PECVD Recipes - Revision history

Biljana: /* Standard Clean Recipe (PECVD#2): "STD CF4/O2 Clean" */ cleaning procedure after a-Si dep

2025-12-10T18:07:38Z

Standard Clean Recipe (PECVD#2): "STD CF4/O2 Clean": cleaning procedure after a-Si dep

← Older revision		Revision as of 18:07, 10 December 2025
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	\|-		\|-
	\|a-Si		\|a-Si
	\|~~1.5~~ min clean for every 1min of deposition		\|2 min clean for every 1min of deposition
	\|-		\|-
	\|a-Si (max ~~30min long~~ dep. in ~~one~~ ~~single~~ ~~run~~)		\|a-Si (max 60min dep before breaking it up and cleaning the chamber)
	\|Wet Clean the Upper Lid/Chamber		\|Wet Clean the Upper Lid/Chamber
	DI water then Isopropyl Alcohol on chamber wall & portholes		DI water then Isopropyl Alcohol on chamber wall & portholes

John d: /* Amorphous-Si deposition (PECVD #2) */

2025-11-26T23:54:33Z

Amorphous-Si deposition (PECVD #2)

← Older revision		Revision as of 23:54, 26 November 2025
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	*[[PECVD-2 - a-Si Recipe and Dep process (2025)\|a-Si Recipe and Dep process]] 2025-11		*[[PECVD-2 - a-Si Recipe and Dep process (2025)\|a-Si Recipe and Dep process]] 2025-11
	**Developed by Ryan Hersey & ~~Skjyler~~ Palatnik, Group of Prof. Max Millar-Blanchaer		**''Developed by Ryan Hersey & Skyler Palatnik, Group of Prof. Max Millar-Blanchaer''
	*[https://wiki.nanotech.ucsb.edu/wiki/images/9/9d/03-Amorphous-Si-PECVD-2.pdf Amorphous Si Deposition Recipe] (2013-09, Ning Cao)		*[https://wiki.nanotech.ucsb.edu/wiki/images/9/9d/03-Amorphous-Si-PECVD-2.pdf Amorphous Si Deposition Recipe] (2013-09, Ning Cao)
	*[https://wiki.nanotech.ucsb.edu/wiki/images/0/09/ASi_deposition_and_film_stress_using_AV_dep_tool.pdf Amorphous Si Film - Characterization and Stress] - DOE/recipe variations		*[https://wiki.nanotech.ucsb.edu/wiki/images/0/09/ASi_deposition_and_film_stress_using_AV_dep_tool.pdf Amorphous Si Film - Characterization and Stress] - DOE/recipe variations

John d: /* Amorphous-Si deposition (PECVD #2) */ link to new a-Si recipe page

2025-11-26T23:42:31Z

Amorphous-Si deposition (PECVD #2): link to new a-Si recipe page

← Older revision		Revision as of 23:42, 26 November 2025
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	==Amorphous-Si deposition (PECVD #2)==		==Amorphous-Si deposition (PECVD #2)==

			*[[PECVD-2 - a-Si Recipe and Dep process (2025)\|a-Si Recipe and Dep process]] 2025-11
⚫	*[https://wiki.nanotech.ucsb.edu/wiki/images/9/9d/03-Amorphous-Si-PECVD-2.pdf Amorphous Si Deposition Recipe]
			**Developed by Ryan Hersey & Skjyler Palatnik, Group of Prof. Max Millar-Blanchaer
⚫	*[https://wiki.nanotech.ucsb.edu/wiki/images/0/09/ASi_deposition_and_film_stress_using_AV_dep_tool.pdf Amorphous Si Film Characterization and Stress]
		⚫	*[https://wiki.nanotech.ucsb.edu/wiki/images/9/9d/03-Amorphous-Si-PECVD-2.pdf Amorphous Si Deposition Recipe] (2013-09, Ning Cao)
		⚫	*[https://wiki.nanotech.ucsb.edu/wiki/images/0/09/ASi_deposition_and_film_stress_using_AV_dep_tool.pdf Amorphous Si Film - Characterization and Stress] - DOE/recipe variations

