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	<id>https://wiki.nanofab.ucsb.edu/w/index.php?action=history&amp;feed=atom&amp;title=Silicon_Deep_Etcher_%28Plasma-Therm_SLR%29</id>
	<title>Silicon Deep Etcher (Plasma-Therm SLR) - Revision history</title>
	<link rel="self" type="application/atom+xml" href="https://wiki.nanofab.ucsb.edu/w/index.php?action=history&amp;feed=atom&amp;title=Silicon_Deep_Etcher_%28Plasma-Therm_SLR%29"/>
	<link rel="alternate" type="text/html" href="https://wiki.nanofab.ucsb.edu/w/index.php?title=Silicon_Deep_Etcher_(Plasma-Therm_SLR)&amp;action=history"/>
	<updated>2026-07-29T21:51:01Z</updated>
	<subtitle>Revision history for this page on the wiki</subtitle>
	<generator>MediaWiki 1.43.9</generator>
	<entry>
		<id>https://wiki.nanofab.ucsb.edu/w/index.php?title=Silicon_Deep_Etcher_(Plasma-Therm_SLR)&amp;diff=162184&amp;oldid=prev</id>
		<title>John d at 23:04, 6 August 2024</title>
		<link rel="alternate" type="text/html" href="https://wiki.nanofab.ucsb.edu/w/index.php?title=Silicon_Deep_Etcher_(Plasma-Therm_SLR)&amp;diff=162184&amp;oldid=prev"/>
		<updated>2024-08-06T23:04:29Z</updated>

		<summary type="html">&lt;p&gt;&lt;/p&gt;
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				&lt;td colspan=&quot;2&quot; style=&quot;background-color: #fff; color: #202122; text-align: center;&quot;&gt;← Older revision&lt;/td&gt;
				&lt;td colspan=&quot;2&quot; style=&quot;background-color: #fff; color: #202122; text-align: center;&quot;&gt;Revision as of 23:04, 6 August 2024&lt;/td&gt;
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  &lt;td colspan=&quot;2&quot; class=&quot;diff-lineno&quot;&gt;Line 1:&lt;/td&gt;
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  &lt;td style=&quot;color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;=Recipes=&lt;/div&gt;&lt;/td&gt;
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  &lt;td class=&quot;diff-marker&quot; data-marker=&quot;−&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt;=[[Si Deep RIE (PlasmaTherm/Bosch Etch)|Si Deep RIE (PlasmaTherm/Bosch Etch) - DECOMISSIONED]]=&lt;/div&gt;&lt;/td&gt;
  &lt;td colspan=&quot;2&quot; class=&quot;diff-empty diff-side-added&quot;&gt;&lt;/td&gt;
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  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt; &#039;&#039;&#039;This tool does not exist in this configuration any more, so these recipes are for Reference purposes Only!!!&#039;&#039;&#039;&lt;/div&gt;&lt;/td&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt; &#039;&#039;&#039;This tool does not exist in this configuration any more, so these recipes are for Reference purposes Only!!!&#039;&#039;&#039;&lt;/div&gt;&lt;/td&gt;
&lt;/tr&gt;
&lt;tr&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt; The machine was upgraded to be the new Plasma-Therm Fluorine ICP Etcher - the chamber configuration is now different, making these recipes invalid.&lt;/div&gt;&lt;/td&gt;
  &lt;td class=&quot;diff-marker&quot;&gt;&lt;/td&gt;
  &lt;td style=&quot;background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;&quot;&gt;&lt;div&gt; The machine was upgraded to be the new Plasma-Therm Fluorine ICP Etcher - the chamber configuration is now different, making these recipes invalid.&lt;/div&gt;&lt;/td&gt;
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		<author><name>John d</name></author>
	</entry>
	<entry>
		<id>https://wiki.nanofab.ucsb.edu/w/index.php?title=Silicon_Deep_Etcher_(Plasma-Therm_SLR)&amp;diff=162183&amp;oldid=prev</id>
		<title>John d: ICP from dry etch recipes</title>
		<link rel="alternate" type="text/html" href="https://wiki.nanofab.ucsb.edu/w/index.php?title=Silicon_Deep_Etcher_(Plasma-Therm_SLR)&amp;diff=162183&amp;oldid=prev"/>
		<updated>2024-08-06T23:04:15Z</updated>

		<summary type="html">&lt;p&gt;ICP from dry etch recipes&lt;/p&gt;
&lt;p&gt;&lt;b&gt;New page&lt;/b&gt;&lt;/p&gt;&lt;div&gt;=[[Si Deep RIE (PlasmaTherm/Bosch Etch)|Si Deep RIE (PlasmaTherm/Bosch Etch) - DECOMISSIONED]]=&lt;br /&gt;
 &amp;#039;&amp;#039;&amp;#039;This tool does not exist in this configuration any more, so these recipes are for Reference purposes Only!!!&amp;#039;&amp;#039;&amp;#039;&lt;br /&gt;
 The machine was upgraded to be the new Plasma-Therm Fluorine ICP Etcher - the chamber configuration is now different, making these recipes invalid.&lt;br /&gt;
 For Deep Silicon Etching, the [[ICP Etching Recipes#High Rate Bosch Etch .28DSEIII.29|Plasma-Therm DSE-iii]] is often used.  Some single-step Silicon etching is still performed on the [[ICP Etching Recipes#Si Etching .28Fluorine ICP Etcher.29|SLR Fluorine ICP]], due to the slower etch rate.&lt;br /&gt;
&lt;br /&gt;
==Bosch and Release Etch (Si Deep RIE)==&lt;br /&gt;
&lt;br /&gt;
*[//wiki.nanotech.ucsb.edu/wiki/images/0/02/10-Si_Etch_Bosch_Release_DRIE.pdf Bosch and Release Processes]&lt;br /&gt;
**Ideal for deep (&amp;gt;&amp;gt;1µm), vertical etching of Silicon. Through-wafer etches are possible (requires carrier wafer).&lt;br /&gt;
**Etch rate depends on area of exposed silicon being etched.&lt;br /&gt;
**Al&amp;lt;sub&amp;gt;2&amp;lt;/sub&amp;gt;O&amp;lt;sub&amp;gt;3&amp;lt;/sub&amp;gt; mask (ALD or Sputter) has &amp;gt;9000:1 selectivity&lt;br /&gt;
**SiO&amp;lt;sub&amp;gt;2&amp;lt;/sub&amp;gt; (PECVD) mask has ~100:1 selectivity&lt;br /&gt;
**Thermal SiO&amp;lt;sub&amp;gt;2&amp;lt;/sub&amp;gt; has ~300:1 selectivity.&lt;br /&gt;
&lt;br /&gt;
==Single-step Si Etching (not Bosch Process!) (Si Deep RIE)==&lt;br /&gt;
&lt;br /&gt;
*[//wiki.nanotech.ucsb.edu/wiki/images/d/d2/10-Si_Etch_using_DRIE_%28single-step%29.pdf Single-step Si Vertical Etch Recipe - SF&amp;lt;sub&amp;gt;6&amp;lt;/sub&amp;gt;-C&amp;lt;sub&amp;gt;4&amp;lt;/sub&amp;gt;F&amp;lt;sub&amp;gt;8&amp;lt;/sub&amp;gt;-Ar]&lt;/div&gt;</summary>
		<author><name>John d</name></author>
	</entry>
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