Nano-Imprint (Nanonex NX2000) - Revision history

John d: decmoissioned notice

2025-08-08T17:01:24Z

decmoissioned notice

← Older revision		Revision as of 17:01, 8 August 2025
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			'''<big>DECOMISSIONED - this tool is no longer in the lab, this page is for historical informational purposes only.</big>'''
	{{tool\|{{PAGENAME}}		{{tool\|{{PAGENAME}}
	\|picture=Nanonex.jpg		\|picture=Nanonex.jpg
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	}}		}}
	= About =		= About =
	The Nanonex NX2000 is a nanoimprinting system that allows for direct pattern transfer from a pre-fabricated master mold into an underlying polymer material. Lateral feature sizes down to less than 10 nm have been demonstrated on this tool. The system can do thermal imprinting into a polymer at temperatures up to 200°C and chamber pressures up to 600 psi. The system can also imprint into and cure UV-cureable materials on top of underlayer polymers in order to planarize samples and provide for high aspect ratio imprint lithography. Since the system uses no rigid plates, but air pressure only, the pressure uniformity is excellent in the system. The heating and cooling rates are as high as 300°C/min. Several types of resists are supplied, including [[~~media~~:NXR-1020-Datasheet.pdf\|NXR-1020]], [[~~media~~:mr-l-7000-Imprint-Polymer.pdf\|mr-l-7020]], and {{fl\|Mr-UVCur21.pdf\|MR-UVCur21}}. The system is capable of handling piece parts up to 100 mm wafers. An additional alignment system is also available for 100 mm wafers for aligned imprinting. Non-stick coatings for master molds are deposited using FDTS in the [[Molecular Vapor Deposition]] system. For creation of master molds, please call for a discussion of our other capabilities, including electron-beam lithography.		The Nanonex NX2000 is a nanoimprinting system that allows for direct pattern transfer from a pre-fabricated master mold into an underlying polymer material. Lateral feature sizes down to less than 10 nm have been demonstrated on this tool. The system can do thermal imprinting into a polymer at temperatures up to 200°C and chamber pressures up to 600 psi. The system can also imprint into and cure UV-cureable materials on top of underlayer polymers in order to planarize samples and provide for high aspect ratio imprint lithography. Since the system uses no rigid plates, but air pressure only, the pressure uniformity is excellent in the system. The heating and cooling rates are as high as 300°C/min. Several types of resists are supplied, including [[Media:NXR-1020-Datasheet.pdf\|NXR-1020]], [[Media:Mr-l-7000-Imprint-Polymer.pdf\|mr-l-7020]], and {{fl\|Mr-UVCur21.pdf\|MR-UVCur21}}. The system is capable of handling piece parts up to 100 mm wafers. An additional alignment system is also available for 100 mm wafers for aligned imprinting. Non-stick coatings for master molds are deposited using FDTS in the [[Molecular Vapor Deposition]] system. For creation of master molds, please call for a discussion of our other capabilities, including electron-beam lithography.

	=Detailed Specifications=		=Detailed Specifications=

John d: added wikipage to template

2018-12-18T18:58:48Z

added wikipage to template

← Older revision		Revision as of 18:58, 18 December 2018
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	\|materials =		\|materials =
	\|toolid=36		\|toolid=36
			\|wikipage=Nano-Imprint_(Nanonex_NX2000)
	}}		}}
	= About =		= About =

Reynolds t at 18:35, 9 May 2018

2018-05-09T18:35:51Z

← Older revision		Revision as of 18:35, 9 May 2018
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	*Minimum substrate size: small pieces		*Minimum substrate size: small pieces
	*Largest substrate size: 100 mm wafer		*Largest substrate size: 100 mm wafer
	*Several resists, non-stick layers, and master copy formation also available		*Several resists, non-stick layers, and master copy formation also available.

