Process Group - Process Control Data - Revision history

John d: /* Ion Beam Sputter Deposition (Veeco Nexus) - Process Control */ fixed old data link

2026-09-21T19:44:35Z

Ion Beam Sputter Deposition (Veeco Nexus) - Process Control: fixed old data link

← Older revision		Revision as of 19:44, 21 September 2026
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	Old data in a different format can be found below:		Old data in a different format can be found below:

	*[[Old Deposition Data - 2021-12-15]]		*[[Old Deposition Data - 2021-12-15#Ion Beam Deposition (Veeco NEXUS)\|Old Deposition Data - 2021-12-15]]

John d: /* Si Etching (FL-ICP Process Control) */

2026-08-31T17:42:10Z

Si Etching (FL-ICP Process Control)

← Older revision		Revision as of 17:42, 31 August 2026
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	=== Si Etching (FL-ICP Process Control) ===		=== Si Etching (FL-ICP Process Control) ===
	''This Si etch is much more sensitive to chamber condition, allowing us to detect ~~chamber~~ ~~contamination~~ faster.''		''This Si etch is much more sensitive to chamber condition, allowing us to detect tool issues faster.''

	*'''Recipe: [[ICP Etching Recipes#Si Etch Recipes (Fluorine ICP Etcher)\|SiVertHFv2]]''' - C<sub>4</sub>F<sub>8</sub>/SF<sub>6</sub>/CF<sub>4</sub> etch of 100mm Silicon Wafer with ~50% open area and resist mask		*'''Recipe: [[ICP Etching Recipes#Si Etch Recipes (Fluorine ICP Etcher)\|SiVertHFv2]]''' - C<sub>4</sub>F<sub>8</sub>/SF<sub>6</sub>/CF<sub>4</sub> etch of 100mm Silicon Wafer with ~50% open area and resist mask

John d: /* Maskless Aligner (Heidelberg MLA150) - Process Control */ added by SEM

2026-08-11T17:48:47Z

Maskless Aligner (Heidelberg MLA150) - Process Control: added by SEM

← Older revision		Revision as of 17:48, 11 August 2026
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	== Maskless Aligner (Heidelberg MLA150) - Process Control ==		== Maskless Aligner (Heidelberg MLA150) - Process Control ==

	* ''The Process Group measures the smallest "clean" line-space pitch at different locations on the wafer, and calls this the "best resolution" for that region of the wafer.'' ''Measured with 0.25µm steps.''		* ''The Process Group measures the smallest "clean" line-space pitch (by SEM) at different locations on the wafer, and calls this the "best resolution" for that region of the wafer.'' ''Measured with 0.25µm steps.''
	* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?usp=drive_link '''Data sheet'''], listing measured values, includes links to travelers & SEM's etc.		* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?usp=drive_link '''Data sheet'''], listing measured values, includes links to travelers & SEM's etc.
	* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?gid=167054213#gid=167054213 '''Plots''' of "best" resolution across wafer] - chart of resolution vs. time		* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?gid=167054213#gid=167054213 '''Plots''' of "best" resolution across wafer] - chart of resolution vs. time

John d: /* Maskless Aligner (Heidelberg MLA150) - Process Control */ updated best res definition

2026-08-11T17:43:05Z

Maskless Aligner (Heidelberg MLA150) - Process Control: updated best res definition

← Older revision		Revision as of 17:43, 11 August 2026
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	== Maskless Aligner (Heidelberg MLA150) - Process Control ==		== Maskless Aligner (Heidelberg MLA150) - Process Control ==

	* ''The Process Group measures the smallest "clean" line-space pitch at different locations on the wafer.'' ''Measured with 0.25µm steps.''		* ''The Process Group measures the smallest "clean" line-space pitch at different locations on the wafer, and calls this the "best resolution" for that region of the wafer.'' ''Measured with 0.25µm steps.''
	* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?usp=drive_link '''Data sheet'''], listing measured values, includes links to travelers & SEM's etc.		* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?usp=drive_link '''Data sheet'''], listing measured values, includes links to travelers & SEM's etc.
	* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?gid=167054213#gid=167054213 '''Plots''' of "best" resolution across wafer] - chart of resolution vs. time		* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?gid=167054213#gid=167054213 '''Plots''' of "best" resolution across wafer] - chart of resolution vs. time

