Stepper Mask-Making Guidelines (Generic) - Revision history

John d at 15:13, 26 June 2025

2025-06-26T15:13:05Z

← Older revision		Revision as of 15:13, 26 June 2025
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	###[[Autostep 200 Mask Making Guidance\|See here for GCA mask details]]		###[[Autostep 200 Mask Making Guidance\|See here for GCA mask details]]
	##For the ASML PAS 5500/300: 6x6x0.250 inches, quartz, 4x magnification/reduction		##For the ASML PAS 5500/300: 6x6x0.250 inches, quartz, 4x magnification/reduction
	###[[Stepper 3 (ASML DUV)#Mask Design and CAD files\|See here for ASML mask details]]
	##Academic users only: contact [[Demis D. John\|Demis]] for our mask plate quotes. Industrial users must contact photomask vendors themselves to get their own quotes. One of the following:		##Academic users only: contact [[Demis D. John\|Demis]] for our mask plate quotes. Industrial users must contact photomask vendors themselves to get their own quotes. One of the following:
	###"GCA AutoStep 200" - this works for the GCA 6300 as well		###"GCA AutoStep 200" - this works for the GCA 6300 as well

John d: /* Required Parameters to Order */

2025-06-26T15:11:46Z

Required Parameters to Order

← Older revision		Revision as of 15:11, 26 June 2025
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	For the stepper you are designing for, make sure you know:		For the stepper you are designing for, make sure you know:

			#Magnification:
	#Magnification: Our I-Line steppers are 5x, and the DUV stepper is 4x reduction.
			##GCA I-Line steppers are 5x
			##ASML DUV stepper is 4x reduction.
	#Maximum exposure field size:		#Maximum exposure field size:
	##Your designs must fit within this area, including spacing between adjacent Image Fields.		##Your designs must fit within this area, including spacing between adjacent Image Fields.
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	#Minimum Feature size (chrome or glass) in your design, at ''Reticle (magnified) Scale.'' This is used to choose a quoted product number from our photomask vendor quotes; smaller features means more expensive mask plate (long write time).		#Minimum Feature size (chrome or glass) in your design, at ''Reticle (magnified) Scale.'' This is used to choose a quoted product number from our photomask vendor quotes; smaller features means more expensive mask plate (long write time).
	##For GCA's multiply your 1x wafer-scale feature size by 5x.		##For GCA's multiply your 1x wafer-scale feature size by 5x.
	##For ASML PAS 5500/300, ~~multiple~~ your 1x wafer-scale feature size by 4x.		##For ASML PAS 5500/300, multiply your 1x wafer-scale feature size by 4x.
	#Reticle size/thickness/material (already included on UCSB quotes for academic users)		#Reticle size/thickness/material (already included on UCSB quotes for academic users)
	##For the GCA Steppers: 5x5x0.090 inches, soda-lime glass, 5x magnification/reduction		##For the GCA Steppers: 5x5x0.090 inches, soda-lime glass, 5x magnification/reduction

John d: /* CAD Tips */ linked to multi-image stepper reticle tutorials

2025-06-10T19:21:29Z

CAD Tips: linked to multi-image stepper reticle tutorials

← Older revision		Revision as of 19:21, 10 June 2025
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	**For our GCA systems, which we have the full reticle template files for, you can optionally do the 5x magnification and insert into the template file yourself if desired.		**For our GCA systems, which we have the full reticle template files for, you can optionally do the 5x magnification and insert into the template file yourself if desired.