Thibeault: /* About */

2014-04-01T21:08:15Z

About

← Older revision		Revision as of 21:08, 1 April 2014
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	}}		}}
	= About =		= About =
	The Nanonex NX2000 is a nanoimprinting system that allows for direct pattern transfer from a pre-fabricated master mold into an underlying polymer material. Lateral feature sizes down to less than 10 nm have been demonstrated on this tool. The system can do thermal imprinting into a polymer at temperatures up to 200°C and chamber pressures up to 600 psi. The system can also imprint into and cure UV-cureable materials on top of underlayer polymers in order to planarize samples and provide for high aspect ratio imprint lithography. Since the system uses no rigid plates, but air pressure only, the pressure uniformity is excellent in the system. The heating and cooling rates are as high as 300°C/min. Several types of resists are supplied, including [[media:NXR-1020-Datasheet.pdf\|NXR-1020]], [[media:mr-l-7000-Imprint-Polymer.pdf\|mr-l-7020]], and mr-~~UVCur~~. The system is capable of handling piece parts up to 100 mm wafers. An additional alignment system is also available for 100 mm wafers for aligned imprinting. Non-stick coatings for master molds are deposited using FDTS in the [[Molecular Vapor Deposition]] system. For creation of master molds, please call for a discussion of our other capabilities, including electron-beam lithography.		The Nanonex NX2000 is a nanoimprinting system that allows for direct pattern transfer from a pre-fabricated master mold into an underlying polymer material. Lateral feature sizes down to less than 10 nm have been demonstrated on this tool. The system can do thermal imprinting into a polymer at temperatures up to 200°C and chamber pressures up to 600 psi. The system can also imprint into and cure UV-cureable materials on top of underlayer polymers in order to planarize samples and provide for high aspect ratio imprint lithography. Since the system uses no rigid plates, but air pressure only, the pressure uniformity is excellent in the system. The heating and cooling rates are as high as 300°C/min. Several types of resists are supplied, including [[media:NXR-1020-Datasheet.pdf\|NXR-1020]], [[media:mr-l-7000-Imprint-Polymer.pdf\|mr-l-7020]], and {{fl\|Mr-UVCur21.pdf\|MR-UVCur21}}. The system is capable of handling piece parts up to 100 mm wafers. An additional alignment system is also available for 100 mm wafers for aligned imprinting. Non-stick coatings for master molds are deposited using FDTS in the [[Molecular Vapor Deposition]] system. For creation of master molds, please call for a discussion of our other capabilities, including electron-beam lithography.

	=Detailed Specifications=		=Detailed Specifications=

Thibeault: /* About */

2014-04-01T21:07:04Z

About

← Older revision		Revision as of 21:07, 1 April 2014
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	}}		}}
	= About =		= About =
	The Nanonex NX2000 is a nanoimprinting system that allows for direct pattern transfer from a pre-fabricated master mold into an underlying polymer material. Lateral feature sizes down to less than 10 nm have been demonstrated on this tool. The system can do thermal imprinting into a polymer at temperatures up to 200°C and chamber pressures up to 600 psi. The system can also imprint into and cure UV-cureable materials on top of underlayer polymers in order to planarize samples and provide for high aspect ratio imprint lithography. Since the system uses no rigid plates, but air pressure only, the pressure uniformity is excellent in the system. The heating and cooling rates are as high as 300°C/min. Several types of resists are supplied, including [[media:NXR-1020-Datasheet.pdf\|NXR-1020]], ~~NX2010, and~~ [[media:mr-l-7000-Imprint-Polymer.pdf\|mr-l-~~7000~~]]. The system is capable of handling piece parts up to 100 mm wafers. An additional alignment system is also available for 100 mm wafers for aligned imprinting. Non-stick coatings for master molds ~~can~~ ~~also~~ be ~~provided~~. For creation of master molds, please call for a discussion of our other capabilities, including electron-beam lithography.		The Nanonex NX2000 is a nanoimprinting system that allows for direct pattern transfer from a pre-fabricated master mold into an underlying polymer material. Lateral feature sizes down to less than 10 nm have been demonstrated on this tool. The system can do thermal imprinting into a polymer at temperatures up to 200°C and chamber pressures up to 600 psi. The system can also imprint into and cure UV-cureable materials on top of underlayer polymers in order to planarize samples and provide for high aspect ratio imprint lithography. Since the system uses no rigid plates, but air pressure only, the pressure uniformity is excellent in the system. The heating and cooling rates are as high as 300°C/min. Several types of resists are supplied, including [[media:NXR-1020-Datasheet.pdf\|NXR-1020]], [[media:mr-l-7000-Imprint-Polymer.pdf\|mr-l-7020]], and mr-UVCur. The system is capable of handling piece parts up to 100 mm wafers. An additional alignment system is also available for 100 mm wafers for aligned imprinting. Non-stick coatings for master molds are deposited using FDTS in the [[Molecular Vapor Deposition]] system. For creation of master molds, please call for a discussion of our other capabilities, including electron-beam lithography.

	=Detailed Specifications=		=Detailed Specifications=

Zwarburg at 17:24, 11 July 2012

2012-07-11T17:24:15Z

← Older revision		Revision as of 17:24, 11 July 2012
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	\|type = Lithography		\|type = Lithography
	\|super= Tony Bosch		\|super= Tony Bosch
	\|phone=(805)839-3918x217
	\|location=Bay 4		\|location=Bay 4
	\|email=bosch@ece.ucsb.edu
	\|description = Nanonex NX2000 Nanoimprinting System		\|description = Nanonex NX2000 Nanoimprinting System
	\|manufacturer = Nanonex		\|manufacturer = Nanonex

Zwarburg: moved Nano-Imprint Tool (Nanonex NX2000) to Nano-Imprint (Nanonex NX2000)

2012-07-11T13:57:38Z

moved Nano-Imprint Tool (Nanonex NX2000) to Nano-Imprint (Nanonex NX2000)

← Older revision	Revision as of 13:57, 11 July 2012
(No difference)

