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{| class="wikitable"
| colspan="6" |Flourine ICP: 3.8mT, 50/900W, CF4/CHF3=30/10sccm,  time=210 sec
|-
|Date
|Sample#
|Etch  Rate (nm/min)
|Etch  Selectivity (SiO2/PR)
|Averaged  Sidewall Angle (<sup>o</sup>)
|SEM  Image
|-
|11/5/2021
|SOFL01
|136
|1.2
|
|
|}

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