Tutorials - Revision history

John d: moved stepper masks into mask making section, link to "how photomasks are made" page

2025-08-05T04:37:16Z

moved stepper masks into mask making section, link to "how photomasks are made" page

← Older revision		Revision as of 04:37, 5 August 2025
Line 24:		Line 24:
	* [[Calculators + Utilities#Example%20CAD%20File\|Calculators + Utilities > Example CAD File]] - example stepper mask CAD files, including advanced layout for multiple experiments.		* [[Calculators + Utilities#Example%20CAD%20File\|Calculators + Utilities > Example CAD File]] - example stepper mask CAD files, including advanced layout for multiple experiments.
	* [[Calculators + Utilities#CAD%20Files%20%26%20Templates\|Calculators + Utilities > CAD Files & Templates]] - example GDS/OAS files for various useful structures (alignment marks, verniers, fonts etc)		* [[Calculators + Utilities#CAD%20Files%20%26%20Templates\|Calculators + Utilities > CAD Files & Templates]] - example GDS/OAS files for various useful structures (alignment marks, verniers, fonts etc)

⚫	== Stepper Mask Tutorials ==
⚫	[[File:Stepper Reticle Tutorial - Reticle Masking Schematic.png\|alt=Schematic of stepper blocking off adjacent Images on reticle and exposure onto different wafer locations.\|thumb\|'''[https://wiki.nanofab.ucsb.edu/w/images/c/cb/Demis_D_John_-_Stepper_Reticle_Layout_vs_Wafer_Layout.pdf Click for Stepper Reticle Tutorial]''' Stepper Reticle Patterns (“images”) can optionally be much more sophisticated and flexible than contact plates.\|link=https://wiki.nanofab.ucsb.edu/w/images/c/cb/Demis_D_John_-_Stepper_Reticle_Layout_vs_Wafer_Layout.pdf]]

⚫	* '''[https://wiki.nanofab.ucsb.edu/w/images/c/cb/Demis_D_John_-_Stepper_Reticle_Layout_vs_Wafer_Layout.pdf Stepper Reticle Layout vs Wafer Layout (Demis D. John)]''' ''-'' explains how Stepper mask layout is very different than other litho systems.
⚫	* '''[[Stepper Reticle Layout (Advanced) - Complex Experiments and Variations]]''' - If you need many design variations on your wafer.

	== Mask Making Guidelines ==		== Mask Making Guidelines ==
Line 37:		Line 31:
	* [[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.		* [[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.
	* See [[Tutorials#CAD/Drawing Mask Plates\|CAD tutorials above]] for layout tips and examples.		* See [[Tutorials#CAD/Drawing Mask Plates\|CAD tutorials above]] for layout tips and examples.
			* [[Tutorial - How Photomasks are Made]] - this will help you submit your mask orders and clear up common misconceptions.

		⚫	==== Stepper Mask Tutorials ====
		⚫	[[File:Stepper Reticle Tutorial - Reticle Masking Schematic.png\|alt=Schematic of stepper blocking off adjacent Images on reticle and exposure onto different wafer locations.\|thumb\|'''[https://wiki.nanofab.ucsb.edu/w/images/c/cb/Demis_D_John_-_Stepper_Reticle_Layout_vs_Wafer_Layout.pdf Click for Stepper Reticle Tutorial]''' Stepper Reticle Patterns (“images”) can optionally be much more sophisticated and flexible than contact plates.\|link=https://wiki.nanofab.ucsb.edu/w/images/c/cb/Demis_D_John_-_Stepper_Reticle_Layout_vs_Wafer_Layout.pdf]]

		⚫	* '''[https://wiki.nanofab.ucsb.edu/w/images/c/cb/Demis_D_John_-_Stepper_Reticle_Layout_vs_Wafer_Layout.pdf Stepper Reticle Layout vs Wafer Layout (Demis D. John)]''' ''-'' explains how Stepper mask layout is very different than other litho systems.
		⚫	* '''[[Stepper Reticle Layout (Advanced) - Complex Experiments and Variations]]''' - If you need many design variations on your wafer.

