OLD - PECVD2 Recipes - Revision history

John d: John d moved page PECVD2 Recipes to OLD - PECVD2 Recipes without leaving a redirect: this page is not linked anywhere, looks like 2014 data only

2022-03-03T19:28:52Z

John d moved page PECVD2 Recipes to OLD - PECVD2 Recipes without leaving a redirect: this page is not linked anywhere, looks like 2014 data only

← Older revision	Revision as of 19:28, 3 March 2022
(No difference)

Biljana: /* PECVD 2 (Advanced Vacuum) */

2015-01-09T18:44:36Z

PECVD 2 (Advanced Vacuum)

← Older revision		Revision as of 18:44, 9 January 2015
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	*[[media: Photos Sheet1.pdf\|Dirty platen]]		*[[media: Photos Sheet1.pdf\|Dirty platen]]

⚫	== SiN deposition (PECVD #2) ==
⚫	*[[media:NewAdvPECVD-Nitride2 300C standard recipe.pdf\|Nitride2 Standard Recipe]]
⚫	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data 2014]
⚫	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness uniformity 2014]

	== SiO<sub>2</sub> deposition (PECVD #2) ==		== SiO<sub>2</sub> deposition (PECVD #2) ==
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	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGJZaGtDTVRqa1BRdW5iU1N1Y01jd0E&usp=drive_web#gid=sharing Oxide Data 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGJZaGtDTVRqa1BRdW5iU1N1Y01jd0E&usp=drive_web#gid=sharing Oxide Data 2014]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness uniformity 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness uniformity 2014]

		⚫	== SiN deposition (PECVD #2) ==
		⚫	*[[media:NewAdvPECVD-Nitride2 300C standard recipe.pdf\|Nitride2 Standard Recipe]]
		⚫	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data 2014]
		⚫	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness uniformity 2014]

	==LS SiN deposition (PECVD #2) ==		==LS SiN deposition (PECVD #2) ==

Biljana: /* LS SiN deposition (PECVD #2) */

2014-12-11T21:40:56Z

LS SiN deposition (PECVD #2)

← Older revision		Revision as of 21:40, 11 December 2014
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	==LS SiN deposition (PECVD #2) ==		==LS SiN deposition (PECVD #2) ==
	*[[media:~~AdvPECVD~~-LS Nitride2 300C standard recipe.pdf\|LS Nitride2 Standard Recipe]]		*[[media:NewAdvPECVD-LS Nitride2 300C standard recipe.pdf\|LS Nitride2 Standard Recipe]]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEZvWVhzS1pHUXZkOGcyQWZ4LTNBWGc&usp=drive_web#gid=sharing LS Nitride2 Data 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEZvWVhzS1pHUXZkOGcyQWZ4LTNBWGc&usp=drive_web#gid=sharing LS Nitride2 Data 2014]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014]

Biljana: /* LS SiN deposition (PECVD #2) */

2014-12-11T19:46:46Z

LS SiN deposition (PECVD #2)

← Older revision		Revision as of 19:46, 11 December 2014
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	==LS SiN deposition (PECVD #2) ==		==LS SiN deposition (PECVD #2) ==

	*[[media:AdvPECVD-LS Nitride2 300C standard recipe.pdf\|LS Nitride2 Standard Recipe]]		*[[media:AdvPECVD-LS Nitride2 300C standard recipe.pdf\|LS Nitride2 Standard Recipe]]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEZvWVhzS1pHUXZkOGcyQWZ4LTNBWGc&usp=drive_web#gid=sharing LS Nitride2 Data 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEZvWVhzS1pHUXZkOGcyQWZ4LTNBWGc&usp=drive_web#gid=sharing LS Nitride2 Data 2014]

Biljana: /* LS SiN deposition (PECVD #2) */

2014-12-11T19:46:37Z

LS SiN deposition (PECVD #2)

← Older revision		Revision as of 19:46, 11 December 2014
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	*[[media:AdvPECVD-LS Nitride2 300C standard recipe.pdf\|LS Nitride2 Standard Recipe]]		*[[media:AdvPECVD-LS Nitride2 300C standard recipe.pdf\|LS Nitride2 Standard Recipe]]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEZvWVhzS1pHUXZkOGcyQWZ4LTNBWGc&usp=drive_web#gid=sharing LS Nitride2 Data ~~December~~ 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEZvWVhzS1pHUXZkOGcyQWZ4LTNBWGc&usp=drive_web#gid=sharing LS Nitride2 Data 2014]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014]

