PECVD 2 (Advanced Vacuum) - Revision history

Barreraz: /* Documentation */

2026-03-06T18:55:16Z

Documentation

← Older revision		Revision as of 18:55, 6 March 2026
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	*		*
	*		*
	*[https://wiki.~~nanotech~~.ucsb.edu/w/images/2/2c/~~SOP_for_Advanced_Vacuum_PECVD~~.pdf Operating Instructions]		*[https://wiki.nanofab.ucsb.edu/w/images/9/9a/PECVD2_SOP_Final_V45.47_3-6-26-compressed.pdf Operating Instructions]
	*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" Recipe]		*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" Recipe]
	*[https://wiki.nanofab.ucsb.edu/w/images/1/1b/PECVD2_Recipe_Temperature_Change.pdf Modifying Deposition Temperature]		*[https://wiki.nanofab.ucsb.edu/w/images/1/1b/PECVD2_Recipe_Temperature_Change.pdf Modifying Deposition Temperature]

John d: /* Recipes & Data */

2025-09-29T17:56:15Z

Recipes & Data

← Older revision		Revision as of 17:56, 29 September 2025
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	*Standard Recipes: [[PECVD Recipes#PECVD 2 .28Advanced Vacuum.29\|'''Recipes > Deposition > <u>PECVD #2</u>''']]		*Standard Recipes: [[PECVD Recipes#PECVD 2 .28Advanced Vacuum.29\|'''Recipes > Deposition > <u>PECVD #2</u>''']]

	*A list of ''all available'' deposited films can be found ~~on the~~ Vacuum Deposition Recipes ~~page:~~		*A list of ''all available'' deposited films can be found here: [[Vacuum Deposition Recipes\|Recipes > Vacuum Deposition Recipes]]
	**[[Vacuum Deposition Recipes\|Recipes > Vacuum Deposition Recipes]]

	===Process Control Data===		===Process Control Data===

John d: /* Process Control Data */ added process control images etc.

2025-09-29T17:54:55Z

Process Control Data: added process control images etc.

← Older revision		Revision as of 17:54, 29 September 2025
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	[[File:PECVD1_SiO2_F50_WaferMap_example.jpg\|alt=Screenshot of Filmetrics F50 wafermap of typical DepCals film\|thumb\|215x215px\|Example of DepCals Thickness/Refractive Index uniformity measurement (4% shown here).]]		[[File:PECVD1_SiO2_F50_WaferMap_example.jpg\|alt=Screenshot of Filmetrics F50 wafermap of typical DepCals film\|thumb\|215x215px\|Example of DepCals Thickness/Refractive Index uniformity measurement (4% shown here).]]
	*Standard Recipes: [[PECVD Recipes#PECVD 2 .28Advanced Vacuum.29\|'''Recipes > Deposition > <u>PECVD #2</u>''']]		*Standard Recipes: [[PECVD Recipes#PECVD 2 .28Advanced Vacuum.29\|'''Recipes > Deposition > <u>PECVD #2</u>''']]
	**Thin-Films recorded: SiO2, Si3N4 and Low-Stress Si3N4

	*A list of ''all available'' deposited films can be found on the Vacuum Deposition Recipes page:		*A list of ''all available'' deposited films can be found on the Vacuum Deposition Recipes page:
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	*Process Control Charts: '''[[Process Group - Process Control Data#PECVD #1 (PlasmaTherm 790) - Process Control\|Process Control > PECVD#1]]'''		*Process Control Charts: '''[[Process Group - Process Control Data#PECVD #1 (PlasmaTherm 790) - Process Control\|Process Control > PECVD#1]]'''
	**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=272916741 ~~PECVD#2:~~ Plots of all data]		**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=272916741 Plots of all data]
	**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=1313651154 ~~PECVD#2:~~ SiO<sub>2</sub>]		**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=1313651154 SiO<sub>2</sub> Data]
	**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=773875841 ~~PECVD#2:~~ Si<sub>3</sub>N<sub>4</sub>]		**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=773875841 Si<sub>3</sub>N<sub>4</sub> Data]
	**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=584923738 ~~PECVD#2:~~ Low-Stress Si<sub>3</sub>N<sub>4</sub>]		**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=584923738 Low-Stress Si<sub>3</sub>N<sub>4</sub> Data]
	***[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=203400760 Plots of Low-Stress Si<sub>3</sub>N<sub>4</sub> Data]		***[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=203400760 Plots of Low-Stress Si<sub>3</sub>N<sub>4</sub> Data]