	==Standard Cleaning Procedure (PECVD #2)==		==Standard Cleaning Procedure (PECVD #2)==

Biljana: /* Standard Clean Recipe (PECVD#2): "STD CF4/O2 Clean" */

2025-11-13T22:20:00Z

Standard Clean Recipe (PECVD#2): "STD CF4/O2 Clean"

← Older revision		Revision as of 22:20, 13 November 2025
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	\|-		\|-
	\|a-Si		\|a-Si
	\|~~1min~~ clean for every 1min of deposition		\|1.5 min clean for every 1min of deposition
	\|-		\|-
	\|a-Si (max ~~1hr~~ long dep. in one single run)		\|a-Si (max 30min long dep. in one single run)
	\|Wet Clean the Upper Lid/Chamber		\|Wet Clean the Upper Lid/Chamber
	DI water then Isopropyl Alcohol on chamber wall & portholes		DI water then Isopropyl Alcohol on chamber wall & portholes
	\|-		\|-
	\|Other films:		\|Other films:(max 60min long dep. in one single run)
	If > 29min total dep time		\|If > 29min total dep time
	(Season + Dep)		(Season + Dep)

	\|Wet Clean the Upper Lid/Chamber		Wet Clean the Upper Lid/Chamber

	DI water then Isopropyl Alcohol on chamber wall & portholes		DI water then Isopropyl Alcohol on chamber wall & portholes
	\|}		\|}

Biljana: Cleaning time after A-Si deposition (1min clean for 1min dep)

2025-11-10T23:37:19Z

Cleaning time after A-Si deposition (1min clean for 1min dep)

← Older revision		Revision as of 23:37, 10 November 2025
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	\|-		\|-
	\|SiO<sub>2</sub>		\|SiO<sub>2</sub>
	\|~~1 min~~. clean for every ~~1 min~~. deposition		\|1min. clean for every 1min. deposition
	\|-		\|-
	\|Si<sub>3</sub>N<sub>4</sub>		\|Si<sub>3</sub>N<sub>4</sub>
	\|~~1 min~~. clean for every ~~7 min~~ of deposition		\|1min. clean for every 7min. of deposition
	\|-		\|-
	\|a-Si		\|a-Si
	\|~~1.5 min.~~ clean for every ~~1 min~~ of deposition		\|1min clean for every 1min of deposition
	\|-		\|-
	\|a-Si (max 1hr long dep. in one single run)		\|a-Si (max 1hr long dep. in one single run)
	\|Wet Clean the Upper Lid/Chamber		\|Wet Clean the Upper Lid/Chamber
	DI water then Isopropyl Alcohol on chamber wall & portholes		DI water then Isopropyl Alcohol on chamber wall & portholes

	[Do wet clean for any a-Si deposition regardless of total deposition time!]
	\|-		\|-
	\|Other films:		\|Other films:

Biljana: /* Standard Cleaning Procedure (PECVD #2) */ added info regarding cleaning time for a-Si. Subject to change, since I used cleaning time user suggested ( 1.5 min clean for 1 min deposition time). Added info about max. dep. time for a-Si (1 hr- from Tony's e-mail).

2025-11-07T22:39:02Z

Standard Cleaning Procedure (PECVD #2): added info regarding cleaning time for a-Si. Subject to change, since I used cleaning time user suggested ( 1.5 min clean for 1 min deposition time). Added info about max. dep. time for a-Si (1 hr- from Tony's e-mail).

