Process Group - Process Control Data - Revision history

John d: disabled links on example plot images via `|link=`

2026-02-12T01:45:44Z

disabled links on example plot images via `|link=`

← Older revision		Revision as of 01:45, 12 February 2026
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	Data are collected by our [https://nanofab.ucsb.edu/workforce#internships Process Group Interns] and reviewed by [[Staff List#Process Group\|Process Group Staff]].		Data are collected by our [https://nanofab.ucsb.edu/workforce#internships Process Group Interns] and reviewed by [[Staff List#Process Group\|Process Group Staff]].
	=Deposition, Dielectric (Process Control Data)=		=Deposition, Dielectric (Process Control Data)=
	[[File:PECVD SPC Chart Example.png\|alt=SPC chart example\|thumb\|228x228px\|Example Process Control Charts (SPC) for thin-film DepCals.]]		[[File:PECVD SPC Chart Example.png\|alt=SPC chart example\|thumb\|228x228px\|Example Process Control Charts (SPC) for thin-film DepCals.\|link=]]
	[[File:Surfscan 230113A7G2 after low particles.jpg\|alt=screenshot of surfscan particle count\|thumb\|205x205px\|Example particle counts taken on each tool+film.]]		[[File:Surfscan 230113A7G2 after low particles.jpg\|alt=screenshot of surfscan particle count\|thumb\|205x205px\|Example particle counts taken on each tool+film.\|link=]]
	[[File:PECVD1 SiO2 F50 WaferMap example.jpg\|alt=Screenshot of Filmetrics F50 wafermap of typical DepCals film\|thumb\|215x215px\|Example of DepCals Thickness/Refractive Index uniformity measurement (4% shown here).]]		[[File:PECVD1 SiO2 F50 WaferMap example.jpg\|alt=Screenshot of Filmetrics F50 wafermap of typical DepCals film\|thumb\|215x215px\|Example of DepCals Thickness/Refractive Index uniformity measurement (4% shown here).\|link=]]
	''Process Control data for various deposition tools in the lab.''		''Process Control data for various deposition tools in the lab.''

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	[[File:Process Control - Sputter 5 Titanium Sheet Resistance plot.png\|alt=Screenshot of Sputter 5 Titanium Sheet Resistance process control chart\|thumb\|Sputter 5 Titanium - Sheet Resistance - Process Control Chart - '''Example''' data only.		[[File:Process Control - Sputter 5 Titanium Sheet Resistance plot.png\|alt=Screenshot of Sputter 5 Titanium Sheet Resistance process control chart\|thumb\|Sputter 5 Titanium - Sheet Resistance - Process Control Chart - '''Example''' data only.

	← click a link for live data.]]		← click a link for live data.\|link=]]

	=== Sputter 5: Ti ===		=== Sputter 5: Ti ===
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	[[File:Process Control - E-Beam 4 Titanium Stress plot.png\|alt=Screenshot of E-Beam 4 Titanium Stress - process control chart\|thumb\|E-Beam 4 Titanium Stress - Process Control Chart. '''Example''' data only -		[[File:Process Control - E-Beam 4 Titanium Stress plot.png\|alt=Screenshot of E-Beam 4 Titanium Stress - process control chart\|thumb\|E-Beam 4 Titanium Stress - Process Control Chart. '''Example''' data only -

	← click a link for live data.]]		← click a link for live data.\|link=]]

	=== E-Beam 4: Ti ===		=== E-Beam 4: Ti ===

John d: /* Sputter 5 (AJA ATC 2200-V) - Process Control */ added sputter and EBeam4 example SPC chart screenshots

2026-02-12T01:41:10Z

Sputter 5 (AJA ATC 2200-V) - Process Control: added sputter and EBeam4 example SPC chart screenshots

← Older revision		Revision as of 01:41, 12 February 2026
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	== [[Sputter 5 (AJA ATC 2200-V)]] - Process Control ==		== [[Sputter 5 (AJA ATC 2200-V)]] - Process Control ==
			[[File:Process Control - Sputter 5 Titanium Sheet Resistance plot.png\|alt=Screenshot of Sputter 5 Titanium Sheet Resistance process control chart\|thumb\|Sputter 5 Titanium - Sheet Resistance - Process Control Chart - '''Example''' data only.

			← click a link for live data.]]

