Suss Aligners (SUSS MJB-3) - Revision history

John d at 04:17, 6 December 2025

2025-12-06T04:17:27Z

← Older revision		Revision as of 04:17, 6 December 2025
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	\|materials =		\|materials =
	}}		}}
	{{ToolActions
	\|toolid =
	\|ProcessControlURL =
	\|ProceduresURL =
	\|TrainingURL = mailto:lee_sawyer@ucsb.edu
	}}
	==About==		==About==
	We have two high-performance mask aligners for contact exposure processes. They are manual mechanical systems alignment, contact/proximity, with exposure shuttered by a timer. The resolution (depending on contact mode, optics and exposure wavelength and "operator technique") is into the submicron region. (See descriptions for our "Std." and "IR" units).		We have two high-performance mask aligners for contact exposure processes. They are manual mechanical systems alignment, contact/proximity, with exposure shuttered by a timer. The resolution (depending on contact mode, optics and exposure wavelength and "operator technique") is into the submicron region. (See descriptions for our "Std." and "IR" units).

John d at 04:17, 6 December 2025

2025-12-06T04:17:02Z

← Older revision		Revision as of 04:17, 6 December 2025
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	\|ProcessControlURL =		\|ProcessControlURL =
	\|ProceduresURL =		\|ProceduresURL =
	\|TrainingURL = [mailto:lee_sawyer@ucsb.edu]		\|TrainingURL = mailto:lee_sawyer@ucsb.edu
	}}		}}
	==About==		==About==

John d at 04:16, 6 December 2025

2025-12-06T04:16:47Z

← Older revision		Revision as of 04:16, 6 December 2025
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	\|ProcessControlURL =		\|ProcessControlURL =
	\|ProceduresURL =		\|ProceduresURL =
	\|TrainingURL =		\|TrainingURL = [mailto:lee_sawyer@ucsb.edu]
	}}		}}
	==About==		==About==

John d at 04:16, 6 December 2025

2025-12-06T04:16:03Z

← Older revision		Revision as of 04:16, 6 December 2025
Line 11:		Line 11:
	\|materials =		\|materials =
	}}		}}
			{{ToolActions
			\|toolid =
			\|ProcessControlURL =
			\|ProceduresURL =
			\|TrainingURL =
			}}
	==About==		==About==
	We have two high-performance mask aligners for contact exposure processes. They are manual mechanical systems alignment, contact/proximity, with exposure shuttered by a timer. The resolution (depending on contact mode, optics and exposure wavelength and "operator technique") is into the submicron region. (See descriptions for our "Std." and "IR" units).		We have two high-performance mask aligners for contact exposure processes. They are manual mechanical systems alignment, contact/proximity, with exposure shuttered by a timer. The resolution (depending on contact mode, optics and exposure wavelength and "operator technique") is into the submicron region. (See descriptions for our "Std." and "IR" units).

John d: Docuemntation --> Operating Procedures

2025-12-06T04:15:14Z

Docuemntation --> Operating Procedures

← Older revision		Revision as of 04:15, 6 December 2025
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	===Exposure Optical Spectrum with Filter for i-line Exposure===		===Exposure Optical Spectrum with Filter for i-line Exposure===
	[[image:DUV-Spectra-With-Filter.png\|thumb\|none\|302x302px\|Aligner with Filter for i-line Exposure]]		[[image:DUV-Spectra-With-Filter.png\|thumb\|none\|302x302px\|Aligner with Filter for i-line Exposure]]
			==Operating Procedures==
	==Documentation==

	*[https://wiki.nanotech.ucsb.edu/wiki/images/d/de/MJB_3_SOP.pdf MJB-3 Standard Operating Procedure]		*[https://wiki.nanotech.ucsb.edu/wiki/images/d/de/MJB_3_SOP.pdf MJB-3 Standard Operating Procedure]

John d: updated IR image

2025-11-20T02:56:08Z

updated IR image

← Older revision		Revision as of 02:56, 20 November 2025
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	====Backside Alignment====		====Backside Alignment====
	[[File:MJB-IR - squares alignment and field of view.png\|alt=IR image of two front-to-back aligned squares\|thumb\|140x140px\|Example of the Infrared image showing front-to-back alignment of squares on either side of the wafer. Design your alignment marks according to this field of view 2025-11-19. (Credit: [[Demis D. John]])]]
	On the Standard MJB-3, special black chucks may be used for optically transparent materials, allowing you to view through the wafer.		On the Standard MJB-3, special black chucks may be used for optically transparent materials, allowing you to view through the wafer.

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	*Infrared camera and computer for imaging.		*Infrared camera and computer for imaging.
	*Through-wafer alignment and/or inspection.		*Through-wafer alignment and/or inspection.
			*Design your alignment marks according to this field of view:

	[[File:IR Alignment check 01 - crop.png\|alt=Screenshto of IR camera showing front-to-back alignment\|none\|thumb\|MJB-IR front-to-back alignment check through Silicon substrate, with ~~few-micron~~ ~~etched features~~ on the front, aligned to few-mm photoresist pattern on the backside.]]		[[File:IR Alignment check 01 - crop.png\|alt=Screenshto of IR camera showing front-to-back alignment\|none\|thumb\|MJB-IR front-to-back alignment check through Silicon substrate, with one square on the front, aligned to few-mm photoresist pattern on the backside. 2025-11-19. (Credit: [[Demis D. John]])]]
	<br />		<br />
	===Exposure Optical Spectrum with No Filter===		===Exposure Optical Spectrum with No Filter===

John d: /* Backside Alignment */ added MJB-IR alignment example image.

2025-11-19T23:23:04Z

Backside Alignment: added MJB-IR alignment example image.

← Older revision		Revision as of 23:23, 19 November 2025
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	====Backside Alignment====		====Backside Alignment====
			[[File:MJB-IR - squares alignment and field of view.png\|alt=IR image of two front-to-back aligned squares\|thumb\|140x140px\|Example of the Infrared image showing front-to-back alignment of squares on either side of the wafer. Design your alignment marks according to this field of view 2025-11-19. (Credit: [[Demis D. John]])]]
	On the Standard MJB-3, special black chucks may be used for optically transparent materials, allowing you to view through the wafer.		On the Standard MJB-3, special black chucks may be used for optically transparent materials, allowing you to view through the wafer.

	For backside alignment through opaque materials such as Si or GaAs, our IR aligner has backside infrared illumination (halogen bulb) through these black chucks. ~~A Hammamatsu~~ IR camera is installed to view the infrared image.		For backside alignment through opaque materials such as Si or GaAs, our IR aligner has backside infrared illumination (halogen bulb) through these black chucks. An IR camera is installed to view the infrared image.

	Using a filter, the IR system can be configured for I-line (350 nm) only, assisting in resolution.		Using a filter, the IR system can be configured for I-line (350 nm) only, assisting in resolution.

	==Detailed Specifications==		==Detailed Specifications==

John d: /* Mask Plate Info */ move edge bead to Recipes section

2024-11-22T20:10:10Z

Mask Plate Info: move edge bead to Recipes section

← Older revision		Revision as of 20:10, 22 November 2024
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	*[[Mask Making Guidelines for Contact Aligners\|Mask Making Guidelines - Contact Masks]] - ''in progress''		*[[Mask Making Guidelines for Contact Aligners\|Mask Making Guidelines - Contact Masks]] - ''in progress''
	*[[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.		*[[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.
⚫	*[[Photolithography - Manual Edge-Bead Removal Techniques]]
⚫	**Edge bead removal helps improve resolution and alignment quality.

	===CAD Files===		===CAD Files===
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	*Recipes > Lithography > Photolithography Recipes > [[Contact Alignment Recipes#Suss Aligners .28SUSS MJB-3.29\|'''<u>SUSS MJB-3</u>''']]		*Recipes > Lithography > Photolithography Recipes > [[Contact Alignment Recipes#Suss Aligners .28SUSS MJB-3.29\|'''<u>SUSS MJB-3</u>''']]
	**''Starting recipes for various I-Line photoresists, positive and negative.''		**''Starting recipes for various I-Line photoresists, positive and negative.''
		⚫	*[[Photolithography - Manual Edge-Bead Removal Techniques]]
		⚫	**Edge bead removal helps improve resolution and alignment quality.

John d: /* Detailed Specifications */ link to edge bead removal

2024-11-22T20:07:12Z

Detailed Specifications: link to edge bead removal

← Older revision		Revision as of 20:07, 22 November 2024
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	**±3% over 2" diameter		**±3% over 2" diameter
	**±5% over 3" diameter		**±5% over 3" diameter
			*Min. Feature Size:
			**Approx.

	===IR Aligner===		===IR Aligner===
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	*[[Mask Making Guidelines for Contact Aligners\|Mask Making Guidelines - Contact Masks]] - ''in progress''		*[[Mask Making Guidelines for Contact Aligners\|Mask Making Guidelines - Contact Masks]] - ''in progress''
	*[[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.		*[[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.
			*[[Photolithography - Manual Edge-Bead Removal Techniques]]
			**Edge bead removal helps improve resolution and alignment quality.

	===CAD Files===		===CAD Files===

John d: links to CAD files/help

2024-09-05T21:48:22Z

links to CAD files/help

← Older revision		Revision as of 21:48, 5 September 2024
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	*[https://wiki.nanotech.ucsb.edu/w/images/1/11/MJB_3_IR_Alignment_Mode_Conversion.pdf MJB-3 IR Alignment Mode Conversion]		*[https://wiki.nanotech.ucsb.edu/w/images/1/11/MJB_3_IR_Alignment_Mode_Conversion.pdf MJB-3 IR Alignment Mode Conversion]

	=== Mask Plate Info ===		===Mask Plate Info===

	*[[Mask Making Guidelines for Contact Aligners\|Mask Making Guidelines - Contact Masks]] - ''in progress''		*[[Mask Making Guidelines for Contact Aligners\|Mask Making Guidelines - Contact Masks]] - ''in progress''
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	===CAD Files===		===CAD Files===
			''For designing your mask plates.''

	*Male/female alignment marks (GDS): [[Media:MA6-FrontBack AlignMarks only.gds\|MA6-FrontBack_AlignMarks_only.gds]]		*Male/female alignment marks (GDS): [[Media:MA6-FrontBack AlignMarks only.gds\|MA6-FrontBack_AlignMarks_only.gds]]
			*[[Calculators + Utilities#CAD%20Layout%20Programs\|CAD Layout Programs]]
			*[[Calculators + Utilities#CAD%20Design%20Tips\|CAD Design Tips]]
			*[[Calculators + Utilities#CAD%20Files%20.26%20Templates\|CAD Files & Templates]] - alignment markers, verniers and other useful CAD objects

	==Recipes==		==Recipes==