PECVD Recipes: Difference between revisions
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*[[Media:PECVD2-SiN-Recipe-NoAr-ExtraN2-120W-250C-Low-Stress.pdf|SiN Deposition Recipe - No Ar Extra N<sub>2</sub> (120W 250° Low Stress)]] |
*[[Media:PECVD2-SiN-Recipe-NoAr-ExtraN2-120W-250C-Low-Stress.pdf|SiN Deposition Recipe - No Ar Extra N<sub>2</sub> (120W 250° Low Stress)]] |
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==SiO<sub>2</sub> deposition (Unaxis VLR) == |
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=== SiO<sub>2</sub> (2% SiH<sub>4</sub>) === |
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!width=350 align=center|50° |
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!width=350 align=center|100° |
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!width=350 align=center|250° |
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*[[Media:PECVD2-SiO2-Recipe-5W-50C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 50°)]] |
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*[[Media:PECVD2-SiO2-Recipe-5W-100C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 100°)]] |
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*[[Media:PECVD2-SiO2-Recipe-5W-250C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 250°)]] |
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=== SiO<sub>2</sub> (2% SiH<sub>4</sub> - No Ar) === |
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!width=350 align=center|50° |
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!width=350 align=center|100° |
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!width=350 align=center|250° |
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*[[Media:PECVD2-SiO2-Recipe-NoAr-50C.pdf|SiO<sub>2</sub> Deposition Recipe - No Ar (50°)]] |
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*[[Media:PECVD2-SiO2-Recipe-NoAr-100C.pdf|SiO<sub>2</sub> Deposition Recipe - No Ar (100°)]] |
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*[[Media:PECVD2-SiO2-Recipe-NoAr-250C.pdf|SiO<sub>2</sub> Deposition Recipe - No Ar (250°)]] |
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Revision as of 18:18, 20 August 2012
Back to Vacuum Deposition Recipes.
PECVD 1 (PlasmaTherm 790)
SiN deposition (PECVD #1)
SiO2 deposition (PECVD #1)
PECVD 2 (Advanced Vacuum)
SiN deposition (PECVD #2)
SiO2 deposition (PECVD #2)
ICP-PECVD (Unaxis VLR)
SiN deposition (Unaxis VLR)
SiN (2% SiH4)
50° | 100° | 250° |
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SiN (2% SiH4 - No-Ar)
50° | 100° | 250° |
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SiN (2% SiH4 - No-Ar - Extra N2)
50° | 100° | 250° |
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SiO2 deposition (Unaxis VLR)
SiO2 (2% SiH4)
50° | 100° | 250° |
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SiO2 (2% SiH4 - No Ar)
50° | 100° | 250° |
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