John d: /* Recipes & Historical Data */

2025-09-29T17:52:46Z

Recipes & Historical Data

← Older revision		Revision as of 17:52, 29 September 2025
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	*For particle counting method, see the [[Wafer scanning process traveler\|Surfscan Scanning Procedure]]		*For particle counting method, see the [[Wafer scanning process traveler\|Surfscan Scanning Procedure]]

	==Recipes & ~~Historical~~ Data==		==Recipes & Data==
			[[File:PECVD_SPC_Chart_Example.png\|alt=SPC chart example\|thumb\|228x228px\|Example Process Control Charts (SPC) for thin-film DepCals.]]

			[[File:Surfscan_230113A7G2_after_low_particles.jpg\|alt=screenshot of surfscan particle count\|thumb\|205x205px\|Example particle counts taken on each film.]]
	*Recipes can be found on the PECVD Recipes Page:
			[[File:PECVD1_SiO2_F50_WaferMap_example.jpg\|alt=Screenshot of Filmetrics F50 wafermap of typical DepCals film\|thumb\|215x215px\|Example of DepCals Thickness/Refractive Index uniformity measurement (4% shown here).]]
	**[[PECVD Recipes#PECVD 2 .28Advanced Vacuum.29\|Recipes > ~~Vacuum~~ Deposition ~~Recipes~~ > ~~PECVD Recipes > '''~~<u>PECVD 2 ~~- Advanced Vacuum~~</u>''']]		*Standard Recipes: [[PECVD Recipes#PECVD 2 .28Advanced Vacuum.29\|'''Recipes > Deposition > <u>PECVD #2</u>''']]
	**Thin-Films recorded: SiO2, Si3N4 and Low-Stress Si3N4		**Thin-Films recorded: SiO2, Si3N4 and Low-Stress Si3N4

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	===Process Control Data===		===Process Control Data===

			*Process Control Charts: '''[[Process Group - Process Control Data#PECVD #1 (PlasmaTherm 790) - Process Control\|Process Control > PECVD#1]]'''
⚫	*[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=~~272916741 PECVD#2:~~ Plots of ~~all~~ ~~data~~]
	*[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=~~1313651154~~ PECVD#2: ~~SiO<sub>2</sub>~~]		**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=272916741 PECVD#2: Plots of all data]
	*[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=~~773875841~~ PECVD#2: Si<sub>~~3</sub>N<sub>4~~</sub>]		**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=1313651154 PECVD#2: SiO<sub>2</sub>]
	*[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=~~584923738~~ PECVD#2: ~~Low-Stress~~ Si<sub>3</sub>N<sub>4</sub>]		**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=773875841 PECVD#2: Si<sub>3</sub>N<sub>4</sub>]
	**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=~~203400760~~ ~~Plots of~~ Low-Stress Si<sub>3</sub>N<sub>4</sub> ~~Data~~]		**[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=584923738 PECVD#2: Low-Stress Si<sub>3</sub>N<sub>4</sub>]
		⚫	***[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=203400760 Plots of Low-Stress Si<sub>3</sub>N<sub>4</sub> Data]

Biljana: /* Documentation */

2025-02-21T19:29:11Z

Documentation

← Older revision		Revision as of 19:29, 21 February 2025
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	*		*
	*[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions]		*[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions]

	*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" Recipe]		*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" Recipe]

	*[https://wiki.nanofab.ucsb.edu/w/images/1/1b/PECVD2_Recipe_Temperature_Change.pdf Modifying Deposition Temperature]		*[https://wiki.nanofab.ucsb.edu/w/images/1/1b/PECVD2_Recipe_Temperature_Change.pdf Modifying Deposition Temperature]

Biljana: /* Documentation */

2025-02-21T19:27:49Z

Documentation

← Older revision		Revision as of 19:27, 21 February 2025
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	*		*
	*[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions]		*[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions]