← Older revision		Revision as of 22:39, 7 November 2025
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	The cleaning procedure is very important in order to have consistent result on this tool and also to keep particulate count low. After each deposition you should clean the tool following instructions carefully. The clean is done in two steps:		The cleaning procedure is very important in order to have consistent result on this tool and also to keep particulate count low. After each deposition you should clean the tool following instructions carefully. The clean is done in two steps:

	#(If >29min dep time) Wet cleaning: Start cleaning by using a cleanroom wipe sprayed with DI. Wipe upper chamber sidewalls with it. Finish cleaning by using the cleanroom wipe sprayed with IPA & wiping again.		#If > 29min (season+dep. time) Wet cleaning: Start cleaning by using a cleanroom wipe sprayed with DI. Wipe upper chamber sidewalls with it. Finish cleaning by using the cleanroom wipe sprayed with IPA & wiping again. Do not clean shower-head!
	#Load the recipe for cleaning "STD CF<sub>4</sub>/O<sub>2</sub> Clean" (edit the recipe and change ONLY time of cleaning). Follow instructions regarding required time for cleaning.		#Load the recipe for cleaning "STD CF<sub>4</sub>/O<sub>2</sub> Clean" (edit the recipe and change ONLY time of cleaning). Follow instructions regarding required time for cleaning.

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	\|1 min. clean for every 7 min of deposition		\|1 min. clean for every 7 min of deposition
	\|-		\|-
			\|a-Si
⚫	\|If > 29min total dep time
			\|1.5 min. clean for every 1 min of deposition
			\|-
			\|a-Si (max 1hr long dep. in one single run)
			\|Wet Clean the Upper Lid/Chamber
			DI water then Isopropyl Alcohol on chamber wall & portholes

			[Do wet clean for any a-Si deposition regardless of total deposition time!]
			\|-
			\|Other films:
		⚫	If > 29min total dep time
	(Season + Dep)		(Season + Dep)
	\|Wet Clean the Upper Lid/Chamber		\|Wet Clean the Upper Lid/Chamber

John d: /* PECVD 1 (PlasmaTherm 790) */ added cleaning times, and a-Si

2025-10-06T21:49:34Z

PECVD 1 (PlasmaTherm 790): added cleaning times, and a-Si

← Older revision		Revision as of 21:49, 6 October 2025
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	==Standard Cleaning Procedure (PECVD #1)==		==Standard Cleaning Procedure (PECVD #1)==
	The cleaning procedure is very important in order to have consistent result on this tool and also to keep particulate count low. After each deposition you should clean the tool following instructions carefully. ~~The clean is done in two steps:~~		The cleaning procedure is very important in order to have consistent result on this tool and also to keep particulate count low. After each deposition you should clean the tool following instructions carefully.

			The clean is done in two steps:
⚫	#Wet cleaning (start cleaning by using a cleanroom wipe sprayed with DI. Wipe chamber sidewalls with it. Finish cleaning by using the cleanroom wipe sprayed with IPA. )

⚫	#Load the recipe for cleaning "CF4/O2 Clean" (~~edit~~ the recipe and ~~change~~ ~~ONLY~~ ~~time~~ of cleaning). Follow instructions regarding a required time for cleaning.
		⚫	#'''Wet cleaning''' (start cleaning by using a cleanroom wipe sprayed with DI. Wipe chamber sidewalls with it. Finish cleaning by using the cleanroom wipe sprayed with IPA. )
	#
		⚫	#Load the recipe for plasma cleaning "'''''CF4/O2 Clean'''''" (run the recipe and it will pop-up asking for the cleaning time). Follow instructions regarding a required time for cleaning.

	{\| class="wikitable"		{\| class="wikitable"
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	\|-		\|-
	\|SiO<sub>2</sub>		\|SiO<sub>2</sub>
			\|1 min clean for every 1 min dep
	\|TBD
	\|-		\|-
	\|Si<sub>3</sub>N<sub>4</sub>		\|Si<sub>3</sub>N<sub>4</sub>
			\|1 min clean for every 7 min dep
	\|TBD
	\|-		\|-
	\|SiOxNy		\|SiOxNy
	\|Same as ~~XYZ~~		\|Same as SiO<sub>2</sub>
			\|-
			\|a-Si
			\|Same time as Si<sub>3</sub>N<sub>4</sub>
	\|}		\|}