Zwarburg at 13:57, 11 July 2012

2012-07-11T13:57:27Z

← Older revision		Revision as of 13:57, 11 July 2012
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	\|manufacturer = Nanonex		\|manufacturer = Nanonex
	\|materials =		\|materials =
			\|toolid=36
	}}		}}
	= About =		= About =

Zwarburg: /* About */

2012-06-28T14:42:57Z

About

← Older revision		Revision as of 14:42, 28 June 2012
Line 11:		Line 11:
	}}		}}
	= About =		= About =
	The Nanonex NX2000 is a nanoimprinting system that allows for direct pattern transfer from a pre-fabricated master mold into an underlying polymer material. Lateral feature sizes down to less than 10 nm have been demonstrated on this tool. The system can do thermal imprinting into a polymer at temperatures up to 200°C and chamber pressures up to 600 psi. The system can also imprint into and cure UV-cureable materials on top of underlayer polymers in order to planarize samples and provide for high aspect ratio imprint lithography. Since the system uses no rigid plates, but air pressure only, the pressure uniformity is excellent in the system. The heating and cooling rates are as high as 300°C/min. Several types of resists are supplied, including ~~NX1020~~, NX2010, and mr-I-7000. The system is capable of handling piece parts up to 100 mm wafers. An additional alignment system is also available for 100 mm wafers for aligned imprinting. Non-stick coatings for master molds can also be provided. For creation of master molds, please call for a discussion of our other capabilities, including electron-beam lithography.		The Nanonex NX2000 is a nanoimprinting system that allows for direct pattern transfer from a pre-fabricated master mold into an underlying polymer material. Lateral feature sizes down to less than 10 nm have been demonstrated on this tool. The system can do thermal imprinting into a polymer at temperatures up to 200°C and chamber pressures up to 600 psi. The system can also imprint into and cure UV-cureable materials on top of underlayer polymers in order to planarize samples and provide for high aspect ratio imprint lithography. Since the system uses no rigid plates, but air pressure only, the pressure uniformity is excellent in the system. The heating and cooling rates are as high as 300°C/min. Several types of resists are supplied, including [[media:NXR-1020-Datasheet.pdf\|NXR-1020]], NX2010, and [[media:mr-l-7000-Imprint-Polymer.pdf\|mr-l-7000]]. The system is capable of handling piece parts up to 100 mm wafers. An additional alignment system is also available for 100 mm wafers for aligned imprinting. Non-stick coatings for master molds can also be provided. For creation of master molds, please call for a discussion of our other capabilities, including electron-beam lithography.

	=Detailed Specifications=		=Detailed Specifications=

Zwarburg: Created page with "{{tool|{{PAGENAME}} |picture=Nanonex.jpg |type = Lithography |super= Tony Bosch |phone=(805)839-3918x217 |location=Bay 4 |email=bosch@ece.ucsb.edu |description = Nanonex NX2000 N…"

2012-06-28T14:34:44Z

Created page with "{{tool|{{PAGENAME}} |picture=Nanonex.jpg |type = Lithography |super= Tony Bosch |phone=(805)839-3918x217 |location=Bay 4 |email=bosch@ece.ucsb.edu |description = Nanonex NX2000 N…"

New page

{{tool|{{PAGENAME}}
|picture=Nanonex.jpg
|type = Lithography
|super= Tony Bosch
|phone=(805)839-3918x217
|location=Bay 4
|email=bosch@ece.ucsb.edu
|description = Nanonex NX2000 Nanoimprinting System
|manufacturer = Nanonex
|materials =
}}
= About =
The Nanonex NX2000 is a nanoimprinting system that allows for direct pattern transfer from a pre-fabricated master mold into an underlying polymer material. Lateral feature sizes down to less than 10 nm have been demonstrated on this tool. The system can do thermal imprinting into a polymer at temperatures up to 200°C and chamber pressures up to 600 psi. The system can also imprint into and cure UV-cureable materials on top of underlayer polymers in order to planarize samples and provide for high aspect ratio imprint lithography. Since the system uses no rigid plates, but air pressure only, the pressure uniformity is excellent in the system. The heating and cooling rates are as high as 300°C/min. Several types of resists are supplied, including NX1020, NX2010, and mr-I-7000. The system is capable of handling piece parts up to 100 mm wafers. An additional alignment system is also available for 100 mm wafers for aligned imprinting. Non-stick coatings for master molds can also be provided. For creation of master molds, please call for a discussion of our other capabilities, including electron-beam lithography.

=Detailed Specifications=
*Thermal imprinting up to 200°C and 600 psi chamber pressure (equivalent to 1200 psi on the wafer stack); 300°C/min heat-cool rates
*UV-imprinting
*In-house resist processes and subsequent pattern transfer offered
*Resolution: 10 nm demonstrated
*Minimum substrate size: small pieces
*Largest substrate size: 100 mm wafer
*Several resists, non-stick layers, and master copy formation also available