	If you follow the above rules, your printed "''reticle_layout''" Cell will have Instances of each of your design's Images/patterns, and the coordinates/sizes of these Cells are exactly what you use to write your Stepper program.		* If you follow the above rules, your printed "''reticle_layout''" Cell will have Instances of each of your design's Images/patterns, and the coordinates/sizes of these Cells are exactly what you use to write your Stepper program.
			** You can then fill out the Image Coordinates onto a programming cheat-sheet, such as this one for the ASML: [https://wiki.nanofab.ucsb.edu/w/images/5/56/UCSB_ASML_DUV_Stepper_-_Programming_Worksheet.pptx UCSB_Stepper_-_Programming_Worksheet.pptx]
			* If you are doing many design variations, you should utilize the Stepper's mix-and-match capabilities, [https://wiki.nanofab.ucsb.edu/wiki/Tutorials#Stepper_Mask_Tutorials:~:text=verniers%2C%20fonts%20etc)-,Stepper%20Mask%20Tutorials '''as described in these tutorials''']. This allows more design variations on a single plate, saving valuable (expensive) mask plate area/cost.

	See the example CAD Files here:		See the example CAD Files here:

John d: /* Plots for Approval or Online Mask Viewer */ adde polarity & mirroring

2025-05-30T22:57:01Z

Plots for Approval or Online Mask Viewer: adde polarity & mirroring

← Older revision		Revision as of 22:57, 30 May 2025
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	Make sure the photomask vendor will show you a plot/image/schematic of the mask write ''before'' they actually produce the mask plate. This is your chance to catch any errors before they start the expensive mask writing operation.		Make sure the photomask vendor will show you a plot/image/schematic of the mask write ''before'' they actually produce the mask plate. This is your chance to catch any errors before they start the expensive mask writing operation.

	'''Do NOT approve the mask production until you are 100% sure everything looks ok!''' Make sure all questions are answered, and ideally the Schematics ~~looks~~ 100% correct before you approve the mask writing! If anything looks amiss, make sure yo get updated schematics to confirm everything has been corrected.		'''Do NOT approve the mask production until you are 100% sure everything looks ok!''' Make sure all questions are answered, and ideally the Schematics look 100% correct before you approve the mask writing! If anything looks amiss, make sure you get updated schematics to confirm everything has been corrected.

	This a the way to avoid expensive mistakes!		This a the way to avoid expensive mistakes!

			==== Flipped Mirroring ====
			Some mask vendors return plots of your mask ''Flipped in X'', ie. "right-reading Chrome Up". This is because the mask writers write directly onto photoresist on the Chrome side of the plate, so this is plotting exactly what the mask-writer is going to write.

			==== Inverted Polarity ====
			Some mask vendors return plots of your mask with White = Chrome & Dark = Clear glass, which can be counter-intuitive. (This is due to the mask writer's software, which ''colors'' where the mask-writing will occur, which will ''remove'' the Chrome in those regions).

	==Definitions for Mask/Reticle Order Form==		==Definitions for Mask/Reticle Order Form==

John d: /* Required Parameters to Order */ added Plots of Approval

2025-05-30T22:51:25Z

Required Parameters to Order: added Plots of Approval

← Older revision		Revision as of 22:51, 30 May 2025
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	##GCA AutoStep 200: ≥1mm @ 1x wafer-scale (≥5mm @ 5x mask-scale) of chrome		##GCA AutoStep 200: ≥1mm @ 1x wafer-scale (≥5mm @ 5x mask-scale) of chrome
	##ASML PAS 5500/300 (DUV): ≥1mm of Chrome at 1x wafer-scale		##ASML PAS 5500/300 (DUV): ≥1mm of Chrome at 1x wafer-scale
	#~~Either~~ ~~the~~ quoted product number from our photomask vendor quotes, or ~~reticle~~ ~~size/thickness/material~~		#Minimum Feature size (chrome or glass) in your design, at ''Reticle (magnified) Scale.'' This is used to choose a quoted product number from our photomask vendor quotes; smaller features means more expensive mask plate (long write time).
			##For GCA's multiply your 1x wafer-scale feature size by 5x.
			##For ASML PAS 5500/300, multiple your 1x wafer-scale feature size by 4x.
			#Reticle size/thickness/material (already included on UCSB quotes for academic users)
	##For the GCA Steppers: 5x5x0.090 inches, soda-lime glass, 5x magnification/reduction		##For the GCA Steppers: 5x5x0.090 inches, soda-lime glass, 5x magnification/reduction
	###[[Autostep 200 Mask Making Guidance\|See here for GCA mask details]]		###[[Autostep 200 Mask Making Guidance\|See here for GCA mask details]]
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	These values will vary depending on the stepper you're designing for. Contact the Stepper's Process Expert or Tool Supervisor to find out/confirm the values on your mask order form.		These values will vary depending on the stepper you're designing for. Contact the Stepper's Process Expert or Tool Supervisor to find out/confirm the values on your mask order form.

