Maskless Aligner (Heidelberg MLA150) - Revision history

John d: rearrange subheadings

2025-12-06T09:20:09Z

rearrange subheadings

← Older revision		Revision as of 09:20, 6 December 2025
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	**(No backside alignment)		**(No backside alignment)

			==Operating Procedures==
	==Documentation==

	===Operating Procedures===		===Standard Operating Procedures===

	*[https://wiki.nanofab.ucsb.edu/w/images/7/7b/MLA150_SOP_Rev_N_%28LS%29.pdf MLA150 - Standard Operating Procedure] - updated Nov 15th 2024		*[https://wiki.nanofab.ucsb.edu/w/images/7/7b/MLA150_SOP_Rev_N_%28LS%29.pdf MLA150 - Standard Operating Procedure] - updated Nov 15th 2024
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	**User manuals ''are available at the tool and on the tool's computer.''		**User manuals ''are available at the tool and on the tool's computer.''
	[https://wiki.nanofab.ucsb.edu/w/images/9/95/MLA150_Quick_Start_Rev_B.pdf MLA150 Quick Start Guide Experienced Users Only*]		[https://wiki.nanofab.ucsb.edu/w/images/9/95/MLA150_Quick_Start_Rev_B.pdf MLA150 Quick Start Guide Experienced Users Only*]
		⚫	*[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, reflecting allowed sample sizes for each focus mode.

			=== Video Training ===
	*[https://gauchocast.hosted.panopto.com/Panopto/Pages/Viewer.aspx?id=5813cf18-37cb-48f1-aee6-acd50055c65e '''Video Training for MLA150''']		*[https://gauchocast.hosted.panopto.com/Panopto/Pages/Viewer.aspx?id=5813cf18-37cb-48f1-aee6-acd50055c65e '''Video Training for MLA150''']
	**''Bookmarks in the video can point you to specific solutions/procedures.''		**''Bookmarks in the video can point you to specific solutions/procedures.''
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	***[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, which are currently not reflected in the video.		***[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, which are currently not reflected in the video.
	***Numerous solved issues have been added to the [[MLA150 - Troubleshooting\|'''Troubleshooting page''']].		***Numerous solved issues have been added to the [[MLA150 - Troubleshooting\|'''Troubleshooting page''']].

⚫	*[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, reflecting allowed sample sizes for each focus mode.
			=== Special Procedures ===
⚫	*[[MLA150 - Large Image GDS Generation\|Large Image Patterning]] - one way to generate a GDS file out of an arbitrary image (eg. JPG, BMP, PNG etc.)

	*[[Lithography Calibration - Analyzing a Focus-Exposure Matrix\|Calibrating your Process with a Focus-Exposure Matrix (FEM)]] - called ''"Series"'' mode on the MLA		*[[Lithography Calibration - Analyzing a Focus-Exposure Matrix\|Calibrating your Process with a Focus-Exposure Matrix (FEM)]] - called ''"Series"'' mode on the MLA
		⚫	*[[MLA150 - Large Image GDS Generation\|Large Image Patterning]] - one way to generate a GDS file out of an arbitrary image (eg. JPG, BMP, PNG etc.)

	===[[MLA150 - Troubleshooting\|<u>Troubleshooting & Known Bugs</u>]]===		===[[MLA150 - Troubleshooting\|<u>Troubleshooting & Known Bugs</u>]]===

John d: /* Video Trainings */ link to request training, Video Trainings moved to Procedures & renamed to "Traiing procedure", updated ToolActions

2025-12-06T09:17:13Z

Video Trainings: link to request training, Video Trainings moved to Procedures & renamed to "Traiing procedure", updated ToolActions