	#

	===[https://wiki.nanotech.ucsb.edu/w/images/7/72/PECVD1-cleaning.png Standard Cleaning Recipe (PECVD#1): "CF4/O2 Clean"]===		===[https://wiki.nanotech.ucsb.edu/w/images/7/72/PECVD1-cleaning.png Standard Cleaning Recipe (PECVD#1): "CF4/O2 Clean"]===

Biljana: /* ICP-PECVD (Unaxis VLR) */

2025-10-06T20:38:03Z

ICP-PECVD (Unaxis VLR)

← Older revision		Revision as of 20:38, 6 October 2025
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	#Load the recipe for cleaning "STD CF<sub>4</sub>/O<sub>2</sub> Clean" (edit the recipe and change ONLY time of cleaning). Follow instructions regarding required time for cleaning.		#Load the recipe for cleaning "STD CF<sub>4</sub>/O<sub>2</sub> Clean" (edit the recipe and change ONLY time of cleaning). Follow instructions regarding required time for cleaning.

	===[https://wiki.~~nanotech~~.ucsb.edu/w/~~images/3/34/PECVD2_photo_for_cleaning~~.~~png~~ Standard Clean Recipe (PECVD#2): "STD CF4/O2 Clean"]===		===[https://wiki.nanofab.ucsb.edu/wiki/File:STD_CF4-O2_Clean_PECVD2.jpg Standard Clean Recipe (PECVD#2): "STD CF4/O2 Clean"]===
	Click the above link for a screenshot of the standard cleaning recipe, for which you will enter a custom time. The recipe is set up so that it will pop up a window for the cleaning time upon running the recipe - you do not need to edit the recipe before running it.		Click the above link for a screenshot of the standard cleaning recipe, for which you will enter a custom time. The recipe is set up so that it will pop up a window for the cleaning time upon running the recipe - you do not need to edit the recipe before running it.

John d: /* SiO2 deposition (PECVD #2) */ mentioned RIX, stress etc.

2025-05-07T18:01:02Z

SiO2 deposition (PECVD #2): mentioned RIX, stress etc.

← Older revision		Revision as of 18:01, 7 May 2025
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	*[https://docs.google.com/spreadsheets/d/1fTDNXxpf4tgNYLIEs_jvehG1KvtXqqTRDBI7sHNAVvo/edit#gid=0 SiO<sub>2</sub><nowiki> [PECVD 1] Current Process Control Data</nowiki>]		*[https://docs.google.com/spreadsheets/d/1fTDNXxpf4tgNYLIEs_jvehG1KvtXqqTRDBI7sHNAVvo/edit#gid=0 SiO<sub>2</sub><nowiki> [PECVD 1] Current Process Control Data</nowiki>]
			**Lists film data, such as dep rate, stress, particle count, refractive index etc.

			=== Old Data ===
	*[https://wiki.nanotech.ucsb.edu/wiki/Old_Deposition_Data_-_2021-12-15#SiO2_deposition_.28PECVD_.231.29 SiO<sub>2</sub><nowiki> [PECVD 1] Historical Data</nowiki>] - Oct. 2021 and earlier		*[https://wiki.nanotech.ucsb.edu/wiki/Old_Deposition_Data_-_2021-12-15#SiO2_deposition_.28PECVD_.231.29 SiO<sub>2</sub><nowiki> [PECVD 1] Historical Data</nowiki>] - Oct. 2021 and earlier

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	*[https://docs.google.com/spreadsheets/d/1DGU745SeunYz4sLs1LpGKbtOYX-tQyBHEvVYcMxHRKE/edit#gid= Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>]		*[https://docs.google.com/spreadsheets/d/1DGU745SeunYz4sLs1LpGKbtOYX-tQyBHEvVYcMxHRKE/edit#gid= Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Standard Recipe</nowiki>]
	*[https://docs.google.com/spreadsheets/d/1fTDNXxpf4tgNYLIEs_jvehG1KvtXqqTRDBI7sHNAVvo/edit#gid=98787450 Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Current Process Control Data</nowiki>]		*[https://docs.google.com/spreadsheets/d/1fTDNXxpf4tgNYLIEs_jvehG1KvtXqqTRDBI7sHNAVvo/edit#gid=98787450 Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Current Process Control Data</nowiki>]
			**Lists film data, such as dep rate, stress, particle count, refractive index etc.

