Revision as of 16:34, 17 August 2012

PECVD 1 (PlasmaTherm 790)

@@ Line 18: / Line 18: @@
 *[[media:PECVD2-SiO2-Data.pdf|SiO<sub>2</sub> Deposition Particle Thickness Data]]
-=[[ICP-PECVD (Unaxis VLR)]]=
+= [[ICP-PECVD (Unaxis VLR)]] =
-== SiN deposition (Unaxis VLR)  ==
+==SiN deposition (Unaxis VLR) ==
+=== SiN (2% SiH<sub>4</sub>)   ===
-*[[media:PECVD2-SiN-Recipe-5W-High-Stress.pdf|SiN Deposition Recipe (5W High Stress)]]
+*50°
-*[[media:PECVD2-SiN-Recipe-50W-Medium-Stress.pdf|SiN Deposition Recipe (50W Medium Stress)]]
+**
-*[[media:PECVD2-SiN-Recipe-120W-Low-Stress.pdf|SiN Deposition Recipe (120W Low Stress)]]
+**
+**
+*100°C
+**[[Media:PECVD2-SiN-Recipe-5W-High-Stress.pdf|SiN Deposition Recipe (5W 100° High Stress)]]
+**[[Media:PECVD2-SiN-Recipe-50W-Medium-Stress.pdf|SiN Deposition Recipe (50W 100° Medium Stress)]]
+**[[Media:PECVD2-SiN-Recipe-120W-Low-Stress.pdf|SiN Deposition Recipe (120W 100° Low Stress)]]
+*250°C
+**
+**
+**
+=== SiN  (2% SiH<sub>4</sub> - No-Ar)  ===
+*50°
+**
+**
+**
+*100°C
+**
+**
+**
+*250°C
+**
+**
+**