			=== Plots for Approval or Online Mask Viewer ===
			Make sure the photomask vendor will show you a plot/image/schematic of the mask write ''before'' they actually produce the mask plate. This is your chance to catch any errors before they start the expensive mask writing operation.

			'''Do NOT approve the mask production until you are 100% sure everything looks ok!''' Make sure all questions are answered, and ideally the Schematics looks 100% correct before you approve the mask writing! If anything looks amiss, make sure yo get updated schematics to confirm everything has been corrected.

			This a the way to avoid expensive mistakes!

	==Definitions for Mask/Reticle Order Form==		==Definitions for Mask/Reticle Order Form==
	When submitting the photo mask order, the following notes & definitions apply:		When submitting the photo mask order, the following notes & definitions apply:

	#"'''Grade'''" or "'''Product Code'''" will be one of the items on our quote. This will specify the glass type (soda-lime or quartz), plate size (4" square and 0.090" thick, for example), and the resolution. The grade choice determines the price, and is chosen based on required feature size (smaller feature size is more expensive). This is found on the vendor's quote, or you ask the vendor for a price based on desired minimum feature size (smallest feature actually present on your CAD file).		#"'''Grade'''" or "'''Product Code'''" will be one of the items on our quote. This will specify the glass type (soda-lime or quartz), plate size (4" square and 0.090" thick, for example), and the pattern resolution. The grade choice determines the price, and is chosen based on required feature size (smaller feature size is more expensive). This is found on the vendor's quote, or you ask the vendor for a price based on desired minimum feature size (smallest feature actually present on your CAD file).
	##Although you will submit your CAD file at 1x wafer scale, the actual reticle is printer larger by the stepper's magnification (eg. 4x or 5x mag, depending on the stepper system), so make sure to choose your reticle grade accounting for this; eg. If my CAD has 1.0µm lines smallest feature, I should choose a photomask grade better/equal to 4.0µm for a stepper with 4x reduction.		##Although you will submit your CAD file at 1x wafer scale, the actual reticle is printer larger by the stepper's magnification (eg. 4x or 5x mag, depending on the stepper system), so make sure to choose your reticle grade accounting for this; eg. If my CAD has 1.0µm lines smallest feature, I should choose a photomask grade better/equal to 4.0µm for a stepper with 4x reduction.
	##"'''Address Unit'''" - this is the "pixel size" or "raster scan step" for the mask write. The smaller the address unit, the longer the mask write time, so the higher the cost. Also the vendor may need to use a more expensive writer for smaller Address Units. Typically 50nm (cheap/coarse) down to 1nm (expensive/precise).		##"'''Address Unit'''" - this is the "pixel size" or "raster scan step" for the mask write. The smaller the address unit, the longer the mask write time, so the higher the cost. Also the vendor may need to use a more expensive writer for smaller Address Units. Typically 50nm (cheap/coarse) down to 1nm (expensive/precise).
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	#'''Mirroring''' should be "'''<u>Right-Reading</u> (ie. legible text) when viewed with <u>Chrome Down</u>'''", if your CAD is exactly what you want on the wafer, for all our systems.		#'''Mirroring''' should be "'''<u>Right-Reading</u> (ie. legible text) when viewed with <u>Chrome Down</u>'''", if your CAD is exactly what you want on the wafer, for all our systems.
	##If you are doing backside alignment, make sure you Mirror your layers appropriately! We usually perform the mirroring ourselves in CAD and still submit the order with "Right Reading/Chrome Down", to avoid any confusion.		##If you are doing backside alignment, make sure you Mirror your layers appropriately! We usually perform the mirroring ourselves in CAD and still submit the order with "Right Reading/Chrome Down", to avoid any confusion.
			##IMPORTANT: Some mask vendors return plots of your mask ''Flipped in X'', ie. "right-reading Chrome Up".
	#'''Polarity''' is usually "''Polygons are Clear/Dark Field''", to ensure the regions between Images (patterns) and outer portions are all opaque Chrome. However, you can make your mask ''Polygons are Dark/Clear Field'', you just need to add polygons to put Chrome in between your adjacent Images. (FYI, "''Digitized data''" is another way of saying "''The polygons you drew''".)		#'''Polarity''' is usually "''Polygons are Clear/Dark Field''", to ensure the regions between Images (patterns) and outer portions are all opaque Chrome. However, you can make your mask ''Polygons are Dark/Clear Field'', you just need to add polygons to put Chrome in between your adjacent Images. (FYI, "''Digitized data''" is another way of saying "''The polygons you drew''".)
	##Whether you are planning to use Positive or Negative photoresist makes a difference! Plan your process and the Mask Polarity accordingly.		##Whether you are planning to use Positive or Negative photoresist makes a difference! Plan your process and the Mask Polarity accordingly.
			##IMPORTANT: Some mask vendors return plots of your mask with White = Chrome, which can be counter-intuitive (due to the mask writer's software, which colors where the mask-writing will occur to remove the Chrome in those regions).
	#“'''Min. Feature on Mask'''” refers to minimum clear or opaque feature, assuming features similar to <u>lines/spaces</u>. This should be at the reticle-scale since that is what the Photomask company will be making & fabricating for you - see "Grade" above.		#“'''Min. Feature on Mask'''” refers to minimum clear or opaque feature, assuming features similar to <u>lines/spaces</u>. This should be at the reticle-scale since that is what the Photomask company will be making & fabricating for you - see "Grade" above.
	#“'''Min. Contact'''” refers to features with aspect ratio close to 1:1, eg. Squares and circles (such as "contact pads"). These have a separate spec (often worse) due to the mask manufacturing process, so make sure to choose the appropriate grade of photomask with this in mind.		#“'''Min. Contact'''” refers to features with aspect ratio close to 1:1, eg. Squares and circles (such as "contact pads"). These have a separate spec (often worse) due to the mask manufacturing process, so make sure to choose the appropriate grade of photomask with this in mind.

