Tube Furnace (Tystar 8300) - Revision history

John d: corrected model

2026-04-21T18:11:49Z

corrected model

← Older revision		Revision as of 18:11, 21 April 2026
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	\|description = Tystar 8" 3-Tube Oxidation/Annealing System		\|description = Tystar 8" 3-Tube Oxidation/Annealing System
	\|manufacturer = Tystar Corporation		\|manufacturer = Tystar Corporation
	\|model = ~~Tystar~~ 8300		\|model = Tytan 3-Stack 8300
	\|materials =		\|materials =
	\|toolid=999		\|toolid=999

John d: /* About */ moved some info to process section

2025-11-21T00:58:30Z

About: moved some info to process section

← Older revision		Revision as of 00:58, 21 November 2025
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	*'''Tubes #2 and #3''': Dry or wet oxidation of silicon (unprocessed, clean)		*'''Tubes #2 and #3''': Dry or wet oxidation of silicon (unprocessed, clean)
	*'''Tube #3''': General furnace annealing & oxidation, including processed material		*'''Tube #3''': General furnace annealing & oxidation, including processed material

⚫	Each process tube can ~~accomodate~~ up to one hundred 8” wafers per cycle. We have boats for 2", 3", 4", 6", 8" and irregular shaped pieces. ~~The maximum temperature is 1100°C for the system. Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>.~~

	==Process Information==		==Process Information==
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	Keep in mind that all process must be 30 minutes in length at a minimum. Processes less than 30 minutes will suffer from poor uniformity because the process tube will not have sufficient time to saturate with O<sub>2</sub> or DI-H<sub>2</sub>O.		Keep in mind that all process must be 30 minutes in length at a minimum. Processes less than 30 minutes will suffer from poor uniformity because the process tube will not have sufficient time to saturate with O<sub>2</sub> or DI-H<sub>2</sub>O.

		⚫	Each process tube can accommodate up to one hundred 8” wafers per cycle. We have boats for 2", 3", 4", 6", 8" and irregular shaped pieces.

			The maximum temperature is 1100°C for the system. Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>.

	===Gases Available===		===Gases Available===

John d: /* Recipes */ moved recipes to Tystar Recipes page, linked to them here.

2024-10-24T22:00:15Z

Recipes: moved recipes to Tystar Recipes page, linked to them here.

@@ Line 40: / Line 40: @@
 ==Recipes==
-'''Tube 1:'''
+* '''Tube 3''' - Wet/Dry Oxidation, Annealing
 ===[[Thermal Processing Recipes#Tystar 8300|<u>Oxidation Rates & Data</u>]]===

John d: /* Recipes */ updated temperature/time limits

2024-10-24T18:39:26Z

Recipes: updated temperature/time limits

← Older revision		Revision as of 18:39, 24 October 2024
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	*SOG425.001 - ''Spin-On Glass Cure''		*SOG425.001 - ''Spin-On Glass Cure''
	*ALGAAS.001 - ''Oxidation of AlGaAs''		*ALGAAS.001 - ''Oxidation of AlGaAs''
			*ANNEAL.001 - ''Anneal with variable time and temp.''

	'''Tube 2:'''		'''Tube 2:'''
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	=== Process Limits ===		=== Process Limits ===

			* Max temperatures:
			** Tube 1: TBD, something like 950°C max.
			** Tube 2: 1050°C for <<24hr; 1100°C for max. 3hr.
			** Tube 2: 1050°C for <<24hr; 1100°C max. 3hr.
	* '''DRY1050''' may not be run for more than 3hrs. O2 flow is 3SLPM, which is too high to run for more than 3hr.		* '''DRY1050''' may not be run for more than 3hrs. O2 flow is 3SLPM, which is too high to run for more than 3hr.
	** Contact supervisor for other options, such as '''''DRYVAR''''' @ 1100°C, or with lower O2 flow.		** Contact supervisor for other options, such as '''''DRYVAR''''' @ 1100°C, or with lower O2 flow.

John d: process limits added

2024-03-07T18:15:52Z

process limits added

← Older revision		Revision as of 18:15, 7 March 2024
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	*DRYVAR.003 - ''DryOx, variable temp.''		*DRYVAR.003 - ''DryOx, variable temp.''
	*ANNEAL.003 - ''Anneal with variable time and temperature''		*ANNEAL.003 - ''Anneal with variable time and temperature''

			=== Process Limits ===

			* '''DRY1050''' may not be run for more than 3hrs. O2 flow is 3SLPM, which is too high to run for more than 3hr.
			** Contact supervisor for other options, such as '''''DRYVAR''''' @ 1100°C, or with lower O2 flow.
			* '''WET1050''' may not be run for more than 24hrs without authorization. Contact supervisor if need to run longer.
			* No recipe should be run with >1slpm gas flow without discussing with supervisor first, or gas bottles will be depleted very fast and likely run out during your process.

