Optical Film Thickness (Nanometric) - Revision history

John d: note to use FIlmtrics F40, and locaiton=Removed From Lab

2022-05-13T14:30:15Z

note to use FIlmtrics F40, and locaiton=Removed From Lab

← Older revision		Revision as of 14:30, 13 May 2022
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	\|super= Bill Millerski		\|super= Bill Millerski
	\|phone=(805)839-3918x219		\|phone=(805)839-3918x219
	\|location=~~Bay~~ 7		\|location=REMOVED FROM LAB
	\|email=silva@ece.ucsb.edu		\|email=silva@ece.ucsb.edu
	\|description = Reflectometer for optical thin film measurement		\|description = Reflectometer for optical thin film measurement
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	\|-		\|-
	!<code>'''''Equipment removed from lab due to low usage on 2022-03-22'''''</code>		!<code>'''''Equipment removed from lab due to low usage on 2022-03-22'''''</code>
			\|-
			!Repalced by the newer [[Filmetrics F40-UV Microscope-Mounted\|<u>Filmetrics F40</u>]]
	\|}		\|}

John d: formatting "unavaialble" note

2022-03-22T18:02:03Z

formatting "unavaialble" note

← Older revision		Revision as of 18:02, 22 March 2022
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	}}		}}

			<br />
⚫	<code>'''~~This~~ ~~tool is currently unavailable - Tool Removed~~ from lab due to low usage on 2022-03-22'''</code>
			{\| class="wikitable"
			!
			TOOL IS UNAVAILABLE
			\|-
		⚫	!<code>'''''Equipment removed from lab due to low usage on 2022-03-22'''''</code>
			\|}

	=About=		=About=

John d: Note stating tool removed from lab.

2022-03-22T17:59:50Z

Note stating tool removed from lab.

← Older revision		Revision as of 17:59, 22 March 2022
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	\|manufacturer = Nanometrics		\|manufacturer = Nanometrics
	\|materials =		\|materials =
	}}		}}

⚫	= About =
			<code>'''This tool is currently unavailable - Tool Removed from lab due to low usage on 2022-03-22'''</code>

		⚫	=About=
	This tool is for thickness and optical property measurements of films on silicon substrates. Other substrates are permitted, but results will not be accurate. The technique used is white light reflection. Data is taken with normal incidence reflection of white light (480 nm – 850 nm) from the surface and spectral data is captured through a spectrometer attached to the camera port of the microscope. The data is modeled and the optical parameters are adjusted to give a best least-squared fit to the data. Refractive index can be manually entered or used as a parameter in the fitting routine. Absorbing films will give incorrect results. This unit can measure thicknesses of films in spots down to approximately 10 um, allowing for measurement of thin films at various points in the processing.		This tool is for thickness and optical property measurements of films on silicon substrates. Other substrates are permitted, but results will not be accurate. The technique used is white light reflection. Data is taken with normal incidence reflection of white light (480 nm – 850 nm) from the surface and spectral data is captured through a spectrometer attached to the camera port of the microscope. The data is modeled and the optical parameters are adjusted to give a best least-squared fit to the data. Refractive index can be manually entered or used as a parameter in the fitting routine. Absorbing films will give incorrect results. This unit can measure thicknesses of films in spots down to approximately 10 um, allowing for measurement of thin films at various points in the processing.

	=Equipment Specifications=		=Equipment Specifications=

	*480-850 nm reflection spectrum		*480-850 nm reflection spectrum
	*Designed for silicon substrates; others allowed, but accuracy not guaranteed		*Designed for silicon substrates; others allowed, but accuracy not guaranteed

Silva at 15:34, 28 October 2021

2021-10-28T15:34:06Z

← Older revision		Revision as of 15:34, 28 October 2021
Line 2:		Line 2:
	\|picture=Nanometric.jpg		\|picture=Nanometric.jpg
	\|type = Inspection, Test and Characterization		\|type = Inspection, Test and Characterization
	\|super= ~~Mike~~ ~~Silva~~		\|super= Bill Millerski
	\|phone=(805)839-3918x219		\|phone=(805)839-3918x219
	\|location=Bay 7		\|location=Bay 7

Biljana at 18:02, 22 August 2012

2012-08-22T18:02:09Z

← Older revision		Revision as of 18:02, 22 August 2012
Line 4:		Line 4:
	\|super= Mike Silva		\|super= Mike Silva
	\|phone=(805)839-3918x219		\|phone=(805)839-3918x219
	\|location=Bay ?		\|location=Bay 7
	\|email=silva@ece.ucsb.edu		\|email=silva@ece.ucsb.edu
	\|description = Reflectometer for optical thin film measurement		\|description = Reflectometer for optical thin film measurement

