Oven 5 (Labline): Difference between revisions
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= About = |
= About = |
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The oven temperature can be controlled from 30C-200C with a ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use. |
The oven temperature can be controlled from 30C-200C with a user programable ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use. |
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=Documentation= |
=Documentation= |
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*[[ media: Watlow_982_controller.pdf|Operating Instructions Chapter 7 is specific to Nanofab users]] |
*[[ media: Watlow_982_controller.pdf|Operating Instructions: Chapter 7 is specific to Nanofab users]] |
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*[[ media: Oven5.pdf|Oven 5 Manual]] |
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=Oven 5= |
=Oven 5= |
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{{ |
{{tool2|{{PAGENAME}} |
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|picture=Oven5.jpg |
|picture=Oven5.jpg |
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|type = Lithography |
|type = Lithography |
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|super= |
|super= Michael Barreraz |
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|super2= Aidan Hopkins |
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|location=Bay 5 |
|location=Bay 5 |
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|description = ? |
|description = ? |
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Latest revision as of 17:21, 30 August 2022
About
The oven temperature can be controlled from 30C-200C with a user programable ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use.
Documentation
Oven 5
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