	*Deposition Rate: ≈ 7.87 nm/min (users must calibrate this prior to critical deps)
	*Refractive Index: ≈ 1.938
	*Stress ≈ 1.76MPa
	*HF etch rate~47nm/min

	== Amorphous-Si deposition (PECVD #2) ==		== Amorphous-Si deposition (PECVD #2) ==

Biljana: /* Photos */

2014-12-11T19:11:21Z

Photos

← Older revision		Revision as of 19:11, 11 December 2014
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	==Photos==		==Photos==

	*[[media: ~~Dirty~~ ~~platen photos~~.pdf\|Dirty platen]]		*[[media: Photos Sheet1.pdf\|Dirty platen]]

	== SiN deposition (PECVD #2) ==		== SiN deposition (PECVD #2) ==

Biljana: /* SiN deposition (PECVD #2) */

2014-12-11T19:01:32Z

SiN deposition (PECVD #2)

← Older revision		Revision as of 19:01, 11 December 2014
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	== SiN deposition (PECVD #2) ==		== SiN deposition (PECVD #2) ==
	*[[media:~~New Advanced PECVD~~-Nitride2 300C standard recipe.pdf\|Nitride2 Standard Recipe]]		*[[media:NewAdvPECVD-Nitride2 300C standard recipe.pdf\|Nitride2 Standard Recipe]]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data 2014]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness uniformity 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness uniformity 2014]

Biljana: /* SiN deposition (PECVD #2) */

2014-12-11T17:54:31Z

SiN deposition (PECVD #2)

← Older revision		Revision as of 17:54, 11 December 2014
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	== SiN deposition (PECVD #2) ==		== SiN deposition (PECVD #2) ==
	*[[media:New Advanced PECVD-Nitride2 300C standard recipe.pdf\|Nitride2 Standard Recipe]]		*[[media:New Advanced PECVD-Nitride2 300C standard recipe.pdf\|Nitride2 Standard Recipe]]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data ~~Devcember~~ 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data 2014]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness uniformity 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness uniformity 2014]

	*Deposition Rate: ≈ 7.93 nm/min (users must calibrate this prior to critical deps)
	*Refractive Index: ≈ 1.961
	*Stress ≈ 495MPa
	*HF etch rate:~49nm/min

	== SiO<sub>2</sub> deposition (PECVD #2) ==		== SiO<sub>2</sub> deposition (PECVD #2) ==

Biljana: /* SiO2 deposition (PECVD #2) */

2014-12-11T17:52:33Z

SiO2 deposition (PECVD #2)

← Older revision		Revision as of 17:52, 11 December 2014
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	== SiO<sub>2</sub> deposition (PECVD #2) ==		== SiO<sub>2</sub> deposition (PECVD #2) ==
	*[[media:~~Advanced PECVD~~ OXIDE 300C standard recipe ~~OXIDE Standard Recipe~~.pdf\|Oxide Standard Recipe]]		*[[media:NewAdvPECVD OXIDE 300C standard recipe.pdf\|Oxide Standard Recipe]]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGJZaGtDTVRqa1BRdW5iU1N1Y01jd0E&usp=drive_web#gid=sharing Oxide Data 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGJZaGtDTVRqa1BRdW5iU1N1Y01jd0E&usp=drive_web#gid=sharing Oxide Data 2014]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness uniformity 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness uniformity 2014]

Biljana: /* SiO2 deposition (PECVD #2) */

2014-12-11T17:12:57Z

SiO2 deposition (PECVD #2)

← Older revision		Revision as of 17:12, 11 December 2014
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	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGJZaGtDTVRqa1BRdW5iU1N1Y01jd0E&usp=drive_web#gid=sharing Oxide Data 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGJZaGtDTVRqa1BRdW5iU1N1Y01jd0E&usp=drive_web#gid=sharing Oxide Data 2014]
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness uniformity 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness uniformity 2014]

	*Deposition Rate: ≈ 28.64 nm/min (users must calibrate this prior to critical deps)
	*Refractive Index: ≈ 1.475
	*Stress ≈ -260MPa
	*HF etch rate~623nm/min

	==LS SiN deposition (PECVD #2) ==		==LS SiN deposition (PECVD #2) ==