ICP Etching Recipes: Difference between revisions
Jump to navigation
Jump to search
| Line 19: | Line 19: | ||
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]] |
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]] |
||
=[[Si-Etch (XeF2 Etch (Xetch))]]= |
|||
==Si Etch (XeF2 Etch (Xetch))== |
==Si Etch (XeF2 Etch (Xetch))== |
||
===Si Etch === |
|||
*[[media:06-XeF2-etch-recipe.pdf|Si Etch Recipe]] |
*[[media:06-XeF2-etch-recipe.pdf|Si Etch Recipe]] |
||
Revision as of 18:42, 17 September 2013
Back to Dry Etching Recipes.