Template:LithRecipe Table: Difference between revisions
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| width="" bgcolor="#DAF1FF" | [[Contact_Alignment_Recipes#Suss Aligners (SUSS MJB-3)|Suss Aligners]] |
| width="65" bgcolor="#DAF1FF" | [[Contact_Alignment_Recipes#Suss Aligners (SUSS MJB-3)|Suss Aligners]] |
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| width="65" bgcolor="#DAF1FF" | [[Contact_Alignment_Recipes#Contact Aligner (SUSS MA-6)|Contact Aligner]] |
| width="65" bgcolor="#DAF1FF" | [[Contact_Alignment_Recipes#Contact Aligner (SUSS MA-6)|Contact Aligner]] |
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| width=" |
| width="100" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 1 (GCA 6300)|Stepper 1<br>(GCA 6300)]] |
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| width=" |
| width="100" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 2 (AutoStep 200)|Stepper 2<br>(AutoStep 200)]] |
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| width=" |
| width="100" bgcolor="#DAF1FF" | [[Stepper Recipes#Stepper 3 (ASML DUV)|Stepper 3<br>(ASML DUV)]] |
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| width="30" bgcolor="#DAF1FF" | [[Flood_Exposure_Recipes#DUV Flood Expose|DUV Flood]] |
| width="30" bgcolor="#DAF1FF" | [[Flood_Exposure_Recipes#DUV Flood Expose|DUV Flood]] |
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| width=" |
| width="175" bgcolor="#DAF1FF" | [[E-Beam_Lithography_Recipes#Field Emission SEM 1 (FEI Sirion)|Field Emission SEM 1<br>(FEI Sirion)]] |
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| width=" |
| width="175" bgcolor="#DAF1FF" | [[E-Beam_Lithography_Recipes#E-Beam Lithography System (JEOL JBX-6300FS)|E-Beam Lithography System<br>(JEOL JBX-6300FS)]] |
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Revision as of 14:59, 21 August 2012
| width="65" bgcolor="#DAF1FF" | Suss Aligners
| width="65" bgcolor="#DAF1FF" | Contact Aligner
| width="100" bgcolor="#DAF1FF" | Stepper 1
(GCA 6300)
| width="100" bgcolor="#DAF1FF" | Stepper 2
(AutoStep 200)
| width="100" bgcolor="#DAF1FF" | Stepper 3
(ASML DUV)
| width="30" bgcolor="#DAF1FF" | DUV Flood
| width="175" bgcolor="#DAF1FF" | Field Emission SEM 1
(FEI Sirion)
| width="175" bgcolor="#DAF1FF" | E-Beam Lithography System
(JEOL JBX-6300FS)