	==== Steppers ====		==== Steppers ====

John d: /* Mask Making Guidelines */ subhe adings

2025-07-18T14:21:10Z

Mask Making Guidelines: subhe adings

← Older revision		Revision as of 14:21, 18 July 2025
Line 33:		Line 33:
	== Mask Making Guidelines ==		== Mask Making Guidelines ==
	''Info for mask/CAD layout for specific tools.''		''Info for mask/CAD layout for specific tools.''

			==== General ====
	* [[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.		* [[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.
	* See [[Tutorials#CAD/Drawing Mask Plates\|CAD tutorials above]] for layout tips and examples.		* See [[Tutorials#CAD/Drawing Mask Plates\|CAD tutorials above]] for layout tips and examples.

			==== Steppers ====
	* [[Stepper Mask-Making Guidelines (Generic)\|Stepper Mask-Making Guidelines]] - Info needed to design and order a reticle for our Stepper systems.		* [[Stepper Mask-Making Guidelines (Generic)\|Stepper Mask-Making Guidelines]] - Info needed to design and order a reticle for our Stepper systems.
	* [https://docs.google.com/document/d/1b9YT11RPsl-UlLvN74hrQvG01OcYDL16r6I5lPOlBEo/edit?usp=sharing ASML-specific Mask Making Guidelines (Private)] - More detailed info to design and order a reticle for this specific ASML system.		* [https://docs.google.com/document/d/1b9YT11RPsl-UlLvN74hrQvG01OcYDL16r6I5lPOlBEo/edit?usp=sharing ASML-specific Mask Making Guidelines (Private)] - More detailed info to design and order a reticle for this specific ASML system.
Line 41:		Line 45:
	* [[Autostep 200 Mask Making Guidance]] - information on designing and ordering your photomasks for the GCA AutoStep 200.		* [[Autostep 200 Mask Making Guidance]] - information on designing and ordering your photomasks for the GCA AutoStep 200.
	* [[GCA 6300 Mask Making Guidance]] (''Work in progress'') - GCA 6300 Stepper		* [[GCA 6300 Mask Making Guidance]] (''Work in progress'') - GCA 6300 Stepper

			==== Contact Aligners ====
	* [[Mask Making Guidelines for Contact Aligners\|Mask Making Guidelines - Contact Masks]] - for the MJB-3 & MA6 Contact Aligners		* [[Mask Making Guidelines for Contact Aligners\|Mask Making Guidelines - Contact Masks]] - for the MJB-3 & MA6 Contact Aligners

			==== Direct-Write ====
	* [[MLA150 - Design Guidelines]] - for the Heidelberg MLA150 Direct-Writer		* [[MLA150 - Design Guidelines]] - for the Heidelberg MLA150 Direct-Writer

John d: /* Mask Making Guidelines */ link to cad, separated by litho type

2025-07-18T14:19:47Z

Mask Making Guidelines: link to cad, separated by litho type

← Older revision		Revision as of 14:19, 18 July 2025
Line 34:		Line 34:
	''Info for mask/CAD layout for specific tools.''		''Info for mask/CAD layout for specific tools.''
	* [[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.		* [[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.
			* See [[Tutorials#CAD/Drawing Mask Plates\|CAD tutorials above]] for layout tips and examples.

	* [[Stepper Mask-Making Guidelines (Generic)\|~~'''~~Stepper Mask-Making Guidelines~~'''~~]] - Info needed to design and order a reticle for our Stepper systems.		* [[Stepper Mask-Making Guidelines (Generic)\|Stepper Mask-Making Guidelines]] - Info needed to design and order a reticle for our Stepper systems.
	* [https://docs.google.com/document/d/1b9YT11RPsl-UlLvN74hrQvG01OcYDL16r6I5lPOlBEo/edit?usp=sharing ASML-specific Mask Making Guidelines (Private)] - More detailed info to design and order a reticle for this specific ASML system.		* [https://docs.google.com/document/d/1b9YT11RPsl-UlLvN74hrQvG01OcYDL16r6I5lPOlBEo/edit?usp=sharing ASML-specific Mask Making Guidelines (Private)] - More detailed info to design and order a reticle for this specific ASML system.
	** ''Access is restricted to trained users only by ASML's requirement - please contact [[Demis D. John\|tool supervisor]] for access.''		** ''Access is restricted to trained users only by ASML's requirement - please contact [[Demis D. John\|tool supervisor]] for access.''