← Older revision		Revision as of 09:17, 6 December 2025
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	\|InstructionsURL =		\|InstructionsURL =
	\|ProcessControlURL =		\|ProcessControlURL =
	\|TrainingURL = Maskless_Aligner_(Heidelberg_MLA150)#~~Video_Trainings~~		\|TrainingURL = Maskless_Aligner_(Heidelberg_MLA150)#Training_Procedure
	}}		}}
	==About==		==About==
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	**User manuals ''are available at the tool and on the tool's computer.''		**User manuals ''are available at the tool and on the tool's computer.''
	[https://wiki.nanofab.ucsb.edu/w/images/9/95/MLA150_Quick_Start_Rev_B.pdf MLA150 Quick Start Guide Experienced Users Only*]		[https://wiki.nanofab.ucsb.edu/w/images/9/95/MLA150_Quick_Start_Rev_B.pdf MLA150 Quick Start Guide Experienced Users Only*]
		⚫	*[https://gauchocast.hosted.panopto.com/Panopto/Pages/Viewer.aspx?id=5813cf18-37cb-48f1-aee6-acd50055c65e '''Video Training for MLA150''']
		⚫	**''Bookmarks in the video can point you to specific solutions/procedures.''
		⚫	**'''UPDATES to the Video Training''': ''please review the addendums below:''
		⚫	***New software has been installed, the '''[https://wiki.nanotech.ucsb.edu/w/images/e/ec/MLA150_SOP_Rev_L_%28LS%29.docx.pdf SOP]''' shows the newer menu options.
		⚫	***CRITICAL: There are now TWO locations on which you must choose "Optical Autofocus". Failure to do so can result in <u>system damage</u>.
		⚫	***[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, which are currently not reflected in the video.
		⚫	***Numerous solved issues have been added to the [[MLA150 - Troubleshooting\|'''Troubleshooting page''']].
	*[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, reflecting allowed sample sizes for each focus mode.		*[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, reflecting allowed sample sizes for each focus mode.
	*[[MLA150 - Large Image GDS Generation\|Large Image Patterning]] - one way to generate a GDS file out of an arbitrary image (eg. JPG, BMP, PNG etc.)		*[[MLA150 - Large Image GDS Generation\|Large Image Patterning]] - one way to generate a GDS file out of an arbitrary image (eg. JPG, BMP, PNG etc.)
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	*Double-side polished transparent substrates can sometimes produce difficulties, due to the exposure light reflecting from the wafer underside. Many users have found ways to make them work properly - contact [[Demis D. John\|staff]] if you need help with this.		*Double-side polished transparent substrates can sometimes produce difficulties, due to the exposure light reflecting from the wafer underside. Many users have found ways to make them work properly - contact [[Demis D. John\|staff]] if you need help with this.

	===~~Video~~ ~~Trainings~~===		===Training Procedure===
	'''Important:''' You must be authorized by a supervisor to use the tool! The video training is only one part of the training. Contact [[Biljana Stamenic\|'''<u>the Supervisor</u>''']] for training procedures.
	To get authorized on this tool:		To get authorized on this tool:

			#please study the training videos here: '''[https://gauchocast.hosted.panopto.com/Panopto/Pages/Viewer.aspx?id=5813cf18-37cb-48f1-aee6-acd50055c65e Heidelberg MLA150 Training Video]'''
	#please study the training videos below,
	#"shadow" experienced users in your group, if you have any, and		#"shadow" experienced users in your group, if you have any, and
	#when you are ready, ~~contact~~ ~~'''[[Biljana~~ ~~Stamenic\|the~~ ~~supervisor]]'''~~ ~~for~~ ~~a hands-on check-off.~~		#when you are ready, click this button to request training:{{ToolTrainingButton\|toolid=32}}

⚫	*~~'''~~[https://gauchocast.hosted.panopto.com/Panopto/Pages/Viewer.aspx?id=5813cf18-37cb-48f1-aee6-acd50055c65e ~~Heidelberg MLA150~~ Training ~~Video]~~'''
⚫	**''Bookmarks in the video can point you to specific solutions/procedures.''
⚫	*'''UPDATES to the Video Training''': ''please review the addendums below:''
⚫	**New software has been installed, the '''[https://wiki.nanotech.ucsb.edu/w/images/e/ec/MLA150_SOP_Rev_L_%28LS%29.docx.pdf SOP]''' shows the newer menu options.
⚫	**CRITICAL: There are now TWO locations on which you must choose "Optical Autofocus". Failure to do so can result in <u>system damage</u>.
⚫	**[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, which are currently not reflected in the video.
⚫	**Numerous solved issues have been added to the [[MLA150 - Troubleshooting\|'''Troubleshooting page''']].