	*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" Recipe]		*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" Recipe]

	*[https://wiki.nanofab.ucsb.edu/w/images/1/1b/PECVD2_Recipe_Temperature_Change.pdf Modifying Deposition Temperature]		*[https://wiki.nanofab.ucsb.edu/w/images/1/1b/PECVD2_Recipe_Temperature_Change.pdf Modifying Deposition Temperature]

	*[[Wafer Coating Process Traveler]]		*[[Wafer Coating Process Traveler]]
	*For particle counting method, see the [[Wafer scanning process traveler\|Surfscan Scanning Procedure]]		*For particle counting method, see the [[Wafer scanning process traveler\|Surfscan Scanning Procedure]]

Biljana: /* Documentation */

2025-02-20T19:20:40Z

Documentation

← Older revision		Revision as of 19:20, 20 February 2025
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	*[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions]		*[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions]
	*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" Recipe]		*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" Recipe]
		⚫	*[https://wiki.nanofab.ucsb.edu/w/images/1/1b/PECVD2_Recipe_Temperature_Change.pdf Modifying Deposition Temperature]
	*
⚫	*[https://wiki.nanofab.ucsb.edu/w/images/1/1b/PECVD2_Recipe_Temperature_Change.pdf Modifying Deposition Temperature ~~in a Personal Recipe~~]
	*[[Wafer Coating Process Traveler]]		*[[Wafer Coating Process Traveler]]
	*For particle counting method, see the [[Wafer scanning process traveler\|Surfscan Scanning Procedure]]		*For particle counting method, see the [[Wafer scanning process traveler\|Surfscan Scanning Procedure]]

Biljana: /* Documentation */

2025-02-20T19:19:15Z

Documentation

← Older revision		Revision as of 19:19, 20 February 2025
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	*[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions]		*[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions]
	*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" Recipe]		*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" Recipe]
			*
	*[https://wiki.nanofab.ucsb.edu/w/images/1/1b/PECVD2_Recipe_Temperature_Change.pdf Modifying Deposition Temperature in a Personal Recipe]		*[https://wiki.nanofab.ucsb.edu/w/images/1/1b/PECVD2_Recipe_Temperature_Change.pdf Modifying Deposition Temperature in a Personal Recipe]
	*[[Wafer Coating Process Traveler]]		*[[Wafer Coating Process Traveler]]

Biljana: /* Documentation */

2025-02-20T00:02:58Z

Documentation

← Older revision		Revision as of 00:02, 20 February 2025
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	*		*
	*[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions]		*[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions]
	*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" ~~recipe~~]		*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" Recipe]
			*[https://wiki.nanofab.ucsb.edu/w/images/1/1b/PECVD2_Recipe_Temperature_Change.pdf Modifying Deposition Temperature in a Personal Recipe]
	*[[Wafer Coating Process Traveler]]		*[[Wafer Coating Process Traveler]]
	*For particle counting method, see the [[Wafer scanning process traveler\|Surfscan Scanning Procedure]]		*For particle counting method, see the [[Wafer scanning process traveler\|Surfscan Scanning Procedure]]

Biljana: /* Documentation */

2025-02-19T23:14:10Z

Documentation

← Older revision		Revision as of 23:14, 19 February 2025
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	*		*
	*[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions]		*[https://wiki.nanotech.ucsb.edu/w/images/2/2c/SOP_for_Advanced_Vacuum_PECVD.pdf Operating Instructions]
	*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "~~STD_LS_Si3N4v4~~" recipe]		*[https://wiki.nanofab.ucsb.edu/w/images/6/68/PECVD2_STD_LS_Si3N4v4recipe_depositiontime.pdf Modifying Deposition Time in "STD LS-Si3N4v4" recipe]
	*[[Wafer Coating Process Traveler]]		*[[Wafer Coating Process Traveler]]
	*For particle counting method, see the [[Wafer scanning process traveler\|Surfscan Scanning Procedure]]		*For particle counting method, see the [[Wafer scanning process traveler\|Surfscan Scanning Procedure]]