Zwarburg at 16:57, 1 July 2012

2012-07-01T16:57:38Z

← Older revision		Revision as of 16:57, 1 July 2012
Line 2:		Line 2:
	\|picture=Nanometric.jpg		\|picture=Nanometric.jpg
	\|type = Inspection, Test and Characterization		\|type = Inspection, Test and Characterization
	\|super= ~~Tony~~ ~~Bosch~~		\|super= Mike Silva
	\|phone=(805)839-~~3918x217~~		\|phone=(805)839-3918x219
	\|location=Bay ?		\|location=Bay ?
	\|email=~~bosch~~@ece.ucsb.edu		\|email=silva@ece.ucsb.edu
	\|description = Reflectometer for optical thin film measurement		\|description = Reflectometer for optical thin film measurement
	\|manufacturer = Nanometrics		\|manufacturer = Nanometrics

Zwarburg at 16:13, 1 July 2012

2012-07-01T16:13:58Z

← Older revision		Revision as of 16:13, 1 July 2012
Line 1:		Line 1:
	{{tool\|{{PAGENAME}}		{{tool\|{{PAGENAME}}
	\|picture=Nanometric.jpg		\|picture=Nanometric.jpg
			\|type = Inspection, Test and Characterization
	\|type = Wet Processing
	\|super= Tony Bosch		\|super= Tony Bosch
	\|phone=(805)839-3918x217		\|phone=(805)839-3918x217

Zwarburg at 16:13, 1 July 2012

2012-07-01T16:13:37Z

← Older revision		Revision as of 16:13, 1 July 2012
Line 10:		Line 10:
	\|materials =		\|materials =
	}}		}}

	= About =		= About =
	This tool is for thickness and optical property measurements of films on silicon substrates. Other substrates are permitted, but results will not be accurate. The technique used is white light reflection. Data is taken with normal incidence reflection of white light (480 nm – 850 nm) from the surface and spectral data is captured through a spectrometer attached to the camera port of the microscope. The data is modeled and the optical parameters are adjusted to give a best least-squared fit to the data. Refractive index can be manually entered or used as a parameter in the fitting routine. Absorbing films will give incorrect results. This unit can measure thicknesses of films in spots down to approximately 10 um, allowing for measurement of thin films at various points in the processing.		This tool is for thickness and optical property measurements of films on silicon substrates. Other substrates are permitted, but results will not be accurate. The technique used is white light reflection. Data is taken with normal incidence reflection of white light (480 nm – 850 nm) from the surface and spectral data is captured through a spectrometer attached to the camera port of the microscope. The data is modeled and the optical parameters are adjusted to give a best least-squared fit to the data. Refractive index can be manually entered or used as a parameter in the fitting routine. Absorbing films will give incorrect results. This unit can measure thicknesses of films in spots down to approximately 10 um, allowing for measurement of thin films at various points in the processing.

Zwarburg: Created page with "{{tool|{{PAGENAME}} |picture=Nanometric.jpg |type = Wet Processing |super= Tony Bosch |phone=(805)839-3918x217 |location=Bay ? |email=bosch@ece.ucsb.edu |description = Reflectome…"

2012-07-01T16:12:06Z

Created page with "{{tool|{{PAGENAME}} |picture=Nanometric.jpg |type = Wet Processing |super= Tony Bosch |phone=(805)839-3918x217 |location=Bay ? |email=bosch@ece.ucsb.edu |description = Reflectome…"

New page

{{tool|{{PAGENAME}}
|picture=Nanometric.jpg
|type = Wet Processing
|super= Tony Bosch
|phone=(805)839-3918x217
|location=Bay ?
|email=bosch@ece.ucsb.edu
|description = Reflectometer for optical thin film measurement
|manufacturer = Nanometrics
|materials =
}}

= About =
This tool is for thickness and optical property measurements of films on silicon substrates. Other substrates are permitted, but results will not be accurate. The technique used is white light reflection. Data is taken with normal incidence reflection of white light (480 nm – 850 nm) from the surface and spectral data is captured through a spectrometer attached to the camera port of the microscope. The data is modeled and the optical parameters are adjusted to give a best least-squared fit to the data. Refractive index can be manually entered or used as a parameter in the fitting routine. Absorbing films will give incorrect results. This unit can measure thicknesses of films in spots down to approximately 10 um, allowing for measurement of thin films at various points in the processing.

=Equipment Specifications=
*480-850 nm reflection spectrum
*Designed for silicon substrates; others allowed, but accuracy not guaranteed
*150 A to tens of microns thickness measurements
*Do not use refractive index option for very thin films
*Manual wafer placement, up to 6" wafers
*Objectives of 5x, 10x, and 20x for 40 um, 20 um, and 10 um spot sizes.; can measure film properties in small areas
*Thicker films require lower objective magnification due to depth of focus
*Programs for PR, SiO2, SiN on silicon