	==Design Info - CAD layout==		==Design Info - CAD layout==

John d: added ToolActions widget

2025-12-06T09:11:40Z

added ToolActions widget

← Older revision		Revision as of 09:11, 6 December 2025
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	\|materials = I-Line Photoresists		\|materials = I-Line Photoresists
	}}		}}
			{{ToolActions\|
			\|toolid = 32
			\|InstructionsURL =
			\|ProcessControlURL =
			\|TrainingURL = Maskless_Aligner_(Heidelberg_MLA150)#Video_Trainings
			}}
	==About==		==About==
	The MLA150 allows for arbitrary direct-write patterning of I-Line photoresists from an uploaded CAD drawing/file (GDS, DXF, CIF etc.). The system uses a [https://en.wikipedia.org/wiki/Digital_micromirror_device digital micromirror device] ("DMD", an array of MEMS mirrors) for patterning the exposure light-field, to programmatically expose digitized patterns directly onto the sample - no glass photomasks/reticles are required.		The MLA150 allows for arbitrary direct-write patterning of I-Line photoresists from an uploaded CAD drawing/file (GDS, DXF, CIF etc.). The system uses a [https://en.wikipedia.org/wiki/Digital_micromirror_device digital micromirror device] ("DMD", an array of MEMS mirrors) for patterning the exposure light-field, to programmatically expose digitized patterns directly onto the sample - no glass photomasks/reticles are required.

John d: /* Video Trainings */

2025-06-19T17:47:13Z

Video Trainings

← Older revision		Revision as of 17:47, 19 June 2025
Line 70:		Line 70:

	===Video Trainings===		===Video Trainings===
		⚫	'''Important:''' You must be authorized by a supervisor to use the tool! The video training is only one part of the training. Contact [[Biljana Stamenic\|'''<u>the Supervisor</u>''']] for training procedures.
	To get authorized on this tool:		To get authorized on this tool:

Line 75:		Line 76:
	#"shadow" experienced users in your group, if you have any, and		#"shadow" experienced users in your group, if you have any, and
	#when you are ready, contact '''[[Biljana Stamenic\|the supervisor]]''' for a hands-on check-off.		#when you are ready, contact '''[[Biljana Stamenic\|the supervisor]]''' for a hands-on check-off.

⚫	'''Important:''' You must be authorized by a supervisor to use the tool! The video training is only one part of the training. Contact [[Biljana Stamenic\|'''<u>the Supervisor</u>''']] for training procedures.

	*'''[https://gauchocast.hosted.panopto.com/Panopto/Pages/Viewer.aspx?id=5813cf18-37cb-48f1-aee6-acd50055c65e Heidelberg MLA150 Training Video]'''		*'''[https://gauchocast.hosted.panopto.com/Panopto/Pages/Viewer.aspx?id=5813cf18-37cb-48f1-aee6-acd50055c65e Heidelberg MLA150 Training Video]'''

John d: updated design info section

2025-06-19T17:46:02Z

updated design info section

← Older revision		Revision as of 17:46, 19 June 2025
Line 86:		Line 86:
	**Numerous solved issues have been added to the [[MLA150 - Troubleshooting\|'''Troubleshooting page''']].		**Numerous solved issues have been added to the [[MLA150 - Troubleshooting\|'''Troubleshooting page''']].

	==Design ~~Tools/~~Info==		==Design Info - CAD layout==

	*[[MLA150 - Design Guidelines\|Design Guidelines + Tips]] - ''~~useful~~ info for designing your CAD files, alignment marks etc.''		*[[MLA150 - Design Guidelines\|Design Guidelines + Tips]] - ''Important info for designing your CAD files, alignment marks etc.''
	*[[MLA150 - CAD Files and Templates\|CAD Files and Templates]]		*[[MLA150 - CAD Files and Templates\|CAD Files and Templates]] - ''example CAD designs and useful CAD structures.''
	*[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Template Guidelines] ''- Choosing the right settings for your substrate size - CRITICAL!''

	==Recipes==		==Recipes==

John d: /* Documentation */

2025-06-07T06:12:30Z

Documentation

← Older revision		Revision as of 06:12, 7 June 2025
Line 62:		Line 62:
	*[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, reflecting allowed sample sizes for each focus mode.		*[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, reflecting allowed sample sizes for each focus mode.
	*[[MLA150 - Large Image GDS Generation\|Large Image Patterning]] - one way to generate a GDS file out of an arbitrary image (eg. JPG, BMP, PNG etc.)		*[[MLA150 - Large Image GDS Generation\|Large Image Patterning]] - one way to generate a GDS file out of an arbitrary image (eg. JPG, BMP, PNG etc.)
	*[[Lithography Calibration - Analyzing a Focus-Exposure Matrix\|Calibrating your Process with a Focus-Exposure Matrix (FEM)]]		*[[Lithography Calibration - Analyzing a Focus-Exposure Matrix\|Calibrating your Process with a Focus-Exposure Matrix (FEM)]] - called ''"Series"'' mode on the MLA

	===[[MLA150 - Troubleshooting\|<u>Troubleshooting & Known Bugs</u>]]===		===[[MLA150 - Troubleshooting\|<u>Troubleshooting & Known Bugs</u>]]===