			=== Old Data ===
	*[https://wiki.nanotech.ucsb.edu/wiki/Old_Deposition_Data_-_2021-12-15#SiN_deposition_.28PECVD_.231.29 Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Historical Data</nowiki>] - Oct. 2021 and earlier		*[https://wiki.nanotech.ucsb.edu/wiki/Old_Deposition_Data_-_2021-12-15#SiN_deposition_.28PECVD_.231.29 Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 1] Historical Data</nowiki>] - Oct. 2021 and earlier

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	*[https://wiki.nanotech.ucsb.edu/wiki/images/2/24/New_PECVD1-LS_SION-recipe_2014_LS_SION_recipe.pdf SiO<sub>x</sub>N<sub>y</sub> Standard Recipe]		*[https://wiki.nanotech.ucsb.edu/wiki/images/2/24/New_PECVD1-LS_SION-recipe_2014_LS_SION_recipe.pdf SiO<sub>x</sub>N<sub>y</sub> Standard Recipe]
	*[https://docs.google.com/spreadsheets/d/1rixyzAAq6q08M5OwvZiDVoh3K8B566XKM-UZAQIAnsg/edit#gid=sharing SiO<sub>x</sub>N<sub>y</sub> Data 2014] - ''~~Rate~~, ~~Index~~ etc.''		*[https://docs.google.com/spreadsheets/d/1rixyzAAq6q08M5OwvZiDVoh3K8B566XKM-UZAQIAnsg/edit#gid=sharing SiO<sub>x</sub>N<sub>y</sub> Data 2014] - ''Lists film data, such as dep rate, stress, particle count, refractive index etc.''
	*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEttR2JSTkRoamR0SUZ4bE5QUW9uS2c&usp=sharing SiO<sub>x</sub>N<sub>y</sub>1000A Thickness uniformity 2014]		*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEttR2JSTkRoamR0SUZ4bE5QUW9uS2c&usp=sharing SiO<sub>x</sub>N<sub>y</sub>1000A Thickness uniformity 2014]

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	*[https://docs.google.com/spreadsheets/d/1cYK-k669vf8YO2q2YCGa3gTdaDI3I3M-a9KR5RDlZWY/edit#gid= SiO<sub>2</sub><nowiki> [PECVD 2] New Standard Recipe</nowiki>] - "''STD SiO2 v2''"		*[https://docs.google.com/spreadsheets/d/1cYK-k669vf8YO2q2YCGa3gTdaDI3I3M-a9KR5RDlZWY/edit#gid= SiO<sub>2</sub><nowiki> [PECVD 2] New Standard Recipe</nowiki>] - "''STD SiO2 v2''"
	*[https://docs.google.com/spreadsheets/d/1wCEcFj6ZMHR4QifngLXwz6dqbyf8hsVKu7bQbMS6EoA/edit#gid= SiO<sub>2</sub><nowiki> [PECVD 2] Old Standard Recipe</nowiki>] - "''STD SiO2''"		**[https://docs.google.com/spreadsheets/d/1wCEcFj6ZMHR4QifngLXwz6dqbyf8hsVKu7bQbMS6EoA/edit#gid= SiO<sub>2</sub><nowiki> [PECVD 2] Old Standard Recipe</nowiki>] - "''STD SiO2''"
	*[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=1313651154 SiO<sub>2</sub><nowiki> [PECVD 2] Current Process Control Data</nowiki>]		*[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=1313651154 SiO<sub>2</sub><nowiki> [PECVD 2] Current Process Control Data</nowiki>]
			**Lists film data, such as dep rate, stress, particle count, refractive index etc.
	*[https://wiki.nanotech.ucsb.edu/wiki/Old_Deposition_Data_-_2021-12-15#SiO2_deposition_.28PECVD_.232.29 SiO<sub>2</sub><nowiki> [PECVD 2] Historical Data</nowiki>] - Before Oct. 2021		*[https://wiki.nanotech.ucsb.edu/wiki/Old_Deposition_Data_-_2021-12-15#SiO2_deposition_.28PECVD_.232.29 SiO<sub>2</sub><nowiki> [PECVD 2] Historical Data</nowiki>] - Before Oct. 2021

