File:SEM Image.png: Difference between revisions

Latest revision as of 18:50, 28 January 2025

Wafer had UV6 or UVN30 as mask. 5min Si etch followed by PostBARC Etch/PR Strip (STD)_V2 with 2min over etch

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current	18:47, 28 January 2025		1,500 × 603 (706 KB)	Gopimeena (talk \| contribs)

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Horizontal resolution	59.05 dpc
Vertical resolution	59.05 dpc

Revision as of 18:47, 28 January 2025 (view source) Gopimeena (talk \| contribs) No edit summary		Latest revision as of 18:50, 28 January 2025 (view source) Gopimeena (talk \| contribs) No edit summary Tag: Visual edit
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			Wafer had UV6 or UVN30 as mask. 5min Si etch followed by PostBARC Etch/PR Strip (STD)_V2 with 2min over etch
	Mask