John d: /* Calibrate your own Litho process */

2025-04-07T18:28:24Z

Calibrate your own Litho process

← Older revision		Revision as of 18:28, 7 April 2025
Line 98:		Line 98:

	=== Calibrate your own Litho process ===		=== Calibrate your own Litho process ===
	* Use '''<u>Series</u>''' mode exposure for doing ~~and~~ FEM on the MLA150.		* Use '''<u>Series</u>''' mode exposure for doing an FEM ("Focus-Exposure Matrix") on the MLA150.
	* [[Lithography Calibration - Analyzing a Focus-Exposure Matrix]] - how to analyze an FEM for repeatable processes		* [[Lithography Calibration - Analyzing a Focus-Exposure Matrix]] - how to analyze an FEM for repeatable processes

Sawyer l: SOP rev

2025-01-13T19:18:24Z

SOP rev

← Older revision		Revision as of 19:18, 13 January 2025
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	===Operating Procedures===		===Operating Procedures===

	*[https://wiki.nanofab.ucsb.edu/w/images/8/8e/~~MLA150_SOP_Rev_M_~~%28LS%29.pdf MLA150 - Standard Operating Procedure] - updated Nov 15th 2024		*[https://wiki.nanofab.ucsb.edu/w/images/7/7b/MLA150_SOP_Rev_N_%28LS%29.pdf MLA150 - Standard Operating Procedure] - updated Nov 15th 2024
	**''Includes File-upload procedure, CAD Conversion, Exposure and Alignment.''		**''Includes File-upload procedure, CAD Conversion, Exposure and Alignment.''
	**User manuals ''are available at the tool and on the tool's computer.''		**User manuals ''are available at the tool and on the tool's computer.''

John d: /* Operating Procedures */ fixed link to FEM analysis

2024-11-22T18:25:58Z

Operating Procedures: fixed link to FEM analysis

← Older revision		Revision as of 18:25, 22 November 2024
Line 62:		Line 62:
	*[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, reflecting allowed sample sizes for each focus mode.		*[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, reflecting allowed sample sizes for each focus mode.
	*[[MLA150 - Large Image GDS Generation\|Large Image Patterning]] - one way to generate a GDS file out of an arbitrary image (eg. JPG, BMP, PNG etc.)		*[[MLA150 - Large Image GDS Generation\|Large Image Patterning]] - one way to generate a GDS file out of an arbitrary image (eg. JPG, BMP, PNG etc.)
	*[[~~MLA150~~ - Focus-Exposure Matrix ~~("Series" mode)~~\|Calibrating your Process with a Focus-Exposure Matrix (FEM)]]		*[[Lithography Calibration - Analyzing a Focus-Exposure Matrix\|Calibrating your Process with a Focus-Exposure Matrix (FEM)]]

	===[[MLA150 - Troubleshooting\|<u>Troubleshooting & Known Bugs</u>]]===		===[[MLA150 - Troubleshooting\|<u>Troubleshooting & Known Bugs</u>]]===

Sawyer l: Updated quick start

2024-11-15T17:39:26Z

Updated quick start

← Older revision		Revision as of 17:39, 15 November 2024
Line 59:		Line 59:
	**''Includes File-upload procedure, CAD Conversion, Exposure and Alignment.''		**''Includes File-upload procedure, CAD Conversion, Exposure and Alignment.''
	**User manuals ''are available at the tool and on the tool's computer.''		**User manuals ''are available at the tool and on the tool's computer.''
	[https://wiki.nanofab.ucsb.edu/w/images/6/68/~~MLA150_Quick_Start_Rev_A~~.pdf MLA150 Quick Start Guide Experienced Users Only*]		[https://wiki.nanofab.ucsb.edu/w/images/9/95/MLA150_Quick_Start_Rev_B.pdf MLA150 Quick Start Guide Experienced Users Only*]
	*[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, reflecting allowed sample sizes for each focus mode.		*[https://wiki.nanotech.ucsb.edu/w/images/4/48/MLA150_Substrate_Template_Rules.pdf Substrate Templates] have been updated, reflecting allowed sample sizes for each focus mode.
	*[[MLA150 - Large Image GDS Generation\|Large Image Patterning]] - one way to generate a GDS file out of an arbitrary image (eg. JPG, BMP, PNG etc.)		*[[MLA150 - Large Image GDS Generation\|Large Image Patterning]] - one way to generate a GDS file out of an arbitrary image (eg. JPG, BMP, PNG etc.)