	=== Sputter 5: Ti ===		=== Sputter 5: Ti ===
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	== [[E-Beam 4 (CHA)]] - Process Control ==		== [[E-Beam 4 (CHA)]] - Process Control ==
			[[File:Process Control - E-Beam 4 Titanium Stress plot.png\|alt=Screenshot of E-Beam 4 Titanium Stress - process control chart\|thumb\|E-Beam 4 Titanium Stress - Process Control Chart. '''Example''' data only -

			← click a link for live data.]]

	=== E-Beam 4: Ti ===		=== E-Beam 4: Ti ===

Noahdutra: /* Unaxis VLR Etch - Process Control */

2025-09-25T21:35:12Z

Unaxis VLR Etch - Process Control

← Older revision		Revision as of 21:35, 25 September 2025
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	==[[ICP Etching Recipes#Process Control Data .28Unaxis VLR.29\|Unaxis VLR Etch]] - Process Control==		==[[ICP Etching Recipes#Process Control Data .28Unaxis VLR.29\|Unaxis VLR Etch]] - Process Control==

	*[[Unaxis VLR Etch - Process Control Data\|InP Etching with Cl<sub>2</sub>/~~N<sub>2<~~/~~sub>~~ @ 200°C - Unaxis Etch]]		*[[Unaxis VLR Etch - Process Control Data\|InP Etching with Cl<sub>2</sub>/H/Ar @ 200°C - Unaxis Etch]]

	==[[ICP Etching Recipes#Process Control Data .28Oxford ICP Etcher.29\|Oxford PlasmaPro Cobra Etcher]] - Process Control==		==[[ICP Etching Recipes#Process Control Data .28Oxford ICP Etcher.29\|Oxford PlasmaPro Cobra Etcher]] - Process Control==

Noahdutra: /* Sputter 5: Ti */ corrected Sputter 5 plots link

2025-08-21T17:49:05Z

Sputter 5: Ti: corrected Sputter 5 plots link

← Older revision		Revision as of 17:49, 21 August 2025
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	=== Sputter 5: Ti ===		=== Sputter 5: Ti ===
	*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=695635057#gid=695635057 Titanium Datasheet]		*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=695635057#gid=695635057 Titanium Datasheet]
	*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=~~1902953136~~#gid=~~1902953136~~ Titanium Plots]		*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=1766775909#gid=1766775909 Titanium Plots]

	=== Sputter 5: Al ===		=== Sputter 5: Al ===
	*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=0#gid=0 Aluminum Datasheet]		*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=0#gid=0 Aluminum Datasheet]
	*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=~~70762763~~#gid=~~70762763~~ Aluminum Plots]		*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=1766775909#gid=1766775909 Aluminum Plots]

	=== Sputter 5: Cr ===		=== Sputter 5: Cr ===
	*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=572205583#gid=572205583 Chromium Datasheet]		*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=572205583#gid=572205583 Chromium Datasheet]
	*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=~~1836018057~~#gid=~~1836018057~~ Chromium Plots]		*[https://docs.google.com/spreadsheets/d/1HiEBTkZdtZmgdtSs619Tnkn-nbCi8BPW9oZYVybjgt4/edit?gid=1766775909#gid=1766775909 Chromium Plots]

	== [[E-Beam 4 (CHA)]] - Process Control ==		== [[E-Beam 4 (CHA)]] - Process Control ==

Noahdutra: Added sputter 5 control data

2025-08-21T17:47:22Z

Added sputter 5 control data

@@ Line 53: / Line 53: @@
 <hr style="height:5px">
 =Deposition, Metal - Process Control Data=
-''Process Control data for various Metal evaporators in the lab.''
+''Process Control data for various deposition tools in the lab.''
 == [[E-Beam 4 (CHA)]] - Process Control ==

Noahdutra: /* GaAs Etch with N2/Cl2 - Process Control Data (Panasonic 2) */ error happened last time

2025-08-14T17:27:28Z

GaAs Etch with N2/Cl2 - Process Control Data (Panasonic 2): error happened last time

