Lithography Recipes: Difference between revisions
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! bgcolor="#D0E7FF" align="center" colspan="2" | '''[[E-Beam Lithography Recipes|E-Beam Lithography]]''' |
! bgcolor="#D0E7FF" align="center" colspan="2" | '''[[E-Beam Lithography Recipes|E-Beam Lithography]]''' |
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! width="50" bgcolor="#D0E7FF" align="center" | '''Positive Resists''' |
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{{LithRecipe Table}} |
{{LithRecipe Table}} |
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Revision as of 15:00, 21 August 2012
Lithography Recipes
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|---|---|---|---|---|---|---|---|---|
| Contact Aligners | Steppers | Flood Expose | E-Beam Lithography | |||||
| Positive Resists | SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) | ||
| AZ4110 | ||||||||
| AZ4210 | ||||||||
| AZ4330RS | ||||||||
| OCG 825-35CS | ||||||||
| SPR 950-0.8 | ||||||||
| SPR 955 CM-0.9 | ||||||||
| SPR 955 CM-1.8 | ||||||||
| SPR 220-3.0 | ||||||||
| SPR 220-7.0 | ||||||||
| THMR-IP3600 HP D | ||||||||
| UV6-0.7 | ||||||||
| Negative Resists | SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) | ||
| AZ5214-EIR | ||||||||
| AZnLOF 2020 | ||||||||
| AZnLOF 2035 | ||||||||
| AZnLOF 2070 | ||||||||
| AZnLOF P5510 | ||||||||
| UVN30-0.5 | ||||||||
| SU-8 2015 | ||||||||
| SUSS MJB-3 | SUSS MA-6 | Stepper 1 (GCA 6300) |
Stepper 2 (AutoStep 200) |
Stepper 3 (ASML DUV) |
MLA150 (Heidelberg) | |||