John d: /* Mask Making Guidelines */

2025-07-18T14:16:38Z

Mask Making Guidelines

← Older revision		Revision as of 14:16, 18 July 2025
Line 35:		Line 35:
	* [[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.		* [[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.

	* [[Stepper Mask-Making Guidelines (Generic)\|'''Stepper Mask-Making Guidelines''']] - Info needed to design and order a reticle for our Stepper systems.		* [[Stepper Mask-Making Guidelines (Generic)\|'''Stepper Mask-Making Guidelines''']] - Info needed to design and order a reticle for our Stepper systems.
	* ~~'''~~[https://docs.google.com/document/d/1b9YT11RPsl-UlLvN74hrQvG01OcYDL16r6I5lPOlBEo/edit?usp=sharing ASML-specific Mask Making Guidelines (Private)]~~'''~~ - More detailed info to design and order a reticle for this specific ASML system.		* [https://docs.google.com/document/d/1b9YT11RPsl-UlLvN74hrQvG01OcYDL16r6I5lPOlBEo/edit?usp=sharing ASML-specific Mask Making Guidelines (Private)] - More detailed info to design and order a reticle for this specific ASML system.
	** ''Access is restricted to trained users only by ASML's requirement - please contact [[Demis D. John\|tool supervisor]] for access.''		** ''Access is restricted to trained users only by ASML's requirement - please contact [[Demis D. John\|tool supervisor]] for access.''

John d: link to "Processing- How do I?"

2025-06-05T17:54:19Z

link to "Processing- How do I?"

← Older revision		Revision as of 17:54, 5 June 2025
Line 2:		Line 2:

	__TOC__		__TOC__

	<hr\>

	== Fabrication Tracking and Process Design ==		== Fabrication Tracking and Process Design ==
Line 49:		Line 47:
	* [[Lithography Calibration - Analyzing a Focus-Exposure Matrix\|Lithography Calibration - Analyzing a Focus-Exposure Matrix (FEM)]] - Projection litho systems (steppers, direct-writers) usually require a lithography calibration, using a Focus-Exposure Matrix/Array (FEM/FEA).		* [[Lithography Calibration - Analyzing a Focus-Exposure Matrix\|Lithography Calibration - Analyzing a Focus-Exposure Matrix (FEM)]] - Projection litho systems (steppers, direct-writers) usually require a lithography calibration, using a Focus-Exposure Matrix/Array (FEM/FEA).
	*{{fl\|Liftoff-Techniques.pdf\|Lift-Off Description/Tutorial}} - How it works, process limits and considerations for designing your process.		*{{fl\|Liftoff-Techniques.pdf\|Lift-Off Description/Tutorial}} - How it works, process limits and considerations for designing your process.

			== General Fabrication ==

			* [[Processing - How Do I…?]] ← This page attempts to list common solutions to fabrication issues our lab users often run into.

John d: added Experimetn Setup links and figures

2025-06-05T16:18:17Z

added Experimetn Setup links and figures

← Older revision		Revision as of 16:18, 5 June 2025
Line 2:		Line 2:

	__TOC__		__TOC__

			<hr\>

			== Fabrication Tracking and Process Design ==
			Designing experiments, tracking your fabrication steps/process improvements, and keeping track of your results are key to achieving repeatable and improved results!

