ICP Etching Recipes: Difference between revisions
Jump to navigation
Jump to search
No edit summary |
|||
Line 2: | Line 2: | ||
=[[ICP Etch 1 (Panasonic E626I)]]= |
=[[ICP Etch 1 (Panasonic E626I)]]= |
||
==SiO Vertical Etch== |
==SiO Vertical Etch== |
||
*[[media:Panasonic1-SiO-Etch.pdf|SiO Vertical Etch]] |
*[[media:Panasonic1-SiO-Etch.pdf|SiO Vertical Etch Recipe]] |
||
=[[ICP Etch 2 (Panasonic E640)]]= |
=[[ICP Etch 2 (Panasonic E640)]]= |
||
=[[ICP-Etch (Unaxis VLR)]]= |
=[[ICP-Etch (Unaxis VLR)]]= |
Revision as of 15:56, 20 August 2012
Back to Dry Etching Recipes.