Plasma Activation (EVG 810) - Revision history

John d: /* Examples */ added more description of the example process

2024-10-24T17:18:31Z

Examples: added more description of the example process

← Older revision		Revision as of 17:18, 24 October 2024
Line 33:		Line 33:
	== Examples ==		== Examples ==
	"Spontaneous" SiO2-SiO2 bonding between a fused-silica SiO2 wafer and Thermally-oxidize Silicon wafer:		"Spontaneous" SiO2-SiO2 bonding between a fused-silica SiO2 wafer and Thermally-oxidize Silicon wafer:
	[[File:Spontaneous Wafer Bond Glass to Silicon - Demis D John.png\|alt=Photo of bonded wafers\|none\|thumb\|100mm Fused Silica wafer with 0.5mm fluidic through-wafer vias (top) bonded to Thermally-oxidized Silicon wafer with etched microfluidic channels (bottom). ''[[Demis D. John]] 2021-01'']]		[[File:Spontaneous Wafer Bond Glass to Silicon - Demis D John.png\|alt=Photo of bonded wafers\|none\|thumb\|100mm Fused Silica wafer with 0.5mm fluidic through-wafer vias (top) bonded to Thermally-oxidized Silicon wafer with etched microfluidic channels (bottom). ''[[Demis D. John]] 2021-01'']]Note the pre-bonding wafer-cleaning process is critical. Each "rainbow" in the above indicates a "particle" trapped between the wafer surfaces, particle thickness corresponds to lateral debonded radius. This example was aligned by hand after EVG O2 activation, no anneal performed afterward. Processing developed, performed and photographed by [[Demis D. John]].

John d: added wafer bond example.

2024-10-24T17:15:08Z

added wafer bond example.

← Older revision		Revision as of 17:15, 24 October 2024
Line 30:		Line 30:
	==Recipes==		==Recipes==
	Please see the [[Oxygen Plasma System Recipes#Plasma Activation .28EVG 810.29\|Oxygen Plasma Recipe]] page for standard EVG recipes.		Please see the [[Oxygen Plasma System Recipes#Plasma Activation .28EVG 810.29\|Oxygen Plasma Recipe]] page for standard EVG recipes.

			== Examples ==
			"Spontaneous" SiO2-SiO2 bonding between a fused-silica SiO2 wafer and Thermally-oxidize Silicon wafer:
			[[File:Spontaneous Wafer Bond Glass to Silicon - Demis D John.png\|alt=Photo of bonded wafers\|none\|thumb\|100mm Fused Silica wafer with 0.5mm fluidic through-wafer vias (top) bonded to Thermally-oxidized Silicon wafer with etched microfluidic channels (bottom). ''[[Demis D. John]] 2021-01'']]

John d: note on "no PR"

2024-10-24T16:34:37Z

note on "no PR"

← Older revision		Revision as of 16:34, 24 October 2024
Line 14:		Line 14:
	==About==		==About==
	This a capacitively coupled Oxygen plasma activation system used exclusively for the surface activation of clean surfaces prior to wafer bonding. This technique allows bonding temperatures to be lowered and is used as a companion tool to the Karl-Suss SB6 wafer bond tool.		This a capacitively coupled Oxygen plasma activation system used exclusively for the surface activation of clean surfaces prior to wafer bonding. This technique allows bonding temperatures to be lowered and is used as a companion tool to the Karl-Suss SB6 wafer bond tool.
			'''No etching nor photoresist is allowed in this tool!'''
			'''It is for "clean" bonding activation only, <u>not</u> plasma etching.'''

	==Detailed Specifications==		==Detailed Specifications==

Sawyer l: SOP rev

2023-10-30T18:06:45Z

SOP rev

← Older revision		Revision as of 18:06, 30 October 2023
Line 23:		Line 23:
	==Documentation==		==Documentation==

	*[https://wiki.~~nanotech~~.ucsb.edu/w/images/c/c0/~~EVG_Plasma_Activation_SOP_Rev_D~~.pdf Plasma Activation Standard Operating Procedure]		*[https://wiki.nanofab.ucsb.edu/w/images/2/21/EVG_Plasma_Activation_SOP_Rev_E.pdf Plasma Activation Standard Operating Procedure]
	*[https://wiki.nanotech.ucsb.edu/wiki/images/9/93/EVG_Plasma_Activation_Recipe_Copying.pdf How to copy recipes]		*[https://wiki.nanotech.ucsb.edu/wiki/images/9/93/EVG_Plasma_Activation_Recipe_Copying.pdf How to copy recipes]

Sawyer l: Updated SOP

2022-09-15T19:06:49Z

Updated SOP

← Older revision		Revision as of 19:06, 15 September 2022
Line 23:		Line 23:
	==Documentation==		==Documentation==

	*[https://wiki.nanotech.ucsb.edu/w/images/3/37/~~EVG_Plasma_Activation_SOP_Rev_C~~.pdf Plasma Activation Standard Operating Procedure]		*[https://wiki.nanotech.ucsb.edu/w/images/c/c0/EVG_Plasma_Activation_SOP_Rev_D.pdf Plasma Activation Standard Operating Procedure]
	*[https://wiki.nanotech.ucsb.edu/wiki/images/9/93/EVG_Plasma_Activation_Recipe_Copying.pdf How to copy recipes]		*[https://wiki.nanotech.ucsb.edu/wiki/images/9/93/EVG_Plasma_Activation_Recipe_Copying.pdf How to copy recipes]