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	*[https://docs.google.com/spreadsheets/d/1JBXEfRGemFJK81RkHfxS0cTucb3viUL7hMGzmKRD5uU/edit#gid= Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] New Standard Recipe</nowiki>] - "''STD Si3N4 v3''"		*[https://docs.google.com/spreadsheets/d/1JBXEfRGemFJK81RkHfxS0cTucb3viUL7hMGzmKRD5uU/edit#gid= Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] New Standard Recipe</nowiki>] - "''STD Si3N4 v3''"
	*[https://docs.google.com/spreadsheets/d/1KS4HfhUJyYVep4H6CRAKpMRP5TA31F0qD-obQkKRnEI/edit#gid= Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] Old Standard Recipe</nowiki>] - "''Nitride2''"		**[https://docs.google.com/spreadsheets/d/1KS4HfhUJyYVep4H6CRAKpMRP5TA31F0qD-obQkKRnEI/edit#gid= Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] Old Standard Recipe</nowiki>] - "''Nitride2''"
	*[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=773875841 Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] Current Process Control Data</nowiki>]		*[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=773875841 Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] Current Process Control Data</nowiki>]
			**Lists film data, such as dep rate, stress, particle count, refractive index etc.
	*[https://wiki.nanotech.ucsb.edu/wiki/Old_Deposition_Data_-_2021-12-15#SiN_deposition_.28PECVD_.232.29 Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] Historical Data</nowiki>] - Before Oct. 2021		*[https://wiki.nanotech.ucsb.edu/wiki/Old_Deposition_Data_-_2021-12-15#SiN_deposition_.28PECVD_.232.29 Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] Historical Data</nowiki>] - Before Oct. 2021

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	*[https://docs.google.com/spreadsheets/d/19VQ6ytYbZ5SsAiXzgWqwlyJUqgjWb8x_eyv7L8DvtwM/edit#gid= Low Stress Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] New Standard Recipe</nowiki>] - "''STD LS-Si3N4 v4''"		*[https://docs.google.com/spreadsheets/d/19VQ6ytYbZ5SsAiXzgWqwlyJUqgjWb8x_eyv7L8DvtwM/edit#gid= Low Stress Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] New Standard Recipe</nowiki>] - "''STD LS-Si3N4 v4''"

	*[https://docs.google.com/spreadsheets/d/1DzzI7aE61R7c6gyk6cGBdm9FtGrApiNJ4AL90ll2C8k/edit#gid= Low Stress Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] Old Standard Recipe</nowiki>] - "'' Old LSNitride2 recipe ''"		**[https://docs.google.com/spreadsheets/d/1DzzI7aE61R7c6gyk6cGBdm9FtGrApiNJ4AL90ll2C8k/edit#gid= Low Stress Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] Old Standard Recipe</nowiki>] - "'' Old LSNitride2 recipe ''"

