ICP Etching Recipes: Difference between revisions
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{{recipes|Dry Etching}} |
{{recipes|Dry Etching}} |
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=[[ICP Etch 1 (Panasonic E626I)]]= |
=[[ICP Etch 1 (Panasonic E626I)]]= |
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==SiO<sub>2</sub> Vertical Etch== |
==SiO<sub>2</sub> Vertical Etch (Panasonic 1)== |
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*[[media:Panasonic1-SiO-Etch.pdf|SiO<sub>2</sub> Vertical Etch Recipe]] |
*[[media:Panasonic1-SiO-Etch.pdf|SiO<sub>2</sub> Vertical Etch Recipe]] |
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=[[ICP Etch 2 (Panasonic E640)]]= |
=[[ICP Etch 2 (Panasonic E640)]]= |
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==SiOx Vertical Etch== |
==SiOx Vertical Etch (Panasonic 2)== |
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*[[media:Panasonic2-SiOx-Recipe.pdf|SiOx Vertical Etch Recipe]] |
*[[media:Panasonic2-SiOx-Recipe.pdf|SiOx Vertical Etch Recipe]] |
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Revision as of 20:16, 20 August 2012
Back to Dry Etching Recipes.