Photoresist Spin Coat Benches: Difference between revisions
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#redirect [[Wet Benches#Spin Coat Benches]] |
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{{tool|{{PAGENAME}} |
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|picture=SpinBench.jpg |
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|type = Wet Processing |
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|super= Aidan Hopkins |
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|phone=(805)839-3918x208 |
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|location=? |
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|email=hopkins@ece.ucsb.edu |
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|description = Custom Photoresist Spin Coat Bench |
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|manufacturer = Pure Aire Corporation |
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|materials = |
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}} |
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= About = |
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The facility contains 3 stainless steel solvent benches for photoresist spin coating. The benches consist each of 2 integrated Headway PWM32 series photoresist spinners. Overhead and foot controls are provided. 8 preprogrammed recipes and 2 user-programmable recipes are offered. Automatic wafer lifting and centering stations are offered for spinning large wafers up to 8” in diameter. 6” or 8” Cee ultra-flat hotplates with 0.1°C temperature stability are preset for standard resist bake temperatures (90, 95, 100, 105, 110, 115°C). Other user-changeable hot plates are also provided. Nitrogen guns are also on both sides of the bench. Large resist bottles are stored in a refrigerator amd small user bottles are stored by group in a ventilated steel cabinet. Waste pipets and resist soaked wipes are collected for disposal. A list of stocked resists appears on the lithography processing web page. Other chemicals should be OK'd by laboratory staff prior to use in the laboratory. |
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= Deatailed Specifications = |
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*2 Headway PWM32 spinners per bench, multi-step programming |
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*8 preset spin programs, 2 user defineable |
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*Variety of wafer chucks for 5 mm x 5 mm pieces to 6” wafers |
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*Lifters for large wafer centering |
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*Preset 0.1°C stable, ultra-flat hotplates (90, 95, 1100, 105, 110, 115°C) |
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*'''NO WAX''' on hotplates |
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*Other hotplates for user defined temperatures |
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*Hepa filtered laminar flow for Class 100 |
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*Manual dispense of resist; particle filtering available |
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Latest revision as of 14:42, 12 July 2012
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