John d at 16:51, 11 August 2026

2026-08-11T16:51:18Z

← Older revision		Revision as of 16:51, 11 August 2026
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	\|}		\|}

	== ~~MLA~~ ~~150~~ (Heidelberg) - ~~Proces~~ Control ==		== Maskless Aligner (Heidelberg MLA150) - Process Control ==

	* ''The Process Group measures the smallest "clean" line-space pitch at different locations on the wafer.'' ''Measured with 0.25µm steps.''		* ''The Process Group measures the smallest "clean" line-space pitch at different locations on the wafer.'' ''Measured with 0.25µm steps.''
	* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?usp=drive_link Data sheet], ~~including~~ links to travelers etc.		* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?usp=drive_link '''Data sheet'''], listing measured values, includes links to travelers & SEM's etc.
	* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?gid=167054213#gid=167054213 Plots of "best" resolution across wafer]		* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?gid=167054213#gid=167054213 '''Plots''' of "best" resolution across wafer] - chart of resolution vs. time

	[[File:MLA LithoCal Chart screenshot.png\|alt=MLA LithoCal Chart screenshot\|none\|thumb\|Example SPC Charts for MLA LithoCal "best" resolution. ]]		[[File:MLA LithoCal Chart screenshot.png\|alt=MLA LithoCal Chart screenshot\|none\|thumb\|Example SPC Charts for MLA LithoCal "best" resolution. ]]

John d: added MLA lithocals to wiki

2026-08-11T16:49:40Z

added MLA lithocals to wiki

← Older revision		Revision as of 16:49, 11 August 2026
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	\|[[File:ASML CD Cals - Example Plot.jpg\|alt=ASML CD Calibration Data - Screenshot of SPC Plot\|none\|thumb\|''Example SPC Chart - Measured Critical Dimension "CD" versus Date. [https://docs.google.com/spreadsheets/d/1xW1TFH_QjPMWl9T1jiKzwmYe4B2wg7KY-nqOKUoXttI/edit#gid=1804752281 Click for charts.]''\|link=https://docs.google.com/spreadsheets/d/1xW1TFH_QjPMWl9T1jiKzwmYe4B2wg7KY-nqOKUoXttI/edit#gid=1804752281]]		\|[[File:ASML CD Cals - Example Plot.jpg\|alt=ASML CD Calibration Data - Screenshot of SPC Plot\|none\|thumb\|''Example SPC Chart - Measured Critical Dimension "CD" versus Date. [https://docs.google.com/spreadsheets/d/1xW1TFH_QjPMWl9T1jiKzwmYe4B2wg7KY-nqOKUoXttI/edit#gid=1804752281 Click for charts.]''\|link=https://docs.google.com/spreadsheets/d/1xW1TFH_QjPMWl9T1jiKzwmYe4B2wg7KY-nqOKUoXttI/edit#gid=1804752281]]
	\|}		\|}

			== MLA 150 (Heidelberg) - Proces Control ==

			* ''The Process Group measures the smallest "clean" line-space pitch at different locations on the wafer.'' ''Measured with 0.25µm steps.''
			* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?usp=drive_link Data sheet], including links to travelers etc.
			* [https://docs.google.com/spreadsheets/d/1DbvFFNYeKeS1hG0Hnd-vCQs8CfqnMj2ABdjUv3lyssg/edit?gid=167054213#gid=167054213 Plots of "best" resolution across wafer]

			[[File:MLA LithoCal Chart screenshot.png\|alt=MLA LithoCal Chart screenshot\|none\|thumb\|Example SPC Charts for MLA LithoCal "best" resolution. ]]
			:

John d: disabled links on example plot images via `|link=`

2026-02-12T01:45:44Z

disabled links on example plot images via `|link=`

← Older revision		Revision as of 01:45, 12 February 2026
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	Data are collected by our [https://nanofab.ucsb.edu/workforce#internships Process Group Interns] and reviewed by [[Staff List#Process Group\|Process Group Staff]].		Data are collected by our [https://nanofab.ucsb.edu/workforce#internships Process Group Interns] and reviewed by [[Staff List#Process Group\|Process Group Staff]].
	=Deposition, Dielectric (Process Control Data)=		=Deposition, Dielectric (Process Control Data)=
	[[File:PECVD SPC Chart Example.png\|alt=SPC chart example\|thumb\|228x228px\|Example Process Control Charts (SPC) for thin-film DepCals.]]		[[File:PECVD SPC Chart Example.png\|alt=SPC chart example\|thumb\|228x228px\|Example Process Control Charts (SPC) for thin-film DepCals.\|link=]]
	[[File:Surfscan 230113A7G2 after low particles.jpg\|alt=screenshot of surfscan particle count\|thumb\|205x205px\|Example particle counts taken on each tool+film.]]		[[File:Surfscan 230113A7G2 after low particles.jpg\|alt=screenshot of surfscan particle count\|thumb\|205x205px\|Example particle counts taken on each tool+film.\|link=]]
	[[File:PECVD1 SiO2 F50 WaferMap example.jpg\|alt=Screenshot of Filmetrics F50 wafermap of typical DepCals film\|thumb\|215x215px\|Example of DepCals Thickness/Refractive Index uniformity measurement (4% shown here).]]		[[File:PECVD1 SiO2 F50 WaferMap example.jpg\|alt=Screenshot of Filmetrics F50 wafermap of typical DepCals film\|thumb\|215x215px\|Example of DepCals Thickness/Refractive Index uniformity measurement (4% shown here).\|link=]]
	''Process Control data for various deposition tools in the lab.''		''Process Control data for various deposition tools in the lab.''

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	[[File:Process Control - Sputter 5 Titanium Sheet Resistance plot.png\|alt=Screenshot of Sputter 5 Titanium Sheet Resistance process control chart\|thumb\|Sputter 5 Titanium - Sheet Resistance - Process Control Chart - '''Example''' data only.		[[File:Process Control - Sputter 5 Titanium Sheet Resistance plot.png\|alt=Screenshot of Sputter 5 Titanium Sheet Resistance process control chart\|thumb\|Sputter 5 Titanium - Sheet Resistance - Process Control Chart - '''Example''' data only.

	← click a link for live data.]]		← click a link for live data.\|link=]]

	=== Sputter 5: Ti ===		=== Sputter 5: Ti ===
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	[[File:Process Control - E-Beam 4 Titanium Stress plot.png\|alt=Screenshot of E-Beam 4 Titanium Stress - process control chart\|thumb\|E-Beam 4 Titanium Stress - Process Control Chart. '''Example''' data only -		[[File:Process Control - E-Beam 4 Titanium Stress plot.png\|alt=Screenshot of E-Beam 4 Titanium Stress - process control chart\|thumb\|E-Beam 4 Titanium Stress - Process Control Chart. '''Example''' data only -

	← click a link for live data.]]		← click a link for live data.\|link=]]

	=== E-Beam 4: Ti ===		=== E-Beam 4: Ti ===

John d: /* Sputter 5 (AJA ATC 2200-V) - Process Control */ added sputter and EBeam4 example SPC chart screenshots

2026-02-12T01:41:10Z

Sputter 5 (AJA ATC 2200-V) - Process Control: added sputter and EBeam4 example SPC chart screenshots

← Older revision		Revision as of 01:41, 12 February 2026
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	== [[Sputter 5 (AJA ATC 2200-V)]] - Process Control ==		== [[Sputter 5 (AJA ATC 2200-V)]] - Process Control ==
			[[File:Process Control - Sputter 5 Titanium Sheet Resistance plot.png\|alt=Screenshot of Sputter 5 Titanium Sheet Resistance process control chart\|thumb\|Sputter 5 Titanium - Sheet Resistance - Process Control Chart - '''Example''' data only.

			← click a link for live data.]]

