Other Dry Etching Recipes: Difference between revisions
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*[https://wiki.nanotech.ucsb.edu/w/images/e/e3/44-Etching_Gold_with_Al2O3_Mask_using_Oxford_Ion_Mill_Tool.pdf Au Etch Recipe] |
*[https://wiki.nanotech.ucsb.edu/w/images/e/e3/44-Etching_Gold_with_Al2O3_Mask_using_Oxford_Ion_Mill_Tool.pdf Au Etch Recipe] |
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*[https://wiki.nanotech.ucsb.edu/w/images/f/f1/45-Etching_Nickel_with_Al2O3_Mask_using_Oxford_Ion_Mill_Tool.pdf Ni Etch Recipe] |
*[https://wiki.nanotech.ucsb.edu/w/images/f/f1/45-Etching_Nickel_with_Al2O3_Mask_using_Oxford_Ion_Mill_Tool.pdf Ni Etch Recipe] |
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*[https://wiki.nanotech.ucsb.edu/ |
*[https://wiki.nanotech.ucsb.edu/w/images/5/53/InP_Etching_result-CAIBE.pdf InP Etch Recipe] |
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=Misc= |
=Misc= |
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Revision as of 22:27, 31 July 2020
Back to Dry Etching Recipes.
XeF2 Etch (Xetch)
Vapor HF Etch (uETCH)
CAIBE (Oxford Ion Mill)
- Remind: From now on, one should always use Prf=200W! (see Brian Lingg for explanation)
- Pt Etch Recipe
- Au Etch Recipe
- Ni Etch Recipe
- InP Etch Recipe