← Older revision		Revision as of 17:27, 14 August 2025
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	* [https://docs.google.com/spreadsheets/d/16gHOO3PQn_LinrXGPeSTSBf5dnw3leSLh1gq0PLr43w/edit?gid=0#gid=0 GaAs Etch with N2/Cl2 - '''Etch Data''']		* [https://docs.google.com/spreadsheets/d/16gHOO3PQn_LinrXGPeSTSBf5dnw3leSLh1gq0PLr43w/edit?gid=0#gid=0 GaAs Etch with N2/Cl2 - '''Etch Data''']
	* [https://docs.google.com/spreadsheets/d/16gHOO3PQn_LinrXGPeSTSBf5dnw3leSLh1gq0PLr43w/edit?gid=1804752281#gid=1804752281 GaAs Etch with N2/Cl2 - '''Plots'''][[~~/wiki/~~File:GaAs_Etch_ICP2_SPC.png\|link=https://docs.google.com/spreadsheets/d/16gHOO3PQn_LinrXGPeSTSBf5dnw3leSLh1gq0PLr43w/edit?gid=1804752281#gid=1804752281\|alt=example ICP2 process control chart\|none\|thumb\|249x249px\|[https://docs.google.com/spreadsheets/d/16gHOO3PQn_LinrXGPeSTSBf5dnw3leSLh1gq0PLr43w/edit?gid=1804752281#gid=1804752281 Click for Process Control Charts]]]		* [https://docs.google.com/spreadsheets/d/16gHOO3PQn_LinrXGPeSTSBf5dnw3leSLh1gq0PLr43w/edit?gid=1804752281#gid=1804752281 GaAs Etch with N2/Cl2 - '''Plots'''][[File:GaAs_Etch_ICP2_SPC.png\|link=https://docs.google.com/spreadsheets/d/16gHOO3PQn_LinrXGPeSTSBf5dnw3leSLh1gq0PLr43w/edit?gid=1804752281#gid=1804752281\|alt=example ICP2 process control chart\|none\|thumb\|249x249px\|[https://docs.google.com/spreadsheets/d/16gHOO3PQn_LinrXGPeSTSBf5dnw3leSLh1gq0PLr43w/edit?gid=1804752281#gid=1804752281 Click for Process Control Charts]]]

	=== SiO<sub>2</sub> Etch with CHF<sub>3</sub>/CF<sub>4</sub> - Process Control Data (Panasonic 2) ===		=== SiO<sub>2</sub> Etch with CHF<sub>3</sub>/CF<sub>4</sub> - Process Control Data (Panasonic 2) ===

Noahdutra: /* Panasonic ICP#2 - Process Control */ added ICP2 GaAs to Process control

2025-08-14T17:26:33Z

Panasonic ICP#2 - Process Control: added ICP2 GaAs to Process control

← Older revision		Revision as of 17:26, 14 August 2025
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	*[[Test Data of etching SiO2 with CHF3/CF4-ICP1\|SiO<sub>2</sub> Etch with CHF<sub>3</sub>/CF<sub>4</sub> (Panasonic 1)]] - ''No data prior to 2023-01-20''		*[[Test Data of etching SiO2 with CHF3/CF4-ICP1\|SiO<sub>2</sub> Etch with CHF<sub>3</sub>/CF<sub>4</sub> (Panasonic 1)]] - ''No data prior to 2023-01-20''

	==[[ICP Etching Recipes#Process Control Data .28Panasonic 2.29\|Panasonic ICP#2]] - Process Control==		== [[ICP Etching Recipes#Process Control Data .28Panasonic 2.29\|Panasonic ICP#2]] - Process Control ==

			=== GaAs Etch with N<sub>2</sub>/Cl<sub>2</sub> - Process Control Data (Panasonic 2) ===

			* [https://docs.google.com/spreadsheets/d/16gHOO3PQn_LinrXGPeSTSBf5dnw3leSLh1gq0PLr43w/edit?gid=0#gid=0 GaAs Etch with N2/Cl2 - '''Etch Data''']
			* [https://docs.google.com/spreadsheets/d/16gHOO3PQn_LinrXGPeSTSBf5dnw3leSLh1gq0PLr43w/edit?gid=1804752281#gid=1804752281 GaAs Etch with N2/Cl2 - '''Plots'''][[/wiki/File:GaAs_Etch_ICP2_SPC.png\|link=https://docs.google.com/spreadsheets/d/16gHOO3PQn_LinrXGPeSTSBf5dnw3leSLh1gq0PLr43w/edit?gid=1804752281#gid=1804752281\|alt=example ICP2 process control chart\|none\|thumb\|249x249px\|[https://docs.google.com/spreadsheets/d/16gHOO3PQn_LinrXGPeSTSBf5dnw3leSLh1gq0PLr43w/edit?gid=1804752281#gid=1804752281 Click for Process Control Charts]]]

