Difference between revisions of "ICP Etching Recipes"
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===GaAs Etch === |
===GaAs Etch === |
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*[[media:15-GaAs_etch-Unaxis_ICP_etcher.pdf|GaAs Etch Recipe (30C)]] |
*[[media:15-GaAs_etch-Unaxis_ICP_etcher.pdf|GaAs Etch Recipe (30C)]] |
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+ | ===AlGaAs Etch === |
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+ | *[[media:|AlGaAs Etch Recipe (30C)]] |
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==InP Etch (Unaxis VLR)== |
==InP Etch (Unaxis VLR)== |
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===InP Etch === |
===InP Etch === |
Revision as of 12:47, 2 October 2013
Back to Dry Etching Recipes.
Si Deep RIE (PlasmaTherm/Bosch Etch)
Single-step Si Etching (not Bosch Process!) (Si Deep RIE)
ICP Etch 1 (Panasonic E626I)
SiO2 Etching (Panasonic 1)
Al Etch (Panasonic 1)
Cr Etch (Panasonic 1)
Ti Etch (Panasonic 1)
AlGaAs Etch (Panasonic 1)
GaN Etch (Panasonic 1)
ICP Etch 2 (Panasonic E640)
SiO2 Etching (Panasonic 2)
Al Etch (Panasonic 2)
ICP-Etch (Unaxis VLR)
GaAs Etch
AlGaAs Etch
- [[media:|AlGaAs Etch Recipe (30C)]]