			See this tutorial for example Travelers, Design of Experiments, and Manufacturing Execution Systems:

			* [[Processing - How Do I…?#Experiment%20Setup\|'''Processing \| Experiment Setup''']]

			{\| class="wikitable"
			\|+Examples of Trello + Google Drive for tracking fabrication jobs
			\|[[File:Trello - Example Job Cards.png\|alt=Trello - Example Job Cards screenshot\|none\|thumb\|367x367px\|Tracking to-do and completed tasks.]][[File:Google Drive - Example Job Folder.png\|alt=Google Drive - Example Job Folder screenshot\|none\|thumb\|327x327px\|Example Job Folder on Google Drive with in-process traveler, microscope/SEM images, testing results etc.]]
			\|[[File:Trello - example job card.png\|alt=Trello - example job card screenshot\|none\|thumb\|504x504px\|Example job card for a fabrication run.]]
			\|}

	== CAD/Drawing Mask Plates ==		== CAD/Drawing Mask Plates ==

John d: /* Mask Making Guidelines */

2025-05-08T23:34:14Z

Mask Making Guidelines

← Older revision		Revision as of 23:34, 8 May 2025
Line 19:		Line 19:

	== Mask Making Guidelines ==		== Mask Making Guidelines ==
			''Info for mask/CAD layout for specific tools.''

	* [[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.		* [[Photomask Ordering Procedure for UCSB Users]] - see this page for how to submit your order into the purchasing system.

John d: added TOC, moved CAD to it's own header

2025-05-08T23:33:03Z

added TOC, moved CAD to it's own header

← Older revision		Revision as of 23:33, 8 May 2025
Line 1:		Line 1:
			The following are various tutorials from our NanoFab Wiki, collected here for your convenience.
⚫	~~The following~~ are pages to help you design your devices in drawing programs, and make photomasks (aka. "masks" or "reticles") for various systems in our lab.

			__TOC__
⚫	== Drawing ~~Programs~~ ==

	:[[File:CAD Tutorial for ASML Reticle v1 - screenshot Device Layout cell.png\|alt=screenshot of KLayout view of Device_Layout\|thumb\|300x300px\|KLayout: example CAD file.]]
		⚫	== CAD/Drawing Mask Plates ==
		⚫	:Here are pages to help you design your devices in drawing programs, and make photomasks (aka. "masks" or "reticles") for various systems in our lab.[[File:CAD Tutorial for ASML Reticle v1 - screenshot Device Layout cell.png\|alt=screenshot of KLayout view of Device_Layout\|thumb\|300x300px\|KLayout: example CAD file.]]
	Microfabrication CAD drawings are simple 2D drawings with layers, even though they are intended to become 3D devices through the fabrication process. The fabrication is all top-down, hence only 2D patterning is used.		Microfabrication CAD drawings are simple 2D drawings with layers, even though they are intended to become 3D devices through the fabrication process. The fabrication is all top-down, hence only 2D patterning is used.

John d: John d moved page CAD and Photomask Layout to Tutorials: purpose of the page changed

2025-05-08T23:29:52Z

John d moved page CAD and Photomask Layout to Tutorials: purpose of the page changed

← Older revision	Revision as of 23:29, 8 May 2025
(No difference)

John d: link to liftoff tutorial, new section litho tutorials

2025-04-29T16:05:10Z

link to liftoff tutorial, new section litho tutorials

← Older revision		Revision as of 16:05, 29 April 2025
Line 29:		Line 29:
	* [[MLA150 - Design Guidelines]] - for the Heidelberg MLA150 Direct-Writer		* [[MLA150 - Design Guidelines]] - for the Heidelberg MLA150 Direct-Writer

			== Lithography Tutorials ==
	Projection litho systems (steppers, direct-writers) usually require a lithography calibration, as follows:
		⚫	* [[Lithography Calibration - Analyzing a Focus-Exposure Matrix\|Lithography Calibration - Analyzing a Focus-Exposure Matrix (FEM)]] - Projection litho systems (steppers, direct-writers) usually require a lithography calibration, using a Focus-Exposure Matrix/Array (FEM/FEA).

			*{{fl\|Liftoff-Techniques.pdf\|Lift-Off Description/Tutorial}} - How it works, process limits and considerations for designing your process.
⚫	* [[Lithography Calibration - Analyzing a Focus-Exposure Matrix\|Lithography Calibration - Analyzing a Focus-Exposure Matrix (FEM)]] - ~~how~~ to ~~analyze~~ an FEM