates the "period" - twice the line/space width.		Has line-space periodicity from XYZ to XYZ nm. Isolated versus dense is shown via certain lines protruding further beyond the dense patterns. The text indicates the "period" - twice the line/space width.
⚫	* Single-Die - a single unit cell of the pattern, used for focus-exposure matrix (series)
⚫	** Image Size for the Unit-Cell
⚫	* Full Wafer - covers a 100mm wafer, used for alignment vernier testing.

		⚫	*Single-Die - a single unit cell of the pattern, used for focus-exposure matrix (series)
⚫	== Alignment Marks ==
		⚫	**Image Size for the Unit-Cell
		⚫	*Full Wafer - covers a 100mm wafer, used for alignment vernier testing.

		⚫	==Alignment Marks==
	Any cross shape with a 10-50µm wide line will work for automatic alignment. By default, system expects this cross shape to cover/extend beyond the entire field of view of the chosen microscope, which are the following sizes:		Any cross shape with a 10-50µm wide line will work for automatic alignment. By default, system expects this cross shape to cover/extend beyond the entire field of view of the chosen microscope, which are the following sizes:
	{\| class="wikitable"		{\| class="wikitable"

John d: placeholder for CAD file, alignment mark info

2020-11-14T01:15:38Z

placeholder for CAD file, alignment mark info

New page

== Resolution and Calibration Patterns ==
Has line-space periodicity from XYZ to XYZ nm. Isolated versus dense is shown via certain lines protruding further beyond the dense patterns. The text indicates the "period" - twice the line/space width.
* Single-Die - a single unit cell of the pattern, used for focus-exposure matrix (series)
** Image Size for the Unit-Cell
* Full Wafer - covers a 100mm wafer, used for alignment vernier testing.

== Alignment Marks ==
Any cross shape with a 10-50µm wide line will work for automatic alignment. By default, system expects this cross shape to cover/extend beyond the entire field of view of the chosen microscope, which are the following sizes:
{| class="wikitable"
|+Alignment mark sizes should be larger than the following
!Camera
!Field of View
|-
|Low Mag.
|640 x 480 µm
|-
|High Mag.
|190 x 140 µm
|}
For the best alignment, the High-Mag camera is preferred, so a Cross of ~250µm x 200µm (50µm larger than the high-mag. FOV), with line width of 20µm would be acceptable.

The coordinates to the center of each mark should be known, with respect to the origin (0,0) of the CAD file to be exposed.

Crosses can be exposed by the MLA150 itself (good for full wafers with open areas on the edges), or can be included in your CAD file (good for cleaved pieces without much unused edge area).