	*[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=584923738 Low Stress Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] Current Process Control Data</nowiki>]		*[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=584923738 Low Stress Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] Current Process Control Data</nowiki>]
	*[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=203400760 Plots of Low-Stress Si<sub>3</sub>N<sub>4</sub> Process Control Data]		*[https://docs.google.com/spreadsheets/d/1iSW1eAAg824y9PYYLG9aiaw53PEJ-f9ofylpVlCDq9Y/edit#gid=203400760 Plots of Low-Stress Si<sub>3</sub>N<sub>4</sub> Process Control Data]
			**Lists film data, such as dep rate, stress, particle count, refractive index etc.
	*[[Old Deposition Data - 2021-12-15#Low-Stress SiN deposition .28PECVD .232.29\|Low Stress Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] Historical Data - Before Oct. 2021</nowiki>]]		*[[Old Deposition Data - 2021-12-15#Low-Stress SiN deposition .28PECVD .232.29\|Low Stress Si<sub>3</sub>N<sub>4</sub><nowiki> [PECVD 2] Historical Data - Before Oct. 2021</nowiki>]]
	*:''Old Versions of the recipe:''		*:''Old Versions of the recipe:''
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	*Recipe: "''[https://docs.google.com/spreadsheets/d/1OQp_sux5YEgpcyH3sf0JCwTOhvoi_LSYKOUMRR4Umh4?usp=drive_fs STD LS-Si3N4 3xTime v1]"''		*Recipe: "''[https://docs.google.com/spreadsheets/d/1OQp_sux5YEgpcyH3sf0JCwTOhvoi_LSYKOUMRR4Umh4?usp=drive_fs STD LS-Si3N4 3xTime v1]"''
	*[https://docs.google.com/spreadsheets/d/15aKkk-fIojIDgQfsVlB3lhex-U3Q0edVdNCkzoGBo1Q/edit?usp=sharing Process Control Data]: ~~Calibration~~ ~~Data~~		*[https://docs.google.com/spreadsheets/d/15aKkk-fIojIDgQfsVlB3lhex-U3Q0edVdNCkzoGBo1Q/edit?usp=sharing Process Control Data]: Lists film data, such as dep rate, stress, particle count, refractive index etc.
	*[https://docs.google.com/spreadsheets/d/15aKkk-fIojIDgQfsVlB3lhex-U3Q0edVdNCkzoGBo1Q/edit?gid=974005628#gid=974005628 Process Control Charts/Plots]: Calibration control limits versus date		*[https://docs.google.com/spreadsheets/d/15aKkk-fIojIDgQfsVlB3lhex-U3Q0edVdNCkzoGBo1Q/edit?gid=974005628#gid=974005628 Process Control Charts/Plots]: Calibration control limits versus date

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	*[https://docs.google.com/spreadsheets/d/1CuDMKFTTzGLL6CP-FEI_9cOnUaIw-432ppDFssB59wY/edit#gid=0 Low Deposition Rate SiO<sub>2</sub><nowiki> [ICP-PECVD] - Process Control Data</nowiki>]		*[https://docs.google.com/spreadsheets/d/1CuDMKFTTzGLL6CP-FEI_9cOnUaIw-432ppDFssB59wY/edit#gid=0 Low Deposition Rate SiO<sub>2</sub><nowiki> [ICP-PECVD] - Process Control Data</nowiki>]
			**Lists film data, such as dep rate, stress, particle count, refractive index etc.

	=== Old Data ===		=== Old Data ===
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	*[https://docs.google.com/spreadsheets/d/1x0mB4ySSUfEAfRehAx7k_k3BJuTMczaRxQgxsTAFfo4/edit?gid=744785272#gid=744785272 High Deposition Rate SiO<sub>2</sub><nowiki> [ICP-PECVD] - Standard Recipe</nowiki>] - "''SiO2 HDR250C-new May 2024''"		*[https://docs.google.com/spreadsheets/d/1x0mB4ySSUfEAfRehAx7k_k3BJuTMczaRxQgxsTAFfo4/edit?gid=744785272#gid=744785272 High Deposition Rate SiO<sub>2</sub><nowiki> [ICP-PECVD] - Standard Recipe</nowiki>] - "''SiO2 HDR250C-new May 2024''"
	*[https://docs.google.com/spreadsheets/d/1CuDMKFTTzGLL6CP-FEI_9cOnUaIw-432ppDFssB59wY/edit#gid=1459210138 High Deposition Rate SiO<sub>2</sub><nowiki> [ICP-PECVD] - Current Process Control Data</nowiki>]		*[https://docs.google.com/spreadsheets/d/1CuDMKFTTzGLL6CP-FEI_9cOnUaIw-432ppDFssB59wY/edit#gid=1459210138 High Deposition Rate SiO<sub>2</sub><nowiki> [ICP-PECVD] - Current Process Control Data</nowiki>]
			**Lists film data, such as dep rate, stress, particle count, refractive index etc.

