Dry Etch: Difference between revisions
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Created page with "Currently the Nanofab has the following '''{{PAGENAME}}''' tools. Please click on the tool for more information. * RIE 1 * RIE 2 * RIE 3 * RIE 5 * [[Si Deep RIE]…" |
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#redirect [[Tool_List#Dry Etch]] |
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Currently the Nanofab has the following '''{{PAGENAME}}''' tools. Please click on the tool for more information. |
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* [[RIE 1]] |
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* [[RIE 2]] |
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* [[RIE 3]] |
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* [[RIE 5]] |
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* [[Si Deep RIE]] |
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* [[Ashers]] |
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* [[VLR Etch]] |
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* [[ICP Etch 1]] |
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* [[ICP Etch 2]] |
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* [[UV Ozone Reactor]] |
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* [[Plasma Clean]] |
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* [[XeF2 Etch]] |
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* [[Plasma Activation Tool]] |
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Latest revision as of 01:00, 28 June 2012
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