ICP-PECVD (Unaxis VLR): Difference between revisions
Jump to navigation
Jump to search
No edit summary |
No edit summary |
||
| Line 9: | Line 9: | ||
|manufacturer = Unaxis |
|manufacturer = Unaxis |
||
|materials = |
|materials = |
||
|toolid=17 |
|||
}} |
}} |
||
= About = |
= About = |
||
Revision as of 20:29, 10 July 2012
| |||||||||||||||||||||
About
This system is configured as an ICP PECVD deposition tool with 1000 W ICP power, 600 W RF substrate power, and RT-350°C operation. This chamber has 100% SiH4, N2, O2, and Ar for gas sources. The high density PECVD produces a more dense, higher quality SiO2 and Si3N4, as compared with conventional PECVD. With the high density plasma, deposition of high quality films can be done down to below 50°C for processes requiring lower temperatures. Stress compensation for silicon nitride is characterized.
Detailed Specifications
- 1000W ICP source, 600W RF Sample Bias Source in etching chamber
- RT - 350°C sample temperature
- 100% SiH4, Ar, N2, O2
- Multiple 4” diameter wafer capable system
- Pieces possible by mounting or placing on 4 ” wafer