	===[[Thermal Processing Recipes#Tystar 8300\|<u>Oxidation Rates & Data</u>]]===		===[[Thermal Processing Recipes#Tystar 8300\|<u>Oxidation Rates & Data</u>]]===

John d: /* Gases Available */

2022-12-06T20:49:34Z

Gases Available

← Older revision		Revision as of 20:49, 6 December 2022
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	\|toolid=999		\|toolid=999
	}}		}}
	== About ==		==About==
	The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for specific tubes as follows:		The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for specific tubes as follows:

	* '''Tube #1''': SOG curing & low-temp oxidation
	* '''~~Tubes~~ #~~2 and #3~~''': ~~Dry~~ or ~~wet~~ oxidation ~~of silicon (unprocessed, clean)~~		*'''Tube #1''': SOG curing & low-temp oxidation
	* '''~~Tube~~ #3''': ~~General~~ ~~furnace~~ ~~annealing &~~ oxidation, ~~including~~ ~~processed~~ ~~material~~		*'''Tubes #2 and #3''': Dry or wet oxidation of silicon (unprocessed, clean)
			*'''Tube #3''': General furnace annealing & oxidation, including processed material

	Each process tube can accomodate up to one hundred 8” wafers per cycle. We have boats for 2", 3", 4", 6", 8" and irregular shaped pieces. The maximum temperature is 1100°C for the system. Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>.		Each process tube can accomodate up to one hundred 8” wafers per cycle. We have boats for 2", 3", 4", 6", 8" and irregular shaped pieces. The maximum temperature is 1100°C for the system. Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>.
Line 23:		Line 24:

	Recipe Characterization Data, such as thermal oxidation times, can be found on the recipe page:		Recipe Characterization Data, such as thermal oxidation times, can be found on the recipe page:

	* [[Thermal Processing Recipes\|Thermal Processing Recipes: Tystar 8300]]		*[[Thermal Processing Recipes\|Thermal Processing Recipes: Tystar 8300]]

	Use the [http://cleanroom.byu.edu/OxideTimeCalc BYU] or [http://www.lelandstanfordjunior.com/thermaloxide.html Stanford Leland Jr.] Thermal Oxidation Calculators to determine the time and temperature that will be necessary for your process needs. You can "calibrate" your oxidations to the Stanford calculator by adjusting the ''Partial Pressure'' on the calculator to match your experimental data.		Use the [http://cleanroom.byu.edu/OxideTimeCalc BYU] or [http://www.lelandstanfordjunior.com/thermaloxide.html Stanford Leland Jr.] Thermal Oxidation Calculators to determine the time and temperature that will be necessary for your process needs. You can "calibrate" your oxidations to the Stanford calculator by adjusting the ''Partial Pressure'' on the calculator to match your experimental data.

	Keep in mind that all process must be 30 minutes in length at a minimum. Processes less than 30 minutes will suffer from poor uniformity because the process tube will not have sufficient time to saturate with O<sub>2</sub> or DI-H<sub>2</sub>O.		Keep in mind that all process must be 30 minutes in length at a minimum. Processes less than 30 minutes will suffer from poor uniformity because the process tube will not have sufficient time to saturate with O<sub>2</sub> or DI-H<sub>2</sub>O.

	=== Gases Available ===		===Gases Available===

	* N2 (15/5 slpm)
	* ~~O2 High-range "O2HI" -~~ 15 slpm		*N2 (15/5 slpm)
	* O2 ~~Low~~-range "~~O2LO~~" - 1 slpm		*O2 High-range "O2HI" - 15 slpm
			*O2 Low-range "O2LO" - 1 slpm
	* All gasses flow through the H2O bubbler, which can optionally be filled with heated water or evacuated (no ~~water~~).		*All gasses flow through the H2O bubbler, which can optionally be filled with heated water to flow steam, or evacuated (no steam, gas only).

	==Recipes==		==Recipes==
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	'''Tube 1:'''		'''Tube 1:'''

	* SOG425.001 - ''Spin-On Glass Cure''
	* ~~ALGAAS~~.001 - ''~~Oxidation~~ of ~~AlGaAs~~''		*SOG425.001 - ''Spin-On Glass Cure''
			*ALGAAS.001 - ''Oxidation of AlGaAs''

	'''Tube 2:'''		'''Tube 2:'''

⚫	* WET1050.~~002~~ - ''WetOx at 1050°C''
	* ~~DRY1050~~.002 - ''~~DryOx~~ at 1050°C''		*WET1050.002 - ''WetOx at 1050°C''
	* ~~WETVAR~~.002 - ''~~WetOx,~~ ~~variable~~ ~~temp.~~''		*DRY1050.002 - ''DryOx at 1050°C''
	* ~~DRYVAR~~.002 - ''~~DryOx~~, variable temp.''		*WETVAR.002 - ''WetOx, variable temp.''
		⚫	*DRYVAR.002 - ''DryOx, variable temp.''

