Difference between revisions of "ICP Etching Recipes"
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*[[media:Panasonic2-SiOx-Recipe.pdf|SiO<sub>2</sub> Vertical Etch Recipe]] | *[[media:Panasonic2-SiOx-Recipe.pdf|SiO<sub>2</sub> Vertical Etch Recipe]] | ||
*[[media:Panasonic2-ICP-Plasma-Etch-SiO2-nanoscale-rev1.pdf|SiO<sub>2</sub> Nanoscale Etch Recipe]] | *[[media:Panasonic2-ICP-Plasma-Etch-SiO2-nanoscale-rev1.pdf|SiO<sub>2</sub> Nanoscale Etch Recipe]] | ||
+ | |||
+ | ==SiN<sub>x</sub> Etching (Panasonic 2)== | ||
+ | *[[media:Panasonic2-ICP-Plasma-Etch-SiN-nanoscale-rev1.pdf|SiN<sub>x</sub> Nanoscale Etch Recipe]] | ||
==Al Etch (Panasonic 2)== | ==Al Etch (Panasonic 2)== |
Revision as of 11:39, 22 October 2013
Back to Dry Etching Recipes.