View source for Unaxis VLR Etch - Process Control Data

==Data - InP Ridge Etch (Unaxis VLR)==
[[PECVD1-(PlasmaTherm 790)|PECVD SiO2]] hardmask, patterned on [[Stepper 1 (GCA 6300)|Stepper #2 (AutoStep 200)]] & [[ICP Etch 1 (Panasonic E626I)|Panasonic ICP #1]] 
{| class="wikitable"
|- bgcolor="#fcfcfc"
| colspan="6" |'''InP Ridge Etch''': 200°C, 1.4mT, 800W/125W, Cl<sub>2</sub>=6.3, H<sub>2</sub>=12.7, Ar=2.0 sccm, time=1min30sec (90sec)
''Sample Size:'' 1x1cm epi-grade InP, ~30-40% SiO<sub>2</sub> masking (NingC's pattern). Silicon carrier, no adhesive.

''Conditioning:'' Prior to the etch, do O2 clean 15 minutes, then, chamber coating with the same recipe on 1/4-2" InP on Silicon carrier for 15 minutes.
|- bgcolor="#e4e7ed"
|'''Date'''
|'''Sample#'''
|'''Etch  Rate (nm/min)'''
|'''Etch  Selectivity (InP/SiO2)'''
|'''Comments'''
|'''SEM Images'''
|-
|11/18/22
|ND_Unaxis_03
|800
|45.3
|Only slightly less PR etched led to extremely high selectivity.
|[https://wiki.nanotech.ucsb.edu/w/images/d/dc/30D_unaxis_111822_002.jpg <nowiki>[30D]</nowiki>][https://wiki.nanotech.ucsb.edu/w/images/c/cd/CS_unaxis_111822_003.jpg <nowiki>[CS]</nowiki>]
|-
|11/11/22
|ND_Unaxis_02
|760
|24.5
|
|[https://wiki.nanotech.ucsb.edu/w/images/7/73/30D_unaxis_111122_002.jpg <nowiki>[30D]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/b/bf/CS_unaxis_111122_002.jpg <nowiki>[CS]</nowiki>]
|-
|9/30/22
|ND_Unaxis_01
|760
|22.1
|etch rate is correct, previous rates are 

taken in microns/min
|[https://wiki.nanotech.ucsb.edu/w/images/7/78/30D_unaxis_09302022_002.jpg <nowiki>[30D]</nowiki>][https://wiki.nanotech.ucsb.edu/w/images/f/fe/CS_unaxis_093022_001.jpg <nowiki>[CS]</nowiki>]
|-
|4/28/22
|NP_Unaxis_03
|1.51
|22.2
|Normal profile - vertical and smooth.
|[https://wiki.nanotech.ucsb.edu/w/images/a/ae/Unaxis_03_45D_003.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/a/a8/Unaxis_03_CS_003.jpg <nowiki>[2]</nowiki>]
|-
|3/30/22
|NP_Unaxis_02
|1.41
|14.6
|Strong undercut!
|[https://wiki.nanotech.ucsb.edu/w/images/8/84/Unaxis_02_45D_002.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/6/60/Unaxis_02_CS_002.jpg <nowiki>[2]</nowiki>]
|-
|3/9/22
|NP_Unaxis_01
|1.30
|15.3
|
|[https://wiki.nanotech.ucsb.edu/w/images/3/3e/Unaxis_01_45D_002.jpg <nowiki>[1]</nowiki>] [https://wiki.nanotech.ucsb.edu/w/images/7/71/Unaxis_01_CS_001.jpg <nowiki>[2]</nowiki>]
|-
|11/8/2021
|InP#2102
|1.24
|13.8
|
|[https://wiki.nanotech.ucsb.edu/w/images/4/45/IP210201.pdf][https://wiki.nanotech.ucsb.edu/w/images/4/49/IP210212.pdf]
|-
|2/3/2021
|InP#2101
|1.30
|16
|
|[https://wiki.nanotech.ucsb.edu/w/images/4/47/IP210117.pdf][https://wiki.nanotech.ucsb.edu/w/images/d/d4/IP210119.pdf]
|-
|8/30/2020
|InP#2001
|1.11
|10.4
|
|[https://wiki.nanotech.ucsb.edu/w/images/8/8d/IP020104.pdf]
|-
|1/31/2019
|InP#1901
|0.88
|9.7
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/b/b7/IP190101.pdf][https://wiki.nanotech.ucsb.edu/wiki/images/0/06/IP190103.pdf]
|-
|12/10/2018
|InP#1809
|1.01
|11.4
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/8/84/IP180909.pdf]
|-
|10/3/2018
|InP#1808
|1.01
|13.7
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/e/e5/IP180805.pdf]
|-
|8/7/2018
|InP#1807
|0.81
|8.0
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/f/fb/IP180705.pdf]
|-
|5/22/2018
|InP#1806
|0.88
|8.4
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/e/e1/IP180606.pdf]
|-
|4/26/2018
|InP#1805
|1.29
|13.6
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/c/c8/IP180508.pdf]
|-
|4/10/2018
|InP#1804
|1.12
|12.8
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/1/17/IP180406.pdf]
|-
|4/5/2018
|InP#1803
|1.05
|11.9
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/c/c7/IP180304.pdf]
|-
|3/1/2018
|InP#1802
|0.96
|9
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/6/65/IP180207.pdf]
|-
|1/2/2018
|InP#1801
|1.44
|14.3
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/0/0d/IP180104.pdf]
|-
|12/7/2017
|InP#1714
|0.96
|10.4
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/0/03/IP173306.pdf]
|-
|11/21/2017
|InP#1713
|1.04
|12.1
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/0/02/IP173203.pdf]
|-
|10/23/2017
|InP#1712
|1.11
|13.1
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/4/41/IP173107.pdf]
|-
|10/11/2017
|InP#1711
|1
|11
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/9/97/IP173009.pdf]
|-
|8/28/2017
|InP#1710
|1
|11.7
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/a/aa/IP172905.pdf]
|-
|8/16/2017
|InP#1709
|0.76
|8
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/f/fa/IP172805.pdf]
|-
|7/6/2017
|InP#1708
|0.98
|12.1
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/a/ac/IP172520.pdf]
|-
|5/19/2017
|InP#1707
|0.82
|9.9
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/7/7f/IP170706.pdf]
|-
|5/4/2017
|InP#1706
|0.84
|11
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/d/d1/IP170603.pdf]
|-
|4/20/2017
|inP#1705
|0.88
|10.2
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/5/5b/IP170505.pdf]
|-
|3/21/2017
|InP#1704
|1.01
|11.3
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/f/fd/IP170404.pdf]
|-
|2/21/2017
|InP#1703
|0.91
|11.3
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/b/b8/IP170302.pdf]
|-
|2/7/2017
|InP#1702
|0.75
|7.7
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/2/2f/IP170208.pdf]
|-
|1/23/2017
|InP#1701
|0.93
|9.4
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/7/7f/IP170106.pdf]
|-
|12/15/2016
|InP#1615
|0.91
|9.3
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/6/64/IP161510.pdf]
|-
|12/1/2016
|InP#1614
|0.96
|12.1
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/e/ed/IP161421.pdf]
|-
|10/4/2016
|InP#1613
|0.92
|8.9
|
|[https://wiki.nanotech.ucsb.edu/wiki/images/9/9b/IP161332.pdf]
|}