Silva at 17:54, 30 August 2022

2022-08-30T17:54:24Z

← Older revision		Revision as of 17:54, 30 August 2022
Line 1:		Line 1:
	{{~~tool~~\|{{PAGENAME}}		{{tool2\|{{PAGENAME}}
	\|picture=EVG.jpg		\|picture=EVG.jpg
	\|type = Dry Etch		\|type = Dry Etch
	\|super= Lee Sawyer		\|super= Lee Sawyer
			\|super2= Aidan Hopkins
	\|phone= 805-893-2123		\|phone= 805-893-2123
	\|location=Bay 7		\|location=Bay 7

Sawyer l: SOP update

2022-01-03T17:25:08Z

SOP update

← Older revision		Revision as of 17:25, 3 January 2022
Line 18:		Line 18:
	*Gases used: O<sub>2</sub> and N<sub>2</sub>		*Gases used: O<sub>2</sub> and N<sub>2</sub>
	*Sample size: pieces to 6” wafer		*Sample size: pieces to 6” wafer
	*Max power: 200W
	*Recipes characterized for substrate thicknesses between 250um and 750um. Thicknesses outside of this range need to have parameters optimized to minimize reflective power.		*Recipes characterized for substrate thicknesses between 250um and 750um. Thicknesses outside of this range need to have parameters optimized to minimize reflective power.

	==Documentation==		==Documentation==

	*[https://wiki.nanotech.ucsb.edu/~~wiki~~/images/8/82/~~EVG_Plasma_Activation_SOP_Rev_B~~.pdf Plasma Activation Standard Operating Procedure]		*[https://wiki.nanotech.ucsb.edu/w/images/3/37/EVG_Plasma_Activation_SOP_Rev_C.pdf Plasma Activation Standard Operating Procedure]
	*[https://wiki.nanotech.ucsb.edu/wiki/images/9/93/EVG_Plasma_Activation_Recipe_Copying.pdf How to copy recipes]		*[https://wiki.nanotech.ucsb.edu/wiki/images/9/93/EVG_Plasma_Activation_Recipe_Copying.pdf How to copy recipes]

Jcrode: Text replacement - "www.nanotech.ucsb.edu/wiki/" to "wiki.nanotech.ucsb.edu/wiki/"

2020-04-07T01:32:41Z

Text replacement - "www.nanotech.ucsb.edu/wiki/" to "wiki.nanotech.ucsb.edu/wiki/"

← Older revision		Revision as of 01:32, 7 April 2020
Line 23:		Line 23:
	==Documentation==		==Documentation==

	*[https://~~www~~.nanotech.ucsb.edu/wiki/images/8/82/EVG_Plasma_Activation_SOP_Rev_B.pdf Plasma Activation Standard Operating Procedure]		*[https://wiki.nanotech.ucsb.edu/wiki/images/8/82/EVG_Plasma_Activation_SOP_Rev_B.pdf Plasma Activation Standard Operating Procedure]
	*[https://~~www~~.nanotech.ucsb.edu/wiki/images/9/93/EVG_Plasma_Activation_Recipe_Copying.pdf How to copy recipes]		*[https://wiki.nanotech.ucsb.edu/wiki/images/9/93/EVG_Plasma_Activation_Recipe_Copying.pdf How to copy recipes]

	==Recipes==		==Recipes==

Sawyer l at 21:16, 9 October 2019

2019-10-09T21:16:12Z

← Older revision		Revision as of 21:16, 9 October 2019
Line 24:		Line 24:

	*[https://www.nanotech.ucsb.edu/wiki/images/8/82/EVG_Plasma_Activation_SOP_Rev_B.pdf Plasma Activation Standard Operating Procedure]		*[https://www.nanotech.ucsb.edu/wiki/images/8/82/EVG_Plasma_Activation_SOP_Rev_B.pdf Plasma Activation Standard Operating Procedure]
			*[https://www.nanotech.ucsb.edu/wiki/images/9/93/EVG_Plasma_Activation_Recipe_Copying.pdf How to copy recipes]
	*How to copy recipes

	==Recipes==		==Recipes==

Sawyer l: updated SOP & added recipe editing SOP

2019-10-09T21:15:07Z

updated SOP & added recipe editing SOP

← Older revision		Revision as of 21:15, 9 October 2019
Line 23:		Line 23:
	==Documentation==		==Documentation==

	*[https://~~signupmonkey~~.~~ece~~.ucsb.edu/wiki/images/3/35/~~EVG_Plasma_Activation_SOP~~.pdf Plasma Activation Standard Operating Procedure]		*[https://www.nanotech.ucsb.edu/wiki/images/8/82/EVG_Plasma_Activation_SOP_Rev_B.pdf Plasma Activation Standard Operating Procedure]
			*How to copy recipes

	== Recipes ==		==Recipes==
	Please see the [[Oxygen Plasma System Recipes#Plasma Activation .28EVG 810.29\|Oxygen Plasma Recipe]] page for standard EVG recipes.		Please see the [[Oxygen Plasma System Recipes#Plasma Activation .28EVG 810.29\|Oxygen Plasma Recipe]] page for standard EVG recipes.