Lithography Recipes: Difference between revisions

Revision as of 16:54, 21 August 2012

Lithography Recipes
	Contact Aligners		Steppers			Flood Expose	E-Beam Lithography
Positive Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
AZ4110
AZ4210
AZ4330RS
OCG 825-35CS
SPR 950-0.8
SPR 955 CM-0.9
SPR 955 CM-1.8
SPR 220-3.0
SPR 220-7.0
THMR-IP3600 HP D
UV6-0.7
Negative Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
AZ5214-EIR
AZnLOF 2020
AZnLOF 2035
AZnLOF 2070
AZnLOF P5510
UVN30-0.5
SU-8 2015
Underlayers	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
PMGI SF-11
PMGI SF-15
LOL 2000
XHRIC-11 (BARC)
AR-2 (BARC)
DS-K 101-307 (BARC)
Overlayers	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
CEM-365 IS
E-Beam Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
??????
???????
Nanoimprint Resists	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)
MR-I 7020
Nanonex NX-1020
	SUSS MJB-3	SUSS MA-6	Stepper 1 (GCA 6300)	Stepper 2 (AutoStep 200)	Stepper 3 (ASML DUV)	MLA150 (Heidelberg)

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 {{LithRecipe Table}}
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 ! bgcolor="#D0E7FF" align="center" | '''Underlayers'''
 {{LithRecipe Table}}
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 {{LithRecipe Table}}
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 | bgcolor="#D0E7FF" align="center" | CEM-365 IS
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Lithography Recipes: Difference between revisions

Revision as of 16:54, 21 August 2012

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