	=== Old Data ===		=== Old Data ===
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	* [https://docs.google.com/spreadsheets/d/1CuDMKFTTzGLL6CP-FEI_9cOnUaIw-432ppDFssB59wY/edit#gid=1670372499 Si<sub>3</sub>N<sub>4</sub><nowiki> [ICP-PECVD] - Current Process Control Data</nowiki>]		* [https://docs.google.com/spreadsheets/d/1CuDMKFTTzGLL6CP-FEI_9cOnUaIw-432ppDFssB59wY/edit#gid=1670372499 Si<sub>3</sub>N<sub>4</sub><nowiki> [ICP-PECVD] - Current Process Control Data</nowiki>]
			** Lists film data, such as dep rate, stress, particle count, refractive index etc.

	=== Old Data ===		=== Old Data ===
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	*[https://docs.google.com/spreadsheets/d/1xchMuXlPABSKcW-rMau8B-cw_jnJnwI9qpXqDLUQ8sU/edit?gid=1239658204#gid=1239658204 Low Stress Si<sub>3</sub>N<sub>4</sub><nowiki> [ICP-PECVD] - Standard Recipe</nowiki>] - "''SiN Low Stress 250C-new May 2024''"		*[https://docs.google.com/spreadsheets/d/1xchMuXlPABSKcW-rMau8B-cw_jnJnwI9qpXqDLUQ8sU/edit?gid=1239658204#gid=1239658204 Low Stress Si<sub>3</sub>N<sub>4</sub><nowiki> [ICP-PECVD] - Standard Recipe</nowiki>] - "''SiN Low Stress 250C-new May 2024''"
	*[https://docs.google.com/spreadsheets/d/1CuDMKFTTzGLL6CP-FEI_9cOnUaIw-432ppDFssB59wY/edit#gid=1517031044 Low Stress Si<sub>3</sub>N<sub>4</sub><nowiki> [ICP-PECVD] - Current Process Control Data</nowiki>]		*[https://docs.google.com/spreadsheets/d/1CuDMKFTTzGLL6CP-FEI_9cOnUaIw-432ppDFssB59wY/edit#gid=1517031044 Low Stress Si<sub>3</sub>N<sub>4</sub><nowiki> [ICP-PECVD] - Current Process Control Data</nowiki>]
			**Lists film data, such as dep rate, stress, particle count, refractive index etc.

	=== Old Data ===		=== Old Data ===

John d: /* Si3N4 [ICP-PECVD] */ fixed old SiN recipe link

2025-03-17T21:09:36Z

Si3N4 [ICP-PECVD]: fixed old SiN recipe link

← Older revision		Revision as of 21:09, 17 March 2025
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	=== Old Data ===		=== Old Data ===
	*[https://docs.google.com/spreadsheets/d/~~1MffAE2S-Sga0o4botssPMi_P8C2ghxw4XiHwTnOn95Q~~/edit~~#gid~~=~~1111781219~~ Si<sub>3</sub>N<sub>4</sub><nowiki> [ICP-PECVD] - Standard Recipe</nowiki>] - "''SiN 250C- replaced on May 2024''"		*[https://docs.google.com/spreadsheets/d/1Np5uJ1bw81MxHlDD0qs5Jh_hj7nCSznQTsSEELlT414/edit?usp=sharing Si<sub>3</sub>N<sub>4</sub><nowiki> [ICP-PECVD] - Standard Recipe</nowiki>] - "''SiN 250C- replaced on May 2024''"

	*[https://docs.google.com/spreadsheets/d/1VrgS0cB2OcdZVTCnDAesgQCLRaAgEB_Iajc_OrhXOo0/edit#gid=1199123007 Old Recipe] - 2019		*[https://docs.google.com/spreadsheets/d/1VrgS0cB2OcdZVTCnDAesgQCLRaAgEB_Iajc_OrhXOo0/edit#gid=1199123007 Old Recipe] - 2019