ICP Etching Recipes: Difference between revisions

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{{recipes|Dry Etching}}
=[[XeF2 Etch (Xetch)]]=
*[[media:06-XeF2-etch-recipe.pdf|Si Etch Recipe]]





{{recipes|Dry Etching}}
{{recipes|Dry Etching}}
=[[ICP Etch 1 (Panasonic E626I)]]=
=[[ICP Etch 1 (Panasonic E626I)]]=
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===InP Etch (H<sub>2</sub> Ar)===
===InP Etch (H<sub>2</sub> Ar)===
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]]
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]]

=[[XeF2 Etch (Xetch)]]=
*[[media:06-XeF2-etch-recipe.pdf|Si Etch Recipe]]

Revision as of 16:21, 24 September 2013