ICP Etching Recipes: Difference between revisions

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===InP Etch (H<sub>2</sub> Ar)===
===InP Etch (H<sub>2</sub> Ar)===
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]]
*[[media:UNAXIS-VLR-InP-Etch-Ar-200C-Recipe.pdf|InP Etch Recipe (H<sub>2</sub> Ar 200C)]]
*[[media:|InP-InGaAs Etch Profile (H<sub>2</sub> Ar 200C)]]

==GaN Etch (Unaxis VLR)==
==GaN Etch (Unaxis VLR)==
*[[media:09-Plasma_Etching_of_GaN-UnaxisPM1.pdf|GaN Etch Recipe (85C)]]
*[[media:09-Plasma_Etching_of_GaN-UnaxisPM1.pdf|GaN Etch Recipe (85C)]]

Revision as of 15:18, 3 October 2013

Back to Dry Etching Recipes.

Si Deep RIE (PlasmaTherm/Bosch Etch)

Single-step Si Etching (not Bosch Process!) (Si Deep RIE)

ICP Etch 1 (Panasonic E626I)

SiO2 Etching (Panasonic 1)

Al Etch (Panasonic 1)

Cr Etch (Panasonic 1)

Ti Etch (Panasonic 1)

AlGaAs Etch (Panasonic 1)

GaN Etch (Panasonic 1)

ICP Etch 2 (Panasonic E640)

SiO2 Etching (Panasonic 2)

Al Etch (Panasonic 2)

GaAs Etch (Panasonic 2)

ICP-Etch (Unaxis VLR)

GaAs Etch

AlGaAs Etch

InP Etch (Unaxis VLR)

InP Etch

InP Etch (H2 Ar)

GaN Etch (Unaxis VLR)