	=== Sputter 5: Ti ===		=== Sputter 5: Ti ===
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	== [[E-Beam 4 (CHA)]] - Process Control ==		== [[E-Beam 4 (CHA)]] - Process Control ==
			[[File:Process Control - E-Beam 4 Titanium Stress plot.png\|alt=Screenshot of E-Beam 4 Titanium Stress - process control chart\|thumb\|E-Beam 4 Titanium Stress - Process Control Chart. '''Example''' data only -

			← click a link for live data.]]

	=== E-Beam 4: Ti ===		=== E-Beam 4: Ti ===

Noahdutra: /* Unaxis VLR Etch - Process Control */

2025-09-25T21:35:12Z

Unaxis VLR Etch - Process Control

← Older revision		Revision as of 21:35, 25 September 2025
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	==[[ICP Etching Recipes#Process Control Data .28Unaxis VLR.29\|Unaxis VLR Etch]] - Process Control==		==[[ICP Etching Recipes#Process Control Data .28Unaxis VLR.29\|Unaxis VLR Etch]] - Process Control==

	*[[Unaxis VLR Etch - Process Control Data\|InP Etching with Cl<sub>2</sub>/~~N<sub>2<~~/~~sub>~~ @ 200°C - Unaxis Etch]]		*[[Unaxis VLR Etch - Process Control Data\|InP Etching with Cl<sub>2</sub>/H/Ar @ 200°C - Unaxis Etch]]

	==[[ICP Etching Recipes#Process Control Data .28Oxford ICP Etcher.29\|Oxford PlasmaPro Cobra Etcher]] - Process Control==		==[[ICP Etching Recipes#Process Control Data .28Oxford ICP Etcher.29\|Oxford PlasmaPro Cobra Etcher]] - Process Control==

Noahdutra: /* Sputter 5: Ti */ corrected Sputter 5 plots link

2025-08-21T17:49:05Z

Sputter 5: Ti: corrected Sputter 5 plots link

← Older revision		Revision as of 17:49, 21 August 2025
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	=== Sputter 5: Ti ===		=== Sputter 5: Ti ===
	*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=695635057#gid=695635057 Titanium Datasheet]		*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=695635057#gid=695635057 Titanium Datasheet]
	*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=~~1902953136~~#gid=~~1902953136~~ Titanium Plots]		*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=1766775909#gid=1766775909 Titanium Plots]

	=== Sputter 5: Al ===		=== Sputter 5: Al ===
	*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=0#gid=0 Aluminum Datasheet]		*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=0#gid=0 Aluminum Datasheet]
	*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=~~70762763~~#gid=~~70762763~~ Aluminum Plots]		*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=1766775909#gid=1766775909 Aluminum Plots]

	=== Sputter 5: Cr ===		=== Sputter 5: Cr ===
	*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=572205583#gid=572205583 Chromium Datasheet]		*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=572205583#gid=572205583 Chromium Datasheet]
	*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=~~1836018057~~#gid=~~1836018057~~ Chromium Plots]		*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=1766775909#gid=1766775909 Chromium Plots]

	== [[E-Beam 4 (CHA)]] - Process Control ==		== [[E-Beam 4 (CHA)]] - Process Control ==

← Older revision		Revision as of 21:35, 25 September 2025
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	==[[ICP Etching Recipes#Process Control Data .28Unaxis VLR.29\|Unaxis VLR Etch]] - Process Control==		==[[ICP Etching Recipes#Process Control Data .28Unaxis VLR.29\|Unaxis VLR Etch]] - Process Control==

	*[[Unaxis VLR Etch - Process Control Data\|InP Etching with Cl<sub>2</sub>/~~N<sub>2<~~/~~sub>~~ @ 200°C - Unaxis Etch]]		*[[Unaxis VLR Etch - Process Control Data\|InP Etching with Cl<sub>2</sub>/H/Ar @ 200°C - Unaxis Etch]]

	==[[ICP Etching Recipes#Process Control Data .28Oxford ICP Etcher.29\|Oxford PlasmaPro Cobra Etcher]] - Process Control==		==[[ICP Etching Recipes#Process Control Data .28Oxford ICP Etcher.29\|Oxford PlasmaPro Cobra Etcher]] - Process Control==