	'''Tube 3:'''		'''Tube 3:'''
⚫	* ~~WET1050~~.003 - ''~~WetOx~~ at 1050°C''
⚫	* ~~DRY1050~~.003 - ''DryOx at ~~1050°C~~''
⚫	* WETVAR.003 - ''WetOx, variable temp.''
⚫	* DRYVAR.~~003~~ - ''DryOx, variable temp.''
⚫	* ANNEAL.003 - ''Anneal with variable time and temperature''

		⚫	*WET1050.003 - ''WetOx at 1050°C''
⚫	=== [[Thermal Processing Recipes#Tystar 8300\|<u>Oxidation Rates & Data</u>]] ===
		⚫	*DRY1050.003 - ''DryOx at 1050°C''
		⚫	*WETVAR.003 - ''WetOx, variable temp.''
		⚫	*DRYVAR.003 - ''DryOx, variable temp.''
		⚫	*ANNEAL.003 - ''Anneal with variable time and temperature''

		⚫	===[[Thermal Processing Recipes#Tystar 8300\|<u>Oxidation Rates & Data</u>]]===
	''See the above recipes page for data on oxidation rates for standard oxidation recipes.''		''See the above recipes page for data on oxidation rates for standard oxidation recipes.''

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	==See Also==		==See Also==

	*[http://www.tystar.com/ Tystar] - Manufacturer of the tool		*[http://www.tystar.com/ Tystar] - Manufacturer of the tool
	*[http://cleanroom.byu.edu/OxideThickCalc Silicon Thermal Oxide Thickness Calculator (BYU)] - Use this on-line calculator to calculate times for silicon oxidation.		*[http://cleanroom.byu.edu/OxideThickCalc Silicon Thermal Oxide Thickness Calculator (BYU)] - Use this on-line calculator to calculate times for silicon oxidation.

John d: /* Process Information */ added Gases Available

2021-03-10T21:19:43Z

Process Information: added Gases Available

← Older revision		Revision as of 21:19, 10 March 2021
Line 12:		Line 12:
	\|toolid=999		\|toolid=999
	}}		}}
	= About =		== About ==
	The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for specific tubes as follows:		The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for specific tubes as follows:
	* '''Tube #1''': SOG curing & low-temp oxidation		* '''Tube #1''': SOG curing & low-temp oxidation
Line 20:		Line 20:
	Each process tube can accomodate up to one hundred 8” wafers per cycle. We have boats for 2", 3", 4", 6", 8" and irregular shaped pieces. The maximum temperature is 1100°C for the system. Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>.		Each process tube can accomodate up to one hundred 8” wafers per cycle. We have boats for 2", 3", 4", 6", 8" and irregular shaped pieces. The maximum temperature is 1100°C for the system. Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>.

	=Process Information=		==Process Information==

	Recipe Characterization Data, such as thermal oxidation times, can be found on the recipe page:		Recipe Characterization Data, such as thermal oxidation times, can be found on the recipe page:
Line 28:		Line 28:
	Keep in mind that all process must be 30 minutes in length at a minimum. Processes less than 30 minutes will suffer from poor uniformity because the process tube will not have sufficient time to saturate with O<sub>2</sub> or DI-H<sub>2</sub>O.		Keep in mind that all process must be 30 minutes in length at a minimum. Processes less than 30 minutes will suffer from poor uniformity because the process tube will not have sufficient time to saturate with O<sub>2</sub> or DI-H<sub>2</sub>O.

			=== Gases Available ===
⚫	=Recipes=
			* N2 (15/5 slpm)
			* O2 High-range "O2HI" - 15 slpm
			* O2 Low-range "O2LO" - 1 slpm
			* All gasses flow through the H2O bubbler, which can optionally be filled with heated water or evacuated (no water).

		⚫	==Recipes==

	The following are the available recipes on each furnace tube:		The following are the available recipes on each furnace tube:
Line 50:		Line 56:
	''See the above recipes page for data on oxidation rates for standard oxidation recipes.''		''See the above recipes page for data on oxidation rates for standard oxidation recipes.''