John d: link to advances stepper layout

2025-04-29T01:22:03Z

link to advances stepper layout

← Older revision		Revision as of 01:22, 29 April 2025
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	==Generic Stepper Mask Parameters==		==Generic Stepper Mask Parameters==
⚫	~~'''Tutorial:'''~~ If you are not familiar with the difference between designing Contact Litho Masks and Stepper Litho Masks/Reticles, please review this short tutorial:

			=== '''Tutorial:''' ===
⚫	*~~[https://wiki.nanofab.ucsb.edu/w/images/c/cb/Demis_D_John_-_Stepper_Reticle_Layout_vs_Wafer_Layout.pdf~~ ~~Demis~~ D. ~~John~~ - ~~Stepper~~ ~~Reticle~~ ~~Layout~~ ~~vs.~~ ~~Wafer~~ ~~Layout~~.~~pdf]~~[[File:Stepper Reticle Tutorial - Reticle Masking Schematic.png\|alt=Schematic of stepper blocking off adjacent Images on reticle and exposure onto different wafer locations.\|thumb\|'''[https://wiki.nanofab.ucsb.edu/w/images/c/cb/Demis_D_John_-_Stepper_Reticle_Layout_vs_Wafer_Layout.pdf Click for Tutorial]'''Reticle Patterns (“images”) are independent of wafer-layout. The reticle could contain 20 variations while the wafer could have only a few of the Images actually exposed, in any desired location on the wafer, determined by the Job Programming.\|link=https://wiki.nanofab.ucsb.edu/w/images/c/cb/Demis_D_John_-_Stepper_Reticle_Layout_vs_Wafer_Layout.pdf]]
		⚫	If you are not familiar with the difference between designing Contact Litho Masks and Stepper Litho Masks/Reticles, please review this short tutorial:

			*[https://wiki.nanofab.ucsb.edu/w/images/c/cb/Demis_D_John_-_Stepper_Reticle_Layout_vs_Wafer_Layout.pdf Stepper Reticle Layout vs. Wafer Layout.pdf (Demis D. John)]
			*[[Stepper Reticle Layout (Advanced) - Complex Experiments and Variations\|Advanced Stepper Reticle Layout - Complex Experiments/Variations]]
		⚫	**''If you need many design variations on your wafer, this is a very efficient way to utilize stepper reticles.''[[File:Stepper Reticle Tutorial - Reticle Masking Schematic.png\|alt=Schematic of stepper blocking off adjacent Images on reticle and exposure onto different wafer locations.\|thumb\|'''[https://wiki.nanofab.ucsb.edu/w/images/c/cb/Demis_D_John_-_Stepper_Reticle_Layout_vs_Wafer_Layout.pdf Click for Tutorial]'''Reticle Patterns (“images”) are independent of wafer-layout. The reticle could contain 20 variations while the wafer could have only a few of the Images actually exposed, in any desired location on the wafer, determined by the Job Programming.\|link=https://wiki.nanofab.ucsb.edu/w/images/c/cb/Demis_D_John_-_Stepper_Reticle_Layout_vs_Wafer_Layout.pdf]]

			=== Required Parameters to Order ===
	For the stepper you are designing for, make sure you know:		For the stepper you are designing for, make sure you know:

John d: Corrected ASML reticle size

2025-03-05T02:59:37Z

Corrected ASML reticle size

← Older revision		Revision as of 02:59, 5 March 2025
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	###14.8 x 14.8 mm at 1x wafer-scale (74mm square at 5x reticle-scale)		###14.8 x 14.8 mm at 1x wafer-scale (74mm square at 5x reticle-scale)
	##ASML PAS5500/300 (DUV):		##ASML PAS5500/300 (DUV):
	###Intersection of a ~~21x25mm~~ rectangle and an approx. 31mm circle:		###Intersection of a 22x27mm rectangle and an approx. 31mm circle:
	####[[File:ASML Mask Design Area.png\|alt=KLayout screenshot of ASML mask design area\|none\|thumb\|246x246px\|ASML mask design area - intersection of ~~21x25mm~~ rectangle and 31mm circle, a rectangle with the corners cutoff.]]		####[[File:ASML Mask Design Area.png\|alt=KLayout screenshot of ASML mask design area\|none\|thumb\|246x246px\|ASML mask design area - intersection of 22x27mm rectangle and 31mm circle, a rectangle with the corners cutoff.]]
	###A common design area is: 21x21mm or 22x22mm (closer to edges)		###A common design area is: 21x21mm or 22x22mm (closer to edges)
	###21x25mm, but 800µm on the corners will get cut off.		###21x25mm, but 800µm on the corners will get cut off.

John d: /* Generic Stepper Mask Parameters */ update Tempalte insertion instructions

2025-02-26T18:17:10Z

Generic Stepper Mask Parameters: update Tempalte insertion instructions

← Older revision		Revision as of 18:17, 26 February 2025
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	###"GCA AutoStep 200" - this works for the GCA 6300 as well		###"GCA AutoStep 200" - this works for the GCA 6300 as well
	###"ASML PAS 5500/330" - this is for the 248nm DUV Stepper.		###"ASML PAS 5500/330" - this is for the 248nm DUV Stepper.
	#System model number - ask the photomask vendor to Magnify and Insert your 1x wafer-scale designs into the appropriate stepper template for the model of Stepper you are using.		#System model number - ask the photomask vendor to Magnify and Insert your 1x wafer-scale designs into the appropriate stepper template for the model of Stepper you are using. This will add system (mask-level) Alignment Marks & reticle barcodes on the outer edges.
			##"GCA AutoStep 200" - 5x magnification/reduction. Many users do the magnification & insertion into GCA template themselves, inserting your Cell Instance into [https://wiki.nanotech.ucsb.edu/w/images/c/c4/GCA_Stepper_MaskPlate_Master-DarkField_5x.gds this CAD file] (except it will be missing a Barcode).
			##"ASML PAS 5500/330" - 4x magnification/reduction

	These values will vary depending on the stepper you're designing for. Contact the Stepper's Process Expert or Tool Supervisor to find out/confirm the values on your mask order form.		These values will vary depending on the stepper you're designing for. Contact the Stepper's Process Expert or Tool Supervisor to find out/confirm the values on your mask order form.

John d: link to (0,0) marker on KLayout

2025-02-21T23:29:05Z

link to (0,0) marker on KLayout

@@ Line 48: / Line 48: @@
 #"'''Registration'''" - we usually choose "Not needed" for our plates.  This refers to whether the patterns needs to be accurately aligned to the glass plate itself - which is not a problem for Stepper masks since the system aligns to the written Chrome patterns only.
 ==Generic Stepper design/programming CAD files & spreadsheets==
@@ Line 66: / Line 82: @@
 *Example [https://wiki.nanotech.ucsb.edu/w/images/2/2e/ASML_Reticle_Programming_Params_-_DEM-2020-03_v1.xlsx "Stepper Reticle Programming Params" spreadsheet for reticle "DEM-2020-03"]
 *Example [https://wiki.nanotech.ucsb.edu/w/images/b/b8/Example_Mask_order_form_%28UCSB_ASML_5500%29_-_DEM-2020-03.pdf Reticle Order Form for reticle "DEM-2020-03"]

John d at 22:32, 21 February 2025

2025-02-21T22:32:25Z

← Older revision		Revision as of 22:32, 21 February 2025
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	##ASML PAS 5500/300 (DUV): ≥1mm of Chrome at 1x wafer-scale		##ASML PAS 5500/300 (DUV): ≥1mm of Chrome at 1x wafer-scale
	#Either the quoted product number from our photomask vendor quotes, or reticle size/thickness/material		#Either the quoted product number from our photomask vendor quotes, or reticle size/thickness/material
	##For the GCA Steppers: 5x5x0.090 inches~~, 5x magnification/reduction~~, soda-lime glass		##For the GCA Steppers: 5x5x0.090 inches, soda-lime glass, 5x magnification/reduction
	###[[Autostep 200 Mask Making Guidance\|See here for GCA mask details]]		###[[Autostep 200 Mask Making Guidance\|See here for GCA mask details]]
	##For the ASML PAS 5500/300: 6x6x0.250 inches, 4x magnification/reduction~~, quartz~~		##For the ASML PAS 5500/300: 6x6x0.250 inches, quartz, 4x magnification/reduction
	###[[Stepper 3 (ASML DUV)#Mask Design and CAD files\|See here for ASML mask details]]		###[[Stepper 3 (ASML DUV)#Mask Design and CAD files\|See here for ASML mask details]]
	##Academic users only: contact [[Demis D. John\|Demis]] for our mask plate quotes. Industrial users must contact photomask vendors themselves to get their own quotes.		##Academic users only: contact [[Demis D. John\|Demis]] for our mask plate quotes. Industrial users must contact photomask vendors themselves to get their own quotes. One of the following:
			###"GCA AutoStep 200" - this works for the GCA 6300 as well
			###"ASML PAS 5500/330" - this is for the 248nm DUV Stepper.
	#System model number - ask the photomask vendor to Magnify and Insert your 1x wafer-scale designs into the appropriate stepper template for the model of Stepper you are using.		#System model number - ask the photomask vendor to Magnify and Insert your 1x wafer-scale designs into the appropriate stepper template for the model of Stepper you are using.