UV Ozone Reactor: Difference between revisions
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|super= Lee Sawyer |
|super= Lee Sawyer |
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|super2= Tony Bosch |
|super2= Tony Bosch |
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|model= |
|model=144AX |
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|location=Bay 5 |
|location=Bay 5 |
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|description = UV Ozone |
|description = UV Ozone Cleaner |
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|manufacturer = Jelight |
|manufacturer = Jelight |
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Revision as of 17:09, 8 September 2022
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About
UV+O (atomic oxygen) cleaning method is a photosensitized oxidation process in which the contaminant molecules of photo-resists, resins, human skin oils, cleaning solvent residues, silicone oils, and flux are excited and/or dissociated by the absorption of short-wavelength UV radiation. Near atomically clean surfaces can be achieved in less than one minute. In addition, this process does not damage any sensitive device structures of MOS gate oxide. The system can be used for oxygen activation, etching or oxidation of a surface without ion bombardment.