			=== SiO<sub>2</sub> Etch with CHF<sub>3</sub>/CF<sub>4</sub> - Process Control Data (Panasonic 2) ===



	*[https://docs.google.com/spreadsheets/d/1m0l_UK2lDxlgww4f6nfXe4aQedNeDZsLs46jQ5wR4zw/edit?usp=sharing SiO<sub>2</sub> Etch with CHF<sub>3</sub>/CF<sub>4</sub> - '''Etch Data''']		*[https://docs.google.com/spreadsheets/d/1m0l_UK2lDxlgww4f6nfXe4aQedNeDZsLs46jQ5wR4zw/edit?usp=sharing SiO<sub>2</sub> Etch with CHF<sub>3</sub>/CF<sub>4</sub> - '''Etch Data''']

Noahdutra: /* NEW Std InP Ridge Etch Cl2/H2/Ar/200°C */ Taking away NEW/OLD labels on InP etches

2025-08-13T19:27:37Z

NEW Std InP Ridge Etch Cl2/H2/Ar/200°C: Taking away NEW/OLD labels on InP etches

← Older revision		Revision as of 19:27, 13 August 2025
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	==[[ICP Etching Recipes#Process Control Data .28Oxford ICP Etcher.29\|Oxford PlasmaPro Cobra Etcher]] - Process Control==		==[[ICP Etching Recipes#Process Control Data .28Oxford ICP Etcher.29\|Oxford PlasmaPro Cobra Etcher]] - Process Control==

	=== ~~NEW~~ Std InP Ridge Etch Cl<sub>2</sub>/H<sub>2</sub>/Ar/200°C ===		=== Std InP Ridge Etch Cl<sub>2</sub>/H<sub>2</sub>/Ar/200°C ===
	''Calibration / Process testing data taken using the "InP Ridge Etch" process: Cl2/H2/Ar @ 200°C, 1cm piece with ~50% SiO2 hardmask.''		''Calibration / Process testing data taken using the "InP Ridge Etch" process: Cl2/H2/Ar @ 200°C, 1cm piece with ~50% SiO2 hardmask.''

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	[[File:200C InP.png\|alt=example SPC chart for Oxford ICP Etcher\|none\|thumb\|276x276px\|[https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281 Click for Process Control Charts]\|link=https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281]]		[[File:200C InP.png\|alt=example SPC chart for Oxford ICP Etcher\|none\|thumb\|276x276px\|[https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281 Click for Process Control Charts]\|link=https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281]]

	=== ~~OLD~~ InP Ridge Etch: Cl<sub>2</sub>/CH<sub>4</sub>/H<sub>2</sub>/60°C ===		=== Std InP Ridge Etch: Cl<sub>2</sub>/CH<sub>4</sub>/H<sub>2</sub>/60°C ===
	''Calibration / Process testing data taken using the "InP Ridge Etch" process: Cl2/CH4/H2 @ 60°C, 1cm piece with ~50% SiO2 hardmask.''		''Calibration / Process testing data taken using the "InP Ridge Etch" process: Cl2/CH4/H2 @ 60°C, 1cm piece with ~50% SiO2 hardmask. <u>No longer calibrating this recipe.</u>''

	*[https://docs.google.com/spreadsheets/d/1cEUB7K5BAg9N4vp3rPZw7g0orFkxeQmRkX34Fb4eZco/edit?gid=0#gid=0 "Std InP Ridge Etch" Cl<sub>2</sub>/CH<sub>4</sub>/H<sub>2</sub>/60°C - '''Etch Data Tables''']		*[https://docs.google.com/spreadsheets/d/1cEUB7K5BAg9N4vp3rPZw7g0orFkxeQmRkX34Fb4eZco/edit?gid=0#gid=0 "Std InP Ridge Etch" Cl<sub>2</sub>/CH<sub>4</sub>/H<sub>2</sub>/60°C - '''Etch Data Tables''']

Noahdutra: /* NEW Std InP Ridge Etch Cl2/H2/Ar/200°C */

2025-08-12T23:55:09Z

NEW Std InP Ridge Etch Cl2/H2/Ar/200°C

← Older revision		Revision as of 23:55, 12 August 2025
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	* [https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=0#gid=0 "Std InP Ridge Etch" Cl<sub>2</sub>/H<sub>2</sub>/Ar 200°C - '''Etch Data Tables''']		* [https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=0#gid=0 "Std InP Ridge Etch" Cl<sub>2</sub>/H<sub>2</sub>/Ar 200°C - '''Etch Data Tables''']
	* [https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281 "Std InP Ridge Etch" Cl<sub>2</sub>/H<sub>2</sub>/Ar 200°C - '''Plots''']		* [https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281 "Std InP Ridge Etch" Cl<sub>2</sub>/H<sub>2</sub>/Ar 200°C - '''Plots''']
	[[File:200C InP.png\|alt=example SPC chart for Oxford ICP Etcher\|none\|thumb\|276x276px\|[https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281 Click for Process Control Charts]]]		[[File:200C InP.png\|alt=example SPC chart for Oxford ICP Etcher\|none\|thumb\|276x276px\|[https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281 Click for Process Control Charts]\|link=https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281]]

	=== OLD InP Ridge Etch: Cl<sub>2</sub>/CH<sub>4</sub>/H<sub>2</sub>/60°C ===		=== OLD InP Ridge Etch: Cl<sub>2</sub>/CH<sub>4</sub>/H<sub>2</sub>/60°C ===

Noahdutra: /* NEW Std InP Ridge Etch Cl2/H2/Ar/200°C */

2025-08-12T23:54:41Z

NEW Std InP Ridge Etch Cl2/H2/Ar/200°C

← Older revision		Revision as of 23:54, 12 August 2025
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	* [https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=0#gid=0 "Std InP Ridge Etch" Cl<sub>2</sub>/H<sub>2</sub>/Ar 200°C - '''Etch Data Tables''']		* [https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=0#gid=0 "Std InP Ridge Etch" Cl<sub>2</sub>/H<sub>2</sub>/Ar 200°C - '''Etch Data Tables''']
	* [https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281 "Std InP Ridge Etch" Cl<sub>2</sub>/H<sub>2</sub>/Ar 200°C - '''Plots'''][[/wiki/File:200C_InP.png\|link=https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281\|alt=example SPC chart for Oxford ICP Etcher\|none\|thumb\|309x309px\|[https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281 Click for Process Control Charts]]]		* [https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281 "Std InP Ridge Etch" Cl<sub>2</sub>/H<sub>2</sub>/Ar 200°C - '''Plots''']
			[[File:200C InP.png\|alt=example SPC chart for Oxford ICP Etcher\|none\|thumb\|276x276px\|[https://docs.google.com/spreadsheets/d/1LE5Cug9uJFYEwu0ZsNsp0W1dTRzcO2EKFhC0wu3w0n4/edit?gid=1804752281#gid=1804752281 Click for Process Control Charts]]]

	=== OLD InP Ridge Etch: Cl<sub>2</sub>/CH<sub>4</sub>/H<sub>2</sub>/60°C ===		=== OLD InP Ridge Etch: Cl<sub>2</sub>/CH<sub>4</sub>/H<sub>2</sub>/60°C ===

← Older revision		Revision as of 21:35, 25 September 2025
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	==[[ICP Etching Recipes#Process Control Data .28Unaxis VLR.29\|Unaxis VLR Etch]] - Process Control==		==[[ICP Etching Recipes#Process Control Data .28Unaxis VLR.29\|Unaxis VLR Etch]] - Process Control==

	*[[Unaxis VLR Etch - Process Control Data\|InP Etching with Cl<sub>2</sub>/~~N<sub>2<~~/~~sub>~~ @ 200°C - Unaxis Etch]]		*[[Unaxis VLR Etch - Process Control Data\|InP Etching with Cl<sub>2</sub>/H/Ar @ 200°C - Unaxis Etch]]

	==[[ICP Etching Recipes#Process Control Data .28Oxford ICP Etcher.29\|Oxford PlasmaPro Cobra Etcher]] - Process Control==		==[[ICP Etching Recipes#Process Control Data .28Oxford ICP Etcher.29\|Oxford PlasmaPro Cobra Etcher]] - Process Control==