	=Useful Information=		==Useful Information==
	[//wiki.nanotech.ucsb.edu/w/images/8/89/TystarMechDrawWaferBoat.pdf Tystar Wafer Boat Drawing - 4" Wafer with 0.5mm Slots]		[//wiki.nanotech.ucsb.edu/w/images/8/89/TystarMechDrawWaferBoat.pdf Tystar Wafer Boat Drawing - 4" Wafer with 0.5mm Slots]

	=See Also=		==See Also==
	*[http://www.tystar.com/ Tystar] - Manufacturer of the tool		*[http://www.tystar.com/ Tystar] - Manufacturer of the tool
	*[http://cleanroom.byu.edu/OxideThickCalc Silicon Thermal Oxide Thickness Calculator (BYU)] - Use this on-line calculator to calculate times for silicon oxidation.		*[http://cleanroom.byu.edu/OxideThickCalc Silicon Thermal Oxide Thickness Calculator (BYU)] - Use this on-line calculator to calculate times for silicon oxidation.
	*[http://www.lelandstanfordjunior.com/thermaloxide.html Advanced Silicon Thermal Oxide Thickness Calculator (Stanford Leland Jr.)] - Another thermal oxide calculator, with flexibility to vary ''partial pressure'' parameter to calibrate to your own process.		*[http://www.lelandstanfordjunior.com/thermaloxide.html Advanced Silicon Thermal Oxide Thickness Calculator (Stanford Leland Jr.)] - Another thermal oxide calculator, with flexibility to vary ''partial pressure'' parameter to calibrate to your own process.

	=Operational Instructions=		==Operational Instructions==

	*[//wiki.nanotech.ucsb.edu/w/images/8/8a/Tystar_Operational_Procedure.pdf Operating Instructions]		*[//wiki.nanotech.ucsb.edu/w/images/8/8a/Tystar_Operational_Procedure.pdf Operating Instructions]

John d: /* Recipes */ link to recipes page

2021-02-02T01:08:10Z

Recipes: link to recipes page

← Older revision		Revision as of 01:08, 2 February 2021
Line 46:		Line 46:
	* DRYVAR.003 - ''DryOx, variable temp.''		* DRYVAR.003 - ''DryOx, variable temp.''
	* ANNEAL.003 - ''Anneal with variable time and temperature''		* ANNEAL.003 - ''Anneal with variable time and temperature''

			=== [[Thermal Processing Recipes#Tystar 8300\|<u>Oxidation Rates & Data</u>]] ===
			''See the above recipes page for data on oxidation rates for standard oxidation recipes.''

	=Useful Information=		=Useful Information=
	[~~[Media:~~TystarMechDrawWaferBoat.pdf\|Tystar Wafer Boat Drawing - 4" Wafer with 0.5mm Slots]]		[//wiki.nanotech.ucsb.edu/w/images/8/89/TystarMechDrawWaferBoat.pdf Tystar Wafer Boat Drawing - 4" Wafer with 0.5mm Slots]

	=See Also=		=See Also=
Line 57:		Line 60:
	=Operational Instructions=		=Operational Instructions=

	*[~~[media:Tystar Operational Procedure~~.pdf\|Operating Instructions]]		*[//wiki.nanotech.ucsb.edu/w/images/8/8a/Tystar_Operational_Procedure.pdf Operating Instructions]

Bosch t: /* About */

2020-04-20T16:48:50Z

About

← Older revision		Revision as of 16:48, 20 April 2020
Line 18:		Line 18:
	* '''Tube #3''': General furnace annealing & oxidation, including processed material		* '''Tube #3''': General furnace annealing & oxidation, including processed material

	Each process tube can accomodate up to one hundred 8” wafers per cycle. We have boats for 2", 3", 4", 6", 8" and irregular shaped pieces. The maximum temperature is ~~1050~~°C for the system. Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>.		Each process tube can accomodate up to one hundred 8” wafers per cycle. We have boats for 2", 3", 4", 6", 8" and irregular shaped pieces. The maximum temperature is 1100°C for the system. Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>.

	=Process Information=		=Process Information=

John d: /* About */ specified tube 2: unprocessed, Tube3 processed is ok

2019-05-31T05:56:57Z

About: specified tube 2: unprocessed, Tube3 processed is ok

← Older revision		Revision as of 05:56, 31 May 2019
Line 15:		Line 15:
	The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for specific tubes as follows:		The three stack Tystar 8” furnace is used primarily for 3 processes. The processes are dedicated for specific tubes as follows:
	* '''Tube #1''': SOG curing & low-temp oxidation		* '''Tube #1''': SOG curing & low-temp oxidation
	* '''Tubes #2 and #3''': Dry or wet oxidation of silicon		* '''Tubes #2 and #3''': Dry or wet oxidation of silicon (unprocessed, clean)
	* '''Tube #3''': General furnace annealing		* '''Tube #3''': General furnace annealing & oxidation, including processed material

	Each process tube can accomodate up to one hundred 8” wafers per cycle. We have boats for 2", 3", 4", 6", 8" and irregular shaped pieces. The maximum temperature is 1050°C for the system. Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>.		Each process tube can accomodate up to one hundred 8” wafers per cycle. We have boats for 2", 3", 4", 6", 8" and irregular shaped pieces. The maximum temperature is 1050°C for the system. Gases used are O<sub>2</sub>, Steam from DI-H<